JPS62183034A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS62183034A JPS62183034A JP2368586A JP2368586A JPS62183034A JP S62183034 A JPS62183034 A JP S62183034A JP 2368586 A JP2368586 A JP 2368586A JP 2368586 A JP2368586 A JP 2368586A JP S62183034 A JPS62183034 A JP S62183034A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- recording medium
- magnetic layer
- magnetic recording
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000010410 layer Substances 0.000 claims abstract description 24
- 239000011241 protective layer Substances 0.000 claims abstract description 15
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 8
- 239000000956 alloy Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 150000002894 organic compounds Chemical class 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 abstract description 16
- 238000005260 corrosion Methods 0.000 abstract description 16
- 238000010438 heat treatment Methods 0.000 abstract description 14
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 abstract description 3
- 229910020630 Co Ni Inorganic materials 0.000 abstract description 2
- 229910002440 Co–Ni Inorganic materials 0.000 abstract description 2
- 229920006267 polyester film Polymers 0.000 abstract description 2
- -1 polytetrafluoroethylene Polymers 0.000 abstract description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 abstract description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 230000002463 transducing effect Effects 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は磁気記録媒体を製造する方法に関し、さらに
詳しくは強磁性金属もしくは強磁性金属の合金からなる
磁性層を有する磁気記録媒体の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a magnetic recording medium, and more specifically, a method for manufacturing a magnetic recording medium having a magnetic layer made of a ferromagnetic metal or an alloy of ferromagnetic metals. Regarding.
強磁性金属もしくは強磁性金属の合金からなる磁性層を
有する磁気記録媒体は１通常強磁性金属もしくは強磁性
金属の合金を真空蒸着法等によって基体上に被着するこ
とにより作られ、高密度記録に適した特性を有する反面
、大気中に放置しておくと、水酸化物層が生成したり、
塩化物、硫化物の析出による孔食が発生し、耐食性が十
分ではないため、飽和磁束密度が劣化するなどの欠点が
あった。A magnetic recording medium having a magnetic layer made of a ferromagnetic metal or an alloy of ferromagnetic metals is usually made by depositing a ferromagnetic metal or an alloy of ferromagnetic metals on a substrate by vacuum deposition, etc., and is capable of high-density recording. On the other hand, if left in the atmosphere, a hydroxide layer may form,
Pitting corrosion occurs due to precipitation of chlorides and sulfides, and corrosion resistance is insufficient, resulting in drawbacks such as deterioration of saturation magnetic flux density.
このため、従来においては、磁性層上に種々の有機化合
物の保護層をプラズマ重合法等で形成すること（特開昭
５７−８２２２９号、特開昭５８−６０４２７号、特開
昭５８−８８８２８号、特開昭５８−１０２３３０号）
が行なわれているが、孔食の発生は防止できるものの、
いまだ飽和磁束密度が劣化し、十分な耐食性は得られて
いない。For this reason, in the past, protective layers of various organic compounds were formed on the magnetic layer by plasma polymerization, etc. No., Japanese Patent Publication No. 58-102330)
Although pitting corrosion can be prevented,
The saturation magnetic flux density still deteriorates and sufficient corrosion resistance is not achieved.
この発明は上記従来方法の磁性層の腐食という欠点を解
決し、もって耐食性に優れた磁気記録媒体を得ることが
できる磁気記録媒体の８Ｍ造方法を提供することを目的
とする。An object of the present invention is to provide an 8M manufacturing method for a magnetic recording medium that can overcome the drawback of the conventional method of corrosion of the magnetic layer and thereby produce a magnetic recording medium with excellent corrosion resistance.
この目的を達成するため、この発明においては、基体上
に磁性層を形成し、その磁性層の上に有機化合物からな
る保、ｉＪ？？７を設けることによって、孔食の発生や
水酸化物層の生成を防ＩＩ：、でき、シフ′１）も保護
層を１没けたのちに加熱処理を行ない、この加熱処理に
よって磁性層の表面が酸化され、耐食性の優れた酸化物
が形成される。In order to achieve this object, in the present invention, a magnetic layer is formed on a substrate, and a magnetic layer made of an organic compound is formed on the magnetic layer. ? By providing 7, it is possible to prevent the occurrence of pitting corrosion and the formation of a hydroxide layer. Schiff'1) also performs heat treatment after removing the protective layer, and this heat treatment improves the surface of the magnetic layer. is oxidized to form an oxide with excellent corrosion resistance.
実施例１
）１さ１０７／Ｉｎのポリエステルフィルムからなる基
体ター真空蒸着装置に装填し＝、 Ｉ Ｘｌ０−５Ｔ
ｏｒｒの真空下でＣｏ−Ｎｉ合金（重せ比８０ ： ２
０）を加熱蒸発させ、ノ、（体上に厚さ１５００人のＣ
ｏ−Ｎｉからなる磁性層を形成した。つぎに、これをプ
ラズマ処理装置に装填し、テトラメチルシランの七ツマ
ーガスを１０１０５ｅの流欲で導入し、ガス圧力を０．
０ＩＴｏｒｒに設定したのち、２００Ｗの高周波電力を
印加してプラズマ重合し、厚さ１５０人の保護層を形成
した。ついで、直ちに６０°Ｃ１１０％ＲＨの雰囲気内
に１２０時間静ｉｉｔ Ｌ／て加熱処理を行なった。Example 1) A substrate made of a polyester film with a diameter of 107/In was loaded into a vacuum evaporation apparatus.
Co-Ni alloy (overlapping ratio 80:2
0) is heated to evaporate,
A magnetic layer made of o-Ni was formed. Next, this was loaded into a plasma processing apparatus, and a 7-mer gas of tetramethylsilane was introduced at a flow rate of 10105e, and the gas pressure was set to 0.
After setting the temperature to 0 I Torr, high frequency power of 200 W was applied to perform plasma polymerization to form a protective layer with a thickness of 150 mm. Immediately thereafter, heat treatment was performed in an atmosphere of 60° C. and 110% RH for 120 hours.
実施例２
実施例１のプラズマ重合におけるテトラメチルシランの
モノマーガスに換えて、エチレンのモノマーガスを用い
た。それ以外は実施例１と同様である。Example 2 In place of the tetramethylsilane monomer gas in the plasma polymerization of Example 1, ethylene monomer gas was used. The rest is the same as in Example 1.
実施例３
実施例１のプラズマ重合に換えて、ポリテトラフルオロ
エチレンのスパッタリングを、Ａｒガス圧を０．０２Ｔ
ｏｒｒに設定し、３００Ｗの高周波電力を印加して行な
うことにより、２００人の保護層を形成した。それ以外
は実施例１と同様である。Example 3 Instead of plasma polymerization in Example 1, sputtering of polytetrafluoroethylene was performed at an Ar gas pressure of 0.02T.
A protective layer was formed for 200 people by applying a high frequency power of 300 W and setting the temperature to 0. The rest is the same as in Example 1.
比較例１〜３
実施例１〜３において、加熱処理を省いた。それ以外は
実施例１〜３と同様である。Comparative Examples 1 to 3 In Examples 1 to 3, the heat treatment was omitted. The rest is the same as Examples 1 to 3.
比較例４
実施例１において、保護層の形成を省いた。それ以外は
実施例１と同様である。Comparative Example 4 In Example 1, the formation of the protective layer was omitted. The rest is the same as in Example 1.
比較例５
実施例１において、保ｉ層の形成および加熱処理を省い
た。それ以外は実施例１と同様である。Comparative Example 5 In Example 1, the formation of the i-retaining layer and the heat treatment were omitted. The rest is the same as in Example 1.
表は各実施例および各比較例で得られた磁気テープを６
０℃、９０％ＲＨの雰囲気下に７日間静置して飽和磁束
密度を測定し、静置前の磁気テープの飽和密度を１００
％としてこれと比較した値でその劣化率を調べた結果で
ある。The table shows 6 magnetic tapes obtained in each example and each comparative example.
The saturation magnetic flux density of the magnetic tape was measured by leaving it standing in an atmosphere of 0°C and 90% RH for 7 days, and the saturation density of the magnetic tape before standing was 100
This is the result of investigating the deterioration rate by comparing the value as %.
表
この表から明らかなように、この発明で得られた磁気テ
ープ（実施例１〜３）はいずれも比較例１〜５で得られ
た磁気テープに比べて飽和磁束密度の劣化率が低い。Table As is clear from this table, all of the magnetic tapes obtained in the present invention (Examples 1 to 3) have a lower rate of deterioration in saturation magnetic flux density than the magnetic tapes obtained in Comparative Examples 1 to 5.
また、耐食性試験を行なった磁気テープの表面を肉眼で
Ｎ１６したところ、比較例４，５で得られた磁気テープ
では塩化物、硫化物からなる孔食が認められたが、それ
以外の磁気テープの表面には異常が認められなかった。In addition, when the surface of the magnetic tape subjected to the corrosion resistance test was subjected to N16 with the naked eye, pitting corrosion consisting of chlorides and sulfides was observed in the magnetic tapes obtained in Comparative Examples 4 and 5, but in other magnetic tapes. No abnormality was observed on the surface.
なお、有機化合物からなる保護層の形成法としては、プ
ラズマ重合法、スパッタリング法の他にイオンブレーテ
ィング法等が好ましく、特に高度に架橋したものが好ま
しい。また、加熱処理は主に大気中で行なわれ、加熱温
度が低すぎると磁性層を酸化することができず、一方加
熱温度が高すぎると基体の変形等が生ずるので、加熱温
度は５０〜８０℃が好ましく、さらに加熱時間は８０時
間以上が好ましく、１００〜１５０時間がより好ましい
。また、有機化合物からなる保護層の形成に用いる物質
としては、ケイ素系、炭化水素系、フッ素系のものを用
いることができる。また、保護層の厚さが薄すぎると、
磁性層を保護することができず、一方保護層の厚さが厚
すぎると、読み出し、書き込み時の損失が大きくなるの
で、保護層の厚さは２０〜１０００人とするのがよい。In addition, as a method for forming the protective layer made of an organic compound, in addition to a plasma polymerization method and a sputtering method, an ion blasting method and the like are preferable, and a highly crosslinked one is particularly preferable. In addition, heat treatment is mainly carried out in the atmosphere, and if the heating temperature is too low, the magnetic layer cannot be oxidized, while if the heating temperature is too high, deformation of the substrate will occur, so the heating temperature should be 50 to 80℃. C., and the heating time is preferably 80 hours or more, more preferably 100 to 150 hours. Furthermore, as the substance used to form the protective layer made of an organic compound, silicon-based, hydrocarbon-based, or fluorine-based substances can be used. Also, if the thickness of the protective layer is too thin,
If the magnetic layer cannot be protected and the protective layer is too thick, loss during reading and writing will increase, so the thickness of the protective layer is preferably 20 to 1000 layers.
以上説明したように、この発明においては、磁性層の上
に有機化合物からなる保護層を形成するので、孔食の発
生や水酸化物層の生成を防止でき。As explained above, in the present invention, since a protective layer made of an organic compound is formed on the magnetic layer, occurrence of pitting corrosion and formation of a hydroxide layer can be prevented.
しかも保護層を設けたのちに加熱処理を行なうから、磁
性層の表面が酸化され、耐食性の優れた酸化物が形成さ
れるので、耐食性に優れ、電磁変換特性の安定した磁気
記録媒体を得ることが可能である。このように、この発
明の効果は顕著である。Moreover, since heat treatment is performed after forming the protective layer, the surface of the magnetic layer is oxidized and an oxide with excellent corrosion resistance is formed, making it possible to obtain a magnetic recording medium with excellent corrosion resistance and stable electromagnetic conversion characteristics. is possible. As described above, the effects of this invention are remarkable.
Claims (1)
磁性層を形成し、その磁性層の上に有機化合物からなる
保護層を設けたのち、加熱処理することを特徴とする磁
気記録媒体の製造方法。Manufacture of a magnetic recording medium characterized by forming a magnetic layer made of a ferromagnetic metal or an alloy of ferromagnetic metals on a substrate, providing a protective layer made of an organic compound on the magnetic layer, and then heat-treating. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2368586A JPS62183034A (en) | 1986-02-07 | 1986-02-07 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2368586A JPS62183034A (en) | 1986-02-07 | 1986-02-07 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62183034A true JPS62183034A (en) | 1987-08-11 |
Family
ID=12117300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2368586A Pending JPS62183034A (en) | 1986-02-07 | 1986-02-07 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62183034A (en) |
-
1986
- 1986-02-07 JP JP2368586A patent/JPS62183034A/en active Pending
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