JPS6010672Y2 - gas treatment tower - Google Patents

gas treatment tower

Info

Publication number
JPS6010672Y2
JPS6010672Y2 JP17468679U JP17468679U JPS6010672Y2 JP S6010672 Y2 JPS6010672 Y2 JP S6010672Y2 JP 17468679 U JP17468679 U JP 17468679U JP 17468679 U JP17468679 U JP 17468679U JP S6010672 Y2 JPS6010672 Y2 JP S6010672Y2
Authority
JP
Japan
Prior art keywords
cylinder chamber
inner cylinder
outer cylinder
liquid
tower
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17468679U
Other languages
Japanese (ja)
Other versions
JPS5690924U (en
Inventor
文雄 西口
Original Assignee
三菱重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱重工業株式会社 filed Critical 三菱重工業株式会社
Priority to JP17468679U priority Critical patent/JPS6010672Y2/en
Publication of JPS5690924U publication Critical patent/JPS5690924U/ja
Application granted granted Critical
Publication of JPS6010672Y2 publication Critical patent/JPS6010672Y2/en
Expired legal-status Critical Current

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  • Gas Separation By Absorption (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Treating Waste Gases (AREA)

Description

【考案の詳細な説明】 本考案は、水又は薬液による洗浄、又は吸着などを行う
ガス処理塔に関する。
[Detailed Description of the Invention] The present invention relates to a gas treatment tower that performs cleaning or adsorption with water or a chemical solution.

排ガス中の有害成分を除去する方法として洗浄法があり
、その有害成分の種類により、水洗、薬洗になどが行な
われるが、この際には、従来は別々に独立した水洗塔、
薬洗塔を設置し処理していた。
There is a cleaning method to remove harmful components from exhaust gas, and depending on the type of harmful components, water washing, chemical washing, etc. are performed, but in this case, conventionally, separate water washing towers,
A chemical washing tower was installed and treated.

この方法では設置スペースおよびコスト面で割高となる
ため、殆んど一塔処理9例えばアルカリ洗浄または水洗
浄ですまされているが、前者ではHCIなど酸性有害成
分などには効果があるが、NH3などのアルカリ性有害
成分などには効果はない。
Since this method is relatively expensive in terms of installation space and cost, most single-tower treatments9 are used, such as alkaline cleaning or water cleaning.The former is effective against acidic harmful components such as HCI, but NH3 It has no effect on alkaline harmful ingredients such as.

後者はNH3など水に容易に吸収されるものには効果が
あるが、その他の有害成分には効果が少く不完全である
The latter is effective against substances that are easily absorbed by water, such as NH3, but is incomplete and has little effect on other harmful components.

本考案は一塔で異性の有害成分を除去できるコンパクト
化した洗浄法による排ガス処理装置を提供するものであ
る。
The present invention provides an exhaust gas treatment device using a compact cleaning method that can remove harmful isomeric components in one tower.

本考案か塔内構造を二重に腰その内筒部および外筒部を
個々に独立させた排ガス処理装置である。
The present invention is an exhaust gas treatment device in which the internal structure of the tower is doubled, and the inner cylinder and outer cylinder are made independent.

本構造によれば、排ガス中の有害成分に応じて水洗、ア
ルカリ洗、酸洗を目的によって二種類選択し実施でき、
コンパクト化がはかられ設置スペースおよび低コストで
二液処理ができる。
According to this structure, water washing, alkaline washing, and pickling can be selected from two types depending on the purpose, depending on the harmful components in the exhaust gas.
It is compact and can perform two-liquid processing with less installation space and cost.

また、内筒部又は外筒部少なくとも一方を吸着剤充填塔
として使用することもできる。
Moreover, at least one of the inner cylinder part and the outer cylinder part can also be used as an adsorbent packed column.

又ガスの吸収率を上げるために同質の濃い液を薄い液で
処理することも出来る。
It is also possible to treat a homogeneous thick liquid with a thin liquid in order to increase the gas absorption rate.

第1図は本考案の一実施例であり、第2図は第1図のI
−I矢視図である。
Figure 1 shows an embodiment of the present invention, and Figure 2 shows the I of Figure 1.
-I arrow view.

第1図及び第2図に於て、1は排ガス導入管であって、
2は一次処理を行なう外筒室、3は充填物、4は液のス
プレーノズル、4′は補給液ノズル、5はデミスタ−1
7は二次処理を行なう内筒室であって、外筒室2より導
管6によって導入される。
In FIGS. 1 and 2, 1 is an exhaust gas introduction pipe,
2 is an outer cylindrical chamber for performing primary treatment, 3 is a filling material, 4 is a liquid spray nozzle, 4' is a replenishment liquid nozzle, and 5 is a demister 1
Reference numeral 7 denotes an inner cylindrical chamber for performing secondary treatment, which is introduced from the outer cylindrical chamber 2 through a conduit 6.

8は内筒室内の充填物、9は液のスプレーノズル、9′
は補給液ノズル(水洗浄以外のときは4′および9′は
必要はない)、10はデミスタであって、11は排ガス
排出管である。
8 is the filling in the inner cylinder chamber, 9 is a liquid spray nozzle, 9'
1 is a replenishing liquid nozzle (4' and 9' are not necessary for purposes other than water cleaning), 10 is a demister, and 11 is an exhaust gas discharge pipe.

14は液供給管であって、ノズル4に供給される。14 is a liquid supply pipe, which is supplied to the nozzle 4.

12は外筒液の排出管、また15は内筒液の供給管でノ
ズル9に供給される。
12 is a discharge pipe for the outer cylinder liquid, and 15 is a supply pipe for the inner cylinder liquid, which is supplied to the nozzle 9.

13は内筒液の排出管である。13 is a discharge pipe for the inner cylinder liquid.

排ガス導入管1により導入された排ガスは、スプレーノ
ズル4から噴霧された液(水洗のときはH2O,アルカ
リ洗のときはNaO■容液など)と向流し充填物3によ
って気流接触が充分行なわれた後、デミスタ5を経て導
管3によって内筒室(二次処理筒)へ導かれる。
The exhaust gas introduced through the exhaust gas introduction pipe 1 is brought into sufficient air flow contact with the liquid sprayed from the spray nozzle 4 (H2O for water washing, NaO2 liquid for alkaline washing, etc.) by the counterflow filling 3. After that, it is guided to the inner cylinder chamber (secondary processing cylinder) via the demister 5 and the conduit 3.

その間にデミスタ、充填物によってミスト、ヒユーム、
ダストはガス処理と同時に除去される。
In between, the mist, hium, by demister and filling,
Dust is removed simultaneously with gas treatment.

内筒室7内の作用(二次処理、薬洗のときはNaOH,
H2SO4,HCl0などの溶液)も外筒室2と同様で
あり、排ガス排出管11より有害成分を除去された後、
排出される。
Action inside the inner cylinder chamber 7 (for secondary treatment and chemical washing, use NaOH,
Solutions such as H2SO4 and HCl0) are also the same as those in the outer cylinder chamber 2, and after harmful components are removed from the exhaust gas exhaust pipe 11,
It is discharged.

外筒室2の排出液は排出管12からポンプを経て液供給
管14に循環され、内筒室7の排出液も同様に独立した
ポンプを経て、供給管15のノズルへ循環される。
The liquid discharged from the outer cylinder chamber 2 is circulated from the discharge pipe 12 through the pump to the liquid supply pipe 14, and the liquid discharged from the inner cylinder chamber 7 is similarly circulated to the nozzle of the supply pipe 15 through an independent pump.

これらの液の操作は従来方法と同様である。Manipulation of these liquids is similar to conventional methods.

本考案によれば、二液処理方法が排ガス中の有害成分に
応じて効果的に実施できるので有害ガス処理が完全に行
なえる。
According to the present invention, since the two-component treatment method can be effectively implemented depending on the harmful components in the exhaust gas, the harmful gas can be completely processed.

また二段処理なのでミスト、ヒユーム、ダストの除去も
より完全となり、−前方式なのでコンパクト化でき設置
面積の節減と、低コスト化がはかられる。
In addition, since it is a two-stage process, mist, fume, and dust can be removed more completely, and because it is a front-end process, it can be made more compact, reducing the installation area and lowering costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、一実施態様の立面図、第2図はその断面図で
ある。 2・・・・・・外筒室、6・・・・・・導管、7・・・
・・・内筒室。
FIG. 1 is an elevational view of one embodiment, and FIG. 2 is a cross-sectional view thereof. 2... Outer cylinder chamber, 6... Conduit, 7...
...Inner cylinder chamber.

Claims (1)

【実用新案登録請求の範囲】 2重同心円構造のガス処理塔において、塔内構造を二重
にして互いに独立して設けられた外側の内筒と内側の円
筒の間の部分(以下、外筒室という。 )及び内側の円筒の内部(以下、内筒室という。 )、外筒室及び内筒室に各々設けられた吸収領域又は吸
着領域、外筒室の一端側と内筒室の一端側とを連通ずる
導管を有し、外筒室と内筒室とを直列に連通ずる排ガス
流路が形成されており、かつ外筒室及び内筒室に、異な
る液体を供給する手段を有することを特徴とするガス処
理塔。
[Claims for Utility Model Registration] In a gas treatment tower with a double concentric structure, the internal structure of the tower is doubled and the part between the outer inner cylinder and the inner cylinder (hereinafter referred to as the outer cylinder) is provided independently from each other. ) and the inside of the inner cylinder (hereinafter referred to as the inner cylinder chamber), absorption areas or adsorption areas provided in the outer cylinder chamber and the inner cylinder chamber, one end side of the outer cylinder chamber and one end of the inner cylinder chamber. an exhaust gas passage connecting the outer cylinder chamber and the inner cylinder chamber in series, and has means for supplying different liquids to the outer cylinder chamber and the inner cylinder chamber. A gas processing tower characterized by:
JP17468679U 1979-12-17 1979-12-17 gas treatment tower Expired JPS6010672Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17468679U JPS6010672Y2 (en) 1979-12-17 1979-12-17 gas treatment tower

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17468679U JPS6010672Y2 (en) 1979-12-17 1979-12-17 gas treatment tower

Publications (2)

Publication Number Publication Date
JPS5690924U JPS5690924U (en) 1981-07-20
JPS6010672Y2 true JPS6010672Y2 (en) 1985-04-11

Family

ID=29685406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17468679U Expired JPS6010672Y2 (en) 1979-12-17 1979-12-17 gas treatment tower

Country Status (1)

Country Link
JP (1) JPS6010672Y2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008221042A (en) * 2007-03-08 2008-09-25 Orion Shoko Kk Deodorization apparatus
JP6214256B2 (en) * 2013-07-16 2017-10-18 アマノ株式会社 Dust collector

Also Published As

Publication number Publication date
JPS5690924U (en) 1981-07-20

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