JPS62193644A - Reaction tube for heat treatment - Google Patents
Reaction tube for heat treatmentInfo
- Publication number
- JPS62193644A JPS62193644A JP3501486A JP3501486A JPS62193644A JP S62193644 A JPS62193644 A JP S62193644A JP 3501486 A JP3501486 A JP 3501486A JP 3501486 A JP3501486 A JP 3501486A JP S62193644 A JPS62193644 A JP S62193644A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- outside
- reinforcing member
- reaction tube
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 28
- 238000010438 heat treatment Methods 0.000 title claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000012779 reinforcing material Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 6
- 230000002787 reinforcement Effects 0.000 claims description 3
- 230000003014 reinforcing effect Effects 0.000 abstract description 22
- 238000005452 bending Methods 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2415—Tubular reactors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00094—Jackets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00157—Controlling the temperature by means of a burner
Abstract
Description
【発明の詳細な説明】
の
この発明はウェハなどの半導体材料を熱処理するための
反応管に関するものである。DETAILED DESCRIPTION OF THE INVENTION This invention relates to a reaction tube for heat treating semiconductor materials such as wafers.
従」L悲1」1
一般にダイオードやトランジスタなどの半導体を製造す
るには、種々の熱処理が必要であり、なかでも半導体材
料としてのシリコンウェハの酸化処理工程や拡散処理工
程は極めて重要である。In general, various heat treatments are required to manufacture semiconductors such as diodes and transistors, and among them, oxidation treatment and diffusion treatment of silicon wafers as semiconductor materials are extremely important.
従来、このような熱処理をするために、一般に拡散炉と
呼ばれている電気炉を使用している。電気炉には石英ガ
ラス製の反応管が設けられている。その反応管の外側に
はコイル状の発熱体が設けられている。Conventionally, an electric furnace generally called a diffusion furnace has been used to perform such heat treatment. The electric furnace is equipped with a reaction tube made of quartz glass. A coiled heating element is provided on the outside of the reaction tube.
石英ガラスは1050℃付近で歪を生じ、特に高温で長
時間使用すると、熱変形を起こして、わん曲する。Quartz glass becomes distorted at around 1050° C., and when used particularly at high temperatures for a long period of time, it undergoes thermal deformation and becomes warped.
そのような観点から、特開昭57−35336号発明が
提案された。すなわち、石英ガラス製反応管本体の加熱
部外域を耐熱性セラミック管で囲み、さらにその耐熱性
セラミツり管を石英ガラス保護管で包囲したのである。From this point of view, the invention of JP-A-57-35336 was proposed. That is, the area outside the heating section of the quartz glass reaction tube body was surrounded by a heat-resistant ceramic tube, and the heat-resistant ceramic tube was further surrounded by a quartz glass protection tube.
明が ゛ しようとする。 、−
前述のような熱処理用反応管にあっては、製造が極めて
困難であるばかりでなく、耐熱性セラミック管と石英ガ
ラス製反応管または石英ガラス保護管とは、熱膨張率が
相違しており、高温時に損傷を受ける危険がある。Akira tries to do it. , - Not only is it extremely difficult to manufacture the reaction tube for heat treatment as described above, but the coefficient of thermal expansion is different between the heat-resistant ceramic tube and the quartz glass reaction tube or quartz glass protection tube. There is a risk of damage at high temperatures.
11弘圧左
この発明は前述のような従来技術の欠点を解消して、石
英ガラス製の反応管が損傷を受けがたく、しかも高温状
態で長時間使用しても石英ガラス製反応管が熱変形のた
めに過度にわん曲することのないようにした熱処理用反
応管を提供することを目的としている。11 Pressure Left This invention solves the drawbacks of the prior art as described above, and makes the quartz glass reaction tube less likely to be damaged, and moreover, the quartz glass reaction tube does not heat up even when used for a long time at high temperatures. It is an object of the present invention to provide a reaction tube for heat treatment that is prevented from being excessively bent due to deformation.
l1悲1乱
このような目的を達成するために、この発明は、半導体
材料を内部で熱処理するための石英ガラス製の反応管に
おいて、反応管を内側管と外側管とから構成し、それら
内側管と外側管との間にスパイラルコイル状または網状
の補強材を介在させたことを特徴とJる熱処理用反応管
を要旨としている。In order to achieve such an object, the present invention provides a reaction tube made of quartz glass for internally heat-treating semiconductor materials, in which the reaction tube is composed of an inner tube and an outer tube, and the inner tube is The gist of this invention is a reaction tube for heat treatment characterized by having a spiral coil or mesh reinforcing material interposed between the tube and the outer tube.
円 1、を ンするだめの
この発明にあっては、石英ガラス製の反応管を外側管と
内側管とに分け、しかもそれらの外側管と内側管との間
にスパイラルコイル状または網状の補強部材を介在させ
る。あるいは、スパイラルコイル状または網状の補強部
材を介在させて、外側管と内側管の一部または全部を溶
着させる。特にそのような補強材をWまたはMoで構成
すると極めて顕著な効果が得られる。In this invention, which is intended to include circle 1, a reaction tube made of quartz glass is divided into an outer tube and an inner tube, and a spiral coil or net reinforcement is provided between the outer tube and the inner tube. Interpose a member. Alternatively, a part or all of the outer tube and the inner tube are welded by interposing a reinforcing member in the form of a spiral coil or a mesh. In particular, when such a reinforcing material is made of W or Mo, extremely remarkable effects can be obtained.
ウェハなどの半導体材料を熱処理する際に、高温で長時
間使用したとしても、石英ガラス製の石英管が熱変形を
起こして大きくわん曲しようとしても、スパイラルコイ
ル状または網状の補強部材が存在しているので、それに
より支持されて補強されているため、過度の変形現象が
発生しない。When heat-treating semiconductor materials such as wafers, even if the quartz tube made of quartz glass is thermally deformed and bends significantly even if it is used for a long time at high temperatures, there is a spiral coil-shaped or net-shaped reinforcing member. Because it is supported and reinforced, excessive deformation does not occur.
しかも、補強部材はスパイラルコイル状または網状であ
り、外側管と内側管との間に相当なスペースを設けてお
くと、補強部材と反応管の内側管と外側管との間に熱膨
張差があったとしも、それは十分に吸収される。Moreover, the reinforcing member is in the form of a spiral coil or a mesh, and if a considerable space is provided between the outer tube and the inner tube, the difference in thermal expansion between the reinforcing member and the inner and outer tubes of the reaction tube will be reduced. Even if there is, it will be fully absorbed.
友1九
まず第1図に示すように、石英ガラス製の反応管のうち
、内側に存在する内側管1を準備する。Friend 19 First, as shown in FIG. 1, an inner tube 1 located inside a reaction tube made of quartz glass is prepared.
次に第2図に示すように内側管1の外側に補強部材1を
スパイラルコイル状に巻く。あるいは、補強部材を内側
管1の表面に網状に取り付ける。Next, as shown in FIG. 2, the reinforcing member 1 is wound around the outside of the inner tube 1 in the form of a spiral coil. Alternatively, the reinforcing member is attached to the surface of the inner tube 1 in a net-like manner.
続いて、第3図に示すJ:うに、石英ガラス−5=
製の反応管の外側を構成する外側管3を補強部材1の外
側に設定する。その際、内側管1と外側管3とを所定の
対応位置に設定し、それらの内側管1と外側管3との間
に補強部材2が介在されるようにする。Subsequently, an outer tube 3 constituting the outer side of the reaction tube made of quartz glass-5 shown in FIG. 3 is set on the outer side of the reinforcing member 1. At this time, the inner tube 1 and the outer tube 3 are set at predetermined corresponding positions, and the reinforcing member 2 is interposed between the inner tube 1 and the outer tube 3.
この時、補強部材2は密接して設けるのではなく、第4
図に示すように、互いに相当なスペース4を設けて配置
するのが望ましい。At this time, the reinforcing members 2 are not provided closely together, but rather
As shown in the figure, they are preferably arranged with a considerable spacing 4 from each other.
補強部材2がスパイラルコイル形状であろうと網状であ
ろうと、隣接する補強部材2があまり近接しないほうが
よい。Regardless of whether the reinforcing members 2 have a spiral coil shape or a net shape, it is better that adjacent reinforcing members 2 are not too close to each other.
最後に、第5図に示すように前述のように組立てた内側
管1と、外側管3と、それらの間の補強部材2とを一緒
に回転させつつ、バーナ5により外側から加熱し、必要
に応じて外側管3と内側管1とを部分的に結合させ、そ
れら外側管3と内側管1とを固定し、それらの間に補強
部材2を介在固定する。ここで= 6 =
第6図に示すように、外側管3と内側管1を補強部材2
を介して溶着し、一体化してもある程度効果があるが、
補強部材2が外側管3おにび外側管1に相対的に少し移
動できるようにしておくのが望ましい。Finally, as shown in FIG. 5, the inner tube 1, the outer tube 3, and the reinforcing member 2 between them, assembled as described above, are heated from the outside with a burner 5 while rotating together. Accordingly, the outer tube 3 and the inner tube 1 are partially connected, the outer tube 3 and the inner tube 1 are fixed, and the reinforcing member 2 is interposed and fixed between them. Here = 6 = As shown in Figure 6, the outer tube 3 and the inner tube 1 are connected to the reinforcing member 2
Although it is somewhat effective to weld and integrate through
It is desirable that the reinforcing member 2 is allowed to move a little relative to the outer tube 3 and the outer tube 1.
なお、内側管1と外側管3とに対する加熱は、外側から
のみでなく、内側から行なってもよいことは言うまでも
ない。It goes without saying that the inner tube 1 and the outer tube 3 may be heated not only from the outside but also from the inside.
さて、補強部材2の材料について説明すれば、種々の観
点より最も望ましいのはWまたはMoである。その理由
は高温強度が高く、また、熱膨張係数も小さく、石英ガ
ラス中に拡散しにくいからである。Now, to explain the material of the reinforcing member 2, the most desirable material from various viewpoints is W or Mo. The reason for this is that it has high high temperature strength and a small coefficient of thermal expansion, making it difficult to diffuse into quartz glass.
第7図は前述のようにして製造された本発明の熱処理用
反応管の一例を示す全体図である。もちろん、この発明
はこのような形態の反応管に限定されるものではない。FIG. 7 is an overall view showing an example of the heat treatment reaction tube of the present invention manufactured as described above. Of course, the present invention is not limited to this type of reaction tube.
第1図〜第5図はこの発明による熱処理用反応管を製造
する一連の工程を示す説明図、第6.7図はこの発明に
よる熱処理用反応管を示す概略図である。
1、、、、、、、、内側管
2、、、、、、、、補強部材
3、、、、、、、、外側部材
4、、、、、、、、スペース
5、、、、、、、、バーナ
第1図
第2図
第3図
第3A図
第4図
第5図
←耳「5
第6図1 to 5 are explanatory diagrams showing a series of steps for manufacturing a heat treatment reaction tube according to the present invention, and FIGS. 6 and 7 are schematic diagrams showing a heat treatment reaction tube according to the present invention. 1, Inner pipe 2, Reinforcement member 3, Outer member 4, Space 5, ,, Burner Fig. 1 Fig. 2 Fig. 3 Fig. 3 A Fig. 4 Fig. 5 ← Ear "5" Fig. 6
Claims (2)
製の反応管において、反応管を内側管と外側管とから構
成し、それら内側管と外側管との間にスパイラルコイル
状または網状の補強材を介在させたことを特徴とする熱
処理用反応管。(1) In a reaction tube made of quartz glass for internally heat treating semiconductor materials, the reaction tube is composed of an inner tube and an outer tube, and a spiral coil or net reinforcement is provided between the inner tube and the outer tube. A reaction tube for heat treatment characterized by having a material interposed therein.
求の範囲第1項に記載の熱処理用反応管。(2) The reaction tube for heat treatment according to claim 1, wherein the reinforcing material is made of Mo or W.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3501486A JPS62193644A (en) | 1986-02-21 | 1986-02-21 | Reaction tube for heat treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3501486A JPS62193644A (en) | 1986-02-21 | 1986-02-21 | Reaction tube for heat treatment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62193644A true JPS62193644A (en) | 1987-08-25 |
JPH0571293B2 JPH0571293B2 (en) | 1993-10-06 |
Family
ID=12430215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3501486A Granted JPS62193644A (en) | 1986-02-21 | 1986-02-21 | Reaction tube for heat treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62193644A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5194401A (en) * | 1989-04-18 | 1993-03-16 | Applied Materials, Inc. | Thermally processing semiconductor wafers at non-ambient pressures |
-
1986
- 1986-02-21 JP JP3501486A patent/JPS62193644A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5194401A (en) * | 1989-04-18 | 1993-03-16 | Applied Materials, Inc. | Thermally processing semiconductor wafers at non-ambient pressures |
Also Published As
Publication number | Publication date |
---|---|
JPH0571293B2 (en) | 1993-10-06 |
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