JPS62281418A - Heating device - Google Patents

Heating device

Info

Publication number
JPS62281418A
JPS62281418A JP12517386A JP12517386A JPS62281418A JP S62281418 A JPS62281418 A JP S62281418A JP 12517386 A JP12517386 A JP 12517386A JP 12517386 A JP12517386 A JP 12517386A JP S62281418 A JPS62281418 A JP S62281418A
Authority
JP
Japan
Prior art keywords
clean room
furnace
reaction tube
furnace body
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12517386A
Other languages
Japanese (ja)
Other versions
JP2671979B2 (en
Inventor
Katsunobu Miyagi
勝伸 宮城
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TERU SAAMUKO KK
Tokyo Electron Sagami Ltd
Original Assignee
TERU SAAMUKO KK
Tokyo Electron Sagami Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TERU SAAMUKO KK, Tokyo Electron Sagami Ltd filed Critical TERU SAAMUKO KK
Priority to JP61125173A priority Critical patent/JP2671979B2/en
Publication of JPS62281418A publication Critical patent/JPS62281418A/en
Application granted granted Critical
Publication of JP2671979B2 publication Critical patent/JP2671979B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To stabilize a furnace temperature and to prevent an increase of temperature in a clean room by providing heat shielding means having a reach including both a furnace and a clean room to prevent convection of the air between the furnace side and the clean room side. CONSTITUTION:A clean room 8A is arranged at the front end of, and in touch with, a furnace 2 of a pressure-reduced CVD device. At the rear end of the furnace 2, a clean room 8B is arranged similarly. A reaction tube 6 is inserted into a heat insulating member 4 fixed to the inside of the furnace 2 and the front end of this reaction tube 6 faces the clean room 8A and the rear end faces the clean room 8B. Between the end parts of the reaction tube 6 and the end parts of the furnace 2, a water cooling jacket 34A as a heat shielding means which insulates the furnace 2 from the clean room 8A while covering an exposed part of the reaction tube 6 with its reach including said two end parts. On a periphery of the water cooling jacket 34A, a water inlet pipe 38 for circulating a cooling water spirally is arranged. The existence of the water cooling jackets 34A and 34B enables the restraint of variation of temperature of the furnace 2 caused by convection of the air, resulting in the stabilization of the temperature of the furnace 2.

Description

【発明の詳細な説明】 3、発明の詳細な説明 〔産業上の利用分野〕 この発明は、IC基板の表面に対する特定の薄膜形成な
どに用いる加熱装置に係り、特に、炉体と清浄室との遮
断などに関する。
Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a heating device used for forming a specific thin film on the surface of an IC substrate, and in particular, relates to a heating device used for forming a specific thin film on the surface of an IC substrate, and in particular, related to the blocking of

〔従来の技術〕[Conventional technology]

一般に、半導体処理工場において、加熱装置としての減
圧CVD装置では、その炉体側と清浄空気室側とをパー
チージョンで仕切り、炉体側に対して清浄空気室側の圧
力を高(設定して炉体側の不浄空気が清浄空気室側へ侵
入するのを防止している。
In general, in a low-pressure CVD device used as a heating device in a semiconductor processing factory, the furnace body side and the clean air chamber side are separated by a perch joint, and the pressure on the clean air chamber side is set to be higher than that on the furnace body side. This prevents unclean air from entering the clean air chamber.

第6図は、従来の減圧CVD装置の前部の構成を示す。FIG. 6 shows the configuration of the front part of a conventional reduced pressure CVD apparatus.

炉体2に設置された断熱材4の内部には、IC基板など
を収容して加熱処理を行う反応管(アウターチューブ)
6が設置され、この反応管6の端部は、炉体2に隣接し
て設置された清浄室(スカベンジャ)8Aに臨ませられ
ている。この清浄室8Aと炉体2との間には、両者を仕
切る炉体2側の仕切り壁10が設けられ、この仕切り壁
10に対して清浄室8Aの前面壁12が固定されている
Inside the heat insulating material 4 installed in the furnace body 2, there is a reaction tube (outer tube) that accommodates IC boards and performs heat treatment.
6 is installed, and the end of this reaction tube 6 faces a clean room (scavenger) 8A installed adjacent to the furnace body 2. A partition wall 10 on the furnace body 2 side is provided between the clean chamber 8A and the furnace body 2, and a front wall 12 of the clean chamber 8A is fixed to this partition wall 10.

この減圧CVD装置において、炉体2側に対して清浄室
8A側の空気清浄化のために、内部の気圧を高く設定す
ることが行われている。清浄室8Aの気圧が高く設定さ
れた場合、炉体2側から清浄室8A側への不浄空気の侵
入は生じないが、炉体2側と清浄室8A側との間に生じ
る気圧差のため、清浄室8A側から炉体2側に矢印aで
示すように、気流を生じる。
In this reduced pressure CVD apparatus, the internal pressure is set high in order to clean the air on the clean chamber 8A side with respect to the furnace body 2 side. If the air pressure in the clean room 8A is set high, no unclean air will enter the clean room 8A from the furnace body 2 side, but due to the pressure difference between the furnace body 2 side and the clean room 8A side. , an air current is generated from the clean room 8A side to the furnace body 2 side as shown by arrow a.

このような気流によって炉体2の内部側に空気の対流を
起こすと、炉体2の温度分布が変化するので、その対流
を防止するとともに、炉体2側から清浄室8Aへの放熱
を防止するための対策として、第6図に示すように、清
浄室8Aの前面壁12の内面部には断熱材4と同様に反
応管6を覆う断熱材14が設置されているとともに、反
応管6の周囲部に生しる隙間18に繊維状の断熱材20
が詰め込まれている。
When air convection occurs inside the furnace body 2 due to such airflow, the temperature distribution of the furnace body 2 changes, so this convection is prevented, and heat radiation from the furnace body 2 side to the clean room 8A is also prevented. As a measure to prevent this, as shown in FIG. 6, a heat insulating material 14 is installed on the inner surface of the front wall 12 of the clean room 8A to cover the reaction tube 6 in the same way as the heat insulating material 4, and also to cover the reaction tube 6. A fibrous heat insulating material 20 is placed in the gap 18 created around the periphery of the
is packed.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで、清浄室8A側には、反応管6を開閉する自動
キャップ機構22、その自動キャップ機構22を自動的
に駆動する自動開閉機構24、反応管6の端部を封止す
るOリングの冷却機構26、自動キャップ機構22を冷
却する冷却機構28が設置されているとともに、各冷却
機構26.28に対して冷却水を循環させる冷却水用配
管などの各種の機構が設置されており、30は冷却水を
導く冷却水用配管の接続部である。
By the way, on the clean room 8A side, there is an automatic capping mechanism 22 that opens and closes the reaction tube 6, an automatic opening and closing mechanism 24 that automatically drives the automatic capping mechanism 22, and a cooling O-ring that seals the end of the reaction tube 6. A cooling mechanism 28 for cooling the mechanism 26 and the automatic capping mechanism 22 is installed, and various mechanisms such as cooling water piping for circulating cooling water to each cooling mechanism 26.28 are installed. is the connection part of the cooling water piping that leads the cooling water.

このように清浄室8A側には各種の設備が設けられてい
るため、空間的な余裕が極めて少なく、また、清浄室8
Aの外部には、その側面側にIC基板などの被処理物を
移送する昇降装置、冷却水用配管、排気ダクトなどが設
置され、その正面側には移送手段が設置されている。
Since various types of equipment are installed on the clean room 8A side, there is very little space available.
On the outside of A, an elevating device for transferring objects to be processed such as IC boards, cooling water piping, exhaust ducts, etc. are installed on its side, and a transfer means is installed on its front side.

したがって、反応管6を洗浄する際に、清浄室8Aにお
いて、断熱材14.20を設置する作業は、空間的に非
常に困難であり、作業性が悪く、また、断熱材14.2
0を設置しても気流を完全に阻止することは非常に困難
である。
Therefore, when cleaning the reaction tube 6, installing the heat insulating material 14.20 in the clean room 8A is very spatially difficult and has poor workability.
Even if 0 is installed, it is very difficult to completely block the airflow.

さらに、繊維状などの断熱材14.20を用いた場合、
清浄室8Aの下側に塵埃32の堆積が確認されており、
これが清浄室8Aならびに清浄室8Aを設置している清
浄空気室側の清浄状態を悪化させる原因になるおそれが
ある。
Furthermore, when using a heat insulating material such as fibrous material 14.20,
It has been confirmed that dust 32 has accumulated on the lower side of the clean room 8A,
This may cause deterioration of the cleanliness of the clean room 8A and the clean air chamber in which the clean room 8A is installed.

そして、従来では、反応管6の装着ごとに断熱材14.
20の設置作業が必要であり、その設置状態によって温
度プロファイルの再現性が悪く、温度制御が区々になる
Conventionally, each time a reaction tube 6 is attached, a heat insulating material 14.
20 installation operations are required, and the reproducibility of the temperature profile is poor depending on the installation state, making temperature control variable.

また、従来の減圧CVD装置では、第6図に示すように
、清浄室8Aにおいて、反応管6の端部が露出している
ため、その露出部での放熱によって、清浄室8Aの内壁
および雰囲気温度を上昇させる欠点がある。
In addition, in the conventional low-pressure CVD apparatus, as shown in FIG. 6, the end of the reaction tube 6 is exposed in the clean chamber 8A, and the heat dissipated from the exposed portion causes the inner wall of the clean chamber 8A to be exposed to the atmosphere. It has the disadvantage of increasing temperature.

そこで、この発明は、断熱材の設置作業を省略し、断熱
材による塵埃の発生および清浄室側の温度上昇を抑制す
るとともに、炉体側の温度制御を良好にした加熱装置の
提供を目的とする。
Therefore, the present invention aims to provide a heating device that eliminates the work of installing a heat insulating material, suppresses the generation of dust caused by the heat insulating material and the temperature rise in the clean room side, and improves the temperature control on the furnace body side. .

〔問題点を解決するための手段〕[Means for solving problems]

この発明の加熱装置は、第1図および第2図に示すよう
に、炉体2に隣接して設けられた清浄室8A、8Bの内
部に、炉体2の端部と炉体2から突出させた反応管6の
端部との間に跨がって反応管6の周囲を覆い、炉体2側
と清浄室8A、8B側とを遮断する熱遮蔽手段(水冷ジ
ャケット34A、34B)を設置したものである。
As shown in FIGS. 1 and 2, the heating device of the present invention has an end portion of the furnace body 2 and a portion protruding from the furnace body 2 inside the clean chambers 8A and 8B provided adjacent to the furnace body 2. A heat shielding means (water cooling jackets 34A, 34B) is provided to cover the periphery of the reaction tube 6 and cut off the furnace body 2 side and the clean chambers 8A, 8B side. It was installed.

〔作   用〕[For production]

このように構成すると、炉体2側と清浄室8A。 With this configuration, the furnace body 2 side and the clean room 8A.

8B側とを熱遮蔽手段(水冷ジャケラl−34A、34
B)によって遮断できるので、従来のように炉体2と清
浄室8A、8Bとの間に断熱材14.20を設置する必
要がなく、熱遮蔽手段(水冷ジャケット34A、34B
)によって清浄室8A、8Bの温度上昇を抑制できると
ともに、炉体2と清浄室8A、8B側との空気の対流を
抑えることができ、炉体2の温度変化を抑え、その制御
を良好に行うことができる。しかも、断熱材14.20
の省略によってその設置作業が不要になり、断熱材14
.20を設置した場合の塵埃32の発生や温度制御が不
均一になるなどの不都合が防止される。
8B side and heat shielding means (water cooling jacket l-34A, 34
B), there is no need to install a heat insulating material 14, 20 between the furnace body 2 and the clean rooms 8A, 8B as in the conventional case.
), it is possible to suppress the temperature rise in the clean rooms 8A and 8B, and it is also possible to suppress air convection between the furnace body 2 and the clean rooms 8A and 8B side, suppressing temperature changes in the furnace body 2 and improving its control. It can be carried out. Moreover, insulation material 14.20
Omission of the insulation material 14 eliminates the need for its installation work.
.. 20 is installed, problems such as generation of dust 32 and uneven temperature control can be prevented.

そして、この発明の加熱装置において、熱遮蔽手段は、
反応管6の端部外周に冷却水を循環させた水冷ジャケラ
)34A、34Bで構成すれば、炉体2側と清浄室8A
、8B側とを容易に遮断できるとともに、その水冷ジャ
ケット34A、34Bの冷却作用によって清浄室8A、
8Bの温度上昇を抑えることができる。
In the heating device of this invention, the heat shielding means is
If it is configured with water-cooled jackets (34A and 34B) in which cooling water is circulated around the outer circumference of the end of the reaction tube 6, the furnace body 2 side and the clean room 8A
, 8B side, and the cooling effect of the water cooling jackets 34A, 34B allows the clean room 8A, 8B side to be easily shut off.
8B temperature rise can be suppressed.

〔実 施 例〕〔Example〕

第1図は、この発明の加熱装置の実施例を示し、この実
施例は減圧CVD装置に関するものである。
FIG. 1 shows an embodiment of a heating device of the present invention, and this embodiment relates to a low pressure CVD device.

第1図に示すように、炉体2に隣接してその前部端には
、清浄室8Aが設置され、また、炉体2の後部端には、
同様に清浄室8Bが設置されている。そして、炉体2の
内部に固定された断熱材4の内部に反応管6が挿入され
ており、この反応管6の前部端が清浄室8A、その後部
端が清浄室8Bに臨ませられている。
As shown in FIG. 1, a clean room 8A is installed adjacent to the furnace body 2 at its front end, and at the rear end of the furnace body 2,
Similarly, a clean room 8B is installed. A reaction tube 6 is inserted into the inside of the heat insulating material 4 fixed inside the furnace body 2, and the front end of this reaction tube 6 faces the clean room 8A, and the rear end faces the clean room 8B. ing.

清浄室8A側では、反応管6の前部端を開閉する自動キ
ャップ機構22が設けられ、この自動キャップ機構22
は、第2図に示すように、矢印Aの方向に自動開閉機構
24で自動的に開閉される。
On the clean chamber 8A side, an automatic capping mechanism 22 for opening and closing the front end of the reaction tube 6 is provided.
is automatically opened and closed in the direction of arrow A by an automatic opening and closing mechanism 24, as shown in FIG.

そして、反応管6の前部端縁部にはOリング35を介在
させて保持枠36が設置されているとともに、Oリング
35を把持して自動キャップ機構22の前端枠37が設
置されている。保持枠36を介して反応管6の端部と炉
体2の端部との間には、これら両端部間に跨がって反応
管6の露出部分を覆い、炉体2と清浄室8Aとの間を遮
断する熱遮蔽手段の一例として水冷シャケ・ノド34A
が設置されている。水冷ジャケット34Aの周面には、
第3図に示すように、螺旋状に冷却水を循環させる導水
管38が配設されている。水冷ジャケット34Aは、第
4図に示すように、導水管38に対して保持枠36に取
り付けられた配管接続部40から矢印Cで示すように供
給される冷却水の循環によって冷却され、反応管6から
の熱を遮蔽する。清浄室8Aには内部空気を排気するダ
クト用排気口42が設置されて、空気の清浄化が図られ
る。
A holding frame 36 is installed at the front edge of the reaction tube 6 with an O-ring 35 interposed therebetween, and a front end frame 37 of the automatic capping mechanism 22 is installed by gripping the O-ring 35. . Between the end of the reaction tube 6 and the end of the furnace body 2 via the holding frame 36, the exposed part of the reaction tube 6 is covered by spanning between these two ends, and the furnace body 2 and the clean chamber 8A are connected. Water-cooled salmon throat 34A is an example of a heat shielding means that blocks the connection between
is installed. On the circumferential surface of the water cooling jacket 34A,
As shown in FIG. 3, a water guide pipe 38 is provided to circulate cooling water in a spiral manner. As shown in FIG. 4, the water cooling jacket 34A is cooled by the circulation of cooling water supplied to the water conduit 38 from the piping connection part 40 attached to the holding frame 36 as shown by arrow C, and 6. Shield the heat from 6. A duct exhaust port 42 for exhausting internal air is installed in the clean room 8A to purify the air.

また、清浄室8B側では、清浄室8A側と同様に、反応
管6の後部端を開閉する自動キャップ機構44が設けら
れ、この自動キャップ機構44は、第2図に示すように
、矢印Bの方向に自動的に開閉される。そして、反応管
6の後部端縁部には0リング45を介在させて気密性を
保持させた保持枠46が設置されるとともに、0リング
45を把持して自動キャンプ機構44の前端枠47が設
置されている。炉体2の後部端にはシリカクロスなどか
らなる断熱部材4日を介して固定枠50が取り付けられ
ている。これら固定枠50と保持枠46との間には、第
5図に示すように、これら両端部に跨がって炉体2と清
浄室8Bとの間を遮断する熱遮蔽手段の一例として水冷
ジャケット34Bが設置されている。水冷ジャケット3
4Bの周面には、螺旋状に冷却水を循環させる導水管5
2が配設され、導水管52には保持枠46に取り付けら
れた配管接続部53を介して供給される冷却水が常時循
環される。したがって、水冷ジャケラ)34Bはその冷
却水によって冷却され、反応管6からの熱を遮蔽する。
Further, on the clean chamber 8B side, an automatic capping mechanism 44 for opening and closing the rear end of the reaction tube 6 is provided as in the clean chamber 8A side, and as shown in FIG. Automatically opens and closes in the direction of. A holding frame 46 with an O-ring 45 interposed therebetween to maintain airtightness is installed at the rear end of the reaction tube 6, and the front end frame 47 of the automatic camping mechanism 44 is held by gripping the O-ring 45. is set up. A fixed frame 50 is attached to the rear end of the furnace body 2 via a heat insulating member made of silica cloth or the like. As shown in FIG. 5, between the fixed frame 50 and the holding frame 46, a water cooling device is provided as an example of a heat shielding means that spans both ends of these and isolates between the furnace body 2 and the clean room 8B. A jacket 34B is installed. water cooling jacket 3
On the circumferential surface of 4B, there is a water guide pipe 5 that circulates cooling water in a spiral shape.
2 is disposed, and cooling water supplied to the water guide pipe 52 via a pipe connection part 53 attached to the holding frame 46 is constantly circulated. Therefore, the water-cooled jacket 34B is cooled by the cooling water and shields the heat from the reaction tube 6.

49は減圧用の排気口、54は水冷ジャケット34Bの
導水管52を固定する固定手段としての固定用パイプを
示す。
Reference numeral 49 indicates an exhaust port for reducing pressure, and reference numeral 54 indicates a fixing pipe as a fixing means for fixing the water conduit pipe 52 of the water cooling jacket 34B.

そして、清浄室8Aと同様に、清浄室8Bの内部には内
部空気を排気するダクト用排気口56が設置されて、空
気の清浄化が図られる。なお、58は清浄室8B側の正
面ドアである。
Similarly to the clean room 8A, a duct exhaust port 56 for exhausting internal air is installed inside the clean room 8B to purify the air. Note that 58 is a front door on the clean room 8B side.

したがって、炉体2の端部と反応管6の端部との間に跨
がって水冷ジャケラl−34A、34Bが設置されると
、炉体2側と清浄室8Aまたは清浄室8B側との間が各
水冷シャケ’7 ト34 A、34Bによって遮断され
、空気の対流による炉体2の温度の変動を抑えることが
でき、その制御が良好になり、炉体2の温度を安定化で
きる。
Therefore, if the water-cooled jacket l-34A, 34B is installed across the end of the furnace body 2 and the end of the reaction tube 6, the furnace body 2 side and the clean room 8A or clean room 8B side The space between the two water-cooled cages 34A and 34B is cut off by the water-cooled cages 34A and 34B, suppressing fluctuations in the temperature of the furnace body 2 due to air convection, improving control, and stabilizing the temperature of the furnace body 2. .

そして、反応管6の清浄室8A、8Bでの露出部分が水
冷ジャケット34A、34Bによって覆われるので、反
応管6の放熱を抑えることができ、上段炉の温度プロフ
ァイルへの影響を防止できる。
Since the exposed portions of the reaction tubes 6 in the clean chambers 8A and 8B are covered by the water cooling jackets 34A and 34B, heat radiation from the reaction tubes 6 can be suppressed, and the influence on the temperature profile of the upper furnace can be prevented.

なお、実施例では、水冷ジャケット34A、34Bを以
て熱遮蔽手段を構成したが、導水管38.52を配設し
ない遮蔽筒を以て構成してもよい。
In the embodiment, the water cooling jackets 34A and 34B constitute the heat shielding means, but the heat shielding means may be constituted by a shielding tube without the water conduit pipes 38, 52.

〔発明の効果] 以上説明したように、この発明によれば、次のような効
果が得られる。
[Effects of the Invention] As explained above, according to the present invention, the following effects can be obtained.

(a)  従来の断熱材に代え、炉体側と清浄室側との
両者間に跨がって熱遮蔽手段を設置したので、炉体側と
清浄室側との空気の対流を遮断でき、炉体温度を安定化
できる。
(a) Instead of conventional heat insulating material, a heat shielding means is installed across both the furnace body side and the clean room side, so it is possible to block air convection between the furnace body side and the clean room side, and the furnace body Temperature can be stabilized.

(bl  断熱材を設置しないため、そのための作業を
省略できるとともに、断熱材による塵埃の発生を防止で
き、清浄室側の空気の清浄化を高めることができる。
(bl) Since no heat insulating material is installed, the work for that purpose can be omitted, and the generation of dust due to the heat insulating material can be prevented, improving the cleanliness of the air in the clean room side.

(C)  反応管の清浄室に露出した部分が熱遮蔽手段
によって覆われるため、清浄室の温度上昇を防止でき、
清浄室の温度上昇による悪影響を防止できる。
(C) Since the portion of the reaction tube exposed to the clean chamber is covered by a heat shielding means, the temperature rise in the clean chamber can be prevented;
It is possible to prevent the adverse effects of temperature rise in the clean room.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の加熱装置の実施例である減圧CVD
装置を示す一部切欠断面図、第2図は第1図に示した減
圧CVD装置の自動キャンプ機構の動作を示す一部切欠
断面図、第3図は水冷ジャケットの外形を示す側面図、
第4図および第5図は水冷ジャケット部分を示す断面図
、第6図は従来の減圧CVD装置の前部の構成を示す断
面図である。 2・・・炉体、6・・・反応管、8A、8B・・・清浄
室、34A、34B・・・熱遮蔽手段としての水冷ジャ
ケット。 第3図 第4図 第5図
FIG. 1 shows an embodiment of the heating device according to the present invention using a low-pressure CVD method.
FIG. 2 is a partially cutaway sectional view showing the operation of the automatic camping mechanism of the reduced pressure CVD apparatus shown in FIG. 1; FIG. 3 is a side view showing the outer shape of the water cooling jacket;
4 and 5 are cross-sectional views showing the water cooling jacket portion, and FIG. 6 is a cross-sectional view showing the structure of the front part of a conventional reduced pressure CVD apparatus. 2...Furnace body, 6...Reaction tube, 8A, 8B...Clean room, 34A, 34B...Water cooling jacket as heat shielding means. Figure 3 Figure 4 Figure 5

Claims (2)

【特許請求の範囲】[Claims] (1)炉体に隣接して設けられた清浄室の内部に、炉体
の端部と炉体から突出させた反応管の端部との間に跨が
って反応管の周囲を覆い、前記炉体側と前記清浄室側と
を遮断する熱遮蔽手段を設置したことを特徴とする加熱
装置。
(1) Inside a clean room provided adjacent to the furnace body, cover the reaction tube by spanning between the end of the furnace body and the end of the reaction tube protruding from the furnace body, A heating device characterized in that a heat shielding means is installed to isolate the furnace body side and the clean room side.
(2)前記熱遮蔽手段は、前記反応管の端部外周に冷却
水を循環させた水冷ジャケットで構成したことを特徴と
する特許請求の範囲第1項に記載の加熱装置。
(2) The heating device according to claim 1, wherein the heat shielding means is constituted by a water cooling jacket in which cooling water is circulated around the outer periphery of the end of the reaction tube.
JP61125173A 1986-05-30 1986-05-30 Heating equipment Expired - Fee Related JP2671979B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61125173A JP2671979B2 (en) 1986-05-30 1986-05-30 Heating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61125173A JP2671979B2 (en) 1986-05-30 1986-05-30 Heating equipment

Publications (2)

Publication Number Publication Date
JPS62281418A true JPS62281418A (en) 1987-12-07
JP2671979B2 JP2671979B2 (en) 1997-11-05

Family

ID=14903696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61125173A Expired - Fee Related JP2671979B2 (en) 1986-05-30 1986-05-30 Heating equipment

Country Status (1)

Country Link
JP (1) JP2671979B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120141A (en) * 1979-03-08 1980-09-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of measuring pressure in pressure reducing vapor phase growing apparatus
JPS58209112A (en) * 1982-05-31 1983-12-06 Nec Corp Vacuum cvd apparatus
JPS6292635U (en) * 1985-12-02 1987-06-13

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120141A (en) * 1979-03-08 1980-09-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of measuring pressure in pressure reducing vapor phase growing apparatus
JPS58209112A (en) * 1982-05-31 1983-12-06 Nec Corp Vacuum cvd apparatus
JPS6292635U (en) * 1985-12-02 1987-06-13

Also Published As

Publication number Publication date
JP2671979B2 (en) 1997-11-05

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