JPS62188145U - - Google Patents
Info
- Publication number
- JPS62188145U JPS62188145U JP7778086U JP7778086U JPS62188145U JP S62188145 U JPS62188145 U JP S62188145U JP 7778086 U JP7778086 U JP 7778086U JP 7778086 U JP7778086 U JP 7778086U JP S62188145 U JPS62188145 U JP S62188145U
- Authority
- JP
- Japan
- Prior art keywords
- disk
- wafer
- generating means
- electron generating
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 4
- 239000007943 implant Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000005468 ion implantation Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7778086U JPS62188145U (enExample) | 1986-05-22 | 1986-05-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7778086U JPS62188145U (enExample) | 1986-05-22 | 1986-05-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62188145U true JPS62188145U (enExample) | 1987-11-30 |
Family
ID=30926108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7778086U Pending JPS62188145U (enExample) | 1986-05-22 | 1986-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62188145U (enExample) |
-
1986
- 1986-05-22 JP JP7778086U patent/JPS62188145U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62188145U (enExample) | ||
| JPH034648U (enExample) | ||
| JPH0348854U (enExample) | ||
| JPH0355651U (enExample) | ||
| JPS6384867U (enExample) | ||
| JPS62109445U (enExample) | ||
| JPH0388257U (enExample) | ||
| JPS6321088Y2 (enExample) | ||
| JPS6231860U (enExample) | ||
| JPH046154U (enExample) | ||
| JPH04121650U (ja) | 半導体装置の製造装置 | |
| JPH0463121U (enExample) | ||
| JPS61193700U (enExample) | ||
| JPS61104960U (enExample) | ||
| JPH01154489U (enExample) | ||
| JPS63110566U (enExample) | ||
| JPH0231056U (enExample) | ||
| JPH03103550U (enExample) | ||
| JPH02131258U (enExample) | ||
| JPS51150274A (en) | Manufacturing method of semiconductor device | |
| JPS63109437U (enExample) | ||
| JPS62157968U (enExample) | ||
| JPS53116772A (en) | Measuring method of evenness of implanted ions in ion implantation apparatu s | |
| JPS62184483U (enExample) | ||
| JPS6354246U (enExample) |