JPS6232452A - 改良ポジ型ホトレジスト用現像液 - Google Patents

改良ポジ型ホトレジスト用現像液

Info

Publication number
JPS6232452A
JPS6232452A JP60171834A JP17183485A JPS6232452A JP S6232452 A JPS6232452 A JP S6232452A JP 60171834 A JP60171834 A JP 60171834A JP 17183485 A JP17183485 A JP 17183485A JP S6232452 A JPS6232452 A JP S6232452A
Authority
JP
Japan
Prior art keywords
developer
developing solution
organic base
photoresist
positive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60171834A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0567028B2 (Direct
Inventor
Hatsuyuki Tanaka
初幸 田中
Hidekatsu Obara
秀克 小原
Yoshiyuki Satou
佐藤　善亨
Shingo Asaumi
浅海　慎五
Toshimasa Nakayama
寿昌 中山
Akira Yokota
晃 横田
Hisashi Nakane
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP60171834A priority Critical patent/JPS6232452A/ja
Priority to US06/892,646 priority patent/US4784937A/en
Publication of JPS6232452A publication Critical patent/JPS6232452A/ja
Publication of JPH0567028B2 publication Critical patent/JPH0567028B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60171834A 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液 Granted JPS6232452A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60171834A JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液
US06/892,646 US4784937A (en) 1985-08-06 1986-08-04 Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60171834A JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS6232452A true JPS6232452A (ja) 1987-02-12
JPH0567028B2 JPH0567028B2 (Direct) 1993-09-24

Family

ID=15930615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60171834A Granted JPS6232452A (ja) 1985-08-06 1985-08-06 改良ポジ型ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS6232452A (Direct)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution
JP2005309260A (ja) * 2004-04-23 2005-11-04 Tokyo Ohka Kogyo Co Ltd リソグラフィー用リンス液
JP2022507938A (ja) * 2018-12-28 2022-01-18 ヨンチャン ケミカル カンパニー リミテッド 極紫外線リソグラフィー用工程液、及びこれを用いたパターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution
JP2005309260A (ja) * 2004-04-23 2005-11-04 Tokyo Ohka Kogyo Co Ltd リソグラフィー用リンス液
JP2022507938A (ja) * 2018-12-28 2022-01-18 ヨンチャン ケミカル カンパニー リミテッド 極紫外線リソグラフィー用工程液、及びこれを用いたパターン形成方法

Also Published As

Publication number Publication date
JPH0567028B2 (Direct) 1993-09-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term