JPS6237924U - - Google Patents
Info
- Publication number
- JPS6237924U JPS6237924U JP12963785U JP12963785U JPS6237924U JP S6237924 U JPS6237924 U JP S6237924U JP 12963785 U JP12963785 U JP 12963785U JP 12963785 U JP12963785 U JP 12963785U JP S6237924 U JPS6237924 U JP S6237924U
- Authority
- JP
- Japan
- Prior art keywords
- processing apparatus
- vacuum processing
- light
- reflecting mirror
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001816 cooling Methods 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
- Drying Of Semiconductors (AREA)
Description
第1図は実施例の断面図、第2図は収納室の斜
視図、第3図は光センサを収納した収納室の断面
図、第4図は具体回路例である。
1…チヤンバ、2,3…ガラス窓、4…反射鏡
、5…投光器、6…光センサ。
FIG. 1 is a cross-sectional view of an embodiment, FIG. 2 is a perspective view of a storage chamber, FIG. 3 is a cross-sectional view of a storage chamber in which an optical sensor is stored, and FIG. 4 is a specific circuit example. 1... Chamber, 2, 3... Glass window, 4... Reflector, 5... Floodlight, 6... Optical sensor.
補正 昭60.11.13
実用新案登録請求の範囲を次のように補正する
。Amendment November 13, 1980 The scope of claims for utility model registration is amended as follows.
【実用新案登録請求の範囲】
(1) 真空処理装置のチヤンバに、透明部材から
なる2つの窓を所定間隔を隔てて設け、前記チヤ
ンバ内に少なくとも一つの反射鏡を設置し、一方
の窓の外に前記反射鏡に向けて光を投光する投光
手段を設け、さらに他方の窓の外に前記反射鏡の
反射光を受光してその受光の強さに応じた信号を
出力する受光手段を設けたことを特徴とする真空
処理装置。
(2) 前記受光手段は真空に排気した収納室に設
けたことを特徴とする実用新案登録請求の範囲第
1項記載の真空処理装置。
(3) 前記受光手段は冷却手段によつて冷却され
ることを特徴とする実用新案登録請求の範囲第1
項または第2項記載の真空処理装置。[Claims for Utility Model Registration] (1) Two windows made of a transparent material are provided at a predetermined interval in a chamber of a vacuum processing apparatus, at least one reflecting mirror is installed in the chamber, and one window is A light projecting means for projecting light toward the reflecting mirror is provided outside, and a light receiving means is provided outside the other window for receiving the reflected light from the reflecting mirror and outputting a signal according to the intensity of the received light. A vacuum processing apparatus characterized by being provided with. (2) The vacuum processing apparatus according to claim 1, wherein the light receiving means is provided in a storage chamber that is evacuated. (3) Utility model registration claim 1, characterized in that the light receiving means is cooled by a cooling means.
The vacuum processing apparatus according to item 1 or 2.
Claims (1)
なる2つの窓を所定間隔を隔てて設け、前記チヤ
ンバ内に少なくとも一つの反射鏡を設置し、一方
の窓の外に前記反射鏡に向けて光を投光する投光
手段を設け、さらに他方の窓の外に前記反射鏡の
反射光を受光してその受光の強さに応じた信号を
出力する受光手段を設けたことを特徴とする真空
処理装置。 (2) 前記受講手段は真空に排気した収納室に設
けたことを特徴とする実用新案登録請求の範囲第
1項記載の真空処理装置。 (3) 前記受光手段は冷却手段によつて冷却され
ることを特徴とする実用新案登録請求の範囲第1
項または第2項記載の真空処理装置。[Claims for Utility Model Registration] (1) Two windows made of a transparent material are provided at a predetermined interval in a chamber of a vacuum processing apparatus, at least one reflecting mirror is installed in the chamber, and one window is A light projecting means for projecting light toward the reflecting mirror is provided outside, and a light receiving means is provided outside the other window for receiving the reflected light from the reflecting mirror and outputting a signal according to the intensity of the received light. A vacuum processing apparatus characterized by being provided with. (2) The vacuum processing apparatus according to claim 1, wherein the learning means is provided in a storage chamber that is evacuated. (3) Utility model registration claim 1, characterized in that the light receiving means is cooled by a cooling means.
The vacuum processing apparatus according to item 1 or 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985129637U JPH0526737Y2 (en) | 1985-08-26 | 1985-08-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985129637U JPH0526737Y2 (en) | 1985-08-26 | 1985-08-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6237924U true JPS6237924U (en) | 1987-03-06 |
JPH0526737Y2 JPH0526737Y2 (en) | 1993-07-07 |
Family
ID=31026382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985129637U Expired - Lifetime JPH0526737Y2 (en) | 1985-08-26 | 1985-08-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0526737Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03166718A (en) * | 1989-11-27 | 1991-07-18 | Mitsubishi Electric Corp | Chemical vapor growth device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5353970U (en) * | 1976-10-08 | 1978-05-09 | ||
JPS5878428A (en) * | 1981-11-04 | 1983-05-12 | Toshiba Corp | Reactive ion etching apparatus |
JPS58131628A (en) * | 1982-01-31 | 1983-08-05 | 松下電工株式会社 | Arc extinguishing device |
-
1985
- 1985-08-26 JP JP1985129637U patent/JPH0526737Y2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5353970U (en) * | 1976-10-08 | 1978-05-09 | ||
JPS5878428A (en) * | 1981-11-04 | 1983-05-12 | Toshiba Corp | Reactive ion etching apparatus |
JPS58131628A (en) * | 1982-01-31 | 1983-08-05 | 松下電工株式会社 | Arc extinguishing device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03166718A (en) * | 1989-11-27 | 1991-07-18 | Mitsubishi Electric Corp | Chemical vapor growth device |
Also Published As
Publication number | Publication date |
---|---|
JPH0526737Y2 (en) | 1993-07-07 |
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