JPS6218560A - フオトマスクブランクとフオトマスク - Google Patents

フオトマスクブランクとフオトマスク

Info

Publication number
JPS6218560A
JPS6218560A JP60158886A JP15888685A JPS6218560A JP S6218560 A JPS6218560 A JP S6218560A JP 60158886 A JP60158886 A JP 60158886A JP 15888685 A JP15888685 A JP 15888685A JP S6218560 A JPS6218560 A JP S6218560A
Authority
JP
Japan
Prior art keywords
light
shielding film
film
photomask
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60158886A
Other languages
English (en)
Japanese (ja)
Other versions
JPS646449B2 (fr
Inventor
Hisao Kawai
河合　久雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60158886A priority Critical patent/JPS6218560A/ja
Publication of JPS6218560A publication Critical patent/JPS6218560A/ja
Publication of JPS646449B2 publication Critical patent/JPS646449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60158886A 1985-07-17 1985-07-17 フオトマスクブランクとフオトマスク Granted JPS6218560A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60158886A JPS6218560A (ja) 1985-07-17 1985-07-17 フオトマスクブランクとフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158886A JPS6218560A (ja) 1985-07-17 1985-07-17 フオトマスクブランクとフオトマスク

Publications (2)

Publication Number Publication Date
JPS6218560A true JPS6218560A (ja) 1987-01-27
JPS646449B2 JPS646449B2 (fr) 1989-02-03

Family

ID=15681532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158886A Granted JPS6218560A (ja) 1985-07-17 1985-07-17 フオトマスクブランクとフオトマスク

Country Status (1)

Country Link
JP (1) JPS6218560A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0418557A (ja) * 1990-05-14 1992-01-22 Toppan Printing Co Ltd フォトマスクブランクおよびフォトマスクならびにフォトマスクの製造方法
EP1130466A2 (fr) * 2000-02-16 2001-09-05 Shin-Etsu Chemical Co., Ltd. Précurseur de photomasque, masque et procédé pour sa fabrication
JP2002244274A (ja) * 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020178920A1 (fr) * 2019-03-01 2020-09-10 株式会社ブルックマンテクノロジ Dispositif de capture d'image de distance et procédé de capture d'image de distance utilisant un dispositif de capture d'image de distance

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0418557A (ja) * 1990-05-14 1992-01-22 Toppan Printing Co Ltd フォトマスクブランクおよびフォトマスクならびにフォトマスクの製造方法
EP1130466A2 (fr) * 2000-02-16 2001-09-05 Shin-Etsu Chemical Co., Ltd. Précurseur de photomasque, masque et procédé pour sa fabrication
US6503669B2 (en) 2000-02-16 2003-01-07 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and method of manufacture
EP1130466A3 (fr) * 2000-02-16 2003-05-07 Shin-Etsu Chemical Co., Ltd. Précurseur de photomasque, masque et procédé pour sa fabrication
JP2002244274A (ja) * 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法

Also Published As

Publication number Publication date
JPS646449B2 (fr) 1989-02-03

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