JPS6236599Y2 - - Google Patents
Info
- Publication number
- JPS6236599Y2 JPS6236599Y2 JP1983083962U JP8396283U JPS6236599Y2 JP S6236599 Y2 JPS6236599 Y2 JP S6236599Y2 JP 1983083962 U JP1983083962 U JP 1983083962U JP 8396283 U JP8396283 U JP 8396283U JP S6236599 Y2 JPS6236599 Y2 JP S6236599Y2
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- main body
- abrasive material
- polishing
- abrasive grains
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003082 abrasive agent Substances 0.000 claims description 20
- 239000006061 abrasive grain Substances 0.000 claims description 15
- 230000005484 gravity Effects 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 239000010432 diamond Substances 0.000 claims description 5
- 238000004070 electrodeposition Methods 0.000 claims description 4
- 238000005498 polishing Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000007772 electroless plating Methods 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Description
【考案の詳細な説明】
〔考案の技術分野〕
本考案は、主としてセラミツク、サーメツトな
どの硬脆材料のバレル仕上げに好適する研摩材に
関する。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention mainly relates to an abrasive material suitable for barrel finishing hard and brittle materials such as ceramics and cermets.
一般に、バレル仕上げにおいて鋼類を研摩する
場合には、各種のものが用いられている。たとえ
ば、天然石塊、人造焼結石塊、単体の砥料、砥粒
の各種結合体、カツトワイヤなどの金属メデイア
等が、被加工物の材質、形状、研摩目的に応じて
使い分けられている。ところで、近時、例えば窒
化珪素（Si3N4）などのセラミツク成形品が広範囲
に普及している。通常、このセラミツク成形品の
仕上加工もバレル仕上げにより行われることが多
い。しかし、従来の研摩材によりセラミツク成形
品のバレル仕上げを行うと、研摩能率がすこぶる
低く、製品コストの低減をはばむ一因となつてい
た。
Generally, when polishing steel for barrel finishing, various types of polishing tools are used. For example, natural stone blocks, artificial sintered stone blocks, single abrasives, various combinations of abrasive grains, metal media such as cut wires, etc. are used depending on the material, shape, and purpose of polishing of the workpiece. By the way, ceramic molded products such as silicon nitride (Si 3 N 4 ) have recently become widespread. Normally, the finishing of ceramic molded products is often performed by barrel finishing. However, when barrel-finishing ceramic molded products using conventional abrasive materials, the polishing efficiency is extremely low, which is one of the factors that hinders product cost reduction.
本考案は、上記事情を勘案してなされたもの
で、研摩能率が高く硬脆性材料のバレル仕上げに
好適する研摩材を提供することを目的とする。
The present invention was made in consideration of the above circumstances, and an object of the present invention is to provide an abrasive material that has high polishing efficiency and is suitable for barrel finishing of hard and brittle materials.
タングステン、超硬合金等の比重の大きな粒状
の本体部表面に電着層を介してダイヤモンドなど
の硬質の砥粒を被着させたものである。
Hard abrasive grains such as diamond are deposited on the surface of a granular body made of tungsten, cemented carbide, etc. with a large specific gravity via an electrodeposited layer.
以下、本発明の一実施例を図面を参照して詳述
する。
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.
第１図は、本実施例の研摩材を示すもので、こ
の研摩材は、平均粒径が数〜10mmの球状の本体部
１と、この本体部１の表面全体に例えばニツケル
（Ni）などの電着層２により複数の砥粒３…が単
層に被着された砥粒部４とからなつている。上記
本体部１の材質は、タングステン（Ｗ）、超硬合
金等の比重が高い金属が好適している。また、砥
粒３…としては、ダイヤモンド、窒化ボロン
（BN）、炭化珪素を単独又は混合して用いる。こ
のような研摩材の製造例を以下に示す。すなわ
ち、ダイヤモンド砥粒と無電解めつき液（たとえ
ばNi無電解めつきの場合、塩化ニツケル30ｇ／
、次亜リン酸ナトリウム10ｇ／、クエン酸ナ
トリウム10ｇ／水溶液）とを混合し、約90℃に
加熱した状態にタングステン球を浸漬すると、球
表面にダイヤモンド砥粒が電着される。電着層の
厚さは必要に応じて、メツキ時間を調整すること
により、自由に制御することができる。このよう
にして製造した研摩材の一例が第１図である。 FIG. 1 shows the abrasive material of this example. This abrasive material has a spherical main body part 1 with an average particle size of several to 10 mm, and the entire surface of this main body part 1 is made of, for example, nickel (Ni). The electrodeposition layer 2 comprises an abrasive grain portion 4 in which a plurality of abrasive grains 3 are deposited in a single layer. The material of the main body 1 is preferably a metal with high specific gravity such as tungsten (W) or cemented carbide. Further, as the abrasive grains 3, diamond, boron nitride (BN), and silicon carbide are used alone or in combination. An example of manufacturing such an abrasive material is shown below. In other words, diamond abrasive grains and electroless plating solution (for example, in the case of Ni electroless plating, nickel chloride 30g/
, sodium hypophosphite 10g/sodium citrate/aqueous solution) and immerse a tungsten ball in a mixture heated to about 90°C, diamond abrasive grains are electrodeposited on the surface of the ball. The thickness of the electrodeposited layer can be freely controlled by adjusting the plating time as necessary. An example of the abrasive material manufactured in this manner is shown in FIG.
しかして、上記構成の研摩材を用いてバレル研
摩を行うと、本体部１の比重が炭化珪素、酸化ア
ルミニウム等に比べて大きいので、被加工物に対
する研摩材の衝撃力が大きく、その結果研摩力
も、炭化珪素、酸化アルミニウム、金属メデイア
（例えば亜鉛、黄銅等）のほぼ同じ大きさの研摩
材に比べて格段に高くなる。したがつて、被加工
物がセラミツク部品、サーメツト部品、超硬合金
部品などの硬脆材であつても、迅速かつ確実に研
摩できを。しかも、バレル研摩の進行にともない
本体部１より離脱した砥粒３…も、本実施例の研
摩材と協働してバレル研摩加工にあずかるので、
よりきめのこまかい研摩加工を行うことができる
利点を有する。 However, when barrel polishing is performed using an abrasive with the above structure, since the specific gravity of the main body 1 is larger than that of silicon carbide, aluminum oxide, etc., the impact force of the abrasive on the workpiece is large, and as a result, the polishing The force is also significantly higher than for similar sized abrasives made of silicon carbide, aluminum oxide, or metal media (eg, zinc, brass, etc.). Therefore, even if the workpiece is a hard brittle material such as ceramic parts, cermet parts, or cemented carbide parts, it can be polished quickly and reliably. Furthermore, as the barrel polishing progresses, the abrasive grains 3 separated from the main body 1 also participate in the barrel polishing process in cooperation with the abrasive material of this embodiment.
It has the advantage of being able to perform finer-grained polishing.
なお、上記実施例においては、本体部１の形状
は、球状であるが、たとえば第２図に示すように
鋭利な角部を有する塊状又は円柱状、円盤状等任
意形状でよい。さらに、電着層２は、単層構造で
なく多層構造としてもよい。また、電着層の材質
としては、ニツケルに限ることなく、銅、コバル
トを用いてもよい。さらに、本体部１の金属とし
ては、たとえば鋼、黄銅、モリブデン、鉛等、比
重５以上の金属であれば、加工目的に応じて任意
に選択してよい。さらに、本考案の研摩材の製造
方法として、最初に無電解めつきによる電着層に
より砥粒３…を付着させた後、通常の電解めつき
により電着層の厚さを能率的に増すようにしても
よい。さらにまた、本考案の研摩材は、バレル仕
上げ用でなく、噴射加工用の研摩材として用いて
もよい。 In the above embodiment, the main body part 1 has a spherical shape, but may have any shape, such as a block shape with sharp corners, a columnar shape, a disk shape, etc., as shown in FIG. 2, for example. Furthermore, the electrodeposited layer 2 may have a multilayer structure instead of a single layer structure. Further, the material of the electrodeposition layer is not limited to nickel, and copper or cobalt may also be used. Furthermore, the metal of the main body portion 1 may be arbitrarily selected depending on the purpose of processing as long as it has a specific gravity of 5 or more, such as steel, brass, molybdenum, and lead. Furthermore, as a manufacturing method of the abrasive material of the present invention, the abrasive grains 3 are first attached using an electrodeposited layer by electroless plating, and then the thickness of the electrodeposited layer is efficiently increased by ordinary electrolytic plating. You can do it like this. Furthermore, the abrasive material of the present invention may be used not only for barrel finishing but also as an abrasive material for jet machining.
本考案の研摩材は、比重が大きい本体部に硬質
砥粒を被着させたので、研摩力が顕著に向上し、
研摩時間が大幅に短縮する。しかも、本体部から
脱落した砥粒により精密仕上げが可能となり、研
摩加工を確実に行うことができる。とりわけ、本
考案の研摩材は、セラミツク成形品などの硬脆部
材のバレル仕上げに適用した場合に格別の効果を
奏する。
The abrasive material of the present invention has hard abrasive grains attached to the main body, which has a high specific gravity, so the abrasive power is significantly improved.
Polishing time is significantly reduced. Moreover, the abrasive grains that have fallen off from the main body allow precision finishing, and the polishing process can be performed reliably. In particular, the abrasive of the present invention is particularly effective when applied to barrel finishing hard and brittle members such as ceramic molded products.
第１図は本考案の一実施例の研摩材を示す断面
図、第２図は本考案の他の実施例の研摩材を示す
断面図である。
１：本体部、２：電着層（結合層）、３：砥
粒、４：砥粒部。
FIG. 1 is a sectional view showing an abrasive material according to one embodiment of the present invention, and FIG. 2 is a sectional view showing an abrasive material according to another embodiment of the present invention. 1: Main body part, 2: Electrodeposition layer (bonding layer), 3: Abrasive grain, 4: Abrasive grain part.
Claims (1)
合層と、この結合層に保持され上記本体部より
も比重が小さく且つ硬質の複数の砥粒とを具備
することを特徴とする研摩材。 (2) 本体部は比重５以上の金属であることを特徴
とする実用新案登録請求の範囲第１項記載の研
摩材。 (3) 砥粒はダイヤモンドであることを特徴とする
実用新案登録請求の範囲第１項記載の研摩材。 (4) 結合層は金属電着層であることを特徴とする
実用新案登録請求の範囲第１項記載の研摩材。[Claims for Utility Model Registration] (1) A granular main body, a bonding layer attached to the main body, and a plurality of abrasive grains held in the bonding layer and having a lower specific gravity and harder than the main body. An abrasive material comprising: (2) The abrasive material according to claim 1, wherein the main body is made of a metal having a specific gravity of 5 or more. (3) The abrasive material according to claim 1, wherein the abrasive grains are diamond. (4) The abrasive material according to claim 1, wherein the bonding layer is a metal electrodeposition layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8396283U JPS59191251U (en) | 1983-06-03 | 1983-06-03 | Abrasive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8396283U JPS59191251U (en) | 1983-06-03 | 1983-06-03 | Abrasive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59191251U JPS59191251U (en) | 1984-12-19 |
| JPS6236599Y2 true JPS6236599Y2 (en) | 1987-09-17 |
Family
ID=30213916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8396283U Granted JPS59191251U (en) | 1983-06-03 | 1983-06-03 | Abrasive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59191251U (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3546113A1 (en) * | 1985-12-24 | 1987-06-25 | Santrade Ltd | COMPOSITE POWDER PARTICLES, COMPOSITE BODIES AND METHOD FOR THE PRODUCTION THEREOF |
| EP0884133A4 (en) * | 1996-12-06 | 2000-11-29 | Yoshiaki Nagaura | Method and apparatus for manufacture of quartz oscillator |
| KR100391200B1 (en) * | 2000-08-02 | 2003-07-12 | 기아자동차주식회사 | a deburring machine for work |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2545291A (en) * | 1948-10-28 | 1951-03-13 | Lupo Joseph | Polishing compound and carrier therefor |
| JPS4912314U (en) * | 1972-05-11 | 1974-02-01 | ||
| JPS5039870A (en) * | 1973-07-12 | 1975-04-12 | ||
| JPS5847455B2 (en) * | 1977-09-21 | 1983-10-22 | 株式会社神戸製鋼所 | Manufacturing method of small scale steel wire rod |
| JPS6236599U (en) * | 1985-08-22 | 1987-03-04 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5847455U (en) * | 1981-09-22 | 1983-03-30 | 株式会社チップトン | Multilayer media for barrel polishing |
-
1983
- 1983-06-03 JP JP8396283U patent/JPS59191251U/en active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2545291A (en) * | 1948-10-28 | 1951-03-13 | Lupo Joseph | Polishing compound and carrier therefor |
| JPS4912314U (en) * | 1972-05-11 | 1974-02-01 | ||
| JPS5039870A (en) * | 1973-07-12 | 1975-04-12 | ||
| JPS5847455B2 (en) * | 1977-09-21 | 1983-10-22 | 株式会社神戸製鋼所 | Manufacturing method of small scale steel wire rod |
| JPS6236599U (en) * | 1985-08-22 | 1987-03-04 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59191251U (en) | 1984-12-19 |
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