JPS62225932A - Method for analyzing thorium - Google Patents
Method for analyzing thoriumInfo
- Publication number
- JPS62225932A JPS62225932A JP6711086A JP6711086A JPS62225932A JP S62225932 A JPS62225932 A JP S62225932A JP 6711086 A JP6711086 A JP 6711086A JP 6711086 A JP6711086 A JP 6711086A JP S62225932 A JPS62225932 A JP S62225932A
- Authority
- JP
- Japan
- Prior art keywords
- thorium
- boat
- filament
- argon plasma
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052776 Thorium Inorganic materials 0.000 title claims abstract description 36
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title abstract description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 6
- 229910052786 argon Inorganic materials 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 4
- 239000002659 electrodeposit Substances 0.000 claims abstract 2
- 230000006698 induction Effects 0.000 claims abstract 2
- 239000012488 sample solution Substances 0.000 claims description 6
- 230000005284 excitation Effects 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 2
- 238000004458 analytical method Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000009616 inductively coupled plasma Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000000516 activation analysis Methods 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052770 Uranium Inorganic materials 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000011002 quantification Methods 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000002798 spectrophotometry method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 238000000184 acid digestion Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000001636 atomic emission spectroscopy Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011896 sensitive detection Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000004454 trace mineral analysis Methods 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の技術分野〕 本発明は、トリウムの分析法に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to a method for analyzing thorium.
〔発明の技術的背景およびその問題点〕半導体材料中の
微量不純物であるウランＭやトリウム（Ｔｂ）から自然
崩壊によって放出されるα線によりで起るダイナミック
メモリのビット不良はＭａ ｙらの発表峠以来、ソフト
エラーとして大きな問題となった。[Technical background of the invention and its problems] Bit defects in dynamic memory caused by alpha rays emitted by natural decay from trace impurities such as uranium M and thorium (Tb) in semiconductor materials have been reported by May et al. Since the pass, it has become a big problem as a soft error.
高速、大容量化のためメモリーセルを微１１ＦＢ （５
Ｌ。For high speed and large capacity, the memory cells are micro 11FB (5
L.
高集積化するためにはパッケージ材料やチップ構成材料
の低α線化の改良が菖要である。 Ｕ、Ｔｈ含有量の少
ないＬＳＩ構成材料の製法と実際に使用するのに適した
ものを選択するためには測定時間の短くかつ検出感度の
高い分析方法の開発が必要である。In order to achieve high integration, it is essential to improve package materials and chip constituent materials to reduce α-rays. In order to manufacture LSI constituent materials with low U and Th contents and to select materials suitable for actual use, it is necessary to develop an analysis method that requires short measurement time and has high detection sensitivity.
従来一般にトリウムの分析は、（１）吸光光度法。Conventionally, thorium has generally been analyzed using (1) spectrophotometry.
（２）放射化分析法が用いられてきた。（１）は以上の
ような微量分析のためには、感度が不足しており、また
、非常に複雑な化学前処理を要し分析所要時間が長い欠
点がある。（２）は上記目的の分析に広く応用されてい
るが、原子炉を必要とする等品質管理用の分析方法とし
ては実用的でなかった。(2) Activation analysis methods have been used. Method (1) has the disadvantage that it lacks sensitivity for the above-mentioned trace analysis, requires very complicated chemical pretreatment, and takes a long time for analysis. Although method (2) has been widely applied to the above-mentioned analysis, it has not been practical as an analysis method for quality control as it requires a nuclear reactor.
近年蒸発気化−ＩＣＰ法によるトリウムの分析が試みら
れるようになった。この方法は、微量試料を非常に高感
度に分析できるが、その反面、試料の酸濃度やマトリッ
クス成分の影響を受は易い欠点があり、複雑で長時間を
要する化学前処理が必要であった。In recent years, attempts have been made to analyze thorium using the evaporation-ICP method. Although this method can analyze trace amounts of samples with extremely high sensitivity, it has the disadvantage that it is easily affected by the acid concentration and matrix components of the sample, and requires complicated and time-consuming chemical pretreatment. .
以上のように半導体メモリ開発及び製造プロセスでは高
感度で迅速なＴｈ分析法の開発が要求されていた。As described above, development of a highly sensitive and rapid Th analysis method has been required in semiconductor memory development and manufacturing processes.
本発明者らは、これら従来法のトリウム定量分析方法に
おける試料化学前処理、測定の難点を解消したトリウム
の定量分析方法について種々の検討を重ねた結果１本発
明を完成するに至ったものであり、簡便な操作で高感度
な分析方法を提供するものである。The present inventors have completed the present invention as a result of various studies on a method for quantitatively analyzing thorium that overcomes the difficulties of sample chemical pretreatment and measurement in the conventional methods for quantitatively analyzing thorium. It provides a highly sensitive analysis method with simple operation.
すなわち１本発明は、液体被分析試料はそのままもしく
は濃縮後、固体被分析試料は、無機酸もしくは、アルカ
リなどで分解後、必要に応じてイオン交換分離でトリウ
ムをマトリックスから分離濃縮し、得られた試料溶液を
使って高融点金属ボートもしくはフィラメントを陰極、
貴金属を陽極にして電気分解を行いトリウムをボートも
しくはフィラメント上に電着する。In other words, the present invention provides that the liquid sample to be analyzed is obtained as it is or after being concentrated, the solid sample to be analyzed is decomposed with an inorganic acid or alkali, and if necessary, thorium is separated and concentrated from the matrix by ion exchange separation. A refractory metal boat or filament is used as a cathode and
Thorium is electrodeposited onto a boat or filament by electrolysis using a noble metal as an anode.
その後、ボートもしくはフィラメント両端に電極を接続
し、１！流を流し、１５００〜３０００℃に抵抗加熱し
てトリウムを蒸発気化させ、１０〜５０■（２の高周波
誘導刃口熱によって発生させたアルゴンプラズマ内に導
入し、励起発光強度からトリウムを定量できる。高感度
、高精度で簡便かつ迅速に足敏できることをＩＦｉ、徴
とするトリウムの定量分析方法を提供するものである０
本発明では、仮に述べるトリウムの電着分離を行うため
、固体試料の分解はどのような方法を用いても良いが、
加圧分解容器を用いる酸分解等の試薬や容器から汚染の
少ない方法を用いることが望ましい。液体試料は蒸発ａ
縮を行えば、より高感度な検出が可能である。After that, connect electrodes to both ends of the boat or filament, and do 1! The thorium is evaporated by resistive heating to 1500-3000°C, and then introduced into the argon plasma generated by the high-frequency induced heat in step 2.Thorium can be quantified from the excitation emission intensity. .IFi provides a method for quantitative analysis of thorium that is characterized by high sensitivity, high precision, and can be performed simply and quickly.
In the present invention, any method may be used to decompose the solid sample in order to perform the electrodeposition separation of thorium, which will be described temporarily.
It is desirable to use a method that causes less contamination from reagents and containers, such as acid digestion using a pressure digestion vessel. Liquid sample evaporates a
By reducing the size, more sensitive detection is possible.
また電着分離を完全に行うためイオン交換法などの分離
濃縮を行っても良い。この場合、従来の放射化分析法や
吸光光度法で要求される非常に厳密な分離は不要で最も
簡単な装置、条件で十分である。以上のようにして得ら
れた試料溶液を高融点金属製ボートもしくはフィラメン
トを陰極とじ貴金属を陽極として電気分解し、トリウム
をボートに電着分離する。ボートもしくはフィラメント
に。Further, in order to completely perform electrodeposition separation, separation and concentration such as an ion exchange method may be performed. In this case, the extremely strict separation required by conventional activation analysis methods and spectrophotometry methods is unnecessary, and the simplest equipment and conditions are sufficient. The sample solution obtained as described above is electrolyzed using a high melting point metal boat or filament as a cathode and a noble metal as an anode, and thorium is electrodeposited and separated on the boat. Boat or filament.
タングステン（Ｗ） 、タンタル（Ｔａ）、モリブデン
（Ｍｏ）、白金（Ｐｔ）、白金−パラジウム合金（Ｐｔ
−Ｐｄ ）等が使用可能で、グラフアイ） （Ｃ）も使
用できる。また電気分解時の陽極電位を制量して定電位
電解を行えば、トリウムのみの分離が可能で、後のＩＣ
Ｐ発光分光測定で妨害のある鉄等を除くことができる。Tungsten (W), tantalum (Ta), molybdenum (Mo), platinum (Pt), platinum-palladium alloy (Pt
-Pd) etc. can be used, and Graphai) (C) can also be used. In addition, by controlling the anode potential during electrolysis and performing constant potential electrolysis, it is possible to separate only thorium, which can be used later in the IC process.
Interferences such as iron can be removed by P emission spectrometry.
電気分解後、ボートもしくはフィラメントに電位を加え
たまま、アセトン、アルコールなどで洗う、蒸発気化時
に問題となる試料溶液中の酸や塩類は、流しさられるの
で、どのような試料溶液を用いても、常に均一な状態で
蒸発気化が行なえる。また、濃縮率の測定や分取操作が
ないので試料溶液の体積測定が不要である。時に濃縮さ
れた微少量溶液の測容等の煩雑で、誤差を置引しやすい
操作が不要になった。After electrolysis, the boat or filament should be washed with acetone, alcohol, etc. while the potential is still applied.Acids and salts in the sample solution, which can be a problem during evaporation, will be washed away, so no matter what sample solution you use. , evaporation can always be performed in a uniform state. Furthermore, since there is no concentration ratio measurement or preparative separation operation, there is no need to measure the volume of the sample solution. This eliminates the need for complicated and error-prone operations such as measuring the volume of a very small amount of a concentrated solution.
次にトリウムを電着したボートもしくはフィラメントに
電極をとりつけ、電流を流して１５００〜３０００℃に
加熱してトリウムを蒸発気化させＩＣＰ発光分光分析装
置に導入してトリウムの励起発光強度から定量する。従
来非常に恵要であった酸や塩を除くための灰化操作は、
１！着後の洗浄で除かれているので不要である。また従
来の灰化操作では、トリウムが酸化物、金属、その他の
塩類と多様な形で存在するので、蒸発気化時の蒸発温度
が違うためＩＣＰ発光のピークが広がり１強度が低くな
っていた。水沫では電着によるのでトリウムのほとんど
が金属状態で存在するため、蒸発温度が一定であるため
従来法に比較して１．５倍以上のピーク強度が得られる
ようになった。Next, an electrode is attached to a boat or filament on which thorium has been electrodeposited, and a current is applied to heat the boat or filament to 1,500 to 3,000° C. to evaporate the thorium, which is then introduced into an ICP emission spectrometer and quantified from the excitation emission intensity of thorium. The ashing operation to remove acids and salts, which has traditionally been very important,
1! This is not necessary as it is removed by washing after wearing. Furthermore, in conventional ashing operations, since thorium exists in various forms such as oxides, metals, and other salts, the evaporation temperature during evaporation differs, resulting in a broadened peak of ICP emission and a lower intensity. In water droplets, most of the thorium exists in a metallic state due to electrodeposition, and the evaporation temperature is constant, making it possible to obtain a peak intensity 1.5 times or more compared to the conventional method.
以下半導体封止フィラー用高純度シリカを分析した実施
例を示す。Examples of analyzing high-purity silica for semiconductor encapsulation filler are shown below.
試料１０ｇをフッ累樹脂製ビーカーにとり、フッ化水素
酸（１＋１）、５０ｍ／と過塩素酸５ｍｌを加え、熱板
上で乾固近くまで加熱する。放冷後。Take 10 g of the sample in a fluoroplastic beaker, add 50 ml of hydrofluoric acid (1+1) and 5 ml of perchloric acid, and heat on a hot plate until almost dry. After cooling.
塩酸（１＋１ ）、 ５ｍｌを加え、加熱して大部分の
残渣を溶解したのち、内部をフッ素樹脂で被覆した加圧
分解容器中でフッ化水素酸（ｉ＋１）１０ｍＪと塩酸５
ｍｌを加え２００℃２時間加圧分解する。その後硫酸（
１＋１）２ｍｌと過塩素酸５ｍＪ？を加え、硫酸白煙を
発生させ乾固近くまで加熱する。その後水２０ｍ１を加
え加熱して塩類を溶解する。After adding 5 ml of hydrochloric acid (1+1) and dissolving most of the residue by heating, add 10 mJ of hydrofluoric acid (i+1) and 5 ml of hydrochloric acid in a pressure decomposition vessel whose interior is coated with fluororesin.
ml and decompose under pressure at 200°C for 2 hours. Then sulfuric acid (
1+1) 2ml and 5mJ of perchloric acid? Add sulfuric acid, generate white sulfuric acid smoke, and heat to near dryness. Then, add 20 ml of water and heat to dissolve the salts.
得られた溶液に第１図に示すようなタングステン製ボー
トの１の部分を浸し陰極とし１表面積２ｃｍ”の白金電
電を陽極として電解電流ｏ、ｉｘ、刀ロ電王４〜１０Ｖ
で１時間電解する。その後電圧を加えたままボートを溶
液からとり出しエチｉレアルコール、アセトンで洗浄し
そのまま乾燥する。Part 1 of a tungsten boat as shown in Figure 1 was immersed in the obtained solution, and a platinum electrolyte with a surface area of 2 cm was used as an anode, and the electrolytic current was o, ix, 4 to 10 V.
Electrolyze for 1 hour. Thereafter, the boat was taken out of the solution while the voltage was still applied, washed with ethyl alcohol and acetone, and then dried.
以上の操作によりトリウムを電着させたタングステンボ
ートを高温気化装置にとりつけ、第１表に示すように１
００℃で乾燥後２３００℃で気化させてアルゴンプラズ
マ内に導入して発光分光法によりトリウムを足置分析し
た。The tungsten boat with thorium electrodeposited by the above procedure was attached to a high-temperature vaporizer, and 1
After drying at 00°C, it was vaporized at 2300°C, introduced into argon plasma, and thorium was analyzed by optical emission spectroscopy.
定量分析値及び分析所要時間を第２表に示す。Quantitative analysis values and analysis time are shown in Table 2.
以上の結果から明らかなように、従来の放射化分析法と
比較して定量不可能であった。０．５ｐｐｂ以下のトリ
ウムを１７２５の短時間に簡便かつ多量の試料が分析で
きることが判明した。As is clear from the above results, quantification was not possible compared to conventional activation analysis methods. It has been found that thorium of 0.5 ppb or less can be analyzed easily and in a large amount of samples in a short period of time.
本発明によれば、従来定量不可能であった。、５ｐｐｂ
以下のトリウムを短時間にかつ簡便に足置分析すること
が可能で、その工業的価値は犬である。According to the present invention, quantification was not possible in the past. ,5ppb
It is possible to analyze the following thorium in a short time and easily, and its industrial value is significant.
第１表 高周波誘導結合プラズマ発光分光測定条件 第２表Table 1 High frequency inductively coupled plasma emission spectrometry measurement conditions Table 2
第１ｉ′２１は本発明に用いる高温気化用タングステン
ボー！・の１例である。
１・・・試料溶液接触部、２・・・電極取付部。
代理人 弁理士 則 近 憲 佑
同 竹 花 喜久男
第 １ 図1i'21 is the tungsten bow for high temperature vaporization used in the present invention!・This is an example. 1... Sample solution contact part, 2... Electrode mounting part. Agent Patent Attorney Noriyuki Chika Yudo Kikuo Takehana Figure 1
Claims (1)
トもしくはフィラメントを陰極、貴金属を陽極にして電
気分解を行なって、トリウムをボートもしくはフィラメ
ント上に電着し、その後、ボートもしくはフィラメント
に電流を流すことにより１５００〜３０００°に加熱し
てトリウムを蒸発気化させ、１０〜５０ＭＨｚの高周波
誘導加熱によって発生させたアルゴンプラズマ（ＩＣＰ
）内に導入し、励起発光強度からトリウムを定量するこ
とを特徴とするトリウムの分析方法。(1) Using a thorium-containing sample solution, conduct electrolysis using a high-melting point metal boat or filament as a cathode and a noble metal as an anode to electrodeposit thorium onto the boat or filament, and then apply an electric current to the boat or filament. The thorium is heated to 1,500 to 3,000° by flowing it to evaporate it, and argon plasma (ICP) is generated by high-frequency induction heating at 10 to 50 MHz.
) and quantifying thorium from the excitation emission intensity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6711086A JPS62225932A (en) | 1986-03-27 | 1986-03-27 | Method for analyzing thorium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6711086A JPS62225932A (en) | 1986-03-27 | 1986-03-27 | Method for analyzing thorium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62225932A true JPS62225932A (en) | 1987-10-03 |
Family
ID=13335428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6711086A Pending JPS62225932A (en) | 1986-03-27 | 1986-03-27 | Method for analyzing thorium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62225932A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019535002A (en) * | 2016-09-08 | 2019-12-05 | オブチョースカ アグネスＯＢＵＣＨＯＷＳＫＡ， Ａｇｎｅｓ | Apparatus for analyzing elemental composition of liquid sample and method of using the same |
-
1986
- 1986-03-27 JP JP6711086A patent/JPS62225932A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019535002A (en) * | 2016-09-08 | 2019-12-05 | オブチョースカ アグネスＯＢＵＣＨＯＷＳＫＡ， Ａｇｎｅｓ | Apparatus for analyzing elemental composition of liquid sample and method of using the same |
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