JPS62293202A - Manufacture of tapered optical waveguide - Google Patents

Manufacture of tapered optical waveguide

Info

Publication number
JPS62293202A
JPS62293202A JP61136553A JP13655386A JPS62293202A JP S62293202 A JPS62293202 A JP S62293202A JP 61136553 A JP61136553 A JP 61136553A JP 13655386 A JP13655386 A JP 13655386A JP S62293202 A JPS62293202 A JP S62293202A
Authority
JP
Japan
Prior art keywords
optical waveguide
substrate
tapered
plate
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61136553A
Other languages
Japanese (ja)
Other versions
JPH0731289B2 (en
Inventor
Kazuhisa Yamamoto
和久 山本
Tetsuo Taniuchi
哲夫 谷内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61136553A priority Critical patent/JPH0731289B2/en
Publication of JPS62293202A publication Critical patent/JPS62293202A/en
Publication of JPH0731289B2 publication Critical patent/JPH0731289B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To easily manufacture a tapered optical waveguide with good controllability by partially coating an acid on a ferroelectric substrate and subjecting the coating to a heat treatment. CONSTITUTION:Pyrophosphoric acid 3 is coated on the end of a +Z plate 2 of an LiNbO3 substrate l and is subjected to a heat treatment, by which an incident part 4 is formed. The pyrophosphoric acid 3 increases its viscosity and the liquid surface thereof spreads with an increase in temp.; therefore, tapered part 5 is simultaneously formed on the front end face of the light incident part 4. The pyrophosphoric acid 3 is then coated over the entire surface of the +Z plate 2 of the LiNbO3 substrate 1 and is subjected to the heat treatment to form the optical waveguide part 6. The above-mentioned stage is executed to the +Z plate 2 of the LiNbO3 substrate 1 on which a protective mask pattern of Ta is formed. The three-dimensional waveguide is thereby manufactured. Other acids are usable as far as the rate of evaporation thereof is low and such acids can be coated on the substrate surface.

Description

【発明の詳細な説明】 3、発明の詳細な説明 産業上の利用分野 本発明はコヒ−−ラント光を使用する光情報処理2 ヘ
−ジ 分野あるいは光通信、光応用計測制御分野に使用される
光導波路とレーザおよび光ファイバとの高効率結合を可
能にするテーパ状光導波路の作製方法に関するものであ
る。
Detailed Description of the Invention 3. Detailed Description of the Invention Industrial Fields of Use The present invention is applicable to optical information processing using coherent light, optical communications, and optical applied measurement and control fields. The present invention relates to a method for manufacturing a tapered optical waveguide that enables highly efficient coupling of an optical waveguide with a laser and an optical fiber.

従来の技術 プロトン交換法によりL z NbO5基板上に光導波
路を形成しTE/TMモードスプリッタや波長変換素子
などが作製されていた。上記光導波路への結合効率を向
上させるため光入射部の厚みを大きくし光導波部とテー
パ部を用いて結合させるというものである。
Conventional technology A TE/TM mode splitter, a wavelength conversion element, and the like have been fabricated by forming an optical waveguide on an L z NbO5 substrate using a proton exchange method. In order to improve the coupling efficiency to the optical waveguide, the thickness of the light incident part is increased and the light is coupled to the optical waveguide using a tapered part.

従来、テーパ状光導波路の作製方法としてアプライドオ
プティックス(Applied 0ptics)197
9年3月号 Vol 1 B 、No6900〜902
頁のジェー・シー・キャンベル氏(1,C,Compb
el 1 )による方法がある。この方法は第3図に示
されるように保護マスク8が形成された基板1′を徐々
に硝酸銀3′の溶液に浸入していくことにより拡散深さ
を変化させてテーパ状光導波路を形成するというもので
ある。
Conventionally, as a method for manufacturing a tapered optical waveguide, Applied Optics 197
March 9th issue Vol 1 B, No6900-902
Mr. J.C. Campbell (1, C, Compb)
There is a method according to el 1). In this method, as shown in FIG. 3, a substrate 1' on which a protective mask 8 is formed is gradually immersed in a solution of silver nitrate 3', thereby changing the diffusion depth and forming a tapered optical waveguide. That is what it is.

3ページ 発明が解決しようとする問題点 上記のような従来の方法では、基板であるL i Nb
O3基板に安息香酸などの酸を用いてテーパ状光導波路
を作製する場合、溶液の蒸気のため光入射部以外の部分
もプロトン交換されてしまうという問題があった。また
量産性、制御性を確保するためには装置が大型化、複雑
化してしまうという問題点もあった。
Page 3 Problems to be Solved by the Invention In the conventional method as described above, the substrate L i Nb
When a tapered optical waveguide is fabricated using an acid such as benzoic acid on an O3 substrate, there is a problem in that protons are exchanged in areas other than the light incident area due to the vapor of the solution. There is also the problem that in order to ensure mass productivity and controllability, the equipment becomes larger and more complex.

問題点を解決するための手段 本発明は強誘電体基板の表面の一部分に酸を塗布し熱処
理して光入射部を形成した後、表向の光導波路形成部に
酸を塗布し熱処理して光導−波路部を形成することでテ
ーパ状光導波路を作製しようとするものである。
Means for Solving the Problems The present invention applies acid to a part of the surface of a ferroelectric substrate and heat-treats it to form a light incident part, and then coats an optical waveguide forming part on the front surface with acid and heat-treats it. This method attempts to produce a tapered optical waveguide by forming an optical waveguide section.

作   用 本発明の構成によれば蒸発量が少く液状である酸を用い
ることにより、簡単に制御性良く、しかも蒸気の影響を
受けることなくテーノく状導波路を作製することができ
る。
Function According to the configuration of the present invention, by using a liquid acid with a small amount of evaporation, it is possible to easily fabricate a Tenno-shaped waveguide with good controllability and without being affected by vapor.

実施例 (実施例1) 本発明のテーパ状光導波路作製方法の第1の実施例を図
面を用いて説明する。第1図は酸としてピロ燐酸9強誘
電体基板としてL I NbO3基板を用いた第1の実
施例であるテーパ状光導波路作製方法の工程図である。
Example (Example 1) A first example of the method for manufacturing a tapered optical waveguide of the present invention will be described with reference to the drawings. FIG. 1 is a process diagram of a method for manufacturing a tapered optical waveguide according to the first embodiment using pyrophosphoric acid 9 as the acid and a L I NbO3 substrate as the ferroelectric substrate.

同図(→でL I NbO3基板1の+Z板2の端部2
’にピロ燐酸3が塗布されている。
In the same figure (→) L I NbO3 substrate 1 +Z plate 2 end 2
' is coated with pyrophosphoric acid 3.

同図(klで230°C960分熱処理することにより
入射部4が形成される。ピロ燐酸3は温度上昇につれて
粘度が低下し液面が広がる。このため光入射部4の前面
にテーパ部6が同時に形成される。
The incident part 4 is formed by heat treatment at 230°C for 960 minutes at the same figure (kl).As the temperature rises, the viscosity of the pyrophosphoric acid 3 decreases and the liquid surface spreads.Therefore, a tapered part 6 is formed on the front surface of the light incident part 4. formed at the same time.

230°C10分間熱処理を行い光導波部6を形成する
。   ゛ 以上の工程をL I NbC)3基板1の+Z板板上上
Taの保護マスクパターンを形成したものに対して施す
ことにより三次元導波路が作製された。光導波部6の厚
みは0.5pm 、光入射部4の厚みは1μmであった
。He−Neレーザ光(波長0.633μm)と上記テ
ーパ状光導波路との結合効率は光導波部だ5ベーノ けの値so%に対して、1.6倍の45チが得られた。
A heat treatment is performed at 230° C. for 10 minutes to form the optical waveguide portion 6. A three-dimensional waveguide was fabricated by performing the above steps on the +Z plate of the L I NbC 3 substrate 1 on which a protective mask pattern of Ta was formed. The thickness of the optical waveguide section 6 was 0.5 pm, and the thickness of the light incidence section 4 was 1 .mu.m. The coupling efficiency between the He--Ne laser beam (wavelength: 0.633 μm) and the tapered optical waveguide was 45 cm, which is 1.6 times the value of 5 cm in the optical waveguide.

(実施例2) 本発明のテーパ状光導波路作製方法の第2の実施例の工
程甲を第2図に示す。第2図(−)でヒータで加熱され
たNプレート76上にLiNbO3基板1が置かれてい
る。L i NbO3基板1の端部にはピロ燐酸3が塗
布されている。ピロ燐酸3はMプレート7が傾けられて
いるので広がらない。ピロ燐酸3直下に入射部4が形成
される。次に同図(肋のようにMプレート7の端8を端
9に対して水平またはやや下に向け7ることによりピロ
燐酸3が全面に流れ導波部6が形成される。このような
方法を採ると一度の塗布でプロトン交換を行える。捷た
傾き角を制御すやことでテーパ部5を制御することも可
能である。
(Example 2) Step A of the second example of the method for manufacturing a tapered optical waveguide of the present invention is shown in FIG. In FIG. 2 (-), a LiNbO3 substrate 1 is placed on an N plate 76 heated by a heater. Pyrophosphoric acid 3 is applied to the edge of the L i NbO3 substrate 1 . Pyrophosphoric acid 3 does not spread because the M plate 7 is tilted. An input section 4 is formed directly below the pyrophosphoric acid 3. Next, as shown in FIG. If this method is adopted, proton exchange can be performed in one application.It is also possible to control the tapered portion 5 by controlling the tilt angle of the bending.

なお実施し11ではピロ燐酸を用でたが蒸発量が少く基
板表面(−布可能1あ1は他0酸を用“る0ともできる
。またLiNbO3基板だけでなくLiTaO36ぺ巧 また、本発明の酸による塗布を用いると、基板1として
+Z板又は−Z板(Z軸に垂直な面を有する板)を用い
ると表面の荒れが生じない。
In Example 11, pyrophosphoric acid was used, but the amount of evaporation was small and the surface of the substrate (-1) could be used as well. If coating with acid is used, the surface will not be roughened if a +Z plate or -Z plate (a plate having a surface perpendicular to the Z axis) is used as the substrate 1.

発明の効果 本発明のテーパ状光導波路の作製方法によれば、蒸発量
が少く液状である酸を強誘電体基板上に部分塗布し熱処
理を行うことで簡単に制御性良くテーパ状光導波路が作
製できる。しかも導波部が蒸気の影響を受けることはな
い。
Effects of the Invention According to the method for manufacturing a tapered optical waveguide of the present invention, a tapered optical waveguide can be easily manufactured with good controllability by partially applying a liquid acid with low evaporation amount onto a ferroelectric substrate and performing heat treatment. It can be made. Moreover, the waveguide section is not affected by steam.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本鼻明の、テーパ状光導波路作製方法の一実施
例を乍す工程図、第2図は本発明のテーパ状光導波路作
製方法の第2の実施例を示す工程図、第3図は従来のテ
ーパ状光導波路作製方法を示す工程図である。 1・・・・・・LiNbO3基板、3・・・・・・ピロ
燐酸、4・・・・・・光入射部、6・・・・・・テーパ
部、6・・・・・・光導波部。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 第2図
FIG. 1 is a process diagram showing one embodiment of the method for manufacturing a tapered optical waveguide of the present invention, and FIG. 2 is a process diagram showing a second embodiment of the method for manufacturing a tapered optical waveguide of the present invention. FIG. 3 is a process diagram showing a conventional method for manufacturing a tapered optical waveguide. DESCRIPTION OF SYMBOLS 1...LiNbO3 substrate, 3...Pyrophosphoric acid, 4...Light incidence part, 6...Tapered part, 6...Optical waveguide Department. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2

Claims (3)

【特許請求の範囲】[Claims] (1)LiNb_xTa_(_1_−_x_)O_3(
0≦x≦1)基板の表面の一部分に液状の酸を塗布して
光入射部を形成した後、前記LiNb_xTa_(_1
_−_x_)O_3(0≦x≦1)基板表面の光導波路
形成部に液状の酸を塗布し熱処理して光導波路部を形成
する工程により、前記光導波路部とこの光導波路部に比
べて厚みが大である光入射部を形成してなるテーパ状光
導波路の作製方法。
(1) LiNb_xTa_(_1_-_x_)O_3(
0≦x≦1) After applying liquid acid to a part of the surface of the substrate to form a light incident part, the LiNb_xTa_(_1
_−_x_)O_3(0≦x≦1) By applying liquid acid to the optical waveguide forming portion on the surface of the substrate and heat-treating it to form the optical waveguide portion, there is a difference between the optical waveguide portion and this optical waveguide portion. A method for manufacturing a tapered optical waveguide by forming a thick light entrance part.
(2)LiNb_xTa_(_1_−_x_)O_3(
0≦x≦1)基板が+Z板または−Z板である特許請求
の範囲第(1)項記載のテーパ状光導波路の作製方法。
(2) LiNb_xTa_(_1_-_x_)O_3(
0≦x≦1) The method for manufacturing a tapered optical waveguide according to claim (1), wherein the substrate is a +Z plate or a -Z plate.
(3)ピロ燐酸(H_4P_2O_7)を主成分とする
酸を用いる特許請求の範囲第(1)項記載のテーパ状光
導波路の作製方法。
(3) A method for manufacturing a tapered optical waveguide according to claim (1), using an acid whose main component is pyrophosphoric acid (H_4P_2O_7).
JP61136553A 1986-06-12 1986-06-12 Method for producing tapered optical waveguide Expired - Fee Related JPH0731289B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61136553A JPH0731289B2 (en) 1986-06-12 1986-06-12 Method for producing tapered optical waveguide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61136553A JPH0731289B2 (en) 1986-06-12 1986-06-12 Method for producing tapered optical waveguide

Publications (2)

Publication Number Publication Date
JPS62293202A true JPS62293202A (en) 1987-12-19
JPH0731289B2 JPH0731289B2 (en) 1995-04-10

Family

ID=15177913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61136553A Expired - Fee Related JPH0731289B2 (en) 1986-06-12 1986-06-12 Method for producing tapered optical waveguide

Country Status (1)

Country Link
JP (1) JPH0731289B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979812U (en) * 1982-11-19 1984-05-30 オムロン株式会社 Optical coupling structure of thin film optical waveguide
JPS607403A (en) * 1983-06-28 1985-01-16 Canon Inc Forming method of thin film type optical waveguide
JPS60133405A (en) * 1983-12-22 1985-07-16 Canon Inc Formation of pattern
JPS6170541A (en) * 1984-09-14 1986-04-11 Canon Inc Thin film type optical element and its manufacture

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979812U (en) * 1982-11-19 1984-05-30 オムロン株式会社 Optical coupling structure of thin film optical waveguide
JPS607403A (en) * 1983-06-28 1985-01-16 Canon Inc Forming method of thin film type optical waveguide
JPS60133405A (en) * 1983-12-22 1985-07-16 Canon Inc Formation of pattern
JPS6170541A (en) * 1984-09-14 1986-04-11 Canon Inc Thin film type optical element and its manufacture

Also Published As

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JPH0731289B2 (en) 1995-04-10

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