JPS6240825U - - Google Patents
Info
- Publication number
- JPS6240825U JPS6240825U JP13254585U JP13254585U JPS6240825U JP S6240825 U JPS6240825 U JP S6240825U JP 13254585 U JP13254585 U JP 13254585U JP 13254585 U JP13254585 U JP 13254585U JP S6240825 U JPS6240825 U JP S6240825U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- tank
- processing tank
- stripping apparatus
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 239000000126 substance Substances 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 claims 1
- 238000007598 dipping method Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
Landscapes
- Weting (AREA)
Description
第1図は本考案の一実施例の平面図、第2図は
そのA―A断面図である。
1,2,3,4…処理槽、5,6…流水槽、7
…チエーン機構、8…アーム本体、11…シリン
ダ、15…シヤワー手段、16…エアカーテン手
段。
FIG. 1 is a plan view of an embodiment of the present invention, and FIG. 2 is a sectional view taken along line AA. 1, 2, 3, 4...processing tank, 5, 6...running water tank, 7
...Chain mechanism, 8...Arm body, 11...Cylinder, 15...Shower means, 16...Air curtain means.
Claims (1)
基板に塗布されたレジストを段階的に剥離する薬
液を内部に充たした複数の処理槽と、 この処理槽の下流側に設けられ、前記半導体基
板に付着した前記薬液を除去する流水槽と、 前記処理槽および前記流水槽に前記半導体基板
を搬送すると共に各槽内への浸漬および引き上げ
を行なう搬送手段とを具備してなるレジスト剥離
装置において、 半導体基板に洗浄水を吹き付けるシヤワー手段
および処理槽からの反応ガスを遮断するエアカー
テン手段を前記処理槽と流水槽との境界部分に備
えたことを特徴とするレジスト剥離装置。 2 洗浄水が純水である実用新案登録請求の範囲
第1項記載のレジスト剥離装置。 3 エアカーテン手段が窒素ガスを噴射するもの
である実用新案登録請求の範囲第1項記載のレジ
スト剥離装置。[Scope of Claim for Utility Model Registration] 1. A plurality of processing tanks each filled with a chemical solution that gradually removes resist applied to the semiconductor substrate by dipping the semiconductor substrate, and a processing tank provided downstream of the processing tank. a running water tank for removing the chemical solution adhering to the semiconductor substrate; and a transport means for transporting the semiconductor substrate to the processing tank and the running water tank, and for immersing and lifting the semiconductor substrate into each tank. What is claimed is: 1. A resist stripping apparatus, comprising: a shower means for spraying cleaning water onto a semiconductor substrate; and an air curtain means for blocking reaction gas from the processing tank, at a boundary between the processing tank and the running water tank. 2. The resist stripping apparatus according to claim 1, wherein the washing water is pure water. 3. The resist stripping apparatus according to claim 1, wherein the air curtain means injects nitrogen gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13254585U JPS6240825U (en) | 1985-08-30 | 1985-08-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13254585U JPS6240825U (en) | 1985-08-30 | 1985-08-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6240825U true JPS6240825U (en) | 1987-03-11 |
Family
ID=31032032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13254585U Pending JPS6240825U (en) | 1985-08-30 | 1985-08-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6240825U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0532842U (en) * | 1991-10-04 | 1993-04-30 | 豊生ブレーキ工業株式会社 | Caliper for Disc Brake |
EP2924720A1 (en) | 2014-03-24 | 2015-09-30 | Ebara Corporation | Substrate processing apparatus and resist removing unit |
-
1985
- 1985-08-30 JP JP13254585U patent/JPS6240825U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0532842U (en) * | 1991-10-04 | 1993-04-30 | 豊生ブレーキ工業株式会社 | Caliper for Disc Brake |
EP2924720A1 (en) | 2014-03-24 | 2015-09-30 | Ebara Corporation | Substrate processing apparatus and resist removing unit |
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