JPS62250533A - Initial crystallization method for optical disk - Google Patents
Initial crystallization method for optical diskInfo
- Publication number
- JPS62250533A JPS62250533A JP61092249A JP9224986A JPS62250533A JP S62250533 A JPS62250533 A JP S62250533A JP 61092249 A JP61092249 A JP 61092249A JP 9224986 A JP9224986 A JP 9224986A JP S62250533 A JPS62250533 A JP S62250533A
- Authority
- JP
- Japan
- Prior art keywords
- recording film
- recording
- initial crystallization
- flash
- crystallization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 37
- 238000002425 crystallisation Methods 0.000 title claims abstract description 29
- 230000008025 crystallization Effects 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 13
- 239000011368 organic material Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 6
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 abstract description 5
- 230000031700 light absorption Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 40
- 239000004065 semiconductor Substances 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野]
本発明は例えばレーザビームによりヒートモード記録が
可能な光ディスクの初期結晶化方法にに関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a method for initial crystallization of an optical disk capable of heat mode recording using, for example, a laser beam.
(従来の技術)
従来用いられている光ディスクの記録形態は第3図〜第
5図に示す3種のタイプに分類することができる。(Prior Art) The recording format of conventionally used optical discs can be classified into three types shown in FIGS. 3 to 5.
第3図に示すタイプは基板1上に形成した低融点材料の
薄11!2にレーザービームをスポット照射してその部
分を融解・蒸発させ、情報を微小な孔3として記録する
ものである。In the type shown in FIG. 3, a laser beam is spot-irradiated onto a thin layer 11!2 of a low melting point material formed on a substrate 1 to melt and evaporate that portion, thereby recording information as minute holes 3.
また、第4図に示すタイプは、基板4上に下地層6.簿
膜7からなる多層簿IIu5を形成し、レーザービーム
をスポット照射したとき温度が上昇した下地層6から気
泡を発生させ、上方の薄膜7の特定部分に形成される膨
出部8を情報の記録部として用いるものである。The type shown in FIG. 4 has a base layer 6 on the substrate 4. A multilayer film IIu5 consisting of a film 7 is formed, and bubbles are generated from the base layer 6 whose temperature has increased when spot irradiation with a laser beam is performed, and the bulges 8 formed in specific parts of the upper thin film 7 are used as information. It is used as a recording section.
ざらに、第5図に示すタイプは、基板9上に温度変化で
組織の変化する薄膜10を形成し、レーザービームのス
ポット照射で1vi10の局部11を例えば反射率の異
なる組織に変化させることで情報を記録するタイプであ
る。Roughly speaking, the type shown in FIG. 5 forms a thin film 10 whose structure changes with temperature changes on a substrate 9, and changes the local part 11 of 1vi10 into a structure with a different reflectance by spot irradiation with a laser beam. This type records information.
これら各タイプの記録部(3,8,11>はいずれも無
記録部に対して光の透過又は反射の特性に相Aを生じる
ことから、レーザビームを用いて前記各記録部(3,8
,11>の有無を検出することで記録情報を読み出すこ
とができる。Since each of these types of recording parts (3, 8, 11>) produces phase A in the light transmission or reflection characteristics with respect to the non-recording part, each of the recording parts (3, 8, 11) is
, 11>, the recorded information can be read out.
しかし、前記各記録部(3,8,11)のうち、第3図
及び第4図に示すタイプは記録部(3,8>に不可逆的
な変化を与えるものであるため記録は可能でも消去がで
きない。However, among the recording parts (3, 8, 11), the types shown in Figures 3 and 4 cause irreversible changes to the recording parts (3, 8>), so even if recording is possible, erasure is impossible. I can't.
一方、第5図に示すタイプは記録膜の材料として熱的に
光学特性が可逆変化する材料を用いれば、記録及び消去
の双方が可能となる。On the other hand, the type shown in FIG. 5 allows both recording and erasing by using a material whose optical properties can be reversibly changed thermally as the recording film material.
+J
ところで、Ge、Te、InSb等の半導体は、安定な
結晶相と非晶質相との2つの状態をとり得ることはよく
知られており、それぞれの状態での複素屈折率N=n−
ikが異なることはJ、5TUKEによりJ、OF、N
0N−crysta 11 ine Sol id
41 (1970)において詳しく報告されている。+J By the way, it is well known that semiconductors such as Ge, Te, and InSb can have two states, a stable crystalline phase and an amorphous phase, and the complex refractive index N=n- in each state.
The difference in ik is J, OF, N by J, 5 TUKE.
0N-crysta 11 ine Solid
41 (1970).
また、このような半導体の結晶化と非晶質相との2つの
状態をレーザービームによる熱処理で可逆的に変化させ
て光メモリを得る着想は、S、R。Furthermore, the idea of obtaining an optical memory by reversibly changing the two states of a semiconductor, crystallized and amorphous, by heat treatment with a laser beam is the idea of S and R.
0VSHINSKY等によって
Metallurgical 1ranscatio
ns 2641 (1971)誌に提示されている。Metallurgical 1ranscatio by 0VSHINSKY etc.
ns 2641 (1971).
すなわち、Ge、Te、InSb等の半導体は溶融状態
まで加熱して高速に冷却すると、非晶質となり、より低
い温度に加熱してゆっくり冷却すると結晶質となる特性
を有し、この非晶質相と結晶質層とはそれぞれn”−1
k−とn−1kの複素屈折率で特徴付けられる光学的性
質をもって安定に存在するが、これらの半導体は薄膜に
すると化学的安定性に乏しく、大気中では次第に腐蝕し
て劣化するので、メモリ用の光ディスクとしては実用的
でなかった。In other words, when semiconductors such as Ge, Te, and InSb are heated to a molten state and cooled rapidly, they become amorphous, and when they are heated to a lower temperature and cooled slowly, they become crystalline. The phase and crystalline layer are each n”-1
Although they exist stably with optical properties characterized by complex refractive indices of k- and n-1k, these semiconductors have poor chemical stability when made into thin films and gradually corrode and deteriorate in the atmosphere, so they are not suitable for memory. It was not practical as an optical disc for
その1々、これらの半導体を化合物としたり、耐久性の
ある保護膜の間に挟んだりして耐久性を持たせる試みも
なされている。例えば、第6図に示すようにアクリル又
はポリカーボネート樹脂で形成シタ基板20上に、S
i 02 保護膜21 (1000A>、TeGe記録
膜22 (700A>。Attempts have also been made to make these semiconductors more durable by making them into compounds or sandwiching them between durable protective films. For example, as shown in FIG. 6, an S
i 02 protective film 21 (1000A>, TeGe recording film 22 (700A>).
S i 02保護膜23 (100OA>を形成し、ざ
らに耐久性を向上するためUV樹脂膜24を塗付したも
のが知られている。It is known that a S i 02 protective film 23 (100 OA>) is formed and a UV resin film 24 is applied to roughly improve durability.
前記5i02保護膜21.23は記録時及び消去時のレ
ーザーパワーにより孔が形成されることを防止する機能
を発揮する。The 5i02 protective films 21 and 23 function to prevent holes from being formed due to laser power during recording and erasing.
このような記録膜22を用いて形成した相変化型の光デ
ィスクは化学的に安定であり、かつ、記録/消去の繰り
返し特性も安定していることが知られている。It is known that a phase change optical disk formed using such a recording film 22 is chemically stable and has stable recording/erasing repeatability.
しかし、この光ディスクにも次のような欠点がおる。す
なわち、Teで形成した相変化型半導体のように記録膜
が成膜直後結晶状態で存在する場合は別として、通常の
GeヤTeGe、InSb等の相変化型半導体は成膜直
後において記録膜が非晶質状態で存在するため、そのま
までは書き込みを行なうことができない。However, this optical disc also has the following drawbacks. That is, apart from cases where the recording film exists in a crystalline state immediately after deposition, such as in a phase change semiconductor formed of Te, in ordinary phase change semiconductors such as Ge, TeGe, and InSb, the recording film does not exist immediately after deposition. Since it exists in an amorphous state, it cannot be written to as it is.
一般に結晶と非晶質との相変化を利用して情報の記録を
行なう場合、大ぎなパワーで短いパルスのレーザー光照
射で書き込み(非晶質化)を行ない、また、比較的小ざ
いパワーでかつ長いパルスのレーザ光照射で消去(結晶
化)を行なう。Generally, when recording information using the phase change between crystal and amorphous, writing (amorphousization) is performed by irradiating a short pulse of laser light with high power, and writing is performed using a relatively low power. Erasing (crystallization) is then performed by irradiating a long pulse of laser light.
したがって、初期の状態が非晶質である場合、まず光デ
イスク全面に亘って前記記録膜を結晶化しなければなら
ない。このような初期結晶化は比較的小さいパワーのレ
ーザービームを光ディスクの円周方向に連続照射するこ
とによっても行なわれる場合もあるが、これでは初期結
晶化に要する時間が長くなるという問題がある。Therefore, if the initial state is amorphous, the recording film must first be crystallized over the entire surface of the optical disk. Such initial crystallization may also be carried out by continuous irradiation of a laser beam of relatively low power in the circumferential direction of the optical disk, but this has the problem of increasing the time required for initial crystallization.
また、ディスク装置内に2つのレーザビーム源を設け、
このうちの1つを初期結晶化と消去結晶化に兼用し、こ
れにより初期結晶化をしながら他の1つのレーザービー
ムによって、書き込みを行なうことも考えられるが、こ
の場合にはレーザービーム源が2つであるため装置のコ
ストアップを招くという問題がある1、
このような問題は製品化された光ディスクを工場等から
出荷する前にその記録層を非晶質から結晶へ変化させれ
ば解消される。In addition, two laser beam sources are provided in the disk device,
It is also possible to use one of these laser beams for both initial crystallization and erase crystallization, thereby performing initial crystallization while writing with the other laser beam, but in this case, the laser beam source There is a problem that the cost of the device increases due to the presence of two layers.1 This problem can be solved by changing the recording layer from amorphous to crystalline before shipping the manufactured optical disk from the factory. be done.
非晶質物質を結晶化させるには一般にはその物質のを結
晶化温度(通常150℃以上)以上に加熱するばよい。In order to crystallize an amorphous substance, it is generally necessary to heat the substance to a temperature higher than the crystallization temperature (usually 150° C. or higher).
しかし、通常上述したような記録膜を成膜した光デイス
ク用の基板はコストの点からアクリル、ポリカーボネー
ト等の有機質材料により形成されでいるので、このよう
な基板を結晶化温度以上に昇温すると、この基板が変形
したり溶けてしまうという問題がある。However, substrates for optical disks on which the above-mentioned recording film is deposited are usually made of organic materials such as acrylic and polycarbonate due to cost considerations, so if such substrates are heated above their crystallization temperature, However, there is a problem that this substrate may be deformed or melted.
この場合、基板を無機質材料、例えばガラス等で形成す
れば上述のような問題は無くなるが、反面コストアップ
を招き、かつ、プリグレープ(レーザービームの案内溝
)を形成することが困難になるという不都合が生じる。In this case, if the substrate is made of an inorganic material such as glass, the above-mentioned problems will disappear, but on the other hand, it will increase the cost and make it difficult to form pregrapes (laser beam guide grooves). This will cause inconvenience.
(発明が解決しようとする問題点)
上述したように従来においては種々の理由から製品化し
た光ディスクの記録膜を工場等からの出荷段階で初期結
晶化することに多くの困難があった。(Problems to be Solved by the Invention) As described above, in the past, for various reasons, there have been many difficulties in initial crystallization of the recording film of a commercialized optical disk at the stage of shipment from a factory or the like.
そこで本発明は、有機質材料からなる基板の温度を上昇
させることなく、記録膜のみの初期結晶化を行なうこと
ができる初期結晶化方法を提供することを目的とするも
のである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide an initial crystallization method that can perform initial crystallization of only a recording film without increasing the temperature of a substrate made of an organic material.
[発明の構成]
(問題点を解決するための手段)
本発明の方法は、有機質材料からなる基板上に結晶質と
非晶質との間で相変化する記録膜を設けてこの記録膜に
対するレーザービームの照射により情報の記録再生が可
能な光ディスクの初期結晶化方法であって、前記記録膜
が非晶質状態にある場合に、この記録膜に所定の光源に
よるフラッシュ露光を行なうようにしたものである。[Structure of the Invention] (Means for Solving the Problems) The method of the present invention provides a recording film that changes phase between crystalline and amorphous on a substrate made of an organic material, and A method for initial crystallization of an optical disk capable of recording and reproducing information by irradiation with a laser beam, in which when the recording film is in an amorphous state, the recording film is exposed to flash light from a predetermined light source. It is something.
(作 用)
有機質材料により形成した基板上に結晶質と非晶質との
間で相変化する記録膜を設けることにより構成した光デ
ィスクに対して、前記記録膜の初期結晶化を行なう際に
、この記録膜が非晶質状態である場合には、所定の光源
を用いて所定時間のフラッシュ露光を行なう。このフラ
ッシュ露光により前記記録膜の温度が上早しこれにより
記録膜は非晶質から結晶状態に変化する。(Function) When performing initial crystallization of the recording film on an optical disc configured by providing a recording film that changes phase between crystalline and amorphous on a substrate made of an organic material, If this recording film is in an amorphous state, flash exposure is performed for a predetermined time using a predetermined light source. This flash exposure causes the temperature of the recording film to rise rapidly, thereby changing the recording film from an amorphous state to a crystalline state.
この際前記記録膜に対する光線の照射時間はフラッシュ
露光であるため極めて短時間であり、したがって、この
フラッシュ露光による基板の変形等は生じない。At this time, the irradiation time of the light beam to the recording film is extremely short since it is a flash exposure, and therefore, no deformation of the substrate occurs due to the flash exposure.
(実施例)
以下に本発明の実施例を第1図及び第2図を参照して説
明する。(Example) An example of the present invention will be described below with reference to FIGS. 1 and 2.
第1図は本実施例方法を素塊するためのフラッシュ露光
装置の概要を示すものであり、この装置は、図示しない
駆動手段により同図に示す矢印X方向に駆動される透明
のベルトコンベア3oと、このベルトコンベア30の移
動領域における所定の位置において開口部を下方に向け
、かつ、ベルトコンベア30と一定の間隙を隔て配置さ
れた凹面状の反射鏡34と、この反射鏡34内に配置さ
れたフラッシュ露光を行なうための光源であるキセノン
フラッシュランプ33と、前記ベルトコンベア30を挟
んで前記反射鏡34と対向配置された皿状の反射鏡35
とを有して構成されている。FIG. 1 shows an outline of a flash exposure device for agglomerating according to the method of this embodiment, and this device consists of a transparent belt conveyor 3o driven in the direction of the arrow A concave reflecting mirror 34 is disposed at a predetermined position in the movement area of the belt conveyor 30 with its opening facing downward and is spaced apart from the belt conveyor 30 by a certain distance; a xenon flash lamp 33 which is a light source for flash exposure; and a dish-shaped reflecting mirror 35 disposed opposite to the reflecting mirror 34 with the belt conveyor 30 in between.
It is composed of:
そして、前記キセノンフラッシュランプ33は、図示し
ない電源装置により通電制御され所定時間(1μSeC
〜1m5ec程度)発光してフラッシュ光を放射するよ
うになっている。The xenon flash lamp 33 is energized by a power supply device (not shown) for a predetermined period of time (1 μSeC).
~1m5ec) and emit flash light.
次に上記構成のフラッシュ露光装置を用いて相変化型光
ディスクの初期結晶化を行なう方法について説明する。Next, a method for performing initial crystallization of a phase change optical disk using the flash exposure apparatus having the above configuration will be described.
矢印X方向に駆動されるベルトコンベア30上に、透明
な基板31A、31B上にTe、 Ge。Te and Ge are deposited on transparent substrates 31A and 31B on a belt conveyor 30 driven in the direction of arrow X.
InSb等レーザービームに対して光吸収の大ぎい材料
による記録膜32.32Bを予め成膜してなる相変化型
の光ディスク4OA、40Bを載置し、このうち、反射
鏡34の下方に至った光ディスク40Bに対してキセノ
ンフラッシュランプ33から所定時間(1μSeC〜1
m5eC)フラッシュ光36Aを照射する。これにより
、光ディスク40Bの記録膜32Bがフラッシュ光36
Aにより露光され、その結晶化温度まで昇温して初期結
晶化が行なわれる。Phase-change optical disks 4OA and 40B each having a recording film 32, 32B made of a material that has high light absorption for a laser beam, such as InSb, formed in advance are mounted, and the disc 4OA and 40B are placed below the reflecting mirror 34. The optical disc 40B is exposed to the xenon flash lamp 33 for a predetermined period of time (1 μSeC to 1
m5eC) Irradiate with flash light 36A. As a result, the recording film 32B of the optical disc 40B is exposed to the flash light 36.
A is exposed to light, and the temperature is raised to the crystallization temperature to perform initial crystallization.
このとき、第2図(a)に示すようにフラッシュ光36
Aのうち波長が赤外領域のものはほとんど記録膜32B
で吸収され、また、記録膜32Bで吸収されないフラッ
シュ光36Bは透明な基板31Bではとんと吸収される
ことなく透過し透過光36Cとなる。したがって、基板
31Bは発熱することはない。At this time, as shown in FIG. 2(a), the flash light 36
Of A, most of those whose wavelength is in the infrared region are the recording film 32B.
Further, the flash light 36B that is not absorbed by the recording film 32B is transmitted through the transparent substrate 31B without being absorbed and becomes transmitted light 36C. Therefore, the substrate 31B does not generate heat.
また、記録膜32Bの昇温に伴う発熱の影響も考えられ
るが、上述したように露光時間は極めて短時間であり、
記録膜32Bは瞬時に冷却してしまうので、その影響も
ほとんどない。In addition, the effect of heat generation due to the temperature rise of the recording film 32B is also considered, but as mentioned above, the exposure time is extremely short;
Since the recording film 32B is instantly cooled, there is almost no effect thereof.
このようにして、初期結晶化が行なわれた光ディスク4
0Bはベルトコンベア30により反射鏡34から外方に
移送され、次段の光ディスク40Aが反射鏡34の下方
に移送されて以下上述した場合と同様に初期結晶化が実
行される。In this way, the optical disk 4 that has undergone initial crystallization
0B is transferred outward from the reflecting mirror 34 by the belt conveyor 30, and the next stage optical disk 40A is transferred below the reflecting mirror 34, whereupon initial crystallization is performed in the same manner as in the case described above.
本発明は上述した実施例に限定されるものではなく、そ
の要旨の範囲内で種々の変形が可能である。例えば、上
述した実施例方法では、ベルトコンベア方式で光ディス
ク−楔部に初期結晶化を行なう場合について説明したが
、バッチ処理方式により一度に大量の光ディスクに対す
る初期結晶化を実行することもでき、この場合にはより
恒産性を上げることができる。また、前記光源としては
ハロゲンランプを用いても実施できる。The present invention is not limited to the embodiments described above, and various modifications can be made within the scope of the invention. For example, in the method of the embodiment described above, a case was explained in which initial crystallization is performed on an optical disc-wedge portion using a belt conveyor method, but it is also possible to perform initial crystallization on a large number of optical discs at once using a batch processing method. In some cases, productivity can be increased. Furthermore, a halogen lamp may be used as the light source.
実験例:
5インチの円板型のアクリル(PM’MA)基板を用い
反応性スパッタリング法により既述した第6図に示すタ
イプと同様な光ディスクを製造した。すなわち、第2図
(b)に示すようにアクリ114板60上ニS i 0
2 (7)下tt[61f1000A成膜した後、非晶
質のT 690 G e toの記録膜62を700^
成膜し、ざらに、この記録膜62上にSiO2の保護膜
63を1000へ成膜し、その上にUv樹脂膜64を成
膜した。Experimental Example: An optical disk similar to the type shown in FIG. 6 described above was manufactured by a reactive sputtering method using a 5-inch disk-shaped acrylic (PM'MA) substrate. That is, as shown in FIG. 2(b), S i 0 on the acrylic 114 board 60
2 (7) After forming the lower tt[61f1000A film, the recording film 62 of amorphous T 690 G e to is deposited at 700^
A protective film 63 of SiO2 was roughly formed on this recording film 62 to a thickness of 1000, and a UV resin film 64 was formed thereon.
上記成膜工程は、同一の反応性スパッタリング装置によ
り3元独立のターゲットを用いて、SiO2は単元ター
ゲットにより行い、また、T e 90G e 1oは
、Teのターゲットと(3eのターゲットとを前記化学
式で表される成分比になるようにこれら各ターゲットに
印加するRF(ラジオ周波数)パワーを制御しながら行
なった。The above film forming process is performed using the same reactive sputtering apparatus using three independent targets, and SiO2 is performed using a single target. This was carried out while controlling the RF (radio frequency) power applied to each of these targets so that the component ratio expressed as follows.
つぎに上記構成の光ディスクを第1図に示したフラッシ
ュ露光装置の反射鏡34の下方に移送し、キセノンフラ
ッシュランプ33に対して約1MWの電力を供給し、こ
れにより光ディスクに対して500μsecのフラッシ
ュ露光を実施した。Next, the optical disc having the above configuration is transferred below the reflecting mirror 34 of the flash exposure device shown in FIG. Exposure was carried out.
そして、この装着から取り出した光ディスクに対してX
線回折を測定した結果、結晶化していることが判明した
。Then, for the optical disc taken out from this installation,
As a result of measuring line diffraction, it was found that it was crystallized.
[発明の効果]
以上説明した本発明によれば、光ディスクの基板に変形
等の影響を与えることなく非晶質の記録膜を効率良く結
晶化することができる初期結晶化方法を提供することが
できる。[Effects of the Invention] According to the present invention described above, it is possible to provide an initial crystallization method that can efficiently crystallize an amorphous recording film without affecting the substrate of an optical disc by deforming or the like. can.
第1図は本発明の実施例方法にを実現するために用いる
フラッシュ露光装置の概要を示す説明図、第2図(a>
は相変化型光ディスクの記録膜及び基板におけるフラッ
シュ光の吸収状態を示す説明図、第2図(b)は本発明
の実施例における5Ad凶笑第す図はそれぞれ従来の光
ディスクを示す部分断面図、第6図は相変化型光ディス
クの部分断面図である。
30・・・・・・ベルトコンベア、
31A、31B・・・・・・基板、
32A、32B・・・・・・記録膜、
33・・・・・・キセノンフラッシュランプ、40A、
40B・・・・・・光ディスク。FIG. 1 is an explanatory diagram showing an outline of a flash exposure device used to realize the embodiment method of the present invention, and FIG. 2 (a>
2(b) is an explanatory diagram showing the absorption state of flash light in the recording film and substrate of a phase-change optical disc, and FIG. 2(b) is a partial sectional view showing a conventional optical disc. , FIG. 6 is a partial cross-sectional view of a phase change optical disk. 30...Belt conveyor, 31A, 31B...Substrate, 32A, 32B...Recording film, 33...Xenon flash lamp, 40A,
40B...Optical disc.
Claims (2)
間で相変化する記録膜を設けてこの記録膜に対するレー
ザービームの照射により情報の記録再生が可能な光ディ
スクの初期結晶化方法であって、初期状態が非晶質状態
にある前記記録膜に所定の光源によるフラッシュ露光を
行なうことを特徴とする光ディスクの初期結晶化方法。(1) A method for initial crystallization of an optical disc in which a recording film that changes phase between crystalline and amorphous is provided on a substrate made of an organic material, and information can be recorded and reproduced by irradiating the recording film with a laser beam. A method for initial crystallization of an optical disc, characterized in that the recording film, which is initially in an amorphous state, is subjected to flash exposure using a predetermined light source.
請求の範囲第1項記載の光ディスクの初期結晶化方法。(2) The method for initial crystallization of an optical disk according to claim 1, wherein the light source is a xenon flash lamp.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61092249A JPH083918B2 (en) | 1986-04-23 | 1986-04-23 | Initial crystallization method of optical disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61092249A JPH083918B2 (en) | 1986-04-23 | 1986-04-23 | Initial crystallization method of optical disk |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62250533A true JPS62250533A (en) | 1987-10-31 |
JPH083918B2 JPH083918B2 (en) | 1996-01-17 |
Family
ID=14049150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61092249A Expired - Lifetime JPH083918B2 (en) | 1986-04-23 | 1986-04-23 | Initial crystallization method of optical disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH083918B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63261553A (en) * | 1987-04-20 | 1988-10-28 | Hitachi Ltd | Method for crystallizing optical information recording medium |
JPH01122043A (en) * | 1987-11-06 | 1989-05-15 | Hitachi Ltd | Method for crystallization of optical information recording medium |
JPH03156741A (en) * | 1989-11-15 | 1991-07-04 | Hitachi Ltd | Recording medium and optical disk using the same |
EP0706179A2 (en) | 1994-09-27 | 1996-04-10 | Matsushita Electric Industrial Co., Ltd. | Production process of optical information recording medium and production apparatus therefor |
US5615206A (en) * | 1992-08-05 | 1997-03-25 | Pioneer Electronic Corporation | Optical disk |
US5684778A (en) * | 1994-09-27 | 1997-11-04 | Matsushita Electric Industrial Co., Ltd. | Initialization process for a phase change recording medium with a zero level drop in flash light emission |
US6060221A (en) * | 1996-02-16 | 2000-05-09 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for initializing optical recording medium |
WO2000031730A1 (en) * | 1998-11-24 | 2000-06-02 | Plasmon Limited | Optical data storage |
WO2001037196A3 (en) * | 1999-11-16 | 2001-11-22 | Polaroid Corp | System and method for initializing phase change recording media |
WO2003030154A1 (en) * | 2001-09-28 | 2003-04-10 | Tdk Corporation | Optical recording medium and production method thereof |
US6807142B1 (en) | 1999-07-12 | 2004-10-19 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for initializing the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220155A (en) * | 1985-07-19 | 1987-01-28 | Fujitsu Ltd | Manufacture of optical disk |
-
1986
- 1986-04-23 JP JP61092249A patent/JPH083918B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220155A (en) * | 1985-07-19 | 1987-01-28 | Fujitsu Ltd | Manufacture of optical disk |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63261553A (en) * | 1987-04-20 | 1988-10-28 | Hitachi Ltd | Method for crystallizing optical information recording medium |
JPH01122043A (en) * | 1987-11-06 | 1989-05-15 | Hitachi Ltd | Method for crystallization of optical information recording medium |
JPH03156741A (en) * | 1989-11-15 | 1991-07-04 | Hitachi Ltd | Recording medium and optical disk using the same |
JP2523904B2 (en) * | 1989-11-15 | 1996-08-14 | 株式会社日立製作所 | Recording medium and optical disc using the same |
US5615206A (en) * | 1992-08-05 | 1997-03-25 | Pioneer Electronic Corporation | Optical disk |
EP0706179A2 (en) | 1994-09-27 | 1996-04-10 | Matsushita Electric Industrial Co., Ltd. | Production process of optical information recording medium and production apparatus therefor |
US5684778A (en) * | 1994-09-27 | 1997-11-04 | Matsushita Electric Industrial Co., Ltd. | Initialization process for a phase change recording medium with a zero level drop in flash light emission |
US6060221A (en) * | 1996-02-16 | 2000-05-09 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for initializing optical recording medium |
WO2000031730A1 (en) * | 1998-11-24 | 2000-06-02 | Plasmon Limited | Optical data storage |
US6807142B1 (en) | 1999-07-12 | 2004-10-19 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for initializing the same |
WO2001037196A3 (en) * | 1999-11-16 | 2001-11-22 | Polaroid Corp | System and method for initializing phase change recording media |
JP2003515232A (en) * | 1999-11-16 | 2003-04-22 | ポラロイド コーポレイション | System and method for initializing a phase change recording medium |
US6587429B1 (en) | 1999-11-16 | 2003-07-01 | Polaroid Corporation | System and method for initializing phase change recording media |
JP4886954B2 (en) * | 1999-11-16 | 2012-02-29 | センシン・キャピタル,リミテッド・ライアビリティ・カンパニー | System and method for initializing a phase change recording medium |
WO2003030154A1 (en) * | 2001-09-28 | 2003-04-10 | Tdk Corporation | Optical recording medium and production method thereof |
US7327666B2 (en) | 2001-09-28 | 2008-02-05 | Tdk Corporation | Optical recording medium and method of manufacturing same |
Also Published As
Publication number | Publication date |
---|---|
JPH083918B2 (en) | 1996-01-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5272667A (en) | Optical information recording apparatus for recording optical information in a phase change type optical recording medium and method therefor | |
JP2003515232A (en) | System and method for initializing a phase change recording medium | |
JP2000231724A (en) | Use method of optical recording medium and optical recording medium | |
JPS62250533A (en) | Initial crystallization method for optical disk | |
US4860274A (en) | Information storage medium and method of erasing information | |
JP3076412B2 (en) | Optical information recording medium and optical information recording / reproducing method | |
US6278680B1 (en) | Initial crystallization method of recording media and device thereof | |
JPS63153728A (en) | Information recorder | |
JP2583221B2 (en) | Optical recording medium | |
JPH03263626A (en) | Optical information recording, reproducing and erasing member | |
JPS63155439A (en) | Information recording medium | |
JP2782910B2 (en) | Optical information recording method, reproducing method and erasing method | |
JPH0695389B2 (en) | Optical recording medium | |
JPH0341636A (en) | Optical information medium | |
JPH01113936A (en) | Member for recording information | |
JPH0558046A (en) | Rewritable optical data recording medium | |
JPH0827981B2 (en) | Information carrier disc | |
JPH11134723A (en) | Method and device for initializing information recording medium | |
JPH05151571A (en) | Recording method for rewritable optical recording medium | |
JPS6358632A (en) | Information recording medium | |
JPS62259890A (en) | Optical recording medium and its preparation | |
JPH0757303A (en) | Production of optical information recording carrier and information recording carrier | |
JPS63244423A (en) | Information recording medium | |
JPH03168945A (en) | Member for optical information recording, reproducing, and erasing | |
JPH01134738A (en) | Optical information recording member |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |