JPS62201413A - レ−ザ描画装置 - Google Patents
レ−ザ描画装置Info
- Publication number
- JPS62201413A JPS62201413A JP61043758A JP4375886A JPS62201413A JP S62201413 A JPS62201413 A JP S62201413A JP 61043758 A JP61043758 A JP 61043758A JP 4375886 A JP4375886 A JP 4375886A JP S62201413 A JPS62201413 A JP S62201413A
- Authority
- JP
- Japan
- Prior art keywords
- polygon mirror
- sample
- mark
- laser
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 25
- 238000001514 detection method Methods 0.000 claims description 7
- 238000012937 correction Methods 0.000 abstract description 31
- 238000004364 calculation method Methods 0.000 abstract description 7
- 230000001678 irradiating effect Effects 0.000 abstract description 3
- 238000010008 shearing Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 12
- 238000012545 processing Methods 0.000 description 8
- 238000009434 installation Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Mechanical Optical Scanning Systems (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Facsimile Scanning Arrangements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043758A JPS62201413A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043758A JPS62201413A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62201413A true JPS62201413A (ja) | 1987-09-05 |
| JPH0439646B2 JPH0439646B2 (enrdf_load_stackoverflow) | 1992-06-30 |
Family
ID=12672659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61043758A Granted JPS62201413A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62201413A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01235913A (ja) * | 1988-03-16 | 1989-09-20 | Nec Corp | レーザ走査装置 |
| JPH025719U (enrdf_load_stackoverflow) * | 1988-06-22 | 1990-01-16 | ||
| JPH02173609A (ja) * | 1988-12-26 | 1990-07-05 | Nec Corp | レーザ描画装置 |
-
1986
- 1986-02-28 JP JP61043758A patent/JPS62201413A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01235913A (ja) * | 1988-03-16 | 1989-09-20 | Nec Corp | レーザ走査装置 |
| JPH025719U (enrdf_load_stackoverflow) * | 1988-06-22 | 1990-01-16 | ||
| JPH02173609A (ja) * | 1988-12-26 | 1990-07-05 | Nec Corp | レーザ描画装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0439646B2 (enrdf_load_stackoverflow) | 1992-06-30 |
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