JPS62176501A - Operation of centrifugal film dryer - Google Patents

Operation of centrifugal film dryer

Info

Publication number
JPS62176501A
JPS62176501A JP1871186A JP1871186A JPS62176501A JP S62176501 A JPS62176501 A JP S62176501A JP 1871186 A JP1871186 A JP 1871186A JP 1871186 A JP1871186 A JP 1871186A JP S62176501 A JPS62176501 A JP S62176501A
Authority
JP
Japan
Prior art keywords
waste liquid
water
thin film
dryer
water supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1871186A
Other languages
Japanese (ja)
Other versions
JPH0461681B2 (en
Inventor
Yoshiyasu Suzuki
鈴木 良保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1871186A priority Critical patent/JPS62176501A/en
Publication of JPS62176501A publication Critical patent/JPS62176501A/en
Publication of JPH0461681B2 publication Critical patent/JPH0461681B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/22Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222In rotating vessels; vessels with movable parts
    • B01D1/223In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

PURPOSE:To prevent generation of temperature gradient in the device caused by warming up and to carry out continuous operation, by guiding water or hot water from the inside before guiding waste liquid and starting continuous warming up for a specific period of time. CONSTITUTION:An open/close valve 8 is closed before operation of waste liquid treatment, and water is guided into a dryer 4 from a water supply tube 11. A thin film is formed with supplied water on a heat transfer surface 25 by centrifugal force of a rotor blade 23, and heated up by the heat from a heat jacket 24 to form steam to heat up the inside of dryer uniformly. After said specified warming up, a valve 15 is closed to stop supply of water, and then the valve 8 is opened to supply waste liquid 2 into dryer to carry out a continuous waste liquid treatment operation. By such warming up from the inside, temperature difference is not generated between the outer body and inner main shaft, and a specific clearance (a clearance between the inner circumference of outer body and the rotor blade of shaft) is maintained.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は例えば原子力発電設備から排出される放射性廃
液を薄膜状にして加熱・乾燥し、蒸気成分と非蒸気成分
とに分離処理する遠心薄膜乾燥機の運転方法に関する。
Detailed Description of the Invention [Technical Field of the Invention] The present invention relates to centrifugal thin film drying in which radioactive waste liquid discharged from, for example, nuclear power generation equipment is made into a thin film, heated and dried, and separated into steam and non-steam components. Concerning how to operate the machine.

[発明の技術的背景] 一般に遠心薄膜乾燥機は、供給廃液の性状と処理目的に
応じて決定した供給量と、回転翼を備えた回転軸の回転
数とを一定として運転を行なっている。そして制御装置
としては、まず廃液供給量を一定にするためのもの、装
置の濃度条件を一定にするためのもの、一定濃度の蒸発
残渣を得るため廃液の供給量を制御するもの等積々のも
のがある。
[Technical Background of the Invention] Generally, a centrifugal thin film dryer is operated with a supply amount determined depending on the properties of the supplied waste liquid and the purpose of treatment, and a constant rotation speed of a rotating shaft equipped with rotary blades. There are many types of control devices, including those to keep the amount of waste liquid supplied constant, those to keep the concentration conditions of the device constant, and those to control the amount of waste liquid supplied to obtain a constant concentration of evaporation residue. There is something.

[黄鋼技術の問題点] 上記構成によると、定常運転中の廃液処理については、
種々の運転上の工夫がなされており良好な結果を得てい
るが、これはあくまで定常状態における廃液処理であっ
て、非定常時例えば廃液処理開始時等の場合については
特に工夫がなされていないのが実状であり、わずかに外
部加熱方式により乾−機自身を暖機するだけであった。
[Problems with yellow steel technology] According to the above configuration, regarding waste liquid treatment during steady operation,
Various operational improvements have been made and good results have been obtained, but these are only for waste liquid treatment in a steady state, and no special measures have been taken for unsteady situations, such as when starting waste liquid treatment. In reality, the dryer itself was only slightly warmed up using an external heating method.

ここに外部加熱方式とは、例えば遠心1111乾燥撮の
外胴の加熱ジャケットに加熱蒸気を循環させて外部から
乾燥機を乾燥させるものである。かかる外部加熱方式を
採用した場合には、外胴と内部の主軸との間に温度差が
発生し、該温度差により外胴と主軸の熱変形の度合が異
なるために、所定のクリアランス(外胴の内周面と主軸
の回転翼との隙間)を保持することができず、接触して
しまうような場合もある。またaJ!機直後に廃液処理
を行なった場合には、定常状態となる前に乾燥機駆動用
モータ電流が過負荷となるようなこともある。したがっ
て従来は運転開始後に装置を停止させて運転を中断する
といったこともあり、稼働率の向上を図る上で問題があ
った。
The external heating method here refers to, for example, a method in which heated steam is circulated through the heating jacket of the outer body of a centrifugal 1111 dryer to dry the dryer from the outside. When such an external heating method is adopted, a temperature difference occurs between the outer shell and the inner main shaft, and this temperature difference causes a difference in the degree of thermal deformation between the outer shell and the main shaft. In some cases, it may not be possible to maintain the gap between the inner peripheral surface of the shell and the rotor of the main shaft, and they may come into contact with each other. Also aJ! If waste liquid treatment is performed immediately after drying, the motor current for driving the dryer may become overloaded before the dryer reaches a steady state. Therefore, in the past, the device had to be stopped and the operation interrupted after the start of operation, which posed a problem in improving the operating rate.

[発明の目的コ 本発明は以上の点に基づいてなされたものでその目的と
するところは、長時間に亘って安定した廃液処理運転を
連続的に行なうことを可能とし、稼働率の向上を図るこ
とが可能な遠心薄膜乾燥機の運転方法を提供することに
ある。
[Purpose of the Invention] The present invention has been made based on the above points, and its purpose is to enable stable waste liquid treatment operation to be carried out continuously over a long period of time, and to improve the operating rate. It is an object of the present invention to provide a method of operating a centrifugal thin film dryer that can achieve the following objectives.

[発明の概要1 すなわち本発明による遠心薄膜乾燥機の運転方法は、筒
体内に回転翼を有する回転軸を配置し、該回転軸を回転
させた状態で筒体内に廃液を導入して筒体内面の伝熱面
に1llllを形成し、加熱・蒸発させて蒸気を排出す
るとともに蒸発残渣を上記回転翼により掻き取る遠心薄
膜乾燥機の運転方法において、廃液を導入して廃液処理
運転を開始する前に水又は温水を導入して所定時間暖機
運転を行なうようにしたことを特徴とするものである。
[Summary of the Invention 1] That is, the method of operating a centrifugal thin film dryer according to the present invention includes disposing a rotating shaft having rotary blades inside a cylinder, and introducing waste liquid into the cylinder while rotating the rotating shaft. In the operating method of a centrifugal thin film dryer, in which 1lll is formed on the heat transfer surface of the surface, heated and evaporated to discharge steam and scrape off the evaporation residue with the rotary blade, waste liquid is introduced and waste liquid treatment operation is started. This is characterized in that water or hot water is first introduced to perform warm-up operation for a predetermined period of time.

つまり廃液処理運転を開始する前に水又は温水を導入し
て、外側だけでなく内側からも加熱して所定時間暖機運
転を行ない、その後廃液処理運転を行なうものである。
That is, before starting the waste liquid treatment operation, water or hot water is introduced and heated not only from the outside but also from the inside to perform warm-up operation for a predetermined time, and then the waste liquid treatment operation is performed.

[発明の実施例] 以下第1図乃至第4図を参照して本発明の第1の実施例
を説明する。第1図は本実施例による遠心薄膜乾燥機の
運転方法を実施するための装置の概略を示す図で、図中
符号1は廃液2を貯溜する貯槽である。この貯槽1には
廃液配管3を介して遠心薄膜乾燥機」−が接続されてい
る。廃液配管3には貯槽2側より廃液ポンプ5、廃液制
御弁6が順次介挿されており、この廃液ポンプ5により
貯槽1内の廃液2を遠心薄膜乾燥機」−内に圧送する。
[Embodiment of the Invention] A first embodiment of the present invention will be described below with reference to FIGS. 1 to 4. FIG. 1 is a diagram schematically showing an apparatus for carrying out the operating method of a centrifugal thin film dryer according to this embodiment, and reference numeral 1 in the figure is a storage tank for storing waste liquid 2. In FIG. A centrifugal thin film dryer is connected to this storage tank 1 via a waste liquid pipe 3. A waste liquid pump 5 and a waste liquid control valve 6 are sequentially inserted into the waste liquid piping 3 from the storage tank 2 side, and the waste liquid pump 5 pumps the waste liquid 2 in the storage tank 1 into the centrifugal thin film dryer.

また上記廃液配管3には廃液流量検出器7および開閉弁
8が介挿されている。上記廃液制御弁6を制御するのは
廃液制御装置9であり、この廃液制御装置9は上記廃液
流量検出器7からの流恐検出信号S7を基に廃液制御弁
6の開度を調節し、それによって遠心薄膜乾燥機A−に
供給される廃液流山を制御する。
Further, a waste liquid flow rate detector 7 and an on-off valve 8 are inserted into the waste liquid pipe 3. A waste liquid control device 9 controls the waste liquid control valve 6, and this waste liquid control device 9 adjusts the opening degree of the waste liquid control valve 6 based on the flow threat detection signal S7 from the waste liquid flow rate detector 7. Thereby, the waste liquid stream fed to the centrifugal membrane dryer A- is controlled.

上記遠心簿膜乾燥Ia4には上記廃液ラインの他に、水
(又は温水)ラインが接続されている。本実施例では水
を供給する場合として説明する。すなわち図中符号11
は給水配管であり、この給水配管11には給水ポンプ1
2、給水制御弁13、給水流量検出器14、開閉弁15
が順次介挿されている。上記給水制御弁13は給水制御
lI装置16により制御される。すなわち給水制m+装
置16は、給水流量検出器14からの検出信号S14に
基づいて給水制御弁13の開度を調節し、それによって
遠心薄膜乾燥機上に供給される給水流山を調節する。ま
た給水配管11と前記廃液配管3とは配管17を介して
接続されており、この配管17には開閉弁18が介挿さ
れている。
In addition to the waste liquid line, a water (or hot water) line is connected to the centrifugal membrane dryer Ia4. In this embodiment, a case will be described in which water is supplied. In other words, reference numeral 11 in the figure
is a water supply pipe, and this water supply pipe 11 has a water supply pump 1.
2, water supply control valve 13, water supply flow rate detector 14, on-off valve 15
are inserted sequentially. The water supply control valve 13 is controlled by a water supply control lI device 16. That is, the water supply control m+ device 16 adjusts the opening degree of the water supply control valve 13 based on the detection signal S14 from the water supply flow rate detector 14, thereby adjusting the flow rate of the water supply supplied onto the centrifugal thin film dryer. Further, the water supply pipe 11 and the waste liquid pipe 3 are connected via a pipe 17, and an on-off valve 18 is inserted into the pipe 17.

次に第2図および第3図を参照して上記遠心薄膜乾燥機
上の構成について説明する。第2図は遠心薄膜乾燥機上
を一部切欠いて示す斜視図であり、また第3図は縦断面
図である。図中符号21は筒体であり、この筒体21内
には回転軸22が収容されている。この回転軸22には
複数の回転翼23が軸方向に等間隔に取着されている。
Next, the configuration of the centrifugal thin film dryer will be described with reference to FIGS. 2 and 3. FIG. 2 is a partially cutaway perspective view of the top of the centrifugal thin film dryer, and FIG. 3 is a longitudinal sectional view. Reference numeral 21 in the figure is a cylindrical body, and a rotating shaft 22 is accommodated within this cylindrical body 21. A plurality of rotary blades 23 are attached to this rotary shaft 22 at equal intervals in the axial direction.

上記筒体21は二重壁構造となっており、加熱ジャケッ
ト24が形成されているとともに、筒体21の内周面は
伝熱面25となっている。上記加熱ジャケット24内に
は加熱蒸気が供給され、外部から筒体21内を加熱する
。上記筒体21の上部には前記廃液ラインからの廃液2
又は給水ラインからの水を内部に導入するための給液ノ
ズル26が接続されている。この給液ノズル26と軸方
向に同一位置の筒体21内には分配環27が配置されて
いる。この分配環27により各給液ノズル26から導入
される廃液2又は水を伝熱面25に沿って均一に流下さ
せる。筒体21の上記給液ノズル26の上方にはベーパ
ー出口28が接続されており、このベーパー出口28を
介して蒸発した廃液2を排出する。一方筒体21の下端
には排出口29が形成されておりこの排出口29を介し
て廃液2の蒸発残渣を排出する。
The cylindrical body 21 has a double-walled structure, has a heating jacket 24 formed therein, and has a heat transfer surface 25 on the inner circumferential surface of the cylindrical body 21 . Heating steam is supplied into the heating jacket 24 to heat the inside of the cylindrical body 21 from the outside. The upper part of the cylindrical body 21 has a waste liquid 2 from the waste liquid line.
Alternatively, a liquid supply nozzle 26 for introducing water from a water supply line into the interior is connected. A distribution ring 27 is arranged within the cylinder 21 at the same position in the axial direction as the liquid supply nozzle 26 . This distribution ring 27 causes the waste liquid 2 or water introduced from each liquid supply nozzle 26 to flow down uniformly along the heat transfer surface 25. A vapor outlet 28 is connected above the liquid supply nozzle 26 of the cylindrical body 21, and the evaporated waste liquid 2 is discharged through the vapor outlet 28. On the other hand, a discharge port 29 is formed at the lower end of the cylindrical body 21, and the evaporation residue of the waste liquid 2 is discharged through the discharge port 29.

次に運転方法について説明する。まず廃液2を遠心薄膜
乾燥機A−内に導入して廃液処理運転を行なう前に、水
を遠心1111乾燥閤A−内に導入して所定時間暖機運
転を行なう。つまり従来は単に外部加熱方式により外部
のみから乾燥機上を加熱して暖機運転を行なっていたの
に対して、本実施例の場合には外部加熱方式に加えて内
部からも乾燥機A−を加熱して暖礪運転を行なうもので
ある。以下詳細に説明する。すなわち開閉弁8を閉弁し
ておき、給水配管11を介して水を供給する。その際開
閉弁18を開弁して、二方向から温水を供給することも
可能である。このようにして供給された水は給液ノズル
26および分配環27を開して分配され、同時に回転1
123の遠心力が作用する結果、伝熱面25に薄膜が形
成される。そして加熱ジャケット24からの熱により加
熱されて蒸発して蒸気となる。これによって遠心薄膜乾
燥m4−内は内部からも一様に加熱される。このときの
給水流量については予め設定しておき、給水制御装置1
6に記憶させておく。給水制御!l装置16は給水流層
検出器14からの給水流量検出信号814を基に給水制
御弁130開度を調整し、設定された給水流山になるよ
うに制御する。その様子を第4図中線図aで示す。尚第
4図は横軸に時間をとり、縦軸に加熱ジャケット24内
の蒸気温度6回転軸22の回転数、給液流量(水又は廃
液)をとって、それらの時間変化を示したものである。
Next, the driving method will be explained. First, before the waste liquid 2 is introduced into the centrifugal thin film dryer A- to perform a waste liquid treatment operation, water is introduced into the centrifugal 1111 dryer A- and warmed up for a predetermined period of time. In other words, in the past, the top of the dryer was heated only from the outside using an external heating method to warm up the dryer, but in this embodiment, in addition to the external heating method, the top of the dryer A- The heating operation is performed by heating the fuel. This will be explained in detail below. That is, the on-off valve 8 is closed and water is supplied via the water supply pipe 11. At that time, it is also possible to open the on-off valve 18 and supply hot water from two directions. The water thus supplied is distributed by opening the liquid supply nozzle 26 and the distribution ring 27, and at the same time
As a result of the centrifugal force 123 acting, a thin film is formed on the heat transfer surface 25. Then, it is heated by the heat from the heating jacket 24 and evaporates into steam. As a result, the inside of the centrifugal thin film drying m4- is uniformly heated from the inside. The water supply flow rate at this time is set in advance, and the water supply control device 1
Let me remember it in 6. Water supply control! The l device 16 adjusts the opening degree of the water supply control valve 130 based on the water supply flow rate detection signal 814 from the water supply flow layer detector 14, and controls the water supply flow rate to a set water flow rate. The situation is shown in the middle diagram a in FIG. In addition, Fig. 4 shows the time change on the horizontal axis and the steam temperature in the heating jacket 24, the rotation speed of the rotation shaft 22, and the flow rate of the liquid supplied (water or waste liquid) on the vertical axis. It is.

このようにして所定時間暖機運転を行なった後、開閉弁
15を閉弁して水の供給を停止する。次に開閉弁8を開
弁して貯槽1内に貯溜されている廃液2を廃液ポンプ5
により遠心薄膜乾燥機A−に供給する。
After performing the warm-up operation for a predetermined time in this manner, the on-off valve 15 is closed to stop the supply of water. Next, the on-off valve 8 is opened and the waste liquid 2 stored in the storage tank 1 is pumped to the waste liquid pump 5.
is fed to the centrifugal thin film dryer A-.

この廃液2の供給は水の供給の場合と同様開閉弁18を
開弁することにより二方向から行なうことができる。遠
心iia乾燥機上に供給された廃液2は給液ノズル26
を介して筒体21内に導入され、分散環27の均一分散
作用および回転1123の遠心力の作用により伝熱面2
5を薄膜状に流下する。
The waste liquid 2 can be supplied from two directions by opening the on-off valve 18 as in the case of water supply. The waste liquid 2 supplied onto the centrifugal IIA dryer is supplied to the liquid supply nozzle 26.
The heat transfer surface 2
5 flows down in a thin film.

その際加熱ジャケット24を介して加熱され蒸発する。At that time, it is heated through the heating jacket 24 and evaporated.

そして蒸気はペーパー排出口28を介して排出され、ま
た伝熱面25に付着した廃液2の蒸発残渣は回転翼23
の掻き取り作用により除去され、スラリ状あるいは粉体
状となって排出口29より排出される。尚廃12の供給
量は廃液2の性状等を考慮して予め設定しておき、廃液
制御装置9に記憶させておく。廃液制御装置9は廃液流
分検出器7からの廃液流量検出信号S7を基に廃液制御
弁6の開度を調整し、予め設定された廃液流量となるよ
うに制御する。この様子を第4図中線図すで示す。以下
廃液処理運転を連続的に行なう。
The steam is then discharged through the paper outlet 28, and the evaporation residue of the waste liquid 2 adhering to the heat transfer surface 25 is removed from the rotary blade 23.
It is removed by the scraping action of , and is discharged from the discharge port 29 in the form of slurry or powder. Note that the supply amount of the waste 12 is set in advance in consideration of the properties of the waste liquid 2, etc., and is stored in the waste liquid control device 9. The waste liquid control device 9 adjusts the opening degree of the waste liquid control valve 6 based on the waste liquid flow rate detection signal S7 from the waste liquid flow rate detector 7, and controls the waste liquid flow rate to be a preset waste liquid flow rate. This situation is shown in the middle diagram of FIG. The waste liquid treatment operation is then carried out continuously.

以上本実施例によると以下のような効果を奏することが
できる。すなわち廃液処理運転を開始する前に遠心薄膜
乾燥m4−内に水を供給して暖機運転を行ない、暖機運
転完了後直ちに廃液処理運転を開始するようにしている
ので、円滑な廃液処理運転を行なうことができる。特に
従来の外部加熱方式のみによる場合と異なり、遠心薄膜
乾燥機上を内側から一様に加熱して暖機運転を行なうよ
うにしているので、暖機運転により温度勾配が発生する
ようなことを効果的に防止することができるとともに、
運転を中断させるようなことも回避することができ、連
続的な運転が可能となり稼働率の向上を図ることができ
る。
According to this embodiment, the following effects can be achieved. That is, before starting the waste liquid treatment operation, water is supplied into the centrifugal thin film dryer m4- to perform warm-up operation, and the waste liquid treatment operation is started immediately after the warm-up operation is completed, so that the waste liquid treatment operation is smooth. can be done. In particular, unlike the conventional external heating method, the top of the centrifugal thin film dryer is uniformly heated from the inside during warm-up operation, which prevents temperature gradients from occurring during warm-up operation. It can be effectively prevented and
It is also possible to avoid interruptions in operation, enabling continuous operation and improving the operating rate.

次に第2の実施例を説明する。尚この第2実施例に使用
する装置は第1の実施例で使用した装置と同じでありそ
の説明は省略する。この第2の実施例は、第5図中線図
Cおよびdで示すように暖機運転終了後、水の供給を漸
次減少させていくと同時に廃液2を徐々に供給し、給水
流量が零になった時点で廃液流量が所定量となるように
して行なうものである。尚第5図は第4図と同様蒸気温
度1回転数、給液流量の時間変化を示した図ある。
Next, a second embodiment will be explained. The apparatus used in this second embodiment is the same as the apparatus used in the first embodiment, and its explanation will be omitted. In this second embodiment, as shown by lines C and d in FIG. 5, after the warm-up operation is completed, the water supply is gradually reduced and at the same time, the waste liquid 2 is gradually supplied, until the water supply flow rate reaches zero. This is done so that the waste liquid flow rate reaches a predetermined amount when the Similarly to FIG. 4, FIG. 5 is a diagram showing changes in steam temperature per revolution and feed liquid flow rate over time.

まず開閉弁18を閉弁させた状態で、水を給水制御弁1
3を介して遠心薄膜乾燥機」−に供給する。
First, with the on-off valve 18 closed, water is supplied to the water supply control valve 1.
3 to a centrifugal thin film dryer.

供給された水は給液ノズル26を介して筒体21内に導
入され、分散環27の均一分配作用および回転1123
の遠心力作用により伝熱面25上を薄膜状に流下する。
The supplied water is introduced into the cylinder 21 through the liquid supply nozzle 26, and the uniform distribution action of the dispersion ring 27 and the rotation 1123
It flows down on the heat transfer surface 25 in the form of a thin film due to the action of centrifugal force.

そして加熱ジャケット24を介して加熱されて蒸発する
。その時の蒸気により遠心i1Ng乾燥機上内は内部か
ら一様に加熱される。
Then, it is heated through the heating jacket 24 and evaporated. The steam generated at this time uniformly heats the inside of the centrifugal i1Ng dryer from the inside.

尚この時の給水流量については予め設定しておき、給水
制御装[16に記憶させておく。給水制御装al16は
、給水流量検出器14からの給水流l検出信号S14を
基に給水制御弁13の開度を調整して、予め設定された
給水流量となるように制御する。次に所定時間暖機運転
を行なった後、給水制御弁13を徐々に閉弁していき給
水流量を漸次減少させていくとともに、廃液2を徐々に
供給していく。そして給水制御弁13が全開となって給
水流量が零とった時点で廃液2の流器を所定流量とする
。この時第5′図から明らかなように給液流量としては
常に一定である。尚廃液流量については廃液2の性状な
どを考慮して設定しておき、廃液制御装置9に記憶させ
ておく。そして廃液制御装置19により廃液制御弁6の
開度を調節することにより目標流量とする。以後廃液処
理運転を連続的に行なう。尚廃液2の処理については前
記第1の実施例と同様であり、その説明は省略する。
Note that the water supply flow rate at this time is set in advance and stored in the water supply control device [16]. The water supply control device al16 adjusts the opening degree of the water supply control valve 13 based on the water supply flow l detection signal S14 from the water supply flow rate detector 14, and controls the water supply flow rate to a preset water flow rate. Next, after a predetermined period of warm-up operation, the water supply control valve 13 is gradually closed, the water supply flow rate is gradually decreased, and the waste liquid 2 is gradually supplied. Then, when the water supply control valve 13 is fully opened and the water supply flow rate reaches zero, the waste liquid 2 flow is set to a predetermined flow rate. At this time, as is clear from FIG. 5', the supply liquid flow rate is always constant. Note that the waste liquid flow rate is set in consideration of the properties of the waste liquid 2, etc., and is stored in the waste liquid control device 9. Then, the opening degree of the waste liquid control valve 6 is adjusted by the waste liquid control device 19 to obtain the target flow rate. Thereafter, waste liquid treatment operation will be carried out continuously. The treatment of the waste liquid 2 is the same as in the first embodiment, and its explanation will be omitted.

以上この第2の実施例によると、前記第1の実施例と同
様の効果を奏することはもとより、より円滑な運転状態
を提供することができる。すなわち仮に水の供給を停止
したのちしばらく時間をおいて廃液2を供給するとすれ
ば、乾燥機A−は常に加熱ジャケット24を介して加熱
されているために乾燥機上の内部がドライな状態になっ
てしまい、そのような状態で廃液2を供給しても安定し
た運転状態を得ることはできないものと予想される。
As described above, according to the second embodiment, it is possible to not only achieve the same effects as the first embodiment, but also to provide a smoother operating state. In other words, if the waste liquid 2 is supplied after a while after the water supply is stopped, the inside of the dryer A- will be in a dry state because the dryer A- is always heated via the heating jacket 24. Therefore, even if the waste liquid 2 is supplied in such a state, it is predicted that a stable operating state cannot be obtained.

前記第1の実施例の場合には、水の供給を完全に停止さ
せた後直ちに廃液2を供給することでかかる問題を回避
しているのである。これに対してこの第2の実施例の場
合には、遠心薄膜乾燥機り内に常に一定の流体(水又は
廃液又は両者の混合液)が供給されており、いわゆる濡
れ性という観点からみると乾燥機上内が常にウェットな
状態にあるので、安定した運転状態を提供することがで
きる。
In the case of the first embodiment, this problem is avoided by supplying the waste liquid 2 immediately after completely stopping the supply of water. On the other hand, in the case of this second embodiment, a constant fluid (water, waste liquid, or a mixture of both) is always supplied into the centrifugal thin film dryer, and from the viewpoint of so-called wettability. Since the inside of the dryer is always in a wet state, stable operating conditions can be provided.

[発明の効果] 以上詳述したように本発明による遠心薄膜乾燥機の運転
方法によると、円滑な廃液処理運転を連続的に行なうこ
とを可能とし、稼働率を向上させることができる等その
効果は大である。
[Effects of the Invention] As detailed above, according to the operating method of a centrifugal thin film dryer according to the present invention, it is possible to perform smooth waste liquid treatment operation continuously, and the operating rate can be improved, etc. is large.

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第4図は本発明の第1の実施例を示す図で、
第1図は遠心11111乾燥機および周辺機器の構成を
示す図、第2図は遠心薄膜乾燥機を一部切欠いて示す斜
視図、第3図は遠心薄膜乾燥機の縦断面図、第4図は蒸
気温度3回転軸の回転数および給液流量の時間変化を示
す図、第5図は第2の実施例の場合の蒸気温度2回転軸
の回転数および給液流量の時間変化を示す図である。 2・・・廃液、3・・・廃液配管、4 ・・・遠心薄膜
乾燥機、11・・・給水配管、21・・・筒体、22・
・・回転軸、23回転翼、25・・・伝熱面。 出願人代理人 弁理士 鈴江武彦 第1TgJ lソ 第2図 第 3図 第4図 第5図
1 to 4 are diagrams showing a first embodiment of the present invention,
Fig. 1 is a diagram showing the configuration of the centrifugal 11111 dryer and peripheral equipment, Fig. 2 is a partially cutaway perspective view of the centrifugal thin film dryer, Fig. 3 is a vertical sectional view of the centrifugal thin film dryer, and Fig. 4 FIG. 5 is a diagram showing changes over time in the rotation speed of the steam temperature 3 rotation shaft and the feed liquid flow rate, and FIG. It is. 2... Waste liquid, 3... Waste liquid piping, 4... Centrifugal thin film dryer, 11... Water supply piping, 21... Cylindrical body, 22...
... Rotating shaft, 23 rotor blade, 25... heat transfer surface. Applicant's Representative Patent Attorney Takehiko Suzue No. 1 TgJ Iso Figure 2 Figure 3 Figure 4 Figure 5

Claims (3)

【特許請求の範囲】[Claims] (1)筒体内に回転翼を有する回転軸を配置し、該回転
軸を回転させた状態で筒体内に廃液を導入して筒体内面
の伝熱面に薄膜を形成し、加熱・蒸発させて蒸気を排出
するとともに蒸発残渣を上記回転翼により掻き取る遠心
薄膜乾燥機の運転方法において、廃液を導入して廃液処
理運転を開始する前に水又は温水を導入して所定時間暖
機運転を行なうようにしたことを特徴とする遠心薄膜乾
燥機の運転方法。
(1) A rotating shaft with rotary blades is placed inside the cylinder, and while the rotating shaft is rotating, waste liquid is introduced into the cylinder to form a thin film on the heat transfer surface of the inner surface of the cylinder, and is heated and evaporated. In the method of operating a centrifugal thin film dryer in which steam is discharged by the rotor and the evaporation residue is scraped off by the rotary blade, water or hot water is introduced and warm-up operation is performed for a predetermined period of time before introducing waste liquid and starting the waste liquid treatment operation. A method of operating a centrifugal thin film dryer, characterized in that:
(2)水又は温水を導入して所定時間暖機運転を行ない
、水又は温水の導入を完全に停止した後廃液を導入して
廃液処理運転を開始するようにしたことを特徴とする特
許請求の範囲第1項記載の遠心薄膜乾燥機の運転方法。
(2) A patent claim characterized in that water or hot water is introduced, warm-up operation is performed for a predetermined period of time, and after the introduction of water or hot water is completely stopped, waste liquid is introduced and waste liquid treatment operation is started. A method of operating a centrifugal thin film dryer according to item 1.
(3)水又は温水を導入して所定時間暖機運転を行ない
、その後水又は温水の導入を漸次減少させると同時に廃
液を徐々に導入して廃液処理運転を開始するようにした
ことを特徴する特許請求の範囲第1項記載の遠心薄膜乾
燥機の運転方法。
(3) Water or hot water is introduced and warm-up operation is performed for a predetermined period of time, and then the introduction of water or hot water is gradually reduced, and at the same time waste liquid is gradually introduced and waste liquid treatment operation is started. A method for operating a centrifugal thin film dryer according to claim 1.
JP1871186A 1986-01-30 1986-01-30 Operation of centrifugal film dryer Granted JPS62176501A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1871186A JPS62176501A (en) 1986-01-30 1986-01-30 Operation of centrifugal film dryer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1871186A JPS62176501A (en) 1986-01-30 1986-01-30 Operation of centrifugal film dryer

Publications (2)

Publication Number Publication Date
JPS62176501A true JPS62176501A (en) 1987-08-03
JPH0461681B2 JPH0461681B2 (en) 1992-10-01

Family

ID=11979236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1871186A Granted JPS62176501A (en) 1986-01-30 1986-01-30 Operation of centrifugal film dryer

Country Status (1)

Country Link
JP (1) JPS62176501A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03131301A (en) * 1989-02-21 1991-06-04 Ishikawajima Harima Heavy Ind Co Ltd Operation of centrifugal membrane dryer
CN103011316A (en) * 2013-01-21 2013-04-03 重庆科技学院 Polluted waste liquid treatment device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5531414A (en) * 1978-08-25 1980-03-05 Hitachi Ltd Concentrator operation control

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5531414A (en) * 1978-08-25 1980-03-05 Hitachi Ltd Concentrator operation control

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03131301A (en) * 1989-02-21 1991-06-04 Ishikawajima Harima Heavy Ind Co Ltd Operation of centrifugal membrane dryer
CN103011316A (en) * 2013-01-21 2013-04-03 重庆科技学院 Polluted waste liquid treatment device

Also Published As

Publication number Publication date
JPH0461681B2 (en) 1992-10-01

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