JPS6237083U - - Google Patents
Info
- Publication number
- JPS6237083U JPS6237083U JP12811885U JP12811885U JPS6237083U JP S6237083 U JPS6237083 U JP S6237083U JP 12811885 U JP12811885 U JP 12811885U JP 12811885 U JP12811885 U JP 12811885U JP S6237083 U JPS6237083 U JP S6237083U
- Authority
- JP
- Japan
- Prior art keywords
- discharge electrode
- electrode plate
- divided
- electrode plates
- frequency power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Description
第１図はこの考案の１実施例であるプラズマＣ
ＶＤ装置の電極部の構成を示す模式説明図、第２
図、第３図および第４図はこの装置の放電電極板
の分割配置パターンの３種を示した正面図、第５
図は分割各電極板が別々のマツチング回路を介し
て別々の高周波電源にそれぞれ接続されている状
態を示した回路図、第６図は従来の装置の模式説
明図、第７―Ａ図、第７―Ｂ図は従来の装置にお
ける放電電極板の形状パターンの２種を示した正
面図である。
１……真空チヤンバ、２……放電電極板、２′
……アース電極板、３……高周波電源、４，４′
……マツチング回路、５……基板、１１……電気
絶縁帯状部材、１２……バリコン、Ｐ，Ｑ，Ｒ…
…分割放電電極板。
Figure 1 shows a plasma C which is one embodiment of this invention.
Schematic explanatory diagram showing the configuration of the electrode part of the VD device, 2nd
Figures 3 and 4 are front views showing three types of divided arrangement patterns of the discharge electrode plates of this device, and Figure 5.
The figure is a circuit diagram showing that each divided electrode plate is connected to a separate high-frequency power source via a separate matching circuit, Figure 6 is a schematic explanatory diagram of a conventional device, Figure 7-A, Figure 7-B is a front view showing two types of shape patterns of discharge electrode plates in a conventional device. 1... Vacuum chamber, 2... Discharge electrode plate, 2'
...Earth electrode plate, 3...High frequency power supply, 4,4'
... Matching circuit, 5 ... Board, 11 ... Electrical insulation strip member, 12 ... Variable capacitor, P, Q, R ...
...Divided discharge electrode plate.
Claims (1)
チング回路を介して接続される放電電極板とアー
ス電極板とを互いに対向させて配設してなるプラ
ズマＣＶＤ装置の電極部において、前記放電電極
板を複数の放電電極板に分割して形成し、それら
分割された各放電電極板をこれら放電電極板全体
の中心において互いに直交する２軸のそれぞれに
対して対称位置に配置し、かつ分割された各放電
電極板間を電気絶縁帯条部材で電気的に遮断する
とともに、分割された各放電電極板をそれぞれ別
々のマツチング回路を介して同一の、もしくは別
々の高周波電源に接続したことを特徴とするプラ
ズマＣＶＤ装置の電極部。 In the electrode section of a plasma CVD apparatus, in which a discharge electrode plate and a ground electrode plate, which are connected to a high-frequency power source through a matching circuit, are disposed facing each other in the inner space of a vacuum chamber, the discharge electrode plate is It is formed by dividing into a plurality of discharge electrode plates, and each of the divided discharge electrode plates is arranged at a symmetrical position with respect to each of two axes orthogonal to each other at the center of the entire discharge electrode plate, and each of the divided discharge electrode plates is The discharge electrode plates are electrically isolated by an electrically insulating strip member, and each divided discharge electrode plate is connected to the same or different high-frequency power sources via separate matching circuits. Electrode part of plasma CVD equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12811885U JPS641958Y2 (en) | 1985-08-21 | 1985-08-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12811885U JPS641958Y2 (en) | 1985-08-21 | 1985-08-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6237083U true JPS6237083U (en) | 1987-03-05 |
| JPS641958Y2 JPS641958Y2 (en) | 1989-01-18 |
Family
ID=31023499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12811885U Expired JPS641958Y2 (en) | 1985-08-21 | 1985-08-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS641958Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001168044A (en) * | 1999-12-14 | 2001-06-22 | Sharp Corp | Plasma enhanced cvd device, method of manufacturing thin film using it, and method of manufacturing thin film solar battery |
| JP2009231247A (en) * | 2008-03-25 | 2009-10-08 | Tokyo Electron Ltd | Plasma treatment device, and supplying method of high frequency power |
-
1985
- 1985-08-21 JP JP12811885U patent/JPS641958Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001168044A (en) * | 1999-12-14 | 2001-06-22 | Sharp Corp | Plasma enhanced cvd device, method of manufacturing thin film using it, and method of manufacturing thin film solar battery |
| JP2009231247A (en) * | 2008-03-25 | 2009-10-08 | Tokyo Electron Ltd | Plasma treatment device, and supplying method of high frequency power |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS641958Y2 (en) | 1989-01-18 |
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