JPS62244122A - 化合物半導体薄膜の製造装置 - Google Patents

化合物半導体薄膜の製造装置

Info

Publication number
JPS62244122A
JPS62244122A JP8718586A JP8718586A JPS62244122A JP S62244122 A JPS62244122 A JP S62244122A JP 8718586 A JP8718586 A JP 8718586A JP 8718586 A JP8718586 A JP 8718586A JP S62244122 A JPS62244122 A JP S62244122A
Authority
JP
Japan
Prior art keywords
thin film
compound semiconductor
crucible
ionization
cluster
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8718586A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469809B2 (enrdf_load_html_response
Inventor
Hiromoto Ito
弘基 伊藤
Yasuki Kuze
耕己 久世
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8718586A priority Critical patent/JPS62244122A/ja
Publication of JPS62244122A publication Critical patent/JPS62244122A/ja
Publication of JPH0469809B2 publication Critical patent/JPH0469809B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP8718586A 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置 Granted JPS62244122A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8718586A JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8718586A JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Publications (2)

Publication Number Publication Date
JPS62244122A true JPS62244122A (ja) 1987-10-24
JPH0469809B2 JPH0469809B2 (enrdf_load_html_response) 1992-11-09

Family

ID=13907927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8718586A Granted JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Country Status (1)

Country Link
JP (1) JPS62244122A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338367U (enrdf_load_html_response) * 1989-08-28 1991-04-12
US5185287A (en) * 1990-02-22 1993-02-09 Mitsubishi Denki Kabushiki Kaisha Method for producing a quantum well structure
JP2012230952A (ja) * 2011-04-25 2012-11-22 Nippon Telegr & Teleph Corp <Ntt> 注入方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4898775A (enrdf_load_html_response) * 1972-03-28 1973-12-14
JPS5211786A (en) * 1975-07-18 1977-01-28 Futaba Corp Method of manufacturing p-m junction type solar battery
JPS5462776A (en) * 1977-10-27 1979-05-21 Nec Corp Production of compound semiconductor thin films
JPS5625772A (en) * 1979-08-09 1981-03-12 Mieko Kiyozawa Toy for training wearing of cloth for infant

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4898775A (enrdf_load_html_response) * 1972-03-28 1973-12-14
JPS5211786A (en) * 1975-07-18 1977-01-28 Futaba Corp Method of manufacturing p-m junction type solar battery
JPS5462776A (en) * 1977-10-27 1979-05-21 Nec Corp Production of compound semiconductor thin films
JPS5625772A (en) * 1979-08-09 1981-03-12 Mieko Kiyozawa Toy for training wearing of cloth for infant

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338367U (enrdf_load_html_response) * 1989-08-28 1991-04-12
US5185287A (en) * 1990-02-22 1993-02-09 Mitsubishi Denki Kabushiki Kaisha Method for producing a quantum well structure
JP2012230952A (ja) * 2011-04-25 2012-11-22 Nippon Telegr & Teleph Corp <Ntt> 注入方法

Also Published As

Publication number Publication date
JPH0469809B2 (enrdf_load_html_response) 1992-11-09

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