JPS62207241A - Production of acryloyl group-and/or methyacryloyl group-containing compound - Google Patents
Production of acryloyl group-and/or methyacryloyl group-containing compoundInfo
- Publication number
- JPS62207241A JPS62207241A JP4848686A JP4848686A JPS62207241A JP S62207241 A JPS62207241 A JP S62207241A JP 4848686 A JP4848686 A JP 4848686A JP 4848686 A JP4848686 A JP 4848686A JP S62207241 A JPS62207241 A JP S62207241A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- reaction
- epoxy
- formulas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 title abstract description 13
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 title abstract description 4
- 238000004519 manufacturing process Methods 0.000 title description 4
- 239000004593 Epoxy Substances 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 19
- 239000003822 epoxy resin Substances 0.000 abstract description 18
- 229920000647 polyepoxide Polymers 0.000 abstract description 18
- 238000010521 absorption reaction Methods 0.000 abstract description 17
- 238000007259 addition reaction Methods 0.000 abstract description 9
- -1 methacryloyl group Chemical group 0.000 abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 239000003054 catalyst Substances 0.000 abstract description 6
- 239000003112 inhibitor Substances 0.000 abstract description 6
- 238000006116 polymerization reaction Methods 0.000 abstract description 6
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 abstract description 5
- 150000003839 salts Chemical class 0.000 abstract description 5
- NACSMDAZDYUKMU-UHFFFAOYSA-N (4-nitrophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C([N+]([O-])=O)C=C1 NACSMDAZDYUKMU-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 229930185605 Bisphenol Natural products 0.000 abstract description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 abstract 1
- 125000003700 epoxy group Chemical group 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 150000002148 esters Chemical class 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 238000001723 curing Methods 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 125000004185 ester group Chemical group 0.000 description 6
- 239000000178 monomer Substances 0.000 description 5
- WIZMCLXMWBKNKH-UHFFFAOYSA-N (4-methoxyphenyl) 2-methylprop-2-enoate Chemical compound COC1=CC=C(OC(=O)C(C)=C)C=C1 WIZMCLXMWBKNKH-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical class CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 4
- 150000007519 polyprotic acids Polymers 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 3
- GWTKXURKPNYOPX-UHFFFAOYSA-N (2,4-dichlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Cl)C=C1Cl GWTKXURKPNYOPX-UHFFFAOYSA-N 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical class C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 230000001495 anti-association Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-N perisophthalic acid Natural products OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002990 reinforced plastic Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明はアクリルエステル基含有化合物の製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing an acrylic ester group-containing compound.
[従来の技術]
特公昭44−31472号公報、特公昭45−4069
号公報及び特公昭45−15988号公報等に記載され
ているように、不飽和エポキシエステル樹脂は不飽和−
塩基酸と必要に応じて不飽和−塩基酸の一部分を飽和−
塩基酸、飽和多塩基酸、無水飽和多塩基酸、不飽和多塩
基酸及び無水不飽和多塩基酸の中から選ばれた1種また
は2種以上とで置換した酸成分とエポキシ樹脂とをエス
テル化反応触媒、必要に応じて重合防止剤、溶剤あるい
は重合性単量体(以下、モノマーと記載する)の存在下
で加熱反応し、その後必要に応じて溶剤あるいはモノマ
ーを加えて合成される。この樹脂は、硬化触媒として有
機過酸化物と必要に応じて促進剤として金属塩等を使用
することにより、常温あるいは加熱硬化することができ
る。[Prior art] Japanese Patent Publication No. 44-31472, Japanese Patent Publication No. 45-4069
As described in Japanese Patent Publication No. 45-15988, etc., unsaturated epoxy ester resins are unsaturated epoxy ester resins.
Basic acid and optionally unsaturated - partially saturated basic acid -
An acid component substituted with one or more selected from basic acids, saturated polybasic acids, anhydrous saturated polybasic acids, unsaturated polybasic acids, and anhydrous unsaturated polybasic acids and an epoxy resin are esterified. The compound is synthesized by carrying out a heating reaction in the presence of a reaction catalyst, a polymerization inhibitor, a solvent, or a polymerizable monomer (hereinafter referred to as a monomer) if necessary, and then adding a solvent or monomer if necessary. This resin can be cured at room temperature or by heating by using an organic peroxide as a curing catalyst and, if necessary, a metal salt or the like as an accelerator.
この樹脂で溶剤を用いた時には塗料、プリプレグ等とし
て、またモノマーを用いた時は強化プラスチック(F
RP )、注型、接着、塗料等に用いることができる。When using this resin with a solvent, it can be used as paint, prepreg, etc., and when using a monomer, it can be used as a reinforced plastic (F).
RP), casting, adhesion, paint, etc.
上記の樹脂は、変性エポキシ樹脂の1種でありながら無
水マレイン酸、フタル酸等の酸類とエチレングリコール
等の多価アルコール類とを重縮合して得られる不飽和ポ
リエステルをスチレン等のモノマーに溶解してなる不飽
和ポリニスデル樹脂と同じように、有機過酸化物等によ
って硬化できるという特徴をもっている。その上、この
不飽和エポキシエステル樹脂は、−m的なアミンまたは
酸硬化によるエポキシ樹脂と同等あるいはそれ以上の性
能を有しており、特に耐薬品性、耐候性、硬化性、作業
性等の点よりみればエポキシ樹脂よりも優れている0例
えば、耐薬品性において、エポキシ樹脂では、アミン(
常温または加熱硬化も可能)で硬化した時は耐アルカリ
用、酸(加熱硬化)で硬化した時は耐酸用として区別し
ている。そこでこの両方を兼備えたものは常温硬化で得
られ難い。Although the above resin is a type of modified epoxy resin, it is an unsaturated polyester obtained by polycondensing acids such as maleic anhydride and phthalic acid with polyhydric alcohols such as ethylene glycol, and is dissolved in monomers such as styrene. It has the characteristic that it can be cured with organic peroxides, etc., just like the unsaturated polynisder resin made of polynisder. Furthermore, this unsaturated epoxy ester resin has performance equivalent to or superior to epoxy resins cured by amine or acid curing, especially in terms of chemical resistance, weather resistance, curing properties, workability, etc. For example, in terms of chemical resistance, epoxy resins are superior to epoxy resins.
When cured at room temperature or heat curing is possible, it is classified as alkali-resistant, and when cured with acid (heat-cured), it is classified as acid-resistant. Therefore, it is difficult to obtain a material that has both of these characteristics by curing at room temperature.
しかし、不飽和エポキシエステル樹脂であれば、どの硬
化触媒系を用いても耐酸性、耐アルカリ性に優れている
。However, unsaturated epoxy ester resins have excellent acid resistance and alkali resistance no matter which curing catalyst system is used.
この他に硬化性について、エポキシ樹脂では、硬化剤の
使用量が限定されているために一定温度での硬化性の調
節が余り自由でなく、はとんど硬化温度によって調節し
ているのが現状である。従って、常温で硬化する時に、
夏場または冬場ではゲル化が速かったり、または硬化し
なかったりして問題が多い、しかし、上記した不飽和エ
ポキシエステル樹脂は有機過酸化物に必要に応じて促進
剤を用いること及び有機過酸化物の使用量を変えること
によって、夏場も冬場も大体同じような硬化性にできる
特徴をもっている。In addition, regarding curability, in epoxy resins, the amount of curing agent used is limited, so it is not very flexible to adjust the curability at a certain temperature, and most of the time it is adjusted by the curing temperature. This is the current situation. Therefore, when curing at room temperature,
In summer or winter, there are many problems because gelation is fast or it does not harden. It has the characteristic that by changing the amount used, it is possible to achieve roughly the same curing properties in both summer and winter.
[発明が解決しようとする問題点]
従来のエポキシ樹脂と(メタ)アクリル酸とから合成さ
れたビニルエステル樹脂はエポキシ基の開環による2級
水酸基が存在する。このために、粘度が高くなるほか、
吸水率が大きくなり、高度な電気性能が要求される分野
には必ずしも適当なものではなかった。[Problems to be Solved by the Invention] Conventional vinyl ester resins synthesized from epoxy resins and (meth)acrylic acid have secondary hydroxyl groups due to ring opening of epoxy groups. This results in higher viscosity and
It has a high water absorption rate and is not necessarily suitable for fields where high electrical performance is required.
し問題点を解決するための手段]
P olymer、 J 、第16巻、第371頁(1
984年)に西久保らによりポリマー側鎖のエポキシ基
と種々のエステル類が、特定の第4級アンモニウム塩を
触媒として使用すると、比較的温和な条件下で定量的に
反応することが明らかにされた。上述の問題点を解決す
るために、この反応を応用して合成したアクリルエステ
ル基含有化合物が硬化性を有し、硬化性組成物の製造等
にも応用でき、それによって上述の貯蔵等の問題点を解
決できるとを知見し、本発明を完成するに至った。Polymer, J., Vol. 16, p. 371 (1)
(984), Nishikubo et al. revealed that epoxy groups in polymer side chains and various esters react quantitatively under relatively mild conditions when a specific quaternary ammonium salt is used as a catalyst. Ta. In order to solve the above-mentioned problems, the acrylic ester group-containing compound synthesized by applying this reaction has curability and can be applied to the production of curable compositions, thereby solving the storage problems mentioned above. The inventors discovered that the problems could be solved and completed the present invention.
従って、本発明は一般式
%式%
し式中、R1は水素原子またはメチル基であり、Yは酸
素原子または硫黄原子であり、ZはQ(x>n、
る群より選択された基で、ここでXは水素原子、アルキ
ル基、ハロゲン原子、ニトロ基、メトキシ基で、nは1
〜5の整数である]に、エポキシ樹脂を付加反応させる
ことからなる、−a式(式中、R,、Y及びZは上述と
同意義をもち、R2はエポキシ残基である)で表される
アクリロイル基及び/またはメタクリロイル基含有化合
物の製遣方法を提供するにある。Therefore, the present invention provides the general formula % where R1 is a hydrogen atom or a methyl group, Y is an oxygen atom or a sulfur atom, and Z is a group selected from the group Q (x>n, , where X is a hydrogen atom, an alkyl group, a halogen atom, a nitro group, or a methoxy group, and n is 1
is an integer of ~5] with an epoxy resin, represented by the formula -a (wherein R,, Y and Z have the same meanings as above, and R2 is an epoxy residue). An object of the present invention is to provide a method for producing a compound containing an acryloyl group and/or a methacryloyl group.
[作 用]
本発明のアクリロイル基及び/またはメタクリロイル基
含有化合物は下記の一最式に示す付加反応に従って製造
することができる:
R3
(上述の式中、R1、R2、Y及びZは上述と同意義を
もつ)。[Function] The acryloyl group- and/or methacryloyl group-containing compound of the present invention can be produced according to the addition reaction shown in the following formula: R3 (In the above formula, R1, R2, Y and Z are as defined above. have the same meaning).
上述の付加反応において、エポキシ樹脂とアクリル酸フ
ェニルエステル類及び/またはメタクリル酸フェニルエ
ステル類との反応比は、エポキシ樹脂のエポキシ基0.
5・〜2.0モルに対し、アクリル酸フェニルエステル
類及び/またはメタクリル酸フェニルエステル類の合計
エステル基1モルであることが必要であり、この範囲外
の反応比で合成されるアクリルエステル基含有化合物は
硬化性、硬化膜の硬度、耐溶剤性及び耐水性に劣るので
好ましくない。In the above-mentioned addition reaction, the reaction ratio of the epoxy resin and the acrylic acid phenyl esters and/or the methacrylic acid phenyl esters is 0.0.
It is necessary that the total ester group of acrylic acid phenyl esters and/or methacrylic acid phenyl esters be 1 mol per 5.0 to 2.0 mol, and acrylic ester groups synthesized at a reaction ratio outside this range. Containing compounds are not preferred because they are inferior in curability, hardness of cured film, solvent resistance, and water resistance.
上述のC1加反応に使用できるエポキシ樹脂としてはエ
ピコート828(シェル社製)、より高分子量のエビビ
ス型のエポキシ樹脂、エポキシノボラック型のエポキシ
樹脂、N、N−ジグリシジルアニリン、脂環式型のエポ
キシ樹脂、エチレングリコールジグリシジルエーテル等
の種々のエポキシ化合物を挙げることができる。Epoxy resins that can be used in the above C1 addition reaction include Epicote 828 (manufactured by Shell), higher molecular weight Ebibis type epoxy resin, epoxy novolac type epoxy resin, N,N-diglycidylaniline, and alicyclic type epoxy resin. Various epoxy compounds such as epoxy resins and ethylene glycol diglycidyl ether can be mentioned.
また、上述の付加反応に使用できるアクリル酸エステル
類及び/またはメタクリル酸エステル類としては以下に
記載する実施例に使用したp−二トロフェニルメタクリ
ラート、2.4−ジクロロフェニルメタクリラート、フ
ェニルメタクリラート及びp−メトキシフェニルメタク
リラートの他に、下記の化合物を挙げることができる:
R5
書
式中、R1及び2は上述と同意義をもつ。In addition, examples of acrylic esters and/or methacrylic esters that can be used in the above addition reaction include p-nitrophenyl methacrylate, 2,4-dichlorophenyl methacrylate, and phenyl methacrylate used in the examples described below. In addition to p-methoxyphenyl methacrylate and p-methoxyphenyl methacrylate, the following compounds may be mentioned:
R5 In the format, R1 and 2 have the same meanings as above.
1゛ CIl□=C o−o−z 式中、R1及び2は上述と同意義をもつ。1゛ CIl□=C o-o-z In the formula, R1 and 2 have the same meanings as above.
また、 R1
(式中、Ro及びR6は上述と同意義をもち、Aは−c
o−Q*タハーcoc++5cisys)のような自己
増感型のオリゴマーも合成することができる。In addition, R1 (wherein Ro and R6 have the same meanings as above, and A is -c
Self-sensitizing oligomers such as o-Q*taher coc++5cisys) can also be synthesized.
更に、芳香族または他の活性エステル基を有するアクリ
ル酸エステル類及び/またはメタクリル酸エステル類の
一部をジ(ρ−ニトロフェニル)アジピン酸、ジフェニ
ルチオアジピン酸エステル、シ(11−二トロフェニル
)イソフタル酸エステル、トリ(4−クロロフェニル)
トリメリット酸エステル等の多官能性エステル類に変え
ることも可能であり、この場合には高分子量のテレゲリ
ックオリゴマーが得られる。Furthermore, some of the acrylic esters and/or methacrylic esters having aromatic or other active ester groups can be converted into di(ρ-nitrophenyl)adipic acid, diphenylthioadipate, cy(11-nitrophenyl) ) Isophthalic acid ester, tri(4-chlorophenyl)
It is also possible to change to polyfunctional esters such as trimellitic acid ester, and in this case, a high molecular weight telegelic oligomer can be obtained.
また、上述の付加反応の触媒としては種々の第3級アミ
ン、第4級オニウム塩(ホスホニウム塩、アンモニウム
塩)、クラウンエーテル類−KBr、を使用することが
可能であるが、反応をより効果的に進行させるためには
、第3級アミン類より第4級オニウム塩の使用が好まし
い、更に、第4級は、R1−R1で示されるアルキル基
の炭素数の総和が8個以上であることが好ましい。更に
、アルキル基の一部はフェニル基やベンジル基で置換さ
れていてもよい、また、第4級オニウム塩の対イオンと
してはBr−1CI−2■−またはF−が好ましい。In addition, various tertiary amines, quaternary onium salts (phosphonium salts, ammonium salts), and crown ethers-KBr can be used as catalysts for the above-mentioned addition reaction; In order to advance the process, it is preferable to use quaternary onium salts rather than tertiary amines.Furthermore, for quaternary, the total number of carbon atoms in the alkyl groups represented by R1-R1 is 8 or more. It is preferable. Further, a part of the alkyl group may be substituted with a phenyl group or a benzyl group, and Br-1CI-2■- or F- is preferable as a counter ion of the quaternary onium salt.
また、上述の付加反応中のゲル化を防止するために、必
要に応じてフェノール類、キノン類、その他組合防止効
果のある化合物を重合防止剤として使用することもでき
る。これらの重合防止剤は反応後にも添加することがで
きる。Furthermore, in order to prevent gelation during the above-mentioned addition reaction, phenols, quinones, and other compounds having an anti-association effect can be used as polymerization inhibitors, if necessary. These polymerization inhibitors can also be added after the reaction.
これらの重合防止剤としては、例えばハイドロキノン、
ヒドロ・キノンモノメチルエーテル、ベンゾキノン、フ
ェノチアジン、チオセミカルバジット、アセトンチオカ
ルバゾン、銅塩等を挙げることができる。Examples of these polymerization inhibitors include hydroquinone,
Examples include hydroquinone monomethyl ether, benzoquinone, phenothiazine, thiosemicarbasite, acetone thiocarbazone, copper salt, and the like.
以下に記載する実施例においては、生成物の構造の確認
や反応性等の確認の観点から付加反応を無溶媒下で行な
ったが、通常、付加反応に反応溶媒と使用することがで
きる。更に、反応の際の発熱のコントロールや生成物の
粘度の調整、光硬化性材料としての応用等の観点から、
反応溶媒として多官能性アクリラート類、例えばエチレ
ングリコールシアクリラード、エチレングリコールジメ
タクリラード、トリメチロールプロパントリアクリラー
ト、トリメチロール10パントリメタクリラート等を使
用することが好ましい。In the examples described below, the addition reaction was carried out without a solvent from the viewpoint of confirming the structure and reactivity of the product, but a reaction solvent can normally be used in the addition reaction. Furthermore, from the viewpoint of controlling heat generation during reaction, adjusting the viscosity of the product, and application as a photocurable material,
It is preferable to use polyfunctional acrylates such as ethylene glycol cyacrylate, ethylene glycol dimethacrylate, trimethylolpropane triacrylate, trimethylol-10-pantrimethacrylate, etc. as the reaction solvent.
し実 施 例]
以下に実施例(以下、特記しない限り単に「例」と記載
する)を挙げ、本発明を更に説明する。EXAMPLES] The present invention will be further explained with reference to Examples (hereinafter simply referred to as "examples" unless otherwise specified) below.
−L
p−ニトロフェニルメタクリラート20.739(0,
1モル)及びエピコート828(ビスフェノール型エポ
キシ樹脂17.83g>(エポキシ基として0.1モル
)を100m1セパラブルフラスコに取り、これに触媒
としてテトラブチルアンモニウムプロミド(TBAB)
1.64#(0,005モル)を加え、更に重合防止剤
として少Ji(0,01y)のヒドロキノンモノメチル
エーテル(MQ)を添加し、120℃で5時間反応させ
た0反応率をエポキシ当量より求めた所99.5モル%
であった。得られた生成物の分子量(G P Cによる
)は約600であった。-L p-nitrophenyl methacrylate 20.739 (0,
1 mol) and Epicote 828 (bisphenol type epoxy resin 17.83 g (0.1 mol as epoxy group) were placed in a 100 ml separable flask, and tetrabutylammonium bromide (TBAB) was added as a catalyst to this.
1.64# (0,005 mol) was added, and hydroquinone monomethyl ether (MQ) with a low Ji (0,01y) was added as a polymerization inhibitor, and the reaction was carried out at 120°C for 5 hours.The 0 reaction rate was determined as the epoxy equivalent. 99.5 mol% determined from
Met. The molecular weight (according to GPC) of the product obtained was approximately 600.
また、同じ反応を110℃で5時間行なった際の反応率
は94.7モル%であった。Further, when the same reaction was carried out at 110° C. for 5 hours, the reaction rate was 94.7 mol%.
得られた生成物についてIR分析を行なうと、3300
cm−’での一〇Hに基づく吸収はほとんど見られず、
1720cm−’にエステル性c = o (p−ニト
ロフェニルメタクリラートでは1730cm−’)、1
640cm−’にC=C11240cm−■及び116
0cm″′1にC−0−C(エステル性及びエーテル性
)の特性吸収を示し、910eel’″1付近でのエポ
キシ基の吸収は完全に消失していた。When the obtained product was subjected to IR analysis, it was found that 3300
Almost no absorption based on 10H in cm-' is observed,
Esteric c = o at 1720 cm-' (1730 cm-' for p-nitrophenyl methacrylate), 1
640cm-' to C=C11240cm-■ and 116
Characteristic absorption of C-0-C (ester and ether) was shown at 0 cm'''1, and absorption of epoxy groups around 910 eel'''1 completely disappeared.
また、生成物の粘度は約200ボイズであった。Further, the viscosity of the product was about 200 voids.
λ−1
2,4−ジクロロフェニルメタクリラート23.139
(0,1モル)とエピコート82817.83y(エポ
キシ基として0.1モル)の混合物にTBABl、64
f(0,005モル)を加え、少flk(0,01g>
のMQの存在下、120℃で8時間反応を行なった0反
応率をエポキシ当量より求めた所、99.4モル%であ
った。得られた生成物の分子Jl(GPCによる)は約
600であった。λ-1 2,4-dichlorophenyl methacrylate 23.139
(0.1 mol) and Epicote 82817.83y (0.1 mol as epoxy group),
Add f (0,005 mol) and add a small amount of flk (0,01 g>
The reaction was carried out at 120° C. for 8 hours in the presence of MQ, and the zero reaction rate was determined from the epoxy equivalent and was 99.4 mol%. The molecular Jl (according to GPC) of the product obtained was approximately 600.
得られた生成物についてIR分析を行なうと、3300
c+*−’に一〇Hに基づく吸収はほとんど見られず、
1720cm−’番こエステル性C=O11640cm
−’にC=C11240cm−’及び1160cm−’
にC−Q−c(エステル性及びエーテル性)の特性吸収
を示し、910ef’付近でのエポキシ基の吸収は完全
に消失していた。When the obtained product was subjected to IR analysis, it was found that 3300
Almost no absorption based on 10H is seen in c++-',
1720cm-'Number ester C=O11640cm
-' to C=C11240cm-' and 1160cm-'
showed a characteristic absorption of C-Q-c (ester and ether), and the absorption of epoxy groups around 910ef' completely disappeared.
フェニルメタクリラート16.18y(0,1モル)と
エピコート828の17.83g(エポキシ基として0
.1モル)の混合物にTBABl、64y(0,005
モル)と少量(0,011F)+7)M Qを加えて1
20℃で8時間反応させた6反応率をエポキシ当量より
求めた所、94.8モル%であった。16.18y (0.1 mol) of phenyl methacrylate and 17.83g of Epicote 828 (0 as epoxy group)
.. 1 mol) of TBABl, 64y (0,005
mole) and a small amount (0,011F) + 7)M Q and add 1
The reaction rate after 8 hours of reaction at 20°C was determined from the epoxy equivalent and was 94.8 mol%.
得られた生成物の平均分子量(G P Cにょる)は約
560であった。The average molecular weight (GPC) of the obtained product was about 560.
得られた生成物についてIR分析を行なうと、3300
cm−’に一〇Hに基づく吸収はほとんど見られず、1
720e+s−’にエステル性c=o、1640c+@
−’にc=c、1240cm−’及び1160cm−’
Gel: C−0−C(1スプル性及びエーテル性)
の特性吸収を示し、910cm−’付近でのエポキシ基
の吸収は完全に消失していた。When the obtained product was subjected to IR analysis, it was found that 3300
There is almost no absorption based on 10H in cm-', and 1
720e+s-' with ester c=o, 1640c+@
-' c=c, 1240cm-' and 1160cm-'
Gel: C-0-C (1 sprue property and ether property)
It showed a characteristic absorption of 910 cm-', and the absorption of epoxy groups around 910 cm-' completely disappeared.
匹−」L
p−メトキシフェニルメタクリラート19.12g(0
、1モル)とエピコート828の17.83g(エポキ
シ基として0.1モル)の混き物にTBABl 、64
#(0,005−11−ル)とMQo、01yを加え
、120℃で10時間反応させた0反応率をエポキシ当
量より求めた所、91.9モル%であった。L p-methoxyphenyl methacrylate 19.12 g (0
, 1 mol) and 17.83 g (0.1 mol as epoxy group) of Epicote 828 were mixed with TBABl, 64
#(0,005-11-l), MQo, and 01y were added and reacted at 120° C. for 10 hours. The zero reaction rate was determined from the epoxy equivalent and was 91.9 mol %.
得られた生成物の分子11(GPCにょる)は約600
であった。Molecule 11 of the product obtained (GPC) is approximately 600
Met.
得られた生成物についてIR分析を行なうと、3300
c細−に−OHに基づく弱い吸収が見られ、1720e
請−’にエステル性c=o、164’Oc+*−’にC
=C51230cm−’及び1180cm−’にc−o
−cの特性吸収を示し、910e@−’付近でのエポキ
シ基の吸収はほとんど消失していた。When the obtained product was subjected to IR analysis, it was found that 3300
Weak absorption based on -OH is seen in the c-fine, and 1720e
Ester c=o for 164'Oc+*-', C for 164'Oc+*-'
=C51230cm-' and 1180cm-'co
-c characteristic absorption was exhibited, and the absorption of epoxy groups near 910e@-' almost disappeared.
以上のことから、p−メトキシフェニルメタクリラート
とエピコート828の反応では、エポキシ基とエステル
基の反応に加え、副反応としてエポキシ基と空気中の水
の反応がわずかに起こっているものと推定される。From the above, it is presumed that in the reaction between p-methoxyphenyl methacrylate and Epicote 828, in addition to the reaction between the epoxy group and the ester group, a slight reaction between the epoxy group and water in the air occurs as a side reaction. Ru.
何−」LtE考ヱD−
例1で得られた生成物toyに光増悪剤として0.32
のベンゾインエチルエーテルを加え、ガラス板に0.1
1の厚さで塗布し、500ワツトの超高圧水銀灯で20
cmの距離より1分間光照射を行なった所、THF等の
溶媒に不溶の硬化物を生成した。硬化膜の鉛筆硬度は2
H〜3Hであった。0.32 as a photo-enhancing agent to the product toy obtained in Example 1.
of benzoin ethyl ether and 0.1
Coat with a thickness of 1 and 20 cm with a 500 watt ultra-high pressure mercury lamp.
When light was irradiated for 1 minute from a distance of cm, a cured product was produced that was insoluble in solvents such as THF. The pencil hardness of the cured film is 2
It was H to 3H.
また、塗膜の吸水率(重量%)は常温24時間浸漬で0
.07ffi量%であった。In addition, the water absorption rate (weight %) of the coating film is 0 when immersed for 24 hours at room temperature.
.. It was 07ffi amount%.
九−[」Jjし
17.8yのエピコート828にアクリル酸7.4g(
0,1モル)並びに同−ff1ffiのテトラブチルア
ンモニウムプロミド、ヒドロキノンモノメチルエーテル
を添加し、120”Cで3時間反応させた。7.4 g of acrylic acid (
0.1 mol), tetrabutylammonium bromide and hydroquinone monomethyl ether of the same ff1ffi were added, and the mixture was reacted at 120"C for 3 hours.
得られた樹脂はシラツブ状で塗装不可能であったので、
51Fの酢酸エチルを加えて溶液とした後、0.33の
ベンゾインエチルエーテルを加え、ガラス板上に0.1
5mmの厚さに塗布し、室温で1時間、80℃で30分
間放置して溶剤を揮発させ、次に例5(参考例)と同一
条件下で光硬化させた。The resulting resin was sloppy and unpaintable, so
Add 51F ethyl acetate to make a solution, add 0.33F benzoin ethyl ether, and place on a glass plate with 0.1F ethyl acetate.
It was applied to a thickness of 5 mm, left at room temperature for 1 hour and at 80° C. for 30 minutes to evaporate the solvent, and then photocured under the same conditions as in Example 5 (Reference Example).
塗膜の鉛筆硬度は2Hと大差はないが、吸水率は0.6
重1%を示した。The pencil hardness of the paint film is not much different from 2H, but the water absorption rate is 0.6
The weight was 1%.
九−L」I」u
例3で得られた樹脂にスチレン16gを添加し、均一に
溶解した後、過酸化ベンゾイル粉末0.3#を添加し、
溶解した。9-L"I"u 16g of styrene was added to the resin obtained in Example 3, and after uniformly dissolving, 0.3# of benzoyl peroxide powder was added,
Dissolved.
得られた混合物を内径18snの試験管に移し、初め8
0℃で2時間、次いで120℃で2時間加熱して硬化さ
せた。The resulting mixture was transferred to a test tube with an inner diameter of 18 sn, and initially
It was cured by heating at 0°C for 2 hours and then at 120°C for 2 hours.
得られた硬化樹脂の硬度はロックウェル間スケールで1
10であり1、ガラス転移温度は139℃であり、80
℃の10%苛性ソーダ溶液へ1000時間で浸漬後も外
観変化が認められなかった:
[発明の効果]
本発明アクリロイル基及び/またはメタクリロイル基含
有化合物は硬化剤として有機過酸化物のみならず、光増
悪剤を使用する場合にも硬化させることができ、また、
非常に低い吸水率をもつ硬化物を得ることができる。The hardness of the obtained cured resin is 1 on the Rockwell scale.
10 and 1, the glass transition temperature is 139°C, and 80
No change in appearance was observed even after 1000 hours of immersion in a 10% caustic soda solution at a temperature of It can also be hardened when using exacerbants, and
A cured product with very low water absorption can be obtained.
Claims (1)
酸素原子または硫黄原子であり、Zは ▲数式、化学式、表等があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
からな る群より選択された基で、ここでXは水素原子、アルキ
ル基、ハロゲン原子、ニトロ基、メトキシ基で、nは1
〜5の整数である]に、エポキシ樹脂を付加反応させる
ことからなる、一般式 ▲数式、化学式、表等があります▼ (式中、R_1、Y及びZは上述と同意義をもち、R_
2はエポキシ残基である)で表されるアクリロイル基及
び/またはメタクリロイル基含有化合物の製造方法。[Claims] General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R_1 is a hydrogen atom or a methyl group, Y is an oxygen atom or sulfur atom, Z is ▲ Numerical formula, chemical formula, table, etc. There are ▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
, ▲There are mathematical formulas, chemical formulas, tables, etc.▼,▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
a group selected from the group consisting of, where X is a hydrogen atom, an alkyl group, a halogen atom, a nitro group, a methoxy group, and n is 1
There are general formulas ▲mathematical formulas, chemical formulas, tables, etc.▼ (where R_1, Y and Z have the same meanings as above, and R_
2 is an epoxy residue).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4848686A JPS62207241A (en) | 1986-03-07 | 1986-03-07 | Production of acryloyl group-and/or methyacryloyl group-containing compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4848686A JPS62207241A (en) | 1986-03-07 | 1986-03-07 | Production of acryloyl group-and/or methyacryloyl group-containing compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62207241A true JPS62207241A (en) | 1987-09-11 |
JPH0334772B2 JPH0334772B2 (en) | 1991-05-23 |
Family
ID=12804713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4848686A Granted JPS62207241A (en) | 1986-03-07 | 1986-03-07 | Production of acryloyl group-and/or methyacryloyl group-containing compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62207241A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004015159A2 (en) | 2002-08-02 | 2004-02-19 | Koninklijke Philips Electronics N.V. | Wear-resistant stainless cutting element of an electric shaver, electric shaver, and method of producing such a cutting element |
WO2007074781A1 (en) * | 2005-12-27 | 2007-07-05 | Mitsui Chemicals, Inc. | Sealing material for liquid crystals and process for production of liquid crystal panels with the same |
-
1986
- 1986-03-07 JP JP4848686A patent/JPS62207241A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004015159A2 (en) | 2002-08-02 | 2004-02-19 | Koninklijke Philips Electronics N.V. | Wear-resistant stainless cutting element of an electric shaver, electric shaver, and method of producing such a cutting element |
WO2007074781A1 (en) * | 2005-12-27 | 2007-07-05 | Mitsui Chemicals, Inc. | Sealing material for liquid crystals and process for production of liquid crystal panels with the same |
KR100980546B1 (en) * | 2005-12-27 | 2010-09-06 | 미쓰이 가가쿠 가부시키가이샤 | Sealing material for liquid crystals and process for production of liquid crystal panels with the same |
JP5032340B2 (en) * | 2005-12-27 | 2012-09-26 | 三井化学株式会社 | Liquid crystal sealing agent and liquid crystal panel manufacturing method using the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0334772B2 (en) | 1991-05-23 |
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