JPS6240697B2 - - Google Patents

Info

Publication number
JPS6240697B2
JPS6240697B2 JP58203764A JP20376483A JPS6240697B2 JP S6240697 B2 JPS6240697 B2 JP S6240697B2 JP 58203764 A JP58203764 A JP 58203764A JP 20376483 A JP20376483 A JP 20376483A JP S6240697 B2 JPS6240697 B2 JP S6240697B2
Authority
JP
Japan
Prior art keywords
layer
contrast
photoresist layer
photobleachable
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58203764A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59104642A (ja
Inventor
Furederitsuku Gurifuingu Buruusu
Richaado Uesuto Hooru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS59104642A publication Critical patent/JPS59104642A/ja
Publication of JPS6240697B2 publication Critical patent/JPS6240697B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58203764A 1982-11-01 1983-11-01 集積回路の製法 Granted JPS59104642A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US43819482A 1982-11-01 1982-11-01
US438194 1982-11-01
US536923 1983-09-28

Publications (2)

Publication Number Publication Date
JPS59104642A JPS59104642A (ja) 1984-06-16
JPS6240697B2 true JPS6240697B2 (en, 2012) 1987-08-29

Family

ID=23739639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58203764A Granted JPS59104642A (ja) 1982-11-01 1983-11-01 集積回路の製法

Country Status (1)

Country Link
JP (1) JPS59104642A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI875260B (zh) * 2023-10-23 2025-03-01 奇美實業股份有限公司 水溶性組合物、其用途及半導體裝置的製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
US4663275A (en) * 1984-09-04 1987-05-05 General Electric Company Photolithographic method and combination including barrier layer
JPH07107602B2 (ja) * 1985-04-30 1995-11-15 株式会社東芝 パタ−ン形成材料
CA2011927C (en) * 1989-06-02 1996-12-24 Alan Lee Sidman Microlithographic method for producing thick, vertically-walled photoresist patterns
JP2663815B2 (ja) * 1992-11-02 1997-10-15 信越化学工業株式会社 レジストパターン形成方法
US5902716A (en) * 1995-09-05 1999-05-11 Nikon Corporation Exposure method and apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL140629B (nl) * 1963-07-04 1973-12-17 Kalle Ag Lichtgevoelig materiaal voor de vervaardiging van drukvormen en de daarmede vervaardigde drukvormen.
US3511653A (en) * 1966-07-01 1970-05-12 American Cyanamid Co Contrast enhancement of optical images
NL7216227A (en, 2012) * 1972-11-30 1974-06-04
US3873313A (en) * 1973-05-21 1975-03-25 Ibm Process for forming a resist mask
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI875260B (zh) * 2023-10-23 2025-03-01 奇美實業股份有限公司 水溶性組合物、其用途及半導體裝置的製造方法

Also Published As

Publication number Publication date
JPS59104642A (ja) 1984-06-16

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Legal Events

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