JPS62252146A - Sample conveying apparatus - Google Patents

Sample conveying apparatus

Info

Publication number
JPS62252146A
JPS62252146A JP9450486A JP9450486A JPS62252146A JP S62252146 A JPS62252146 A JP S62252146A JP 9450486 A JP9450486 A JP 9450486A JP 9450486 A JP9450486 A JP 9450486A JP S62252146 A JPS62252146 A JP S62252146A
Authority
JP
Japan
Prior art keywords
wafer
cover
sample
arm
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9450486A
Other languages
Japanese (ja)
Inventor
Norio Nakazato
仲里 則男
Fujitsugu Nakatsui
中対 藤次
Yoshichika Fukushima
義親 福島
Yoshinao Kawasaki
義直 川崎
Minoru Soraoka
稔 空岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9450486A priority Critical patent/JPS62252146A/en
Publication of JPS62252146A publication Critical patent/JPS62252146A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent dusts from entering from the periphery of a conveying apparatus to a sample side by providing a cover oppositely to the sample of the apparatus and supplying gas to a space between the sample and a cover. CONSTITUTION:A wafer 11 is placed on the other lower end of an arm 61 to which one end is attached of a revolving unit to attach supporting frames 62a, 62b, and divided at width Y at a tracing portion at the center of the wafer 11 with respect to the revolving center of the arm 61. The width Y is a passage of an elevator for placing the wafer 11 in case of delivering the wafer 11. A cover frame 63 is attached to the other upper end of the arm 61, and a cover 64 is detachably engaged with the frame 63. A gas supplying unit 68 is connected through a pipe 67 with the arm 61 to supply clean gas to between the wafer 11 placed on the frames 62a, 62b and the cover 64. Thus, it can prevent dusts from entering from the outside of the frames 62a, 62b.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は試料搬送装置に係り、特に半導体製造装置の搬
送装置に好適な試料搬送装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a sample transport device, and particularly to a sample transport device suitable for a transport device of a semiconductor manufacturing device.

〔従来の技術〕[Conventional technology]

従来の装置は、特開昭57−90956号公報に記載の
ように、ヘッドに取付けたドラムを回転し、ドラム、に
設けたガイド溝によってカバーで覆われたホルダを上下
動させるとともに爪v:[lfi閉させることにより、
真空加工室へのウェハ供給あるいは搬出を防塵して確実
に行うものがある。
The conventional device, as described in Japanese Patent Application Laid-Open No. 57-90956, rotates a drum attached to a head, moves a holder covered with a cover up and down through a guide groove provided in the drum, and also moves a claw v: [By closing lfi,
There are devices that ensure the supply and removal of wafers to and from the vacuum processing chamber in a dust-proof manner.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術は、ウェハ上方にはカバーがあるが、ウェ
ハ側方は開口されており、浮遊中の塵埃からのウェハの
保護の点については配慮されておらず、降下中の塵埃は
カバーで防げるが浮遊中の塵埃がウェハ側方の開口から
入ってきて、ウェハに付着し、露光、薄膜堆積、エツチ
ング等の各プロセスで障害となり、半導体装置の製品歩
留りを低下させるという問題があった。
In the above conventional technology, there is a cover above the wafer, but the sides of the wafer are open, and no consideration is given to protecting the wafer from floating dust, and falling dust can be prevented by the cover. There is a problem in that floating dust enters through the opening on the side of the wafer and adheres to the wafer, causing problems in various processes such as exposure, thin film deposition, and etching, and reducing the product yield of semiconductor devices.

本発明の目的は、搬送中の試料への塵埃の付着を防々゛
ことができる試料搬送装置を提供することにある。
An object of the present invention is to provide a sample transport device that can prevent dust from adhering to a sample during transport.

〔問題点tt解決するための手段〕[Means to solve the problem tt]

上記目的は、搬送gt置の試料に対向させてカバーを設
け、試料とカバーとの空間に気体を供給するガス供給手
段を設けることにより達成される。
The above object is achieved by providing a cover to face the sample on the conveyance gt position and providing a gas supply means for supplying gas into the space between the sample and the cover.

〔作  用〕[For production]

試料とカバーとの空間に清浄な気体を供給することによ
って空間内の圧力が高くなり、試料側方の開口部から気
体が出て搬送装置周辺から試料側へ塵埃が入るのを防く
゛ことができる。
By supplying clean gas to the space between the sample and the cover, the pressure in the space increases, and the gas comes out from the opening on the side of the sample, preventing dust from entering the sample side from around the transport device. .

〔実 施 例〕〔Example〕

以下、本発明の一実施例を第1図わら第5図により説明
する。
Hereinafter, one embodiment of the present invention will be explained with reference to FIG. 1 and FIG. 5.

第1elに試料搬送装置の詳細を示す。61は例えば図
示しない回転装置に一端を取付けたアームである。アー
ム61の他端上方にはこの場合、ウェハ11を載置して
支持する支持枠62a、62bが取付けである。取付は
配置は第3図に示すように、アーム61の回転中心に対
してウェハUの中心の軌跡部分で幅Yをもって分割しで
ある。幅Yは、ウェハ11の受は渡しの際にウェハ11
を載置する昇降台の通り道である。アーム61の他端上
方にはこの場合。
The details of the sample transport device are shown in the 1st el. Reference numeral 61 is an arm having one end attached to, for example, a rotating device (not shown). In this case, support frames 62a and 62b on which the wafer 11 is placed and supported are attached above the other end of the arm 61. As shown in FIG. 3, the mounting arrangement is such that the rotation center of the arm 61 is divided by a width Y at the locus of the center of the wafer U. The width Y is the width of the wafer 11 when the wafer 11 is transferred.
This is the path for the lifting platform on which the equipment is placed. In this case, above the other end of the arm 61.

カバー枠Bが取付けてあり、カバー枠Sにはカバー6が
着脱可能に嵌め込んである。支持枠62a。
A cover frame B is attached, and a cover 6 is removably fitted into the cover frame S. Support frame 62a.

62 bとカバー枠8との隙間Xはウェハ11を支持枠
から浮かして取り出すときのウェハUの通り道である。
The gap X between the cover frame 62b and the cover frame 8 is a passage for the wafer U when the wafer 11 is lifted from the support frame and taken out.

アーム61にはこの場合、通路65aが設けてあり一方
は支持枠62a、62b側に突き抜け、他端には継手部
およびバイブ67を順次弁してガス供給装置部な継なげ
てガス供給手段が設けである。
In this case, the arm 61 is provided with a passage 65a, one end of which penetrates toward the support frames 62a and 62b, and the other end of which is connected to a gas supply device by sequentially valves a joint part and a vibrator 67. It is a provision.

また、第2図に示すようにカバー例とウェハ11とをは
さむ位置に発光器69aと69bとを設ける。
Further, as shown in FIG. 2, light emitters 69a and 69b are provided at positions sandwiching the cover example and the wafer 11.

上記搬送装置は例えば、第4図に示すような半導体製造
装置に取り付けて用いる。真空室1には。
The above-mentioned transport device is used by being attached to a semiconductor manufacturing device as shown in FIG. 4, for example. In vacuum chamber 1.

ウェハが収納されたカセット10 aを入れるカセット
室2aと、空のカセットlObを入れるカセット室2b
がゲートバルブ5aまた)15bを介して取付けである
。カセット室2aおよび2bには、ウェハを真空室1に
搬入するベルト3aおよびウェハを真空室lから搬出す
るベルト3bが設けである。真空室1内には、カセット
室2aからウェハを受は取るベルト4aと、カセット室
2bにウェハを受は渡すベルト4bと、試料台8を有す
る処理室7と、ベルト4aまたはベルト4bと処理室7
とを結ぶ搬送袋yt6 aまたは6bと、搬送装置6a
または6bにウェハの受は渡しを行なう昇降台9a、9
b、9c、9dとが設ケチ# ル。
A cassette chamber 2a for storing a cassette 10a containing wafers, and a cassette chamber 2b for storing an empty cassette lOb.
The gate valve 5a is also attached via the gate valve 15b. The cassette chambers 2a and 2b are provided with a belt 3a for transporting wafers into the vacuum chamber 1 and a belt 3b for transporting wafers from the vacuum chamber l. Inside the vacuum chamber 1, there is a belt 4a for receiving and taking wafers from the cassette chamber 2a, a belt 4b for receiving and delivering wafers to the cassette chamber 2b, a processing chamber 7 having a sample stage 8, and a belt 4a or belt 4b for processing. room 7
transport bag yt6a or 6b, and transport device 6a
Or 6b is the lifting platform 9a, 9 for receiving and transferring wafers.
b, 9c, and 9d are set.

次暑こ、上記構成の半導体製造装置に使用された搬送装
置の動きについて第1図、第2図および第5図を用いて
説明する。搬送装置6a、5bにガス供給装置1j68
から清浄なガス例えば、窒素、ヘリウム、アルゴン等の
不活性ガスを供給することによって、第1図および第2
図の矢印に示すようにガスが流れる。
Next, the movement of the transport device used in the semiconductor manufacturing apparatus having the above structure will be explained using FIGS. 1, 2, and 5. A gas supply device 1j68 is provided to the transport devices 6a and 5b.
1 and 2 by supplying a clean gas, e.g., an inert gas such as nitrogen, helium, argon, etc.
Gas flows as shown by the arrow in the figure.

この状態で搬送装置6aまたは6bが昇降台9a、9b
、9c、9d間を動きウェハ11の受は渡しをする。例
えば試料台8にウェハな搬送する場合について第5図に
より説明する。
In this state, the conveyor device 6a or 6b is moved to the lifting platform 9a, 9b.
, 9c, and 9d to receive and transfer the wafer 11. For example, the case of transporting a wafer to the sample stage 8 will be explained with reference to FIG.

まず、(a)に示すように試料台8上1こウェハ11を
載置した搬送装置6aが移動してくる。次に、(b)に
示すように昇降台9Cが上昇しウェハ11を持ち上げる
。次に、(C)に示すよう醗こウェハ11を持ち上げた
状態で搬送装置?1f6aが移動して逃げる。
First, as shown in (a), the transport device 6a with one wafer 11 placed on the sample stage 8 moves. Next, as shown in (b), the lifting table 9C rises and lifts up the wafer 11. Next, as shown in (C), the transfer device ? 1f6a moves and escapes.

次に、(d)に示すように昇降台9(が下降して試料台
8にウェハ11を載置し、ウェハ11の搬送を終了する
。また、試料台8から他の場所ヘウェハ11を搬送する
場合には、前記の逆動作となる。
Next, as shown in (d), the lifting table 9 (lowers) to place the wafer 11 on the sample table 8, and the transfer of the wafer 11 is completed. Also, the wafer 11 is transferred from the sample table 8 to another location. In this case, the operation is the reverse of the above.

また、搬送装置の移動途中に第2図に示すように発光器
69aおよび受光器69 bを設けておき、ウェハ11
が搬送されているかどうかの検出を行なう。
Further, as shown in FIG. 2, a light emitter 69a and a light receiver 69b are provided during the movement of the transport device, and the wafer 11
Detects whether or not it is being transported.

二の場合、カバー6は石英等の透明な材料としても良い
。また、カバー6に穴を明けておき、その穴が発光器6
9aの位置にきた時に発光器69 aから光を出してウ
ェハ11の検出を行なうようにすることもできる。
In the second case, the cover 6 may be made of a transparent material such as quartz. Also, a hole is made in the cover 6, and the hole is connected to the light emitter 6.
It is also possible to detect the wafer 11 by emitting light from the light emitter 69a when the wafer 11 reaches the position 9a.

以上、本実施例によれば、搬送*I6a、6bの支持枠
62a、62b上にカバー例が設けてあり、さらに、支
持枠62a、62b上に載置したウェハ11とカバー例
との間に清浄なガスを供給しているので、支持枠62a
、62bの外側からの塵埃の侵入を防く0ことができる
という効果がある。
As described above, according to this embodiment, the cover example is provided on the support frames 62a and 62b of the transport *I6a and 6b, and furthermore, the cover example is provided between the wafer 11 placed on the support frames 62a and 62b and the cover example. Since clean gas is supplied, the support frame 62a
, 62b has the effect of preventing dust from entering from outside.

また、カバー6も着脱可能にしているので、カバー6お
よび支持枠62a、62b内の清掃を容易に行なうこと
ができるという効果がある。
Moreover, since the cover 6 is also made removable, there is an effect that the inside of the cover 6 and the support frames 62a and 62b can be easily cleaned.

また、カバーθを透明なものにしているので、発光器6
9aおよび受光器69 bを用いてウェハ11を容易に
検出できるという効果がある。
In addition, since the cover θ is made transparent, the light emitter 6
This has the advantage that the wafer 11 can be easily detected using the light receiver 9a and the light receiver 69b.

なお、本−実施例では搬送手段にアームを用いた回転方
式のものについて説明したが、直線的に動くものでも良
いし、また、支持枠62a、62bを爪に替えてウェハ
11すりかむ方式にして、ウェハ11を立てて搬送する
ようにしても良い。
In this embodiment, a rotating type using an arm as the conveying means was explained, but it may be a type that moves linearly, or a type that grips the wafer 11 by replacing the support frames 62a and 62b with claws may be used. Alternatively, the wafer 11 may be transported in an upright position.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、ウェハ支持部分にカバーを設けて、さ
らに清浄なガスを供給しているので、搬送中の試料への
塵埃の付着を防失゛ことができるという効果がある。
According to the present invention, since a cover is provided on the wafer support portion and clean gas is supplied, it is possible to prevent dust from adhering to the sample during transportation.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例である試料搬送装置を示す側
断面図、第2図は第1図をA−Aから見た断面図、$3
(2)は第1図をB−Bから見た平断面図、第4図は第
1図の搬送装置を取付けた一例を示す装置の平断面図、
第5図は搬送装置からのクエへの受は渡しを示す図であ
る。 61・・・・・・アーム、62 a 、 62 b −
・・−支持枠、64 ・・−・−第1囚
Fig. 1 is a side sectional view showing a sample transport device which is an embodiment of the present invention, Fig. 2 is a sectional view of Fig. 1 taken from A-A, $3
(2) is a plan sectional view of FIG. 1 viewed from B-B; FIG. 4 is a plan sectional view of the device showing an example of the conveying device shown in FIG. 1 installed;
FIG. 5 is a diagram illustrating the delivery of a query from a conveyance device. 61... Arm, 62 a, 62 b -
...-Support frame, 64 ...--First prisoner

Claims (1)

【特許請求の範囲】[Claims] 1、試料を搬送する搬送手段と、該搬送手段に設けられ
前記試料を支持する支持部と、該支持部に支持された試
料に対向して設けられるカバーと、前記試料と前記カバ
ーとの間に清浄な気体を供給するガス供給手段とからな
ることを特徴とする試料搬送装置。
1. A transport means for transporting a sample, a support section provided on the transport means and supporting the sample, a cover provided facing the sample supported by the support section, and between the sample and the cover. A sample transport device comprising a gas supply means for supplying clean gas to the sample.
JP9450486A 1986-04-25 1986-04-25 Sample conveying apparatus Pending JPS62252146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9450486A JPS62252146A (en) 1986-04-25 1986-04-25 Sample conveying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9450486A JPS62252146A (en) 1986-04-25 1986-04-25 Sample conveying apparatus

Publications (1)

Publication Number Publication Date
JPS62252146A true JPS62252146A (en) 1987-11-02

Family

ID=14112144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9450486A Pending JPS62252146A (en) 1986-04-25 1986-04-25 Sample conveying apparatus

Country Status (1)

Country Link
JP (1) JPS62252146A (en)

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