JPS62279640A - Wafer washing apparatus - Google Patents
Wafer washing apparatusInfo
- Publication number
- JPS62279640A JPS62279640A JP12279886A JP12279886A JPS62279640A JP S62279640 A JPS62279640 A JP S62279640A JP 12279886 A JP12279886 A JP 12279886A JP 12279886 A JP12279886 A JP 12279886A JP S62279640 A JPS62279640 A JP S62279640A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- washing
- peripheral wall
- wafer
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 34
- 230000002093 peripheral effect Effects 0.000 claims abstract description 13
- 238000004140 cleaning Methods 0.000 claims description 34
- 235000012431 wafers Nutrition 0.000 claims description 21
- 239000000356 contaminant Substances 0.000 abstract 1
- 239000000428 dust Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
〔産業上の利用分野〕
本発明はウェハ洗浄装置、特に浮遊ゴミの除去に優れた
流水洗浄槽の構造に関する。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a wafer cleaning apparatus, and particularly to a structure of a running water cleaning tank that is excellent in removing floating debris.
第３図は従来の流水洗浄槽を示す断面図である。 FIG. 3 is a sectional view showing a conventional running water washing tank.
従来、この種の流水洗浄槽１は底部の洗浄水流水口２か
ら洗浄水５を供給し、多孔板３の小孔４を通して洗浄水
３を槽周壁の上縁１ａからオーバーフローさせる構造と
なっている。Conventionally, this type of running water washing tank 1 has a structure in which washing water 5 is supplied from a washing water outlet 2 at the bottom, and the washing water 3 overflows from the upper edge 1a of the tank peripheral wall through small holes 4 of a perforated plate 3. .
上述した従来の流水洗浄槽は被洗浄ウェハとウェハキャ
リアからのゴミが流水洗浄槽の液面に浮遊し、洗浄水３
の一部をオーバーフローさせてもゴミが完全に流水洗浄
槽外に流れ出さず、洗浄終了後にウェハキャリア９を引
き上げる際にウェハ８にゴミが付着し、歩留り低下の原
因となる欠点がある。In the conventional running water cleaning tank described above, dust from the wafer to be cleaned and the wafer carrier floats on the liquid surface of the running water cleaning tank, and the cleaning water 3
Even if a portion of the wafer is allowed to overflow, the dust does not completely flow out of the running water cleaning tank, and when the wafer carrier 9 is pulled up after cleaning, the dust adheres to the wafer 8, resulting in a decrease in yield.
本発明の目的は洗浄槽の液面に浮遊するゴミを完全に除
去し、ウェハ引き上げ時にウェハへのゴミの付着を防止
する装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide an apparatus that completely removes dust floating on the liquid surface of a cleaning tank and prevents dust from adhering to the wafer when the wafer is pulled up.
本発明はウェハを収容した洗浄槽に洗浄水を供給し、そ
の一部を槽の周壁上縁からオーバーフローさせつつ前記
ウェハを洗浄する装置において、前記洗浄槽の上端部に
上下動可能な周壁を設けたことを特徴とするウェハ洗浄
装置である。The present invention provides an apparatus for cleaning wafers by supplying cleaning water to a cleaning tank containing wafers and causing a portion of the water to overflow from the upper edge of the peripheral wall of the tank, in which a peripheral wall that can move up and down is provided at the upper end of the cleaning tank. This is a wafer cleaning apparatus characterized by the following.
次に本発明の一実施例について図面を参照して説明する
。Next, an embodiment of the present invention will be described with reference to the drawings.
第１図は本発明の実施例の側断面図、第２図は側面図で
ある。洗浄槽１は塩化ビニール、テフロン等の材料から
なり、洗浄水流水口２が槽底部に設置されている。多孔
板３は流水洗浄槽１と同様の材料からなり、多数の小孔
４が設置されており、流水洗浄槽１から取外し可能な構
造になっている。FIG. 1 is a side sectional view of an embodiment of the present invention, and FIG. 2 is a side view. The cleaning tank 1 is made of a material such as vinyl chloride or Teflon, and a cleaning water outlet 2 is installed at the bottom of the tank. The perforated plate 3 is made of the same material as the running water washing tank 1, has a large number of small holes 4 installed therein, and has a structure that can be removed from the running water washing tank 1.
洗浄水５は純水、有機溶剤、化学薬品又はこれらを混合
したものであり、洗浄水流水口２から供給され、小孔４
を通り槽１の周壁６の上縁から流れ出しオーバーフロー
状態になる。周壁６は洗浄槽１と同様の材料からなり、
第２図のリンク機構７１に浸漬し、洗浄する。洗浄終了
後、ウェハキャリア９を引き上げる直前に側壁９をスム
ースに下方に移動させれば側壁６で支えられていた洗浄
水５は一気に流水洗浄槽１の外に流れ出す。その後にウ
ェハキャリア９を引き上げる。The cleaning water 5 is pure water, an organic solvent, a chemical, or a mixture thereof, and is supplied from the cleaning water outlet 2 and through the small hole 4.
The liquid flows out from the upper edge of the peripheral wall 6 of the tank 1 and becomes in an overflow state. The peripheral wall 6 is made of the same material as the cleaning tank 1,
The link mechanism 71 in FIG. 2 is immersed and cleaned. After cleaning is completed, if the side wall 9 is smoothly moved downward just before the wafer carrier 9 is pulled up, the cleaning water 5 supported by the side wall 6 flows out of the running water cleaning tank 1 all at once. After that, the wafer carrier 9 is pulled up.
以上説明したように本発明はウェハを引き上げる直前に
流水洗浄槽の上部の洗浄水を一気に流れ出させることに
より、流水洗浄槽の表面に浮遊しているゴミを除去でき
、ウェハを引き上げる直前ばかりでなく、洗浄中にも同
様の操作を行えば更に浮遊ゴミの除去効果を高めること
ができる効果を有するものである。As explained above, the present invention makes it possible to remove dust floating on the surface of the running water cleaning tank by flushing out the washing water at the top of the running water washing tank at once just before pulling up the wafer. If similar operations are performed during cleaning, the effect of removing floating debris can be further enhanced.
第１図は本発明のウェハの洗浄装置の流水洗浄槽を示す
側断面図、第２図は第１図の側面図、第３図は従来のウ
ェハ洗浄装置の流水洗浄槽を示す側断面図である。
１・・・洗浄槽 ２・・・洗浄水流水口３・
・・多孔板 ４・・・小孔５・・・洗浄水
６・・・周壁７・・リンク機構 ８・
・・ウェハ９・・ウェハキャリア（治具）FIG. 1 is a side sectional view showing a running water cleaning tank of a wafer cleaning device of the present invention, FIG. 2 is a side view of FIG. 1, and FIG. 3 is a side sectional view showing a running water cleaning tank of a conventional wafer cleaning device. It is. 1...Cleaning tank 2...Cleaning water outlet 3.
...Perforated plate 4...Small hole 5...Washing water
6... Peripheral wall 7... Link mechanism 8.
...Wafer 9...Wafer carrier (jig)
Claims (1)
一部を槽の周壁上縁からオーバーフローさせつつ前記ウ
ェハを洗浄する装置において、前記洗浄槽の上端部に上
下動可能な周壁を設けたことを特徴とするウェハ洗浄装
置。(1) In an apparatus for cleaning the wafers by supplying cleaning water to a cleaning tank containing wafers and causing a portion of the water to overflow from the upper edge of the peripheral wall of the tank, the peripheral wall is movable up and down at the upper end of the cleaning tank. A wafer cleaning device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12279886A JPS62279640A (en) | 1986-05-28 | 1986-05-28 | Wafer washing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12279886A JPS62279640A (en) | 1986-05-28 | 1986-05-28 | Wafer washing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62279640A true JPS62279640A (en) | 1987-12-04 |
Family
ID=14844894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12279886A Pending JPS62279640A (en) | 1986-05-28 | 1986-05-28 | Wafer washing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62279640A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5393347A (en) * | 1991-07-23 | 1995-02-28 | Pct Systems, Inc. | Method and apparatus for removable weir overflow bath system with gutter |
| US5673713A (en) * | 1995-12-19 | 1997-10-07 | Lg Semicon Co., Ltd. | Apparatus for cleansing semiconductor wafer |
| US5927302A (en) * | 1992-04-07 | 1999-07-27 | Fujitsu Limited | Method for rinsing plate-shaped articles and cleaning bath and cleaning equipment used in the same |
| US6145520A (en) * | 1996-04-24 | 2000-11-14 | Steag Microtech Gmbh | Apparatus for processing substrates in a fluid tank |
| US6354313B1 (en) | 1998-03-05 | 2002-03-12 | Micron Technology, Inc. | Apparatus for rinsing and drying semiconductor wafers in a chamber with a movable side wall |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6232531B2 (en) * | 1981-08-12 | 1987-07-15 | Mitsubishi Electric Corp |
-
1986
- 1986-05-28 JP JP12279886A patent/JPS62279640A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6232531B2 (en) * | 1981-08-12 | 1987-07-15 | Mitsubishi Electric Corp |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5393347A (en) * | 1991-07-23 | 1995-02-28 | Pct Systems, Inc. | Method and apparatus for removable weir overflow bath system with gutter |
| US5927302A (en) * | 1992-04-07 | 1999-07-27 | Fujitsu Limited | Method for rinsing plate-shaped articles and cleaning bath and cleaning equipment used in the same |
| US5673713A (en) * | 1995-12-19 | 1997-10-07 | Lg Semicon Co., Ltd. | Apparatus for cleansing semiconductor wafer |
| CN1083153C (en) * | 1995-12-19 | 2002-04-17 | Lg半导体株式会社 | Apparatus for cleansing semiconductor wafer |
| US6145520A (en) * | 1996-04-24 | 2000-11-14 | Steag Microtech Gmbh | Apparatus for processing substrates in a fluid tank |
| US6354313B1 (en) | 1998-03-05 | 2002-03-12 | Micron Technology, Inc. | Apparatus for rinsing and drying semiconductor wafers in a chamber with a movable side wall |
| US6383304B1 (en) * | 1998-03-05 | 2002-05-07 | Micron Technology, Inc. | Method of rinsing and drying semiconductor wafers in a chamber with a movable side wall |
| US6460554B2 (en) * | 1998-03-05 | 2002-10-08 | Micron Technology, Inc. | Apparatus for rinsing and drying semiconductor wafers in a chamber with a movable side wall |
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