JPS62203049A - Method for measuring article to be measured with x-rays in non-destructive state - Google Patents
Method for measuring article to be measured with x-rays in non-destructive stateInfo
- Publication number
- JPS62203049A JPS62203049A JP61045675A JP4567586A JPS62203049A JP S62203049 A JPS62203049 A JP S62203049A JP 61045675 A JP61045675 A JP 61045675A JP 4567586 A JP4567586 A JP 4567586A JP S62203049 A JPS62203049 A JP S62203049A
- Authority
- JP
- Japan
- Prior art keywords
- measured
- rays
- ray
- article
- passed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 230000001066 destructive effect Effects 0.000 title claims description 5
- 238000005259 measurement Methods 0.000 claims abstract description 13
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000000691 measurement method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000005373 porous glass Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005162 X-ray Laue diffraction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
r産業上の利用分野1
本発明はX線を利用した非破壊測定手段により被測定物
の組成、厚さなどを分析、測定する方法に関する。DETAILED DESCRIPTION OF THE INVENTION r Industrial Field of Application 1 The present invention relates to a method for analyzing and measuring the composition, thickness, etc. of an object to be measured by non-destructive measurement means using X-rays.
「従来の技術に
つの構成元素からなる不通IJJな物体の組成濃度、組
成分布、厚さ等をX線照射により非破壊的に測定すると
き、二の単色X線を用い、被測定物の内部を透過したX
線量を測定する必要がある。``When measuring the composition concentration, composition distribution, thickness, etc. of an impenetrable object consisting of two constituent elements non-destructively using X-ray irradiation, two monochromatic X-rays are used to measure the inside of the object to be measured. X passed through
It is necessary to measure the dose.
この場合、X線源から出射された白色X@を単色X線に
するのが一般であるが、その手段としては、LiF、G
eなどの単結晶を用い、所定のX@をラウェ条件、ブラ
ッグ条件にて回折するのが有力である。In this case, it is common to convert the white X@ emitted from the X-ray source into monochromatic X-rays, but LiF, G
It is effective to use a single crystal such as e and diffract a predetermined X@ under Laue conditions and Bragg conditions.
一方、半導体検出器により白色X線をエネルギごとに分
けて測定する方法もあり、これは単結晶を用いるのと等
価な方法である。On the other hand, there is also a method of measuring white X-rays by dividing them into different energies using a semiconductor detector, which is equivalent to using a single crystal.
「発明が解決しようとする問題点j
上述した前者の測定方法は、単結晶を秒単位の高精度の
角度でセットするものであり、一本のX線ビームをその
単結晶により回折する。``Problems to be Solved by the Invention j'' In the former measurement method described above, a single crystal is set at an angle with high precision on the order of seconds, and a single X-ray beam is diffracted by the single crystal.
この場合、X線源からのX線は30°の角度で立体化で
き、これを具合よくファインビーム状にすれば、被測定
物の一断面が高速走査できj高速測定が可能となるが、
単結晶な用いる方法の一般として、精密機械等のスペー
スが大きいため、Xliビームを同時に多数回折するこ
とができず、その結果、−木のX線ビームにて被測定物
を走査せざるを(りす、測定時間が長くなる。In this case, the X-rays from the X-ray source can be three-dimensionalized at an angle of 30°, and if this is appropriately shaped into a fine beam, a cross section of the object to be measured can be scanned at high speed, and high-speed measurement is possible.
In general, methods using single crystals require a large space for precision equipment, so it is not possible to diffract multiple Xli beams at the same time, and as a result, the object to be measured must be scanned with an X-ray beam of Otherwise, the measurement time will be longer.
一方、上述した後者の測定方法は、半導体検出器が高価
であり、しかも、検出器自体の長期安定性がないため、
これが実用りのネックとなっている。On the other hand, in the latter measurement method mentioned above, the semiconductor detector is expensive and the detector itself does not have long-term stability.
This is the bottleneck for practical use.
本発明は上記の問題点に鑑み、被測定物の非破壊測定が
簡易かつ高速に行なえる方法を提供しようとするもので
ある。SUMMARY OF THE INVENTION In view of the above-mentioned problems, the present invention aims to provide a method that allows non-destructive measurement of an object to be measured easily and at high speed.
r問題点を解決するための手段J
本発明に係る被測定物の非破壊測定方法は、所期の目的
を達成するため、xmi;tからの白色X線を二種以上
のフィルタに通し、これらフィルタを透過した後のX線
ビームを被測定物の測定対象領域にわたって照射すると
ともにその被測定物を透過したX線強度をX線検出器に
より測定することを特徴とする。Means for Solving Problems J In order to achieve the intended purpose, the non-destructive measurement method of the object to be measured according to the present invention passes white X-rays from xmi;t through two or more types of filters, The method is characterized in that the X-ray beam that has passed through these filters is irradiated over the measurement target area of the object to be measured, and the intensity of the X-rays that have passed through the object is measured by an X-ray detector.
「実 施 例J 以下本発明の実施例につき、図面を参照して説明する。“Implementation Example J Embodiments of the present invention will be described below with reference to the drawings.
第1図において、例えば二組成からなる回転状態の不透
明な被測定物lOを組成を分析するとき、X線源1から
パルス状に出射された白色X線II+、!21 はフィ
ルタ2L、2Hを透過することにより、擬似単色化され
たX!at+z 、 x27 となり、これら擬似単色
X線i+2.!22がコリメータ3を通過した後、被測
定物10の測定対象領域(−断面)に照射される。In FIG. 1, for example, when analyzing the composition of a rotating opaque object to be measured consisting of two compositions, white X-rays II+, ! 21 is a pseudo-monochromatic X! by passing through filters 2L and 2H. at+z, x27, and these pseudo-monochromatic X-rays i+2. ! 22 passes through the collimator 3, it is irradiated onto the measurement target region (-cross section) of the object to be measured 10.
被測定物10を透過した後の各X線ビーム、すなわち各
透過XklAK+3. !23は、コリメータ4により
絞られ、これらのX線量がX線検出器5[,5Hを介し
て測定される。Each X-ray beam after passing through the object to be measured 10, that is, each transmitted XklAK+3. ! 23 is focused by the collimator 4, and the amount of these X-rays is measured via the X-ray detectors 5[, 5H.
かくして測定されたX線ffi (n定データ)は、例
えばフィルタ関数とのコンボリューションを行ない、そ
れを回転角度ごとに重ね合わせて被測定物lOの一断面
の組成分布をみるが、これらの処理はX線検出器5L、
511に接続された図示しないコンピュータの記憶デー
タに基づいて行なわれる。The thus measured X-ray ffi (n-constant data) is convolved with a filter function, for example, and superimposed at each rotation angle to obtain the composition distribution of one cross section of the object to be measured lO. is an X-ray detector 5L,
This is performed based on data stored in a computer (not shown) connected to 511.
コンピュータの記憶データは、被測定物を一定間隔ごと
、かつ、一定時間ごとに駆動し、Xi定走査ることによ
り精密に採取したものである。The data stored in the computer is precisely collected by driving the object to be measured at regular intervals and at regular time intervals and performing constant Xi scanning.
なお、上記において二成分からなる被測定物I0を測定
するとき、第2図のごとく、その被測定物lOの一断面
を二分割してX線照射する場合と、第3図のごとく、そ
の被測定物1Gを上下に分割してx!it照射する場合
とがある。In addition, when measuring the object to be measured I0 consisting of two components in the above, there are two cases where one cross section of the object to be measured I0 is divided into two and irradiated with X-rays as shown in Fig. 3. Divide the object to be measured (1G) into upper and lower parts x! There are cases where it is irradiated.
X線源lとしては、例えばタングステンをターゲットと
する白色x3源が用いられ、その最大電圧は150kV
、電流は40mA程度である。As the X-ray source, for example, a white x3 source targeting tungsten is used, and its maximum voltage is 150 kV.
, the current is about 40 mA.
一方のフィルタ2しとしては、55〜134keVのエ
ネルギを透過させるものが用いられ、他方のフィルタ2
)1としては70〜95keVのエネルギを透過させる
ものが用いられる。One filter 2 is one that transmits energy of 55 to 134 keV, and the other filter 2 is
) 1 is one that transmits energy of 70 to 95 keV.
マルチ型のX線検出器5[,511としては、例えばシ
ンチレーション管が用いられる。As the multi-type X-ray detector 5[, 511, for example, a scintillation tube is used.
L述した本発明方法では、X線ビームを一方向から被測
定物lOに向けて照射するので、軸対称の回転せる被測
定物lO1例えばVAD法により作製される5i02−
Ge02系の多孔質ガラス母材を測定するのに都合よく
、その被測定物10をオンライン測定できるとともに、
X線源1.X線検出器5し、511などを移動させるこ
ともない。In the method of the present invention described above, since the X-ray beam is irradiated from one direction toward the object to be measured 1O1, the axially symmetrical rotating object 1O1, for example, 5i02-
It is convenient for measuring the Ge02-based porous glass base material, and the object to be measured 10 can be measured online.
X-ray source 1. There is no need to move the X-ray detector 5, 511, etc.
この際のX線源lとして強度の大きいものを用いれば、
上記多孔質ガラス母材の測定がより高速化でき、第2図
のごとく、シンチレーション管からなるX線検出器5[
,5■を多数並列しておけば、上記オンライン測定がよ
り合理的に行なえる。If a high-intensity X-ray source is used at this time,
The measurement of the porous glass base material can be made faster, and as shown in Fig. 2, the X-ray detector 5 [
, 5) in parallel, the online measurement described above can be performed more rationally.
回転対称でない被測定物10の一断面を測定する場合、
その被測定物lOに向けて多方向からX線照射し、その
際の測定状態を重ね合わせればよい。When measuring a cross section of the object to be measured 10 that is not rotationally symmetrical,
What is necessary is to irradiate the object to be measured IO with X-rays from multiple directions and superimpose the measurement states at that time.
r発明の効果1
以上説明した通り、本発明方法によるときは、X線源か
らの白色X線を二種以トのフィルタに通し、これらフィ
ルタを透過した後のX線ビームを被測定物の測定対象領
域にわたって照射するとともにその被測定物を透過した
X線強度をX線検出器により測定するから、x6源、X
線検出器などを移動させる必要がなく、その光学系の取
り扱いが簡便となり、所望の測定が高速かつ短時間に行
なえ、被測定物のオンライン測定が可能となる。Effects of the Invention 1 As explained above, when using the method of the present invention, white X-rays from an X-ray source are passed through two or more types of filters, and the X-ray beam after passing through these filters is directed toward the object to be measured. The x6 source,
There is no need to move the line detector or the like, the optical system is easy to handle, desired measurements can be made quickly and in a short time, and the object to be measured can be measured online.
第1図は本発明方法の測定原理を略示した正面図、第2
図、第3図は同1−の各種具体例を略示したモ面図と正
面図である。
1・・・・・・・X線源
21、211・・・・拳フィルり
3・−・・優・・コリメータ
4 ・愉・拳・・・コリメータ
51、511・・・・・マルチX線検出器lO・・・・
・・・被測定物
!11.に21””白色X線
!+2 、 !22 ・・・擬似単色X線!+3
、 !23 ・・命透過X線代理人 弁理士 斉
藤 義 雄
第1図
第2図
第3wiFigure 1 is a front view schematically showing the measurement principle of the method of the present invention, Figure 2
3 are a top view and a front view schematically showing various specific examples of the same 1-. 1...X-ray source 21, 211...Fist filter 3--Excellent...Collimator 4 ・Enjoyable fist...Collimator 51, 511...Multi X-ray Detector lO...
...Object to be measured! 11. 21"" white X-ray! +2, ! 22...Pseudo monochromatic X-rays! +3
, ! 23... Life-transmitting X-ray agent Patent attorney Yoshio Saito Figure 1 Figure 2 Figure 3 wi
Claims (1)
れらフィルタを透過した後のX線ビームを被測定物の測
定対象領域にわたって照射するとともにその被測定物を
透過したX線強度をX線検出器により測定することを特
徴とするX線による被測定物の非破壊測定方法。White X-rays from an X-ray source are passed through two or more types of filters, and the X-ray beam that has passed through these filters is irradiated over the measurement target area of the object to be measured, and the intensity of the X-rays that have passed through the object is measured. A non-destructive method for measuring an object using X-rays, the method comprising measuring with an X-ray detector.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61045675A JP2599368B2 (en) | 1986-03-03 | 1986-03-03 | Non-destructive measuring method of object under X-ray |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61045675A JP2599368B2 (en) | 1986-03-03 | 1986-03-03 | Non-destructive measuring method of object under X-ray |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62203049A true JPS62203049A (en) | 1987-09-07 |
JP2599368B2 JP2599368B2 (en) | 1997-04-09 |
Family
ID=12725966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61045675A Expired - Lifetime JP2599368B2 (en) | 1986-03-03 | 1986-03-03 | Non-destructive measuring method of object under X-ray |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2599368B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05322804A (en) * | 1992-05-15 | 1993-12-07 | Hitachi Ltd | Method and device for measuring reflected profile of x ray |
JP2009255049A (en) * | 2008-03-27 | 2009-11-05 | Mitsubishi Electric Corp | Sorting apparatus, sorting method and manufacturing method of recyclable resin material |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5317291A (en) * | 1976-07-30 | 1978-02-17 | Univ Leland Stanford Junior | Xxray camera |
-
1986
- 1986-03-03 JP JP61045675A patent/JP2599368B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5317291A (en) * | 1976-07-30 | 1978-02-17 | Univ Leland Stanford Junior | Xxray camera |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05322804A (en) * | 1992-05-15 | 1993-12-07 | Hitachi Ltd | Method and device for measuring reflected profile of x ray |
JP2009255049A (en) * | 2008-03-27 | 2009-11-05 | Mitsubishi Electric Corp | Sorting apparatus, sorting method and manufacturing method of recyclable resin material |
Also Published As
Publication number | Publication date |
---|---|
JP2599368B2 (en) | 1997-04-09 |
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