JPS62259454A - パタ−ンの欠陥検出方法および装置 - Google Patents

パタ−ンの欠陥検出方法および装置

Info

Publication number
JPS62259454A
JPS62259454A JP61228980A JP22898086A JPS62259454A JP S62259454 A JPS62259454 A JP S62259454A JP 61228980 A JP61228980 A JP 61228980A JP 22898086 A JP22898086 A JP 22898086A JP S62259454 A JPS62259454 A JP S62259454A
Authority
JP
Japan
Prior art keywords
light
defect detection
base material
mask
transmitting small
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61228980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376738B2 (OSRAM
Inventor
Akihiro Yoshida
吉田　昭博
Takahide Iida
隆英 飯田
Hiroshi Miyake
三宅　洋
Shuzo Hattori
服部　秀三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Industries Corp
Original Assignee
Toyoda Automatic Loom Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Automatic Loom Works Ltd filed Critical Toyoda Automatic Loom Works Ltd
Priority to US07/003,572 priority Critical patent/US4760265A/en
Priority to DE8787100518T priority patent/DE3775417D1/de
Priority to EP87100518A priority patent/EP0230285B1/en
Publication of JPS62259454A publication Critical patent/JPS62259454A/ja
Publication of JPH0376738B2 publication Critical patent/JPH0376738B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP61228980A 1986-01-18 1986-09-27 パタ−ンの欠陥検出方法および装置 Granted JPS62259454A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US07/003,572 US4760265A (en) 1986-01-18 1987-01-15 Method and device for detecting defects of patterns in microelectronic devices
DE8787100518T DE3775417D1 (de) 1986-01-18 1987-01-16 Verfahren und vorrichtung zum nachweis von musterfehlern fuer mikroelektronische anordnungen.
EP87100518A EP0230285B1 (en) 1986-01-18 1987-01-16 Method and device for detecting defects of patterns in microelectronic devices

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP839186 1986-01-18
JP61-8391 1986-01-18

Publications (2)

Publication Number Publication Date
JPS62259454A true JPS62259454A (ja) 1987-11-11
JPH0376738B2 JPH0376738B2 (OSRAM) 1991-12-06

Family

ID=11691900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61228980A Granted JPS62259454A (ja) 1986-01-18 1986-09-27 パタ−ンの欠陥検出方法および装置

Country Status (1)

Country Link
JP (1) JPS62259454A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006516331A (ja) * 2003-01-17 2006-06-29 ソシエテ・ウロペエンヌ・ド・システム・オプティク 平行六面体の形状の部品とアクチュエータとを含んで構成される変形システム
WO2011121694A1 (ja) * 2010-03-31 2011-10-06 株式会社 日立ハイテクノロジーズ 検査装置、及び検査方法
JP2024534800A (ja) * 2021-08-16 2024-09-26 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｘ線照射された物体を結像する（ｉｍａｇｅ）結像光学機構
US12625090B2 (en) 2021-08-16 2026-05-12 Carl Zeiss Smt Gmbh Imaging optical arrangement to image an object illuminated by X-rays

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006516331A (ja) * 2003-01-17 2006-06-29 ソシエテ・ウロペエンヌ・ド・システム・オプティク 平行六面体の形状の部品とアクチュエータとを含んで構成される変形システム
WO2011121694A1 (ja) * 2010-03-31 2011-10-06 株式会社 日立ハイテクノロジーズ 検査装置、及び検査方法
JPWO2011121694A1 (ja) * 2010-03-31 2013-07-04 株式会社日立ハイテクノロジーズ 検査装置、及び検査方法
JP2024534800A (ja) * 2021-08-16 2024-09-26 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｘ線照射された物体を結像する（ｉｍａｇｅ）結像光学機構
US12625090B2 (en) 2021-08-16 2026-05-12 Carl Zeiss Smt Gmbh Imaging optical arrangement to image an object illuminated by X-rays

Also Published As

Publication number Publication date
JPH0376738B2 (OSRAM) 1991-12-06

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