JPS62247071A - Device for producing thin metallic film - Google Patents

Device for producing thin metallic film

Info

Publication number
JPS62247071A
JPS62247071A JP9003586A JP9003586A JPS62247071A JP S62247071 A JPS62247071 A JP S62247071A JP 9003586 A JP9003586 A JP 9003586A JP 9003586 A JP9003586 A JP 9003586A JP S62247071 A JPS62247071 A JP S62247071A
Authority
JP
Japan
Prior art keywords
substrate
preheating roller
roller
thin film
metal thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9003586A
Other languages
Japanese (ja)
Inventor
Kiyokazu Toma
清和 東間
Ryuji Sugita
龍二 杉田
Kazuyoshi Honda
和義 本田
Taro Nanbu
太郎 南部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9003586A priority Critical patent/JPS62247071A/en
Publication of JPS62247071A publication Critical patent/JPS62247071A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To provide a titled device for production which can form a thin metallic film by vacuum deposition in a stable state without wrinkling by forming the peripheral face of a preheating roller to a porous face to apply uniform thermal changes to a substrate and to obviate the generation of wrinkling. CONSTITUTION:After the high-polymer material substrate 1 is run along the preheating roller 3, the substrate is run along the peripheral face of a heated cylindrical can 2. The thin metallic film is formed by a vacuum deposition method on the substrate 1 in the position of the can 2. The peripheral face of the roller 3 of the above-mentioned device is formed to the porous face so that the wrinkles are removed. A method by anodic oxidation or for forming another material different from the material of the roll 3 by a thermal spraying method, etc., on the roll surface to roughen the surface then polishing the surface is suitable for forming the above-mentioned surface. Since the wrinkling of the substrate 1 is obviated by the roller 3 in the above-mentioned constitution, the substrate travels in a wrinkle-free state on the cylindrical can 2 and the wrinkle-free thin metallic film is stably obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、高分子材料基板上に直接あるいは下地層を介
して金属薄膜を形成する金属簿膜の製造装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an apparatus for manufacturing a metal thin film, which forms a metal thin film on a polymer material substrate directly or via an underlayer.

(従来の技術) 高分子材料より成る基板上に金属薄膜を形成する方法と
しては、従来、メッキ法、スパッタ法。
(Prior Art) Conventional methods for forming metal thin films on substrates made of polymeric materials include plating and sputtering.

真空蒸着法等がある。特に、基板を円筒状キャンの周面
に沿わせて走行させつつ蒸着する連続真空蒸着法が優れ
ている。
There are vacuum evaporation methods, etc. Particularly excellent is a continuous vacuum deposition method in which the substrate is deposited while running along the circumferential surface of a cylindrical can.

従来の技術を第3図により説明する。第3図は連続真空
蒸着装置の内部構造の概略図を示す、同図において、1
は高分子材料基板、2は円筒状キャン、3は予備加熱ロ
ーラ、4は供給ロール、5は巻取ロール、6はフリーロ
ーラ、7は金属蒸発源である。
The conventional technique will be explained with reference to FIG. Figure 3 shows a schematic diagram of the internal structure of the continuous vacuum evaporation apparatus.
2 is a polymer material substrate, 2 is a cylindrical can, 3 is a preheating roller, 4 is a supply roll, 5 is a take-up roll, 6 is a free roller, and 7 is a metal evaporation source.

高分子材料より成る基板1は、予備加熱ローラ3に沿っ
て走行した後に、昇温された円筒状キャン2の周面に沿
って矢印六方向に走行する。ここで円筒状キャン2を昇
温する理由は、形成する金属薄膜が磁性薄膜の場合には
磁気特性を向上させるためであり、他の金属薄膜の場合
には結晶性等を向上させるためである。すなわち、金属
薄膜型磁気記録媒体等では、一般に蒸着時の基板温度が
高い程保磁力が増加し、記録再生特性が向上する。
The substrate 1 made of a polymeric material runs along the preheating roller 3, and then runs along the circumferential surface of the heated cylindrical can 2 in the six directions of the arrows. The reason for raising the temperature of the cylindrical can 2 here is to improve the magnetic properties when the metal thin film to be formed is a magnetic thin film, and to improve the crystallinity etc. in the case of other metal thin films. . That is, in metal thin film type magnetic recording media and the like, generally, the higher the substrate temperature during vapor deposition, the higher the coercive force and the better the recording and reproducing characteristics.

また他の金属薄膜等では、一般に蒸着時の基板温度が高
い程基板上での金属原子の移動度が高く結晶性が向上す
る。予備加熱ローラ3は、基板のしわを防止するために
必要である。すなわち、予備加熱ローラ3が無いと、室
温にある基板1が昇温された円筒状キャン2に接する際
に、急激な温度変化のためにしわが生じてしまう、基板
1を予備加熱ローラ3で予備加熱した後に昇温された円
筒状キャン2に沿わせて走行させ、前記基板1の上に金
属蒸発源7によって金属薄膜を形成する。
In other metal thin films, generally, the higher the substrate temperature during vapor deposition, the higher the mobility of metal atoms on the substrate and the better the crystallinity. The preheating roller 3 is necessary to prevent wrinkles of the substrate. That is, without the preheating roller 3, when the substrate 1 at room temperature comes into contact with the heated cylindrical can 2, wrinkles would occur due to the sudden temperature change. After being heated, it is run along the heated cylindrical can 2, and a metal thin film is formed on the substrate 1 by the metal evaporation source 7.

(発明が解決しようとする問題点) 第3図のような従来の連続真空蒸着装置では、基板が沿
って走行する円筒状キャン等の周表面は、鏡面あるいは
超鏡面に仕上げられているのが一般的である。
(Problems to be Solved by the Invention) In the conventional continuous vacuum evaporation apparatus as shown in Fig. 3, the peripheral surface of the cylindrical can along which the substrate runs is finished with a mirror or super-mirror finish. Common.

このような走行系で、円筒状キャンに至る前段のローラ
を単に昇温しで予備加熱ローラとしただけではしわが入
るので、何らかの対策が必要である。
In such a running system, if the rollers at the stage before the cylindrical can are simply heated to serve as preheated rollers, wrinkles will appear, so some kind of countermeasure is required.

本発明は、予備加熱ローラの周面を多孔質状にして、基
板に均一な熱変形を与えることによりしわを発生させず
、金属薄膜を真空蒸着によって安定した状態でしわなく
形成できる金属薄膜の製造装置を提供することである。
The present invention provides a porous peripheral surface of the preheating roller to uniformly thermally deform the substrate, thereby preventing the generation of wrinkles, and making it possible to form a metal thin film in a stable state without wrinkles by vacuum evaporation. The purpose is to provide manufacturing equipment.

(問題点を解決するための手段) 上記問題点を解決するため1本発明の金属薄膜の製造装
置は、高分子材料基板を、予備加熱ローラに沿って走行
させた後に昇温された円筒状キャンの周面に沿って走行
させて、前記円筒状キャン位置で、前記基板上に直接あ
るいは下地層を介して金属薄膜を真空蒸着法によって形
成する装置において、前記予備加熱ローラが多孔質の周
面を備えるものである。
(Means for Solving the Problems) In order to solve the above problems, the metal thin film manufacturing apparatus of the present invention includes a cylindrical shape in which a polymeric material substrate is heated after running along a preheating roller. In an apparatus for forming a thin metal film on the substrate directly or through a base layer at the position of the cylindrical can by moving along the circumferential surface of the can, the preheating roller has a porous peripheral surface. It has a surface.

(作 用) 高分子材料基板は、予備加熱ローラによって予備加熱さ
れ、熱変形を生じるわけであるが、予備加熱ローラの周
面が多孔質であると、熱変形が均一となりしわにならな
い、従って、前記高分子材料基板は円筒状キャンではし
わのない状態で走行するので、その上には安定してしわ
のない金属薄膜が得られる。
(Function) The polymer material substrate is preheated by the preheating roller and undergoes thermal deformation. If the peripheral surface of the preheating roller is porous, the thermal deformation is uniform and wrinkles do not occur. Since the polymer material substrate runs in a cylindrical can without wrinkles, a stable wrinkle-free metal thin film can be obtained thereon.

(実施例) 本発明の一実施例を第1図及び第2図により説明する。(Example) An embodiment of the present invention will be described with reference to FIGS. 1 and 2.

第1図は予備加熱ローラ周面の断面概略図で。Figure 1 is a schematic cross-sectional view of the circumferential surface of the preheating roller.

第2図は金属薄膜を形成する高分子材料基板の面を裏面
にするために基板の走行経路を変更した連続真空蒸着装
置の内部構造概略図で、第3図の従来の構成と異なる点
は、円筒状キャン2と予備加熱ローラ3との間にフリー
ローラ9を追加しただけで、その他の構成部分は同じで
同一番号を付しである。
Figure 2 is a schematic diagram of the internal structure of a continuous vacuum evaporation system in which the running path of the substrate is changed so that the surface of the polymer material substrate on which the metal thin film is formed is the back side.The differences from the conventional configuration shown in Figure 3 are: , only a free roller 9 is added between the cylindrical can 2 and the preheating roller 3, and the other constituent parts are the same and are given the same numbers.

第1図において、3は予備加熱ローラ、8は予備加熱ロ
ーラ周面に形成される多孔質材料の細孔である。前記細
孔8部分以外の周表面は、平滑になるよう仕上げの研磨
が施されている。予備加熱ローラ3の周表面を多孔質に
してしわが取れる理由は、従来の鏡面あるいは超鏡面仕
上げの予備加熱ローラに比べると、多孔質化によりロー
ラ表面と基板との摩擦が小さくなるためと考えられる。
In FIG. 1, 3 is a preheating roller, and 8 is a pore of a porous material formed on the circumferential surface of the preheating roller. The peripheral surface other than the 8 portions of the pores is finished by polishing to make it smooth. The reason why the circumferential surface of the preheating roller 3 is made porous to remove wrinkles is thought to be that the friction between the roller surface and the substrate is reduced by making it porous compared to a conventional preheating roller with a mirror or super mirror finish. It will be done.

その結果、前記基板1は予備加熱ローラ3上で微小移動
するわけであるが、それが順次滑らかに進行し、最終的
に前記基板1は予備加熱ローラ3に沿って均一に変形が
完了するものと考えられる。
As a result, the substrate 1 moves slightly on the preheating roller 3, but this progresses smoothly one after another, and finally the substrate 1 completes its deformation uniformly along the preheating roller 3. it is conceivable that.

表面を多孔質にする方法は種々あるが、いかなる方法に
よってもよい、一般に昇温可能なロールは大型で重量も
大きいものが多く、陽極酸化によるかあるいはロール表
面に溶射法等によってロールの材質とは異なる別の材料
を粗に形成し、後に研磨する方法が多孔質化するのに適
している。溶射法で用いる材料としては基本的には硬質
材料が研磨性の点からよく、AD、Oz* SiO,、
MgO,CaOかあるいはそれらを少なくとも2種以上
混合したものが望ましい、予備加熱ローラ3の周表面は
導体である方が望ましい。すなわち、周表面が絶縁体で
あると、高分子材料基板1との接触で帯電し走行が不安
定となる。このような場合には、予備加熱ローラ3の周
面を多孔質の働きが損なわれない程度に金属薄膜で被覆
するとよい。
There are various ways to make the surface porous, but any method may be used. Generally, rolls that can be heated are large and heavy, and the material of the roll is made by anodizing or by thermal spraying on the roll surface. A method of forming a different material roughly and polishing it afterwards is suitable for making it porous. Hard materials are basically the best materials to use in thermal spraying from the viewpoint of abrasiveness, such as AD, Oz*SiO,...
It is preferable to use MgO, CaO, or a mixture of at least two of them.The peripheral surface of the preheating roller 3 is preferably a conductor. That is, if the circumferential surface is an insulator, it will be charged by contact with the polymer material substrate 1, making running unstable. In such a case, it is preferable to cover the peripheral surface of the preheating roller 3 with a thin metal film to the extent that the porous function is not impaired.

なお、予備加熱ローラ3と金属薄膜とが接触することに
よる金属薄膜表面の傷等が問題になる場合は、第2図の
ように前記基板1の走行経路を変更することが可能であ
るが、この時フリーローラ9で基板温度が降下しないよ
うに、予備加熱ローラ3と同程度の温度にする必要があ
る。
Note that if scratches on the surface of the metal thin film due to contact between the preheating roller 3 and the metal thin film become a problem, it is possible to change the travel path of the substrate 1 as shown in FIG. At this time, the temperature of the free roller 9 needs to be about the same as that of the preheating roller 3 so that the substrate temperature does not drop.

次に本発明のより具体的な実施例を説明する。Next, more specific embodiments of the present invention will be described.

予備加熱ローラ3としてその周表面をAG、O,を溶射
により被覆した後研磨したものを用いた。この時の表面
状態を段差針により調べてみると径が50μ閣のピッチ
で存在していた。深さは最大5μ閣程度であった。もち
ろん前記予備加熱ローラ3のAρ201被覆表面とロー
ラ本体とは導通がないので。
The preheating roller 3 used was one whose circumferential surface was coated with AG, O, and the like by thermal spraying and then polished. When the surface condition at this time was examined using a step needle, it was found that the diameter was present at a pitch of 50 μm. The maximum depth was about 5 μm. Of course, there is no electrical conduction between the Aρ201 coated surface of the preheating roller 3 and the roller body.

前記AG20.被覆面上にNi膜を約500人魚着によ
り形成した。その結果、ローラ表面とローラ本体が導通
した。この予備加熱ローラ3を、従来の構成を示す第3
図のように配設して蒸着を行った。基板1として膜厚1
0μ亀のポリイミドフィルム上に膜厚100人のTi[
を形成したものを使用し、この上に金属薄膜として膜厚
2000人のCo−Cr垂直磁気異方性膜を形成した。
Said AG20. A Ni film was formed on the coated surface using approximately 500 mermaid coats. As a result, the roller surface and the roller body were electrically connected. This preheating roller 3 is replaced with a third one showing a conventional configuration.
Vapor deposition was performed with the arrangement as shown in the figure. Film thickness 1 as substrate 1
A Ti film with a thickness of 100 μm was deposited on a 0 μm polyimide film.
A Co--Cr perpendicular magnetic anisotropy film with a thickness of 2000 nm was formed thereon as a metal thin film.

円筒状キャン2の周面の温度は240℃とし、予備加熱
ローラ3の周面の温度は270℃とした。また円筒状キ
ャン2とCo −Cr垂直磁気異方性膜との間に、 1
20Vの電圧を印加した。この120vの電圧の印加は
、基板1の円筒状キャン2へのはりつきを確実にし、蒸
着膜形成時の熱的ダメージを小さくするためのものであ
る。またこの時、予備加熱ローラ3は、Co −Cr膜
と同電位として電圧印加による影響をなくした。これは
特に第2図のような走行系で効果がある。このようにし
て安定した状態で、しわなく薄膜が形成できた。
The temperature of the circumferential surface of the cylindrical can 2 was 240°C, and the temperature of the circumferential surface of the preheating roller 3 was 270°C. Moreover, between the cylindrical can 2 and the Co-Cr perpendicular magnetic anisotropy film, 1
A voltage of 20V was applied. The purpose of applying this voltage of 120 V is to ensure that the substrate 1 adheres to the cylindrical can 2 and to reduce thermal damage during the formation of the deposited film. Further, at this time, the preheating roller 3 was set at the same potential as the Co--Cr film to eliminate the influence of voltage application. This is particularly effective in a running system like the one shown in Figure 2. In this way, a thin film could be formed in a stable state without wrinkles.

なお、前記基板上のTiの代わりに、膜厚2000人の
Ni−Fe膜を介してCo −Cr膜を形成した場合も
同様の結果が得られた。
Note that similar results were obtained when a Co--Cr film was formed via a Ni--Fe film with a thickness of 2000 mm instead of Ti on the substrate.

(発明の効果) 以上の説明のように1本発明の金属薄膜の製造装置によ
れば、高分子材料基板が予備加熱ローラで予備加熱され
、周面の低摩擦により均一に熱変形した後に昇温された
円筒状キャンに沿って走行するので、円筒状キャン位置
で基板上に直接あるいは下地層を介して、金属薄膜を真
空蒸着によって安定した状態でしわなく形成することが
できる。
(Effects of the Invention) As described above, according to the metal thin film manufacturing apparatus of the present invention, the polymeric material substrate is preheated by the preheating roller, uniformly thermally deformed due to the low friction of the peripheral surface, and then elevated. Since it travels along a heated cylindrical can, a metal thin film can be stably formed without wrinkles by vacuum evaporation on the substrate at the position of the cylindrical can, either directly or via an underlayer.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明における金属薄膜の製造装置の予備加熱
ローラ周表面の断面概略図、第2図は金属薄膜を形成す
る基板の面を裏面にするために基板の走行経路を変更し
た金属薄膜製造装置の内部構造概略図、第3図は従来の
金属薄膜製造装置の内部構造概略図である。 1・・・高分子材料基板、 2・・・円筒状キャン、3
・・・予備加熱ローラ、 4・・・供給ロール、5・・
・巻取ロール、  6・・・フリーローラ。 7・・・金属蒸発源、 8・・・細孔、 9・・・フリ
ーローラ。 特許出願人 松下電器産業株式会社 第1図 3 ・・・子4栢かυ弛ローク 8  ・・・ )11面 K 祈多へンrしる ly 
3L’I+xイ4′フ  身■3し第2図 2・・判YfI水へ、ン 5・・・慶駁υ−1し 6 ・・ フッ−ローラ 7・・・金烏魚茫淋 9・・・ フソーリーラ
Fig. 1 is a schematic cross-sectional view of the circumferential surface of the preheating roller of the metal thin film manufacturing apparatus according to the present invention, and Fig. 2 is a metal thin film in which the running path of the substrate is changed so that the surface of the substrate on which the metal thin film is formed is the back side. FIG. 3 is a schematic diagram of the internal structure of a conventional metal thin film manufacturing device. 1... Polymer material substrate, 2... Cylindrical can, 3
... Preheating roller, 4... Supply roll, 5...
・Take-up roll, 6...free roller. 7... Metal evaporation source, 8... Pore, 9... Free roller. Patent applicant Matsushita Electric Industrial Co., Ltd. Fig. 1 3 ...Children 4 Maki or υ Lok 8 ...) Page 11 K Prayer Hen r Sign ly
3L'I +・Fusorilla

Claims (4)

【特許請求の範囲】[Claims] (1)高分子材料基板を、予備加熱ローラに沿って走行
させた後に昇温された円筒状キャンの周面に沿って走行
させて、前記円筒状キャン位置で前記基板上に直接ある
いは下地層を介して金属薄膜を真空蒸着法によって形成
する装置において、前記予備加熱ローラの周面が多孔質
であることを特徴とする金属薄膜の製造装置。
(1) A polymer material substrate is run along a preheating roller and then along the circumferential surface of a heated cylindrical can, and is placed directly on the substrate or on a base layer at the position of the cylindrical can. 1. An apparatus for forming a thin metal film using a vacuum evaporation method, characterized in that the circumferential surface of the preheating roller is porous.
(2)多孔質を成すものが絶縁材料である場合に、前記
多孔質周面を金属薄膜で被覆した予備加熱ローラを有す
ることを特徴とする特許請求の範囲第(1)項記載の金
属薄膜の製造装置。
(2) When the porous material is an insulating material, the metal thin film according to claim (1), further comprising a preheating roller whose porous peripheral surface is coated with a metal thin film. manufacturing equipment.
(3)前記予備加熱ローラ周面の多孔質体が、Al_2
O_3、SiO_2、MgO、CaOかあるいはそれら
を少なくとも2種以上混合したもので溶射によって形成
されていることを特徴とする特許請求の範囲第(1)項
記載の金属薄膜の製造装置。
(3) The porous body on the circumferential surface of the preheating roller is Al_2
The apparatus for manufacturing a metal thin film according to claim 1, wherein the metal thin film is formed by thermal spraying using O_3, SiO_2, MgO, CaO, or a mixture of at least two thereof.
(4)前記予備加熱ローラ周面の多孔質が、金属の陽極
酸化によって形成されたことを特徴とする特許請求の範
囲第(1)項記載の金属薄膜の製造装置。
(4) The metal thin film manufacturing apparatus according to claim (1), wherein the porous surface of the preheating roller is formed by anodizing the metal.
JP9003586A 1986-04-21 1986-04-21 Device for producing thin metallic film Pending JPS62247071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9003586A JPS62247071A (en) 1986-04-21 1986-04-21 Device for producing thin metallic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9003586A JPS62247071A (en) 1986-04-21 1986-04-21 Device for producing thin metallic film

Publications (1)

Publication Number Publication Date
JPS62247071A true JPS62247071A (en) 1987-10-28

Family

ID=13987400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9003586A Pending JPS62247071A (en) 1986-04-21 1986-04-21 Device for producing thin metallic film

Country Status (1)

Country Link
JP (1) JPS62247071A (en)

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