JPS6229236B2 - - Google Patents

Info

Publication number
JPS6229236B2
JPS6229236B2 JP54093606A JP9360679A JPS6229236B2 JP S6229236 B2 JPS6229236 B2 JP S6229236B2 JP 54093606 A JP54093606 A JP 54093606A JP 9360679 A JP9360679 A JP 9360679A JP S6229236 B2 JPS6229236 B2 JP S6229236B2
Authority
JP
Japan
Prior art keywords
paste
thick film
glass frit
resistor
organic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54093606A
Other languages
Japanese (ja)
Other versions
JPS5617275A (en
Inventor
Takafumi Endo
Tetsunori Sawae
Hiromi Yamashita
Toshio Hida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9360679A priority Critical patent/JPS5617275A/en
Priority to US06/160,572 priority patent/US4343833A/en
Priority to EP80302138A priority patent/EP0021833B1/en
Priority to DE8080302138T priority patent/DE3071787D1/en
Publication of JPS5617275A publication Critical patent/JPS5617275A/en
Publication of JPS6229236B2 publication Critical patent/JPS6229236B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 この発明はフアクシミリ、プランタ等に用いら
れ、文字、図形等を感熱記録するサーマルヘツド
の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a thermal head used in facsimiles, planters, etc., for thermally recording characters, figures, etc.

従来、この種の製造方法としては第1図a〜d
に示すものが採られていた。すなわち、第1図a
に示すようにセラミツク基板1上の所定領域すな
わち抵抗予定領域を除く部分に熱圧着等の手段に
より一様厚さの有機皮膜2を被着形成し、この有
機皮膜2により包囲形成された抵抗予定領域に第
1図bのように厚膜抵抗ペースト3をスクリーン
プリンタで印刷して被着、充填する。次に、有機
皮膜2の表面より高く被着された厚膜抵抗ペース
ト3の不要部分を第1図cに示すスキージ4によ
り取り除き、そして乾燥させる。この乾燥後、エ
ツチング法等の手段により有機皮膜2を取り除
き、次に900℃前後で厚膜ペースト5を焼成し、
厚膜抵抗体6すなわち熱記録用の発熱抵抗体を形
成する(第1図d)。
Conventionally, this type of manufacturing method is shown in Figures 1a to d.
The following were taken. That is, Figure 1a
As shown in FIG. 2, an organic film 2 of uniform thickness is formed on a predetermined area of the ceramic substrate 1, excluding the area where the resistor is planned, by thermocompression bonding or the like, and the resistor area surrounded by the organic film 2 is formed. The thick film resistor paste 3 is printed on the area using a screen printer and applied and filled as shown in FIG. 1b. Next, unnecessary portions of the thick film resistor paste 3 that are deposited higher than the surface of the organic film 2 are removed using a squeegee 4 shown in FIG. 1c, and then dried. After this drying, the organic film 2 is removed by means such as etching, and then the thick film paste 5 is fired at around 900°C.
A thick film resistor 6, that is, a heating resistor for thermal recording is formed (FIG. 1d).

ところで、従来のサーマルヘツドの製造方法で
は、厚膜抵抗ペースト3を充填時における有機皮
膜2と厚膜抵抗ペースト3との接合部における相
互の粘着係数が高いこと、また、厚膜抵抗ペース
ト5を乾燥する第3の工程において、厚膜抵抗ペ
ースト5中に含まれる有機溶剤の蒸発による厚膜
抵抗ペースト5の体積減少が不安定なこと、さら
に厚膜抵抗ペースト5を焼成する第4の工程にお
いて、厚膜抵抗ペースト3中に含まれる有機バイ
ンダーの燃焼が不安定なこと等に起因して厚膜抵
抗体6の表面に発泡、燃焼残渣の付着など生じ
る。従つて、厚膜抵抗体6表面に接して送給配置
される感熱記録紙(図示せず)と厚膜抵抗体6と
の接触が不均一となり、印字濃度の不均一、印字
ドツトサイズの不揃い、厚膜抵抗体6への印加電
力の増大及び熱応答性の悪化など、サーマルヘツ
ドとして重大な欠点があつた。
By the way, in the conventional method of manufacturing a thermal head, the mutual adhesion coefficient at the joint between the organic film 2 and the thick film resistor paste 3 is high when the thick film resistor paste 3 is filled, and the thick film resistor paste 5 is In the third step of drying, the volume reduction of the thick film resistor paste 5 due to evaporation of the organic solvent contained in the thick film resistor paste 5 is unstable, and furthermore, in the fourth step of firing the thick film resistor paste 5. Due to unstable combustion of the organic binder contained in the thick film resistor paste 3, foaming, combustion residue, etc. occur on the surface of the thick film resistor 6. Therefore, the contact between the thick film resistor 6 and the thermal recording paper (not shown) that is fed and placed in contact with the surface of the thick film resistor 6 becomes uneven, resulting in uneven print density, uneven print dot size, etc. There were serious drawbacks as a thermal head, such as an increase in the power applied to the thick film resistor 6 and a deterioration in thermal response.

この発明は上記従来の欠点を除去するためにな
されたもので、有機皮膜及び厚膜抵抗ペーストが
被着され不要部分が取り除かれた絶縁基板を乾燥
した後、厚膜抵抗ペースト中に含まれるガラスフ
リツトの軟化温度近傍に達するまで除々に昇温さ
せて予備焼成することになり、本焼成後の厚膜抵
抗体の表面形状を均一、且つその断面形状を凹形
に形成して感熱記録紙への印字を低電力で、しか
も良好な画質が得られるサーマルヘツドの製造方
法を提供するものである。
This invention was made in order to eliminate the above-mentioned conventional drawbacks. After drying the insulating substrate on which the organic film and thick film resistance paste have been applied and the unnecessary parts removed, the glass frit contained in the thick film resistance paste is removed. Pre-firing is carried out by gradually raising the temperature until it reaches around the softening temperature of To provide a method for manufacturing a thermal head that can print with low power and still provide good image quality.

以下、この発明の一実施例を第2図を用いて説
明する。第2図において、まず、第1の工程とし
てセラミツク基板1上の所定領域すなわち抵抗予
定領域以外の部分に熱圧着などの手段により有機
皮膜2を一様厚さに被着形成し第2図a、第2の
工程としてスクリーン・プリンタで厚膜抵抗ペー
スト3をセラミツク基板1上に印刷して、有機皮
膜2により包囲形成された抵抗予定領域に被着、
充填する(第2図b)。次いで、第3の工程とし
てスキージ4により厚膜抵抗ペースト3の不要部
分を取り除いた後、これを乾燥する(第2図
c)。つまり、乾燥前に抵抗ペーストの不要部分
を除去しているため、その除去工程において万一
所要部分が除去され抵抗ペーストの表面に凸凹が
生じても、抵抗ペーストの塗布直後であるので、
抵抗ペースト自体の表面張力作用により元に戻
り、不要部分の完全除去と所要部分の均一性が保
たれることになる。次に第4の工程として、強制
的に空気の流れがあり、且つ10℃/分〜20℃/分
のゆるやかな昇温曲線で上昇し、その最高温度が
厚膜抵抗ペースト5中に含まれるガラスフリツト
の軟化温度以下で予備焼成することにより、有機
皮膜2及び厚膜抵抗ペースト5中のエチルセルロ
ーズ系の有機バインダを蒸発・燃焼させて抵抗体
8を形成する(第2図d)。最後に第5の工程と
して、この予備焼成された抵抗体8を900℃前後
の温度で焼成して厚膜抵抗体9を形成する(第2
図e)。通常用いられている厚膜抵抗ペースト3
の乾燥・焼成時における温度と厚膜抵抗ペースト
の体積減少率は第4図に示すようになる。すなわ
ち、厚膜抵抗ペースト5中に含まれるブチル・カ
ルビトール系の有機溶剤は100℃〜200℃の温度で
蒸発し、前記ペースト中に含まれるエチルセルロ
ーズ系の有機バインダは300℃〜400℃の温度で燃
焼を完了し厚膜抵抗ペーストの体積は60%〜70%
に激減する。又、厚膜抵抗ペースト5中に含まれ
るガラス・フリツトは500℃〜700℃の温度で軟化
を始める。
An embodiment of the present invention will be described below with reference to FIG. In FIG. 2, first, as a first step, an organic film 2 is formed to a uniform thickness on a predetermined region of the ceramic substrate 1, that is, a portion other than the intended resistance region by means such as thermocompression bonding, as shown in FIG. 2a. , as a second step, a thick film resistor paste 3 is printed on the ceramic substrate 1 using a screen printer, and is applied to the resistor area surrounded by the organic film 2;
Fill (Figure 2b). Next, in the third step, unnecessary portions of the thick film resistor paste 3 are removed using a squeegee 4 and then dried (FIG. 2c). In other words, since the unnecessary parts of the resistor paste are removed before drying, even if the necessary parts are removed during the removal process and the surface of the resistor paste becomes uneven, it will be removed immediately after the resistor paste is applied.
It returns to its original state due to the surface tension of the resistance paste itself, allowing complete removal of unnecessary portions and maintaining uniformity of required portions. Next, as the fourth step, there is a forced air flow and the temperature rises at a gradual temperature rise curve of 10°C/min to 20°C/min, and the highest temperature is included in the thick film resistor paste 5. By pre-firing at a temperature below the softening temperature of the glass frit, the organic film 2 and the ethyl cellulose organic binder in the thick film resistor paste 5 are evaporated and burned to form the resistor 8 (FIG. 2d). Finally, as a fifth step, this pre-fired resistor 8 is fired at a temperature of around 900°C to form a thick film resistor 9 (second
Figure e). Commonly used thick film resistor paste 3
The temperature and volume reduction rate of the thick film resistor paste during drying and firing are shown in FIG. That is, the butyl carbitol-based organic solvent contained in the thick film resistance paste 5 evaporates at a temperature of 100°C to 200°C, and the ethyl cellulose-based organic binder contained in the paste evaporates at a temperature of 300°C to 400°C. The volume of thick film resistor paste that completes combustion at temperature is 60%~70%
drastically decreased. Further, the glass frit contained in the thick film resistor paste 5 begins to soften at temperatures between 500°C and 700°C.

従つて、上記厚膜抵抗ペースト5を予備焼成す
る工程(第2図d)により、厚膜抵抗ペースト5
中に含まれる有機溶剤の蒸発および有機バインダ
の燃焼が急激に行われないので本焼成された厚膜
抵抗体9の表面に発泡、燃焼残渣の付着等がなく
なつてその表面の平滑性が良くなる。このため、
感熱記録紙の印字濃度が均一となり、また厚膜抵
抗体に少ない電力印加で印字が出来ると共に厚膜
抵抗体の熱応答性が良くなるので高速印字ができ
る。
Therefore, by the step of pre-baking the thick film resistor paste 5 (FIG. 2d), the thick film resistor paste 5 is
Since the organic solvent contained therein does not evaporate rapidly and the organic binder does not burn, the surface of the fired thick film resistor 9 is free from foaming, adhesion of combustion residue, etc., and has a good surface smoothness. Become. For this reason,
The printing density on the thermosensitive recording paper becomes uniform, printing can be performed with less power applied to the thick film resistor, and the thermal responsiveness of the thick film resistor improves, allowing high-speed printing.

またこの予備焼成により、有機皮膜2と厚膜抵
抗ペースト5との接合部における粘着係数の不都
合も解消されるが、更にこの解消効果を高めるた
めに第3図a〜eに示すように、セラミツク基板
1上に有機皮膜2を形成する第1の工程(第3図
a)厚膜ペースト3をセラミツク基板1上にスク
リーン印刷して、充填、被着する第2工程(第3
図c)との間に有機皮膜2と厚膜抵抗ペースト3
との接合部に粘着性材料10を塗布する工程(第
3図b)を付加しても良い。尚、この粘着性材料
10は有機皮膜2及びセラミツク基板1の全面に
塗布しても良い事は匁論である。
This pre-firing also eliminates the problem of the adhesive coefficient at the joint between the organic film 2 and the thick film resistor paste 5, but in order to further enhance this resolving effect, as shown in FIGS. 3a to 3e, ceramic The first step (FIG. 3a) is to form the organic film 2 on the substrate 1. The second step (third step is to screen print, fill and apply the thick film paste 3 on the ceramic substrate 1.
Figure c) between organic film 2 and thick film resistor paste 3.
A step (FIG. 3b) of applying the adhesive material 10 to the joint portion may be added. Incidentally, it is a theory that this adhesive material 10 may be applied to the entire surface of the organic film 2 and the ceramic substrate 1.

又、厚膜抵抗体9と感熱記録紙との摺動に起因
する厚膜抵抗体9の摩耗を防止するため、厚膜抵
抗体9の上に接して耐摩耗層を形成しても良く、
更に、厚膜抵抗体9を形成した後その表面を研摩
して表面の平滑性をより均一化しても良い。
Further, in order to prevent wear of the thick film resistor 9 due to sliding between the thick film resistor 9 and the heat-sensitive recording paper, a wear-resistant layer may be formed on and in contact with the thick film resistor 9.
Furthermore, after the thick film resistor 9 is formed, its surface may be polished to make the surface smoother more uniform.

以上のように、この発明によれば絶縁基板上の
所定領域にそれぞれ有機皮膜および抵抗ペースト
を一様厚さに被着形成して抵抗ペーストの不要部
分を除去し乾燥させた後、上記抵抗ペーストに含
まれるガラスフリツトの軟化温度近傍まで徐々に
昇温させて上記有機皮膜および抵抗ペースト中の
エチルセルロース系の有機バインダを蒸発、燃焼
させる予備焼成工程を付加し、この後、本焼成す
るようにしたので、焼成された抵抗体表面の平滑
性がよくなり、したがつて、すぐれた画質が少な
い消費電力で、しかも高速で記録できるという効
果がある。
As described above, according to the present invention, after forming an organic film and a resistive paste to a uniform thickness on predetermined areas on an insulating substrate, removing unnecessary portions of the resistive paste, and drying the resistive paste, the resistive paste is A pre-firing step is added in which the temperature is gradually raised to near the softening temperature of the glass frit contained in the resistor paste to evaporate and burn the organic film and the ethyl cellulose organic binder in the resistor paste, and then the main firing is performed. The smoothness of the surface of the fired resistor is improved, resulting in excellent image quality, low power consumption, and high speed recording.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a〜dは従来のサーマルヘツドの製造工
程を説明するための工程図、第2図a〜eはこの
発明の一実施例によるサーマルヘツドの製造工程
を説明するための工程図、第3図a〜eこの発明
のその他の実施例を示す製造工程図、第4図はこ
の発明の作用を説明するための厚膜ペースト体積
−温度特性図である。 図中1はセラミツク基板、2は有機皮膜、3お
よび5は厚膜抵抗ペースト、9は厚膜抵抗体、1
0は粘着性材料である。なお、図中、同一符号は
同一または相当部分を示す。
1A to 1D are process diagrams for explaining the manufacturing process of a conventional thermal head, and FIGS. 2A to 2E are process diagrams for explaining the manufacturing process of a thermal head according to an embodiment of the present invention. 3a to 3e are manufacturing process diagrams showing other embodiments of the present invention, and FIG. 4 is a thick film paste volume-temperature characteristic diagram for explaining the operation of the present invention. In the figure, 1 is a ceramic substrate, 2 is an organic film, 3 and 5 are thick film resistor pastes, 9 is a thick film resistor, 1
0 is sticky material. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】 1 絶縁基板上の抵抗予定領域を除く部分に一様
厚さの有機皮膜を被着形成する工程、この有機皮
膜により包囲形成された上記抵抗予定領域にガラ
スフリツトを含む抵抗ペーストを被着、充填する
工程、この被着、充填された抵抗ペーストの不要
部分を取り除き、その被着厚さを上記有機皮膜の
厚さと同一に形成後、それを乾燥する工程、この
乾燥後、上記ガラスフリツトの軟化温度近傍に達
するまで除々に昇温させて予備焼成する工程、こ
の予備焼成後、上記ガラスフリツトの軟化温度以
上の温度にて焼成し、上記抵抗予定領域に熱記録
用の抵抗体を形成する工程からなるサーマルヘツ
ドの製造方法。 2 絶縁基板上に被着形成された有機皮膜の少な
くとも抵抗ペースト接合面に粘着性材料を塗布さ
せたことを特徴とする特許請求の範囲第1項記載
のサーマルヘツドの製造方法。
[Scope of Claims] 1. A step of depositing and forming an organic film of uniform thickness on a portion of an insulating substrate other than the intended resistance area, and a resistor paste containing glass frit in the intended resistance area surrounded by the organic film. A process of depositing and filling the resistive paste, removing unnecessary parts of the deposited and filled resistor paste, forming the deposited thickness to be the same as the thickness of the organic film, and drying it. After this drying, A step of pre-firing the glass frit by gradually increasing the temperature until it reaches near the softening temperature of the glass frit. After this pre-baking, the glass frit is fired at a temperature higher than the softening temperature of the glass frit, and a resistor for thermal recording is placed in the area where the resistance is planned. A method for manufacturing a thermal head, which comprises a step of forming. 2. The method of manufacturing a thermal head according to claim 1, wherein an adhesive material is applied to at least the resistance paste bonding surface of the organic film formed on the insulating substrate.
JP9360679A 1979-06-26 1979-07-20 Preparation of thermal head Granted JPS5617275A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9360679A JPS5617275A (en) 1979-07-20 1979-07-20 Preparation of thermal head
US06/160,572 US4343833A (en) 1979-06-26 1980-06-17 Method of manufacturing thermal head
EP80302138A EP0021833B1 (en) 1979-06-26 1980-06-25 A method of manufacturing a thermal head
DE8080302138T DE3071787D1 (en) 1979-06-26 1980-06-25 A method of manufacturing a thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9360679A JPS5617275A (en) 1979-07-20 1979-07-20 Preparation of thermal head

Publications (2)

Publication Number Publication Date
JPS5617275A JPS5617275A (en) 1981-02-19
JPS6229236B2 true JPS6229236B2 (en) 1987-06-25

Family

ID=14086981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9360679A Granted JPS5617275A (en) 1979-06-26 1979-07-20 Preparation of thermal head

Country Status (1)

Country Link
JP (1) JPS5617275A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6444762A (en) * 1987-08-13 1989-02-17 Fuji Xerox Co Ltd Production of thick-film type thermal head
JP2757378B2 (en) * 1988-07-18 1998-05-25 富士ゼロックス株式会社 Heating resistor forming method for thermal head
JPH0226759A (en) * 1988-07-18 1990-01-29 Fuji Xerox Co Ltd Forming method of heating resistor of thermal head

Also Published As

Publication number Publication date
JPS5617275A (en) 1981-02-19

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