JPS63158505A - Preparation of tapered optical waveguide - Google Patents
Preparation of tapered optical waveguideInfo
- Publication number
- JPS63158505A JPS63158505A JP30695986A JP30695986A JPS63158505A JP S63158505 A JPS63158505 A JP S63158505A JP 30695986 A JP30695986 A JP 30695986A JP 30695986 A JP30695986 A JP 30695986A JP S63158505 A JPS63158505 A JP S63158505A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- high refractive
- layer
- substrate
- optical waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000007598 dipping method Methods 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 12
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229910003327 LiNbO3 Inorganic materials 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/134—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms
- G02B6/1345—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms using ion exchange
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はコヒーレント光を使用する光情報処理分野、あ
るいは光通信、光応用計測制御分野に使用される光導波
路とレーザおよびファイバとの高屈折率結合を可能にす
るテーパ状光導波路の作製方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to high refractive index coupling between an optical waveguide, a laser, and a fiber used in the field of optical information processing using coherent light, or in the fields of optical communication and optical application measurement and control. The present invention relates to a method for manufacturing a tapered optical waveguide that enables.
従来の技術
プロトン交換法により ＬｉＮｂＯ３上に光導波路を形
成し、Ｔｉｃ／ＴＭ モードスプリッタや波長変換素子
などが作製されていた。上記光導波路は屈折率差（Δｎ
６：）ｏ、１）が大きくシングルモードのみ伝搬させよ
うとすると厚みが０．４〜０．６μｍと非常に薄くなっ
ていた。そのため上記光導波への結合効率を向上させる
ため光入射部をテーパにすることが考えられる。Conventional technology An optical waveguide has been formed on LiNbO3 using a proton exchange method to produce Tic/TM mode splitters, wavelength conversion elements, and the like. The optical waveguide has a refractive index difference (Δn
6:) o, 1) is large and when trying to propagate only a single mode, the thickness was extremely thin at 0.4 to 0.6 μm. Therefore, in order to improve the coupling efficiency to the optical waveguide, it is possible to make the light incidence part tapered.
従来、このテーパ状光導波路の製造方法として（アブラ
イドオプティクス（ムｐｐｌｉｅｄ ０ｐｔｉｃｓ）１
９７９年３月号 １８巻ＮＯ６Ｐ２Ｏ３〜９０２ ）
（Ｄ Ｊ、 Ｃ，Ｃａｍｐｂｅｌｌ 氏によると第３図
に示されるように基板１′を徐々に硝酸銀の溶液４′中
に浸していくことにより拡散深さを変化させてテーパ状
光導波路を作製するというものである。ＬｉＮｂ０．１
’に光導波路を形成する場合、溶液４′として安息香酸
を用い２００°Ｃ程度の温度でテーパ状光導波路が作製
される。第３図で８はヒータ、５はビー力である。Conventionally, as a manufacturing method of this tapered optical waveguide (applied optics 1
March 979 issue Volume 18 NO6P2O3~902)
(According to D. J. Campbell, a tapered optical waveguide is fabricated by changing the diffusion depth by gradually dipping the substrate 1' into a silver nitrate solution 4' as shown in Figure 3. That is.LiNb0.1
When forming an optical waveguide in ', a tapered optical waveguide is produced using benzoic acid as solution 4' at a temperature of about 200°C. In FIG. 3, 8 is a heater and 5 is a bead force.
発明が解決しようとする問題点
上記のようなテーパ状光導波路の作製方法では、高温で
熱処理するため蒸気により液に浸されていない部分にム
ラができるという問題があった。また溶液の空気と接す
る部分の温度が低下し設計通りの入射部が形成できない
という問題もあった。Problems to be Solved by the Invention In the method for manufacturing a tapered optical waveguide as described above, there is a problem in that the heat treatment is performed at a high temperature, so that the steam causes unevenness in the parts not immersed in the liquid. There was also the problem that the temperature of the part of the solution in contact with air decreased, making it impossible to form the input section as designed.
問題点を解決するための手段
本発明のテーパ状導波路の作製方法はＬｉＮｂｚ”ｌ−
ＸＯ３（０≦Ｘ≦１）基板にプロトン交換を行い、高屈
折率層を形成する工程を行った後、上記高屈折率層の溶
解液中に上記基板の一部分を浸し上記高屈折率層の膜厚
を部分的に薄くする工程を行うという手段を用いるもの
である。Means for Solving the Problems The method for manufacturing a tapered waveguide of the present invention is based on LiNbz"l-
After performing a step of performing proton exchange on the XO3 (0≦X≦1) substrate to form a high refractive index layer, a part of the substrate is immersed in a solution of the high refractive index layer to dissolve the high refractive index layer. This method uses a process of partially reducing the film thickness.
作用
本発明の構成によれば室温付近での処理が可能となり簡
単に制御性良く均質なテーパ状光導波路が作製できる。Function: According to the structure of the present invention, processing can be performed at around room temperature, and a homogeneous tapered optical waveguide can be easily manufactured with good controllability.
実施例
第１図は本発明のテーパ状光導波路の作製方法の一実施
例を示す構成図である。第２図にも詳しく示すように１
はプロトン交換により高屈折率層２が形成されたＬｉＮ
ｂ０３Ｚ板［ＬｉＮｂｘＴａ、−ＸＯ３；０≦Ｘ≦１］
である。プロトン交換は燐酸（Ｈ５ＰＯ４）中で２３
０’Ｃ１１時間行った。これにより形成された高屈折率
層２の厚みは１μｍであった。またＬｉＮｂ０゜Ｚ 板
１はテフロン製のサンプルホルダー３で固定されており
、ビーカ５内に入れられてフッ酸（ＨＦ）４中に第一の
部分６が浸されている。この第一の部分６上の高屈折率
層２は室温でのフッ酸４中で５００Å／分のエツチング
レートで膜厚が減少する。Embodiment FIG. 1 is a block diagram showing an embodiment of the method for manufacturing a tapered optical waveguide of the present invention. As shown in detail in Figure 2, 1
is LiN with high refractive index layer 2 formed by proton exchange.
b03Z plate [LiNbxTa, -XO3; 0≦X≦1]
It is. Proton exchange occurs in phosphoric acid (H5PO4) at 23
It was carried out for 11 hours at 0'C. The thickness of the high refractive index layer 2 thus formed was 1 μm. Further, the LiNb0°Z plate 1 is fixed with a sample holder 3 made of Teflon, and placed in a beaker 5, with a first portion 6 immersed in hydrofluoric acid (HF) 4. The thickness of the high refractive index layer 2 on the first portion 6 is reduced at an etching rate of 500 Å/min in hydrofluoric acid 4 at room temperature.
この後１０分間で第二の部分子を徐々にフッ酸４に浸す
ことにより第一の部分６の厚みは当初の１μｍより０．
５μｍ減少し、０．５μｍとなる。また、第二の部分７
は厚み０．５μｍから厚み１μｍまでの部分にわたって
テーパ状の光入射部となる。その後、サンプルホルダー
３ごとＬｉＮｂ０３Ｚ板１をフッ酸４中より引き出しす
ばやく水洗を行う。After that, the second part 6 is gradually immersed in hydrofluoric acid 4 for 10 minutes, so that the thickness of the first part 6 is reduced from the original 1 μm to 0.5 μm.
It decreases by 5 μm to 0.5 μm. Also, the second part 7
becomes a tapered light incident portion over a portion with a thickness of 0.5 μm to 1 μm. Thereafter, the LiNb03Z plate 1 together with the sample holder 3 is pulled out from the hydrofluoric acid 4 and quickly washed with water.
上記のような工程で第２図に示されるようなテーパ状光
導波路が形成される。結合効率を調べるためにＨｅ−Ｎ
ｏ ｖ−ザ（波長０．６３３μｍ ）を用いたところ６
０％の結合効率を得た。この値はテーパ部を持たない光
導波路との結合効率３５％のほぼ倍となっている。Through the steps described above, a tapered optical waveguide as shown in FIG. 2 is formed. He-N to investigate the binding efficiency
When using ov-za (wavelength 0.633 μm) 6
A binding efficiency of 0% was obtained. This value is almost twice the coupling efficiency of 35% with an optical waveguide without a tapered portion.
なお、本実施例では横方向に閉じ込めのないスラブ導波
路について述べたが、上記工程後通常のフォトリソ工程
およびエツチング工程を用いれば横方向の閉じ込めも可
能となる。また、溶解液としてＨＦを用いたがＨＦにＨ
ＮＯ３，水などを混入したものも有効である。In this embodiment, a slab waveguide without lateral confinement has been described, but lateral confinement is also possible if ordinary photolithography and etching steps are used after the above steps. In addition, although HF was used as the dissolving solution, H
Those mixed with NO3, water, etc. are also effective.
発明の効果
本発明のテーパ状光導波路の作製方法によれば、室温で
テーパ状入射部が形成でき、簡単に制御側、均一性良く
テーパ状光導波路が作製できる。Effects of the Invention According to the method for manufacturing a tapered optical waveguide of the present invention, a tapered entrance portion can be formed at room temperature, and a tapered optical waveguide can be easily manufactured with good control and uniformity.
第１図ａは本発明のテーパ状導波路の作製方法の一実施
例を説明するだめの断面図、第１図すは同方法を適用す
る基板の斜視図、第２図は作製されたテーパ状光導波路
の断面図、第３図は従来のテーパ状光導波路の作製方法
を説明するだめの断面図である。
１Ｌ工Ｎｂ０６基板、２・・・・高屈折率層、４・・・
・・フッ酸。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名第１
図
第２図
第３図FIG. 1a is a cross-sectional view illustrating an embodiment of the method for manufacturing a tapered waveguide of the present invention, FIG. 1 is a perspective view of a substrate to which the method is applied, and FIG. FIG. 3 is a cross-sectional view for explaining a conventional method for manufacturing a tapered optical waveguide. 1L engineered Nb06 substrate, 2...high refractive index layer, 4...
...Hydrofluoric acid. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2 Figure 3
Claims (2)
１）基板にプロトン交換を行い高屈折率層を形成する工
程を行った後、上記高屈折率層の溶解液中に上記基板の
一部分を浸し上記高屈折率層の膜厚を部分的に薄くする
工程を行うテーパ状導波路の作製方法。(1) LiNb_xTa_1_-_xO_3 (0≦x≦
1) After performing a step of performing proton exchange on the substrate to form a high refractive index layer, a portion of the substrate is immersed in a solution of the high refractive index layer to partially thin the high refractive index layer. A method for manufacturing a tapered waveguide that involves the process of
テーパ状導波路の作製方法。(2) The method for manufacturing a tapered waveguide according to claim 1, wherein the dissolving solution contains HF.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30695986A JPS63158505A (en) | 1986-12-23 | 1986-12-23 | Preparation of tapered optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30695986A JPS63158505A (en) | 1986-12-23 | 1986-12-23 | Preparation of tapered optical waveguide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63158505A true JPS63158505A (en) | 1988-07-01 |
Family
ID=17963330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30695986A Pending JPS63158505A (en) | 1986-12-23 | 1986-12-23 | Preparation of tapered optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63158505A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60156041A (en) * | 1984-01-23 | 1985-08-16 | Canon Inc | Optical waveguide device |
| JPS6141107A (en) * | 1984-08-01 | 1986-02-27 | Matsushita Electric Ind Co Ltd | Production of taper coupling element |
-
1986
- 1986-12-23 JP JP30695986A patent/JPS63158505A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60156041A (en) * | 1984-01-23 | 1985-08-16 | Canon Inc | Optical waveguide device |
| JPS6141107A (en) * | 1984-08-01 | 1986-02-27 | Matsushita Electric Ind Co Ltd | Production of taper coupling element |
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