JPS6236600Y2 - - Google Patents

Description

[Detailed description of the invention] The present invention uses extremely fine granular or powdery abrasives such as silica (SiO ₂ ), which are very fine and have strong drying properties, in liquid polishing processing using free abrasive particles using a polishing dish container. A polishing dish container that holds the processed material (ferrite, etc.), polisher (wax, etc.), and polishing agent (silica, water) when grains are used, and the polishing dish container is divided into two layers: an inner layer and an outer layer. death,
This invention relates to a two-layer polishing dish container configured so that a polishing agent always condenses and adheres to the outer inner wall of the polishing dish container.

Conventionally, in this type of submerged polishing process using a single-layer container, if a highly drying substance (such as silica) is used for the abrasive grains, the centrifugal force causes the abrasive to damage the inner wall of the polishing dish container and the correction ring. Dry abrasive grain clumps formed by the bonding of fine grain powders may stick and fall onto the polisher during processing. This lump is hard to some extent and causes rolling scratches between the workpiece and the polisher, making it difficult to obtain a scratch-free, smooth mirror surface.

The purpose of this invention is to eliminate the above-mentioned drawbacks.
One more layer is attached to the outside of the conventional one-layer polishing dish container that holds the workpiece polisher and polishing agent, and the polishing dish container has a double structure with an inside and an outside layer.
The inner wall of each layer is always filled with polishing agent, so that even if a lump formed by the combination of minute dry grains or powdered abrasive grains is generated, it will stick to the inner wall of the second layer and will not affect the polisher. It is an object of the present invention to provide a two-layer polishing dish container characterized in that a smooth mirror surface without scratches can be obtained on the finished surface of a workpiece because falling contamination can be avoided.

The present invention will be described in detail below with reference to the drawings. FIG. 1 is a sectional view of a two-layer polishing dish container according to the present invention. The internal structure consists of a rotating cylindrical container 1 consisting of an inner cylindrical container 1a, an outer cylindrical container 1b attached to the outside of the inner cylindrical container 1a, and a rotatably supported correction wheel 4. In a flat processing container in which a polisher is placed inside the container 1a and submerged polishing is performed using free abrasive grains, the height of the outer cylindrical container 1b is set as the height of the inner cylindrical container 1a.
This is a two-layer polishing dish container characterized in that its mounting position is higher than the bottom surface of the inner cylindrical container 1a and less than 1/2 of the height. An aluminum substrate 3 is placed inside the inner cylindrical container 1a.
The polisher 2, which has been melted and cooled beforehand and then molded, is placed on top of the polisher 2, and the work piece 6 is pasted on the polisher 2, and the pasting plate 5 is surrounded by a support to which the flatness of the polisher 2 is corrected and one side is fixed. A correction ring 4 is set so as to be rotatably supported around the tip of a needle 9 inserted into the ring 8. The inside and outside of such a cylindrical container 1 are filled with a polishing agent (silica, water) 7, and in the figure, 7b indicates the water level of the conventional polishing agent 7, and 7a indicates the water level according to the present invention. . When the cylindrical container 1 is forcibly rotated under such conditions, the pasting plate 5 and the correction wheel 4 rotate accordingly, the polisher 2 and the workpiece 6 perform relative movement, and the workpiece 6 is polished. However, at this time, polishing agent 7
The water level becomes 7a, and the abrasive grains dispersed in the machining fluid do not adhere to the correction wheel 4 but to the outer inner wall of the two-layer polishing dish container 1, so they do not fall to the polisher 2, and the polishing process progresses. . FIG. 2 is a plan view of the present invention. Conventional polishing dish containers consist only of the inside shown in this figure,
In the present invention, the polishing agent 7 can also be filled on the outside.

As described above, according to the present invention, simply by making the polishing dish container have a double structure of inside and outside, it is possible to prevent dried lumps caused by fine powder of abrasive grains from falling onto the polisher, resulting in a smooth and high polishing surface without scratches. A two-layer polishing dish container that makes it possible to obtain a mirror surface with high precision can be obtained.

[Brief explanation of the drawing]

FIG. 1 is a sectional view of a two-layer polishing dish container according to the present invention, and FIG. 2 is a plan view thereof. In the figure, 1: cylindrical container, 2: policy,
3: aluminum substrate, 4: correction ring, 5: pasting plate, 6: workpiece, 7: polishing agent, 7a: water level of polishing agent according to the present invention, 7b: water level of conventional polishing agent, 8: support tool, 9 : Kanzaki, 1a: Inner cylindrical container, 1b: Outer cylindrical container.

Claims (1)

[Scope of utility model registration request] It consists of a rotating cylindrical container 1 consisting of an inner cylindrical container 1a, an outer cylindrical container 1b attached to the outside thereof, and a rotatably supported correction wheel 4, and a polisher is applied inside the inner cylindrical container 1a. In a flat processing container that performs submerged polishing using free abrasive grains, the height of the outer cylindrical container 1b is higher than the height of the inner cylindrical container 1a, and the mounting position thereof is higher than the bottom surface of the inner cylindrical container 1a. , and a two-layer polishing dish container having a height of 1/2 or less.