JPS6232263B2 - - Google Patents

Info

Publication number

JPS6232263B2

JPS6232263B2 JP14374484A JP14374484A JPS6232263B2 JP S6232263 B2 JPS6232263 B2 JP S6232263B2 JP 14374484 A JP14374484 A JP 14374484A JP 14374484 A JP14374484 A JP 14374484A JP S6232263 B2 JPS6232263 B2 JP S6232263B2

Authority

JP

Japan

Prior art keywords

amorphous silicon

less

content

photosensitive drums

aluminum alloy

Prior art date

1984-07-11

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

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• 229910021417 amorphous silicon Inorganic materials 0.000 claims description 19
• 229910000838 Al alloy Inorganic materials 0.000 claims description 15
• 230000008021 deposition Effects 0.000 claims description 13
• 239000012535 impurity Substances 0.000 claims description 3
• 229910052710 silicon Inorganic materials 0.000 claims description 3
• 230000001105 regulatory effect Effects 0.000 claims description 2
• 238000005520 cutting process Methods 0.000 description 13
• 238000000151 deposition Methods 0.000 description 12
• 239000000463 material Substances 0.000 description 9
• 229910045601 alloy Inorganic materials 0.000 description 5
• 239000000956 alloy Substances 0.000 description 5
• 230000000694 effects Effects 0.000 description 4
• 230000003746 surface roughness Effects 0.000 description 4
• 229910018134 Al-Mg Inorganic materials 0.000 description 3
• 229910018467 Al—Mg Inorganic materials 0.000 description 3
• 229910003460 diamond Inorganic materials 0.000 description 3
• 239000010432 diamond Substances 0.000 description 3
• 239000000758 substrate Substances 0.000 description 3
• 238000005260 corrosion Methods 0.000 description 2
• 230000007797 corrosion Effects 0.000 description 2
• 229910000765 intermetallic Inorganic materials 0.000 description 2
• 108091008695 photoreceptors Proteins 0.000 description 2
• 238000012360 testing method Methods 0.000 description 2
• 238000007740 vapor deposition Methods 0.000 description 2
• -1 Cu0.1wt% or less Substances 0.000 description 1
• BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
• 238000005299 abrasion Methods 0.000 description 1
• 230000000052 comparative effect Effects 0.000 description 1
• 238000007796 conventional method Methods 0.000 description 1
• 230000002542 deteriorative effect Effects 0.000 description 1
• 238000011161 development Methods 0.000 description 1
• 238000003912 environmental pollution Methods 0.000 description 1
• 238000011156 evaluation Methods 0.000 description 1
• 239000004615 ingredient Substances 0.000 description 1
• 238000005461 lubrication Methods 0.000 description 1
• 238000004519 manufacturing process Methods 0.000 description 1
• 239000011159 matrix material Substances 0.000 description 1
• 230000008018 melting Effects 0.000 description 1
• 238000002844 melting Methods 0.000 description 1
• 229910052751 metal Inorganic materials 0.000 description 1
• 239000002184 metal Substances 0.000 description 1
• 238000000034 method Methods 0.000 description 1
• 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
• 229910000077 silane Inorganic materials 0.000 description 1