JPS6230898A - Method and apparatus for replenishing metallic component to plating bath - Google Patents
Method and apparatus for replenishing metallic component to plating bathInfo
- Publication number
- JPS6230898A JPS6230898A JP17015185A JP17015185A JPS6230898A JP S6230898 A JPS6230898 A JP S6230898A JP 17015185 A JP17015185 A JP 17015185A JP 17015185 A JP17015185 A JP 17015185A JP S6230898 A JPS6230898 A JP S6230898A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- replenishing
- tank
- snso4
- plating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、針1線等にブロンズメッキを行うメッキ浴
に金属成分全補給する方法およびその装置に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method and an apparatus for replenishing all metal components to a plating bath for bronze plating a needle wire or the like.
(従来技術)
従来から、自動車のタイヤ等に用いられるブロンズメッ
キピートワイヤの製造においては、伸線材f Sn”
(2価の錫)イオンおよびCu” (2価の銅)イオン
を含む硫酸浴中に通過させ、置換メッキ法によシ、Cu
−Sn合金を伸線材表面にメッキする方法が採用されて
いる。(Prior art) Conventionally, in the production of bronze-plated peat wire used for automobile tires, etc., drawn wire material f Sn"
Passed through a sulfuric acid bath containing (divalent tin) ions and Cu'' (divalent copper) ions, and then plated by displacement plating, Cu
- A method of plating the surface of the drawn wire material with a Sn alloy has been adopted.
この置換メッキ法では、伸線の素材である内がメッキ浴
中に溶出し、Fe イオ/となり、メッキ浴中のSn
’ +、およびCu’+が伸線材の表面に析出し、Cu
−Sn合金のブロンズ(青銅)がメッキされる。In this displacement plating method, the inner material of wire drawing is eluted into the plating bath and becomes Fe io/, and the Sn in the plating bath is
'+ and Cu'+ precipitate on the surface of the drawn wire material, and Cu'+
- Sn alloy bronze is plated.
このようなメッキ工程においては、メッキ製造の進行と
ともに、メッキ浴中のSn’ +、およびCu’+イオ
ンの濃度が減少して行くため、Sn’+およびCu’+
イオンを外部から補給してやる必要がある。In such a plating process, as the plating process progresses, the concentrations of Sn'+ and Cu'+ ions in the plating bath decrease.
It is necessary to supply ions from outside.
従来技術では、Sn’+の補給金5nSOz水r各液に
て行うと補給タンク中で、Sn が大気中の酸素によ
り酸化され、SnOコ(Sn″+)となシ短時間でSn
2+量が減少するだめ、補給は粉末状、あるいはペース
ト状にして間欠的に補給されている。しかし、このよう
に粉末状やペースト状で補給するとメッキ浴濃度がメッ
キ槽内で局部的な濃度差がおこり、製品にメッキムラが
生じるため水溶液状での補給が望まれている。In the conventional technology, when replenishment of Sn'+ is carried out using 5nSOz water and each solution, Sn is oxidized by oxygen in the atmosphere in the replenishment tank and becomes SnO(Sn''+).
In order to prevent the 2+ amount from decreasing, it is supplied intermittently in the form of powder or paste. However, if it is replenished in the form of powder or paste, local concentration differences will occur in the plating bath, resulting in uneven plating on the product, so replenishment in the form of an aqueous solution is desired.
(発明の目的)
この発明は上記のような実状に鑑みなされたものでSn
SO4水溶液状で、:)n を補給するに際し、Sn’
+酸化による白澗および沈澱全防止し、もって長期にわ
たり水溶液のSn’+濃度全維持すると共にメッキ浴濃
度差全解消し美麗なメッキ農を得ることを目的とするも
のである。(Object of the invention) This invention was made in view of the above-mentioned circumstances.
When replenishing :)n in the form of SO4 aqueous solution, Sn'
The purpose is to completely prevent white sludge and precipitation caused by + oxidation, maintain the full Sn'+ concentration of the aqueous solution over a long period of time, and completely eliminate the difference in plating bath concentration to obtain beautiful plating.
(発明の構成)
この発明の要旨は、
(1)Sn2+イオン、およびCu′+イオンを含有す
る硫酸浴を用いて青銅メッキ全行うメッキ浴に、SnJ
+ k補給する方法において、5nSOv を水iW液
液状して補給タンクに貯液し、この5nSO<z水浴液
に、Fe5Oa f連続的、あるいは間欠的に補給しな
がら、あるいは/および、前記補給タンク内に不活性ガ
ス全充満しながら、SnSO4水r各液全、連続的ある
いは間欠的にメッキ浴に補給することを特徴とするメッ
キ金成成分補給方法、
(215nS04I添加装置と、水添加装置と、攪拌機
とを備えたSn 補給タンクに、Fe50&添加装置
、または/および、不活性ガス供給装置を設けたことを
特徴とするメッキ浴金属成分補給装置である。(Structure of the Invention) The gist of the invention is as follows: (1) SnJ
In the +k replenishment method, 5nSOv is made into a water iW liquid and stored in a replenishment tank, and this 5nSO<z water bath liquid is continuously or intermittently replenished with Fe5Oa, or/and the replenishment tank is A method for replenishing plating metal components, characterized by continuously or intermittently replenishing each SnSO4 water solution into a plating bath while the tank is fully filled with inert gas (a 215nS04I addition device, a water addition device, This is a plating bath metal component replenishment device characterized in that a Sn 2 replenishment tank equipped with a stirrer is provided with an Fe50 & addition device and/or an inert gas supply device.
本発明者等は、SnSO4水浴液におけるSn’+の大
気による酸化反応を阻止し、長期間にわたってSn’+
イオンの濃度全保持する方法について種々研究実験の結
果、補給液であるSn50g水浴液中にFe5O4tf
添加する方法、および、5nSOu水溶液の表面ヲNコ
ガスあるいはM゛ガスの不活性ガスによシ大気からシー
ルする方法が非常に効果があることを見出した。The present inventors have succeeded in preventing the oxidation reaction of Sn'+ in the SnSO4 water bath solution by the atmosphere and
As a result of various research experiments on how to maintain the total concentration of ions, we found that Fe5O4tf was added to the Sn50g water bath solution as a replenishment solution.
It has been found that the method of adding 5n SOu aqueous solution and the method of sealing the surface of the 5nSOu aqueous solution from the atmosphere with an inert gas such as N gas or M gas are very effective.
第1図は5nSO1&水浴液中のSn’+が5nOrに
変化するときの時間的経過を示す図である。第1図(8
)はSn50g水洛液の水浴液Nコガスでシールしたと
きと、大気中に放置したときのSn 量の変動を比較
したものである。図中曲線(a)は大気中に放置したと
きのbn 量の曲線であシ、曲線(至)は表面’(zN
コガスシールしたときのSn’+量の曲線である。FIG. 1 is a diagram showing the time course when 5nSO1 &Sn'+ in the water bath solution changes to 5nOr. Figure 1 (8
) is a comparison of the variation in the amount of Sn when a 50 g Sn water solution was sealed with water bath liquid N cogas and when it was left in the atmosphere. In the figure, curve (a) is the curve for the amount of bn when left in the atmosphere, and the curve (to) is the curve for the surface '(zN
It is a curve of Sn'+ amount when cogas sealed.
図であきらかのように、大気中に放置したものでは2日
経過すると殆どゼロになるのに対して、Nコガスシール
したものではSn’ ”−量の減少はほとんど見られな
い。As is clear from the figure, in the case of the case left in the atmosphere, it becomes almost zero after 2 days, whereas in the case of the case sealed with N cogas, there is almost no decrease in the amount of Sn'''.
また、第1図日は大気中で5nSOs水m液中にFe5
0&を添加したときのめn 量の変動全示したものであ
る。図中曲線(C)はFe’+濃度で10 ppln添
加時のSnJ+量の曲線であり、曲線(dlは同20p
pm、曲線(fEi)は同100 ppm、曲線釦)は
同500ppm添加時のSn’+量の曲線である。In addition, on the day of Figure 1, Fe5 was added to a 5nSOs aqueous solution in the atmosphere.
The figure shows all the fluctuations in the amount of noodles when 0& is added. Curve (C) in the figure is a curve of SnJ+ amount when 10 ppln is added at Fe'+ concentration, and the curve (dl is the same as 20ppln).
pm, the curve (fEi) is the curve of the Sn'+ amount when the same 100 ppm, and the curve button) is the same 500 ppm.
図であきらかのようk、水浴液中にFe5Oa=をFe
”exで20〜500 ppm?1加することによって
Sn”Jiの減少防止に効果があることがわかる。As is clear from the figure, Fe5Oa = Fe in the water bath liquid
It can be seen that adding 20 to 500 ppm?1 of "ex" is effective in preventing a decrease in Sn"Ji.
また、N、2ガスシールする方法と、Fe5o& k添
加する方法を併用することによυ、On 量濃度全さ
らに長期間高濃度に保持することに効果があることも確
認した。It was also confirmed that the combined use of the N,2 gas sealing method and the Fe5o&k addition method is effective in maintaining the total υ,On amount and concentration at a high concentration for a longer period of time.
この実験におけるFe5O4tの添加は実験スタート時
に行い、Sn’+量濃度の分析はポルタンメトリー分析
法によるものである。In this experiment, Fe5O4t was added at the start of the experiment, and the Sn'+ concentration was analyzed by portammetry analysis.
以上のような実験結果にもとづき、この発明は、5nS
O4I水浴液にF6+SOaを添加するかまたば/およ
び、不活性ガスでシールすることにより、Sn”J度を
長期間保持することができるため、メッキ浴のSn J
+成分補給に、Sn50g f水浴液の状態で補給可能
にし濃度差全皆無としたものである。Based on the above experimental results, the present invention provides 5nS
By adding F6+SOa to the O4I water bath solution and/or sealing it with an inert gas, the Sn"J degree can be maintained for a long period of time.
+ component can be replenished in the form of Sn50g f water bath solution, and there is no difference in concentration.
この発明において、前記Fe5O4tの添加量はFe
”濃度で20〜500 ppmの範囲が好ましい。なぜ
なら、添加量が20ppm未満ではSn 濃度減少防
止効果が小さく、500 ppm超ではより大きな効果
が望めず逆にFe J+濃度が増えメッキ効率が低下す
る等の欠点が生じる恐れがある。In this invention, the amount of Fe5O4t added is Fe5O4t.
``A concentration in the range of 20 to 500 ppm is preferable. This is because if the added amount is less than 20 ppm, the effect of preventing the Sn concentration from decreasing is small, and if it exceeds 500 ppm, a greater effect cannot be expected, and on the contrary, the Fe J+ concentration increases and the plating efficiency decreases. There is a possibility that such drawbacks may occur.
より好ましい範囲としては20〜1100ppである。A more preferable range is 20 to 1100 pp.
又このFeSO4は、通常Fe5Oa ・7HJ○(7
水塩)の形で市販されているためこの形態で添加するの
が好ましい。Also, this FeSO4 is usually Fe5Oa ・7HJ○ (7
Since it is commercially available in the form of water salt), it is preferable to add it in this form.
(実施例)
第2図は、この発明装置をブロンズメッキピートワイヤ
製造ラインに実施した1例を示す図である。(1)はメ
ッキ槽であり、Sn’+イオンと、Cu’ +イオンを
含有する硫酸メッキ浴(2)が満たされている。被メツ
キワイヤはこのメッキ浴(2)中音通過させて置換メッ
キが行われる。メッキのi(を行とともにメッキ浴(2
)中のSn1+イオン、およびSn1+イオンは減少し
て行くため画イオンの補給が必要である。(3)はSn
′+補給タンクであり、(4)ばCu’+補給タンクで
ある。この発明の重要なポイントであるSu’+補給タ
ンク(3)には粉末状の5nSO4tf添加するSnS
O4添加装置(5)と、水添加装@(6)および攪拌機
(7)が設けられており、添加されたSn50gと水は
攪拌機(7)によシ水溶液状態とする。この発明はさら
に、このようなSn’+補給タンク(3)にFe50<
=添加装置(8)または/および不活性ガス供給装置(
9)を設けるものである。(Example) FIG. 2 is a diagram showing an example in which the apparatus of the present invention is applied to a bronze plating peat wire production line. (1) is a plating tank filled with a sulfuric acid plating bath (2) containing Sn'+ ions and Cu'+ ions. The wire to be plated is passed through this plating bath (2) for displacement plating. Plating bath (2) along with plating i (row)
) and Sn1+ ions decrease, so it is necessary to replenish image ions. (3) is Sn
'+ supply tank, and (4) Cu'+ supply tank. The Su'+ supply tank (3), which is an important point of this invention, contains SnS to which powdered 5nSO4tf is added.
An O4 addition device (5), a water addition device (6), and a stirrer (7) are provided, and the added Sn50g and water are turned into an aqueous solution by the stirrer (7). This invention further provides Fe50<
= Addition device (8) or/and inert gas supply device (
9).
また、Cu 補給タンク(4)にばCu5Oμ添加装
置Oa、水添加装置(6)、攪拌機(7)が設けてあり
、Cu5Oσも水浴液状態にして補給されるが、CuS
0gは安定しており、不活性ガスシール等の必要はない
。In addition, the Cu replenishment tank (4) is equipped with a Cu5Oμ addition device Oa, a water addition device (6), and a stirrer (7), and Cu5Oσ is also replenished in a water bath liquid state.
0g is stable and there is no need for an inert gas seal.
メッキ浴(2)の濃度管理は例えば螢光X線分析方式の
メッキ浴濃度分析計01)によシ管理されており、装置
全体の作動はコンピュータ(2)により制御されている
。コンピュータα3からSn 補給タンク(3)、お
よびCu’+補給タンク(4)に信号が送られ、Snu
+補給夕:/ り(3)へ(D SnSO4粉末、Fe
QOu %)末、水の各添加量、Nuガス供給八へさら
にSn’+補給タンク(3)からメツキト■(1)への
SnSO4水浴液の補給量も制御される。The concentration of the plating bath (2) is controlled by, for example, a plating bath concentration analyzer 01) using a fluorescent X-ray analysis method, and the operation of the entire apparatus is controlled by a computer (2). A signal is sent from the computer α3 to the Sn supply tank (3) and the Cu'+ supply tank (4), and the Snu
+ Supply evening: / To Ri (3) (D SnSO4 powder, Fe
QOu %), the amount of water added, the Nu gas supply 8, and the amount of SnSO4 water bath solution supplied from the Sn'+ supply tank (3) to Metsukito (1) are also controlled.
また、Cu 補給タンク(4)テは、Cu5Oa扮末
、水の添加量、およびCu’+補給タンク(4)からメ
ッキ槽(1)への補給量も制御されるのである。Furthermore, the amount of Cu5Oa powder and water added to the Cu replenishment tank (4) and the amount of replenishment from the Cu'+ replenishment tank (4) to the plating tank (1) are also controlled.
つぎに、この発明方法の実施例について説明する。Next, examples of the method of this invention will be described.
第2図に例示するこの発明装置音用い、0.97rxm
gのブロンズメッキピードワイヤヲ製造した。Using this invention device sound as exemplified in FIG. 2, 0.97rxm
Bronze plated peed wire of g was manufactured.
Sn j+補給タンク(3)でのSnSO4水溶液の作
製は、7日間に1回メッキ槽(1)へ補給する7日分の
量について行い、1000 ppmのSn’+濃度で貯
液し、20 ppm ノFe (Ff9SOg分で5
4 ppm ) t 12時間毎に添加しなからSn’
+補給タンク(3)でのSnu+の減少を防止した。The SnSO4 aqueous solution in the Sn j+ replenishment tank (3) was prepared in an amount equivalent to 7 days' worth of replenishment to the plating tank (1) once every 7 days, and the solution was stored at a Sn'+ concentration of 1000 ppm and 20 ppm.ノFe (5 in Ff9SOg)
4 ppm) t Add Sn' every 12 hours.
+Prevented the decrease of Snu+ in the supply tank (3).
一方不活性ガヌシールを行う場合は、不活性ガス供給袋
@(9)からNuガス’i 2.0々前供給してガスシ
ーJV金行った。On the other hand, when inert gas sealing was performed, 2.0 g of Nu gas was supplied from the inert gas supply bag @ (9) and Gas Sea JV was performed.
また、Sn j+補給タンク(3)、およびCu’+補
給タン7(41からの、5nSOv水浴液、およびCu
SO4を水溶液のメッキ槽(1)への補給量はメッキ槽
(1)でのSn’ + 72度を500 p’pm、
Cu’+濃度に2000ppmになるよう制御し、連続
補給tffった。Also, 5nSOv water bath liquid and Cu
The amount of SO4 to be supplied to the plating tank (1) as an aqueous solution is as follows: Sn' + 72 degrees in the plating tank (1) at 500 p'pm;
The Cu′+ concentration was controlled to be 2000 ppm, and continuous replenishment tff was performed.
第3図はこの発明実施時のSn J+補給タンク(3)
中のSnj+濃度の変化2示す図である。Figure 3 shows the Sn J+ supply tank (3) when this invention was implemented.
FIG. 2 is a diagram showing a change in the Snj+ concentration in FIG.
図で明らかなようにSnj+補給タンパ3)内でのSn
’+の減少は全く見られなかった。As is clear from the figure, Sn in Snj + supply tamper 3)
No decrease in '+ was observed at all.
また、第4図はこの発明実施時と従来方法実施時のメッ
キ槽(1)内のSn糾濃度変化?示す図である。図中曲
線(G)はこの発明実施時の3nj+濃度曲線であり、
曲線(3)は従来方法実施時のSn’+濃反曲線である
。Also, FIG. 4 shows the change in Sn concentration in the plating tank (1) when this invention is implemented and when the conventional method is implemented. FIG. The curve (G) in the figure is the 3nj+ concentration curve when this invention is implemented,
Curve (3) is the Sn'+ concentration curve when the conventional method is implemented.
図でわかるように、従来は間欠的に粉末状で添加するた
めメッキ槽内で濃度差があったものが、この発明では水
浴液状態で連続的に補給できるためメッキ槽内での濃度
差は全く生じていない。As can be seen in the figure, in the past, there was a difference in concentration within the plating tank because it was added intermittently in the form of powder, but with this invention, it can be continuously replenished in the form of a water bath, so there is no difference in concentration within the plating tank. It hasn't happened at all.
(発明の効果)
以上のようにこの発明は、補助タンク内におけるSnS
O4を水溶液のSn糾儂度を長靭にゎたシ維持できるた
めメッキ浴濃度差も発生せずしたがってブロンズメッキ
ピードワイヤのメッキムラが5.0%減少した。(Effects of the Invention) As described above, the present invention provides SnS in the auxiliary tank.
Since the Sn strength of the O4 aqueous solution could be maintained for a long time, no difference in plating bath concentration occurred, and therefore, the plating unevenness of the bronze plated wire was reduced by 5.0%.
第1図はSnSO4水溶液中のSn” 7f): 5n
Oxに変化するときの時間的経過を示す図、第2図はこ
の発明装置をブロンズメッキピートワイヤ製造フィンに
実施した1例を示す図、第3図はこの発明実施時のSn
’+補給タンク中のSn” iQ度の変化?示す図、第
4図はこの発明実施時と従来方法実施時のメッキ樽内の
Sn’+濃度変化を示す図である。
図中、1:メッキ槽、2:メッキ浴、3 : Sn訝補
給タンク、4 : Cuj+補給タンク、5 : Sn
50g添加装置、6:水添加装置、7:攪拌機、8:F
e5Ou添加装置、9:不活性ガヌ供給装置、1゜:
Cu5Oz h加装性、11ニアa!度分析計、12:
コンピュータ。
第
(A)
→任ゑ時M(day)
1図
(B)
→経悲時311(day)
第 3 図
一級A時澗(day)
第 4 図
一経二時F、’l (mm)Figure 1 shows Sn'' 7f): 5n in SnSO4 aqueous solution.
Figure 2 is a diagram showing the time course of change to Ox, Figure 2 is a diagram showing an example of the invention in which the device was applied to a bronze plating peat wire manufacturing fin, and Figure 3 is a diagram showing the time course of the change to Ox.
Fig. 4 is a diagram showing the change in Sn'+ concentration in the plating barrel when the present invention is implemented and when the conventional method is implemented. In the figure, 1: Plating tank, 2: Plating bath, 3: Sn supply tank, 4: Cuj+ supply tank, 5: Sn
50g addition device, 6: water addition device, 7: stirrer, 8: F
e5Ou addition device, 9: Inert Ganu supply device, 1°:
Cu5Oz h Addability, 11 near a! degree analyzer, 12:
Computer. No. (A) → Time M (day) 1 (B) → Time 311 (day) No. 3 (day) No. 4 (day) No. 4 (day) No. 4 (mm)
Claims (2)
を含有する硫酸浴を用いて青銅メッキを行うメッキ浴に
Sn^2^+イオンを補給する方法において、SnSO
_4を水浴液状にして補給タンクに貯液し、このSnS
O_4水溶液に、FeSO_4を連続的、あるいは間欠
的に補給しながら、あるいは/および、前記補給タンク
内に不活性ガスを充満しながら、SnSO_4水溶液を
、連続的、あるいは間欠的にメッキ浴に補給することを
特徴とするメッキ浴金属成分補給方法。(1) In a method of replenishing Sn^2^+ ions to a plating bath in which bronze plating is performed using a sulfuric acid bath containing Sn^2^+ ions and Cu^2^+ ions, SnSO
_4 is made into a water bath liquid and stored in a supply tank, and this SnS
Continuously or intermittently replenishing the plating bath with the SnSO_4 aqueous solution while continuously or intermittently replenishing the O_4 aqueous solution with FeSO_4, or/and filling the replenishment tank with an inert gas. A method for replenishing metal components in a plating bath, characterized by:
とを備えたSn^2^+補給タンクに、FeSO_4添
加装置、または/および、不活性ガス供給装置を設けた
ことを特徴とするメッキ浴金属成分補給装置。(2) A plating bath characterized in that a Sn^2^+ supply tank equipped with a SnSO_4 addition device, a water addition device, and an agitator is provided with a FeSO_4 addition device and/or an inert gas supply device. Metal component replenishment device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17015185A JPS6230898A (en) | 1985-07-31 | 1985-07-31 | Method and apparatus for replenishing metallic component to plating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17015185A JPS6230898A (en) | 1985-07-31 | 1985-07-31 | Method and apparatus for replenishing metallic component to plating bath |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6230898A true JPS6230898A (en) | 1987-02-09 |
Family
ID=15899622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17015185A Pending JPS6230898A (en) | 1985-07-31 | 1985-07-31 | Method and apparatus for replenishing metallic component to plating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6230898A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999057340A3 (en) * | 1998-05-01 | 2000-02-03 | Dj Parker Company Inc | Chemical mixing, replenishment, and waste management system |
KR20030041039A (en) * | 2001-11-19 | 2003-05-23 | 주식회사 포스코 | Apparatus and method for maintaining the concentration of the ferrous ion for the electroplating process |
JP2014519435A (en) * | 2011-12-26 | 2014-08-14 | シャンドン ダイ エイ シーオー.,エルティーディー | High strength tin bronze plated bead wire and method for manufacturing the same |
-
1985
- 1985-07-31 JP JP17015185A patent/JPS6230898A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999057340A3 (en) * | 1998-05-01 | 2000-02-03 | Dj Parker Company Inc | Chemical mixing, replenishment, and waste management system |
KR20030041039A (en) * | 2001-11-19 | 2003-05-23 | 주식회사 포스코 | Apparatus and method for maintaining the concentration of the ferrous ion for the electroplating process |
JP2014519435A (en) * | 2011-12-26 | 2014-08-14 | シャンドン ダイ エイ シーオー.,エルティーディー | High strength tin bronze plated bead wire and method for manufacturing the same |
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