JPS62175949A - Photomagnetic recording medium protected by compound oxide - Google Patents

Photomagnetic recording medium protected by compound oxide

Info

Publication number
JPS62175949A
JPS62175949A JP23096486A JP23096486A JPS62175949A JP S62175949 A JPS62175949 A JP S62175949A JP 23096486 A JP23096486 A JP 23096486A JP 23096486 A JP23096486 A JP 23096486A JP S62175949 A JPS62175949 A JP S62175949A
Authority
JP
Japan
Prior art keywords
film
protective film
group
metallic oxide
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23096486A
Other languages
Japanese (ja)
Inventor
Masatoshi Satou
正聡 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Publication of JPS62175949A publication Critical patent/JPS62175949A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a photomagnetic recording medium having improved durability by coating, directly or via other layer, at least one face of a magnetic recording layer consisting of a vertically magnetized film with a protective film essentially consisting of a compound oxide composed of a specific ratio of a group III metallic oxide and group IV metallic oxide. CONSTITUTION:At least one face of the magnetic recording layer consisting of the vertically magnetized film is coated directly or via the other layer with the protective film essentially consisting of the compound oxide composed of 20-85mol% group III metallic oxide and 80-15mol% group IV metallic oxide. for example, Al2O3, In2O3, Y2O3, La2O3, etc. are used as the group III metallic oxide to constitute the protective film and, for example, SiO2, TiO2, ZrO2, HfO2, SnO2, etc. are used for the group IV metallic oxide. Both oxides constitute the protective film preferably in the mixed state at a molecular level. The protective film is not always limited to the case in which said film is constituted of only the above-mentioned two kinds of the oxides and for example, a small amt. of a group IIa metallic oxide, for example, MgO, CaO and BaO may be incorporated therein. The film thickness of the protective film is generally enough with 100-10000Angstrom .

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は耐久性に優れた光磁気記録媒体に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a magneto-optical recording medium with excellent durability.

(従来の技術〕 近年の情報化社会の進展は目覚ましく、それに伴い大容
量の記録媒体並びに記録再生方式の必要性が急速に高ま
っており、既にレーザービデオディスク、ディジタルオ
ーディオディスク、文書画像フィルム用DRA%4ディ
スクなどが実用化されている。しかしながら、実用化さ
れた記録媒体は書き換えできない欠点があり、書き換え
可能な記録媒体並びに記録再生方式が望まれている。そ
して、書き換え可能な記録再生方式の一つとして光磁気
記録再生方式が提案され、試作品も発表されている。
(Prior Art) In recent years, the information society has progressed at a remarkable pace, and the need for large-capacity recording media and recording/playback methods is rapidly increasing. %4 discs etc. have been put into practical use. However, the recording media that have been put into practical use have the disadvantage that they cannot be rewritable, and rewritable recording media and recording/playback methods are desired. As one example, a magneto-optical recording and reproducing method has been proposed, and prototypes have also been announced.

この光磁気記録再生方式に使用される光磁気記録媒体は
、基本的にはプラスチック基板やガラス基板の上に非晶
質垂直磁化膜を形成したものであり、磁性材料としては
例えば、GdTbFe、 TbFeCo。
The magneto-optical recording medium used in this magneto-optical recording and reproducing system is basically a plastic substrate or a glass substrate with an amorphous perpendicular magnetization film formed thereon, and the magnetic material is, for example, GdTbFe, TbFeCo, etc. .

GdCo、 TbFe、 GdDyFeなどの希土類−
遷移金属多元合金が使用されている。
Rare earths such as GdCo, TbFe, GdDyFe
Transition metal multi-element alloys are used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明者は、このような光磁気記録媒体の耐久性を調べ
るためにサンプルを作成して高温高温雰囲気中で劣化促
進試験を行ったところ、比較的短期間で保磁力及び磁気
光学特性が劣化するという問題点のあることを見出した
In order to investigate the durability of such magneto-optical recording media, the present inventor prepared samples and conducted accelerated deterioration tests in a high-temperature atmosphere, and found that the coercive force and magneto-optical properties deteriorated in a relatively short period of time. I found out that there is a problem with this.

従って、本発明の目的は、耐久性の向上した光磁気記録
媒体を提供することにある。
Therefore, an object of the present invention is to provide a magneto-optical recording medium with improved durability.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者は、鋭意研究の結果、磁気記録層(垂直磁化膜
のこと)の表裏両面のうち少なくとも一面を、第■族金
属酸化物20〜85モル%と第■族金属酸化物80〜1
5モル%とからなる複合酸化物を主体とする保護膜で、
直接に又は他の層を介して被覆することにより、耐久性
が向上することを見い出し、本発明を成すに至った。
As a result of intensive research, the present inventor has determined that at least one of the front and back surfaces of the magnetic recording layer (perpendicularly magnetized film) contains 20 to 85 mol % of Group (I) metal oxide and 80 to 1 mol % of Group (II) metal oxide.
A protective film mainly composed of a composite oxide consisting of 5 mol%.
It has been discovered that durability can be improved by coating directly or through another layer, and the present invention has been completed.

しかして、本発明は、垂直磁化膜からなる磁気記録層の
少なくとも一面を、第m族金属酸化物2゜〜85モル%
と第■族金属酸化物80〜15モル%とからなる複合酸
化物を主体とする保護膜で、直接に又は他の層を介して
被覆したことを特徴とする光磁気記録媒体を提供する。
Accordingly, in the present invention, at least one surface of the magnetic recording layer consisting of a perpendicularly magnetized film is coated with 2° to 85 mol% of Group M metal oxide.
A magneto-optical recording medium is provided, which is coated directly or via another layer with a protective film mainly composed of a composite oxide consisting of 80 to 15 mol % of a Group (1) metal oxide.

本発明者の実験によれば、不思議なことに、第■族金属
酸化物と第■族金属酸化物との複合酸化物からなる保護
膜において、第■族金属酸化物の含有率を20モル%よ
り低くしても、また逆に〜85モル%より高くしても媒
体の耐久性は劣るのである。
According to the experiments conducted by the present inventor, it was strangely possible to reduce the content of the group (III) metal oxide to 20 mol in a protective film made of a composite oxide of a group (III) metal oxide and a group (III) metal oxide. Even if it is lower than 85 mol %, or conversely higher than 85 mol %, the durability of the medium is poor.

保護膜を構成する第■族金属酸化物としては、例えばA
 l z 02 、  I nzos + Y! 03
 、 Lag’sなどが使用され、第■族金属酸化物と
しては例えばSi Ox + Tt Ot + Zr 
Ot + Hf Ox 。
As the Group Ⅰ metal oxide constituting the protective film, for example, A
l z 02 , I nzos + Y! 03
, Lag's, etc. are used, and examples of group Ⅰ metal oxides include SiOx + TtOt + Zr
Ot+HfOx.

Sn O,などが使用される0両者は分子レベルでの混
合状態で保護膜を構成することが好ましく、従って、保
護膜の形成方法としては、例えば前記複合酸化物をター
ゲットとするスパッタリング、前記複合酸化物を構成す
る金属の合金をターゲットとする反応スパッタリング、
2種類のターゲットを使用する2元(反応又は非反応)
スパッタリング、2元イオンブレーティング、2元真空
蒸着などの真空薄膜形成技術が使用される。
It is preferable that the protective film is formed by mixing SnO, etc. at the molecular level. Therefore, as a method for forming the protective film, for example, sputtering using the composite oxide as a target, sputtering using the composite oxide as a target, Reactive sputtering targeting metal alloys that make up oxides,
Binary (responsive or non-responsive) using two types of targets
Vacuum thin film formation techniques such as sputtering, binary ion blating, and binary vacuum deposition are used.

本発明の保護膜は、前記2種の酸化物だけで構成される
場合に限られる訳ではなく、例えば少量の第m族金属酸
化物2 どが含まれていてもよい。
The protective film of the present invention is not limited to being composed only of the above two types of oxides, and may also contain, for example, a small amount of Group M metal oxide 2 or the like.

このような保護膜の膜厚は、−aには100人〜10.
000人で十分である。
The thickness of such a protective film is 100 to 10.
000 people is enough.

本発明の保護膜は、磁気記録層と直接接触していてもよ
いし、磁気記録層との間に他の層□−例えば、他の保護
膜や他の機能膜例えばカー効果増加膜□が介入していて
も よい、このようなカー効果増加膜としては、例えば、高
屈折率の膜厚が4分の1波長に相当する厚さ又はその近
辺の膜が使用される。
The protective film of the present invention may be in direct contact with the magnetic recording layer, or there may be another layer □ - for example, another protective film or another functional film such as a Kerr effect increasing film □ between the magnetic recording layer and the magnetic recording layer. As such a Kerr effect increasing film which may intervene, for example, a film having a high refractive index having a thickness corresponding to a quarter wavelength or around it is used.

磁気記録層は、一般には基板の上に形成されるが、基板
としては、例えばガラス、プラスチック、セラミック、
アルミニウムなどが使用されるが、基板の上には、予め
、凹凸状のトラックが形成された薄い成形層、誘電体層
、反射層、干渉膜、他の保護膜などが形成されていても
よい、なお、本発明は、プラスチック基板を使用した場
合に顕著を効果を発揮する。
The magnetic recording layer is generally formed on a substrate, and the substrate may be, for example, glass, plastic, ceramic,
Aluminum or the like is used, but a thin molding layer on which uneven tracks are formed, a dielectric layer, a reflective layer, an interference film, or other protective film may be formed in advance on the substrate. Note that the present invention exhibits remarkable effects when a plastic substrate is used.

次いで、磁気記録層を形成する前に下面を保護する目的
から本発明の特徴とする「複合酸化物を主体とする保護
膜」を形成する。
Next, before forming the magnetic recording layer, a "protective film mainly composed of a composite oxide", which is a feature of the present invention, is formed for the purpose of protecting the lower surface.

そして、保護膜の上に直接又は他の層(例えばカー効果
増加膜)を形成した後、常法に従い磁気記録層(垂直磁
化膜)を形成する。垂直磁化膜としては、例えばTbF
e、 GdFe、 DyFe、 GdCo、 1Ioc
o。
Then, directly or after forming another layer (for example, a Kerr effect increasing film) on the protective film, a magnetic recording layer (perpendicular magnetization film) is formed according to a conventional method. As the perpendicular magnetization film, for example, TbF
e, GdFe, DyFe, GdCo, 1Ioc
o.

GdTbPe、  GdDyFe、  TbDyFe、
  GdPeCo、  TbFeCo、  GdDyF
eCo5 GdTbFeCoなどの希土類−遷移金属ア
モルファス合金が主として使用されている。
GdTbPe, GdDyFe, TbDyFe,
GdPeCo, TbFeCo, GdDyF
Rare earth-transition metal amorphous alloys such as eCo5 GdTbFeCo are primarily used.

垂直磁化膜の上には、場合により本発明の保護膜を設け
る0本発明においては、磁気記録層の表面又は裏面の少
なくとも一方に前記保護膜を設ければ良いが、両方に設
けることが好ましい。
A protective film of the present invention is optionally provided on the perpendicular magnetization film. In the present invention, the protective film may be provided on at least one of the front surface or the back surface of the magnetic recording layer, but it is preferable to provide it on both. .

そして一般には本発明の保護膜の上に直接に他の保護膜
列例えばS i O+ A Its O3+  Z r
 Ox +ZnS、AIN、5isNaなどを設けても
よい。
And generally, another protective film array is applied directly on top of the protective film of the present invention, such as S i O+ A Its O3+ Z r
Ox + ZnS, AIN, 5isNa, etc. may also be provided.

以下、実施例によって本発明を具体的に説明するが、本
発明はこれに限定されるものではない。
EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited thereto.

〔実施例1〕 真空槽を5 X 10−7Torrに排気した後、A「
を導入して5 X 10−’Torrにする。φ5イン
チのAt!gos  ・Singの混合焼結ターゲット
を使用し、RFパワー700Wで、ガラス基板上にフォ
トポリマー法により放射線硬化型樹脂層を設けた基板上
に、マグネトロン・スパッタリング法により成膜速度:
約50人/winで、膜厚:1000人のAl、O,・
5iOz複合酸化物CAI!z Os : S ich
 −60: 40モル%)からなる保護膜を形成した。
[Example 1] After evacuating the vacuum chamber to 5 x 10-7 Torr,
to 5×10-'Torr. φ5 inch At! Using a Gos Sing mixed sintered target, the film formation rate was performed using the magnetron sputtering method on a glass substrate with a radiation-curable resin layer formed by the photopolymer method using an RF power of 700 W:
Approximately 50 people/win, film thickness: 1000 people Al, O,・
5iOz composite oxide CAI! zOs: Sich
-60: 40 mol%) was formed.

この膜は波長830 nuにおいて屈折率約1.5を示
す。
This film exhibits a refractive index of approximately 1.5 at a wavelength of 830 nu.

次いで同じAr圧でマグネトロン・スパッタリング法に
よりφ5インチのTbFe合金ターゲット(Tb = 
19原子%)からRFパワー400Wで成膜速度:14
0人/+sinで、膜厚: 1000  人のTbFc
膜(磁気記録層)を形成した。
Next, a φ5 inch TbFe alloy target (Tb =
19 atomic%) at RF power of 400 W and film formation rate: 14
At 0 person/+sin, film thickness: 1000 people TbFc
A film (magnetic recording layer) was formed.

更にその上に同様に膜厚: 1000人のA1203−
 S i O,の複合酸化物(A j! z Os  
: S 1Ox=60 : 40モル%)からなる保護
膜を形成した。
Furthermore, the same film thickness: 1000 people A1203-
S i O, complex oxide (A j! z Os
: S1Ox=60:40 mol%) was formed.

この3層膜は総て同一真空中で行なった。These three-layer films were all formed in the same vacuum.

最後に放射線硬化型の接着剤を用いて、ガラス板を貼り
合わせ、本発明の光磁気記録媒体を製造した。
Finally, glass plates were bonded together using a radiation-curable adhesive to produce a magneto-optical recording medium of the present invention.

得られた光磁気記録媒体の磁気光学特性は、基板側から
測定した時、波長830  n+wで反射率R=44%
、カー回転角θに=0.29°、保磁力H1=5KO,
であった。
The magneto-optical properties of the obtained magneto-optical recording medium have a reflectance R=44% at a wavelength of 830 n+w when measured from the substrate side.
, Kerr rotation angle θ = 0.29°, coercive force H1 = 5KO,
Met.

〔実施例2〕 実施例1と同様にして磁気記録層の表裏両面をA 1 
z Ox  ・S i Ozの複合酸化物(Aj+gO
i:5iOx−40:60モル%)からなる保護膜を形
成した光磁気記録媒体を製造した。
[Example 2] In the same manner as in Example 1, both the front and back surfaces of the magnetic recording layer were coated with A 1
Composite oxide of z Ox ・S i Oz (Aj+gO
A magneto-optical recording medium was manufactured with a protective film formed of (i:5iOx-40:60 mol%).

〔実施例3〕 実施例1と同様にして磁気記録層の表裏両面をA 11
03  ・S i Oxの複合酸化物(AI120゜:
5iOz =80 : 20モル%)からなる保護膜を
形成した光磁気記録媒体を製造した。
[Example 3] Both the front and back surfaces of the magnetic recording layer were coated with A 11 in the same manner as in Example 1.
03 ・S i Ox composite oxide (AI120°:
A magneto-optical recording medium on which a protective film was formed was manufactured.

〔比較例1〕 ANzO*  ・Sin、の複合酸化物からなる保護膜
の代わりに単にSin、膜を使用するほがは実施例1と
同様にして光磁気記録媒体を製造した。
[Comparative Example 1] A magneto-optical recording medium was produced in the same manner as in Example 1, except that instead of the protective film made of the composite oxide of ANzO*.Sin, a film of simple Sin was used.

ただし、5int膜は、RFパ’7−IKW、成膜速度
:120人/winの条件で作成し、膜厚はいずれも約
1000人とした。
However, the 5-inch film was created under the conditions of RF PA'7-IKW, film-forming rate: 120 people/win, and the film thickness was approximately 1000 people/win.

得られた光磁気記録媒体の磁気光学特性は、基板側から
波長830  ns+の光を照射したとき、R=46%
、θx−0.275、Hc=5KO,であった。
The magneto-optical properties of the obtained magneto-optical recording medium were R = 46% when irradiated with light with a wavelength of 830 ns+ from the substrate side.
, θx-0.275, Hc=5KO.

〔比較例2〕 A j!z O3・Sin、の複合酸化物からなる保護
膜の代わりに単にA 1 t Oy膜を使用するはがば
実施例1と同様にして光磁気記録媒体を製造した。
[Comparative Example 2] A j! A magneto-optical recording medium was manufactured in the same manner as in Example 1, except that an A 1 t Oy film was simply used instead of the protective film made of a complex oxide of zO3.Sin.

〈劣化促進試験1〉 実施例1〜3及び比較例1〜2で製造した光磁気記録媒
体を、温度60℃湿度90%の雰囲気中に入れ、垂直磁
化膜の保磁力He(t)を経時的に測定し、それを試験
前の保磁力Hc(0)で割って得られる商α= Hc(
t)/ Hc(0)で保磁力の変化を調べた。尚、商α
の変化は垂直磁化膜の酸化が進んだことを示し、磁気光
学特性が低下したことを示す。
<Accelerated Deterioration Test 1> The magneto-optical recording media manufactured in Examples 1 to 3 and Comparative Examples 1 to 2 were placed in an atmosphere with a temperature of 60°C and a humidity of 90%, and the coercive force He(t) of the perpendicularly magnetized film was measured over time. quotient α = Hc (
Changes in coercive force were investigated using t)/Hc(0). Furthermore, the quotient α
A change in indicates that oxidation of the perpendicularly magnetized film has progressed, indicating that the magneto-optical properties have deteriorated.

この結果を第1表に示す。なお、比較例1のも 。The results are shown in Table 1. Also, Comparative Example 1.

のは、50日経過時点で垂直異方性を示さなくなった。No longer showed vertical anisotropy after 50 days.

第1表(Hc(t)/ He(0)の経口変化〕〔実施
例4〕 予め高さ1400人、幅0.4 μの円周状の突条が1
.6μピツチで同心円状に多数設けられたニッケル・ス
タンパ−を用意した。
Table 1 (Oral changes in Hc(t)/He(0)) [Example 4] One circumferential protrusion with a height of 1400 people and a width of 0.4 μ was prepared in advance.
.. A large number of nickel stampers were prepared concentrically with a pitch of 6μ.

他に厚さt=1.2mm、半径r=loo鶴の円板状ガ
ラス支持体(1b)を用意した。
In addition, a disk-shaped glass support (1b) with a thickness t=1.2 mm and a radius r=loo was prepared.

前記スタンパ−の上にU■硬化型樹脂を塗布し、その上
にガラス支持体(lb)を乗せた。支持体(1b)を通
して紫外線を照射して樹脂を硬化させ、成形体N(la
)を成形した。成形体ji(la)には、深さ1400
人、幅0.4μの円周状の溝が1.6μピツチで同心円
状に多数設けられている。
On top of the stamper, a U-curing resin was applied, and a glass support (lb) was placed thereon. The resin is cured by irradiating ultraviolet rays through the support (1b) to form a molded body N(la
) was molded. The molded body ji (la) has a depth of 1400 mm.
A large number of circumferential grooves each having a width of 0.4μ are provided concentrically at a pitch of 1.6μ.

成形体層(1a)を支持体(lb)と共にスタンパ−か
ら剥離することによりプラスチック系基板(11を得た
A plastic substrate (11) was obtained by peeling the molded body layer (1a) together with the support (lb) from the stamper.

次にスパッタリング装置内に、φ5インチのAlt!0
3  ・Sin、の混合焼結ターゲット及び基板(1)
をセントする。装置内を一旦3X10−’T orrに
排気した後、Arガスを導入して 5×10−” To
rrにする。RFパワーIKWで、スパツタリングを行
なう。こうして、成形体N(Ia)上に成膜速度:約5
0人/minで、膜厚: 1000人のAlz Oz 
 ・S ion複合酸化物(AN、03 :S i O
z =60 : 40モル%)からなる保護11 (2
1を形成した。この膜は波長830nmにおいて屈折率
約1゜54を示す。 次いで、同じガス圧でφ5インチ
のGdz+Fea1cOxzの合金ターゲットを用い、
RFパワーIKW、成膜速度170人/winで、膜厚
500人のC,dFaco膜(3a)を形成した。続イ
テ、Tb、。Fe、。合金ターゲットを用い同様に膜厚
500人のTbFe膜(3b)を形成した。GdFeC
Next, a φ5 inch Alt! 0
3.Sin mixed sintering target and substrate (1)
cent. After evacuating the inside of the device to 3×10-'Torr, Ar gas was introduced to 5×10-''Torr.
Make it rr. Perform sputtering with RF power IKW. In this way, the film formation rate on the molded body N(Ia): about 5
At 0 people/min, film thickness: 1000 people Alz Oz
・S ion composite oxide (AN, 03: S i O
protection 11 (2
1 was formed. This film exhibits a refractive index of approximately 1°54 at a wavelength of 830 nm. Next, using a φ5 inch Gdz+FealcOxz alloy target at the same gas pressure,
A C, dFaco film (3a) with a film thickness of 500 layers was formed at an RF power of IKW and a film formation rate of 170 layers/win. Continued, Tb. Fe,. A TbFe film (3b) with a thickness of 500 yen was similarly formed using an alloy target. GdFeC
.

膜(3a)とTbFe膜(3b)は共に垂直磁化を有し
、本発明でいう垂直磁化膜(3)を構成する。
Both the film (3a) and the TbFe film (3b) have perpendicular magnetization and constitute the perpendicular magnetization film (3) in the present invention.

更にその上に同様に膜厚: 1ooo人のA2□0゜・
S t Ox (7)複合酸化物(ANz 03  :
 S 1oz=6o:4aモル%)からなる保護膜(2
)を形成した。
Furthermore, the same film thickness: 1ooo person's A2□0゜・
S t Ox (7) Composite oxide (ANz 03:
Protective film (2 oz = 6 mol %)
) was formed.

これらの4層膜は総て途中で真空を破らずに継続的な真
空中で形成した。
All of these four-layer films were formed in a continuous vacuum without breaking the vacuum halfway.

最後にUV硬化型の接着剤(4)を用いて、ガラス保f
fFiT5)Fi、を貼り合わせ、第1図に示す構造の
光磁気記録媒体サンプル隘6を製造した。
Finally, use UV curing adhesive (4) to protect the glass.
fFiT5)Fi was bonded together to produce a magneto-optical recording medium sample 6 having the structure shown in FIG.

得られた光磁気記録媒体サンプル阻6の磁気光学特性は
、基板11)側から測定した時、波長830na+で反
射率R=44%、カー回転角θz−0,48、保磁力H
,=4KO,であった。
The magneto-optical properties of the obtained magneto-optical recording medium sample 6, when measured from the substrate 11) side, are as follows: reflectance R=44% at wavelength 830 na+, Kerr rotation angle θz-0,48, coercive force H
,=4 KO.

〔実施例5〕 実施例4と同様にして垂直磁化11i(31の表裏両面
をA 1@ Os  : S i Ox比の異なる種々
の複合酸化物CAR@ 03  : S loz (7
)比は下記−第2表を見よ)からなる保gl M (2
1G形成した種々の光磁気記録媒体サンプル丸2〜8 
(6を除く)を製造した。
[Example 5] In the same manner as in Example 4, the front and back surfaces of the perpendicular magnetization 11i (31) were coated with various composite oxides CAR@03: S loz (7
) ratio is below - see table 2).
1G formed various magneto-optical recording medium samples circles 2 to 8
(excluding 6) were manufactured.

〔比較例3〕 A j! z Oa  : S i Oxの混合焼結タ
ーゲットの代わりに単にSin、ターゲットを使用する
はがば実施例4と同様にして光磁気記録媒体サンプルN
11lを製造した。ただし、5iO1膜は、RFパ’7
−IKW、成11り速度: 100人/m1n(7)条
件で作成し、膜厚は約1000人とした。
[Comparative Example 3] A j! z Oa: Magneto-optical recording medium sample N was prepared in the same manner as in Example 4 using a simple Sin target instead of the mixed sintered target of SiOx.
11 liters were produced. However, the 5iO1 film is
- IKW, growth rate: 100 people/m1n (7) The film thickness was approximately 1000 people.

得られた光磁気記録媒体サンプル11kL1の磁気光学
特性は、基板側から波長830rvの光を照射したとき
、R=44%、θ、 =0.48、Hc =5.3 K
O。
The magneto-optical properties of the obtained magneto-optical recording medium sample 11kL1, when irradiated with light with a wavelength of 830 rv from the substrate side, are as follows: R = 44%, θ = 0.48, Hc = 5.3 K
O.

であった。Met.

〔比較例4〕 ANg 03  : S iotの混合焼結ターゲット
の代わりに単にAN103ターゲットを使用するほかは
実施例4と同様にして光磁気記録媒体サンプル魚9を製
造した。ただし、A J z Os DIは、RFパワ
ーIKW、成膜速度:40人/請ir1の条件で作成し
、膜厚は約1000人とした。
[Comparative Example 4] Magneto-optical recording medium sample 9 was produced in the same manner as in Example 4, except that the AN103 target was simply used instead of the mixed sintered target of ANg03:Siot. However, AJzOs DI was created under the conditions of RF power IKW, film formation rate: 40 people/request ir1, and the film thickness was about 1000 people.

第2表(複合酸化物の組成;単位はモル%)〈劣化促進
テスト2〉 記録媒体サンプル魚1〜9を、温度75℃湿度90%の
雰囲気に588hrs入れた。これにより一般には垂直
磁化膜の酸化劣化が促進される。
Table 2 (composition of composite oxide; unit: mol %) <Deterioration acceleration test 2> Recording medium sample fish 1 to 9 were placed in an atmosphere at a temperature of 75° C. and a humidity of 90% for 588 hours. This generally accelerates oxidation deterioration of the perpendicularly magnetized film.

このテストの後、「=90龍(外周より1011内側)
の位置で保磁力Hcを測定し、テスト前の値と比較した
。この結果を第1図に示す。
After this test, "=90 dragons (1011 inside from the outer circumference)
The coercive force Hc was measured at the position and compared with the value before the test. The results are shown in FIG.

また、上記テストの後、r=92fl(外周より8am
内側)の位置でB E R(Bit Error Ra
te)を測定し、テスト前の値と比較した。この結果を
第2図に示す。BERは垂直磁化膜の欠陥個所の多さを
表わす。
Also, after the above test, r = 92 fl (8 am from the outer circumference)
B E R (Bit Error Ra)
te) was measured and compared with the pre-test value. The results are shown in FIG. BER represents the number of defective locations in the perpendicularly magnetized film.

保磁力11cもBERもテスト前後で変化の少ないもの
が耐久性に優れていると言える。
It can be said that a material with little change in coercive force 11c and BER before and after the test has excellent durability.

〔発明の効果〕〔Effect of the invention〕

以上のとおり、本発明によれば、耐久性に優れた光磁気
記録媒体が得られる。
As described above, according to the present invention, a magneto-optical recording medium with excellent durability can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、実施例のサンプル随6の媒体の概略垂直断面
図である。 第2図は、保磁力の変化を示すグラフである。 第3図は、BERの変化を示すグラフである。 〔主要部分の符号の説明〕 2・−・・・・−・・・−・・保護膜 3−・−・−・−・・−記録層
FIG. 1 is a schematic vertical cross-sectional view of the medium of sample No. 6 of the example. FIG. 2 is a graph showing changes in coercive force. FIG. 3 is a graph showing changes in BER. [Explanation of symbols of main parts] 2.--..--.-.Protective film 3.--.---.--Recording layer

Claims (1)

【特許請求の範囲】 1 垂直磁化膜からなる磁気記録層の少なくとも一面を
、第III族金属酸化物20〜85モル%と第IV族金属酸
化物80〜15モル%とからなる複合酸化物を主体とす
る保護膜で、直接に又は他の層を介して被覆したことを
特徴とする光磁気記録媒体。 2 前記複合酸化物が第III族金属酸化物40〜80モ
ル%と第IV族金属酸化物60〜20モル%とからなるこ
とを特徴とする特許請求の範囲第1項記載の光磁気記録
媒体。 3 前記第III族金属酸化物が酸化アルミニウムで、前
記第IV族金属酸化物が酸化ケイ素であることを特徴とす
る特許請求の範囲第1項又は第2項記載の光磁気記録媒
体。
[Scope of Claims] 1 At least one surface of a magnetic recording layer consisting of a perpendicularly magnetized film is coated with a composite oxide consisting of 20 to 85 mol% of a group III metal oxide and 80 to 15 mol% of a group IV metal oxide. 1. A magneto-optical recording medium characterized by being coated with a protective film, either directly or through another layer. 2. The magneto-optical recording medium according to claim 1, wherein the composite oxide comprises 40 to 80 mol% of a Group III metal oxide and 60 to 20 mol% of a Group IV metal oxide. . 3. The magneto-optical recording medium according to claim 1 or 2, wherein the Group III metal oxide is aluminum oxide, and the Group IV metal oxide is silicon oxide.
JP23096486A 1985-10-15 1986-09-29 Photomagnetic recording medium protected by compound oxide Pending JPS62175949A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-229597 1985-10-15
JP22959785 1985-10-15

Publications (1)

Publication Number Publication Date
JPS62175949A true JPS62175949A (en) 1987-08-01

Family

ID=16894671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23096486A Pending JPS62175949A (en) 1985-10-15 1986-09-29 Photomagnetic recording medium protected by compound oxide

Country Status (1)

Country Link
JP (1) JPS62175949A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63149847A (en) * 1986-12-12 1988-06-22 Nippon Telegr & Teleph Corp <Ntt> Magneto-optical recording medium
JPS63206932A (en) * 1987-02-24 1988-08-26 Matsushita Electric Ind Co Ltd Protective film for optical disk
JPH01245447A (en) * 1988-03-28 1989-09-29 Teijin Ltd Magneto-optical recording medium
US4898774A (en) * 1986-04-03 1990-02-06 Komag, Inc. Corrosion and wear resistant magnetic disk
US4929500A (en) * 1986-04-03 1990-05-29 Komag, Inc. Corrosion resistant magnetic disk
JPH03242843A (en) * 1990-01-31 1991-10-29 Internatl Business Mach Corp <Ibm> Magneto-optic storage medium and dielectric layer thereof
JP5920510B1 (en) * 2015-03-25 2016-05-18 Tdk株式会社 Magnet member

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4898774A (en) * 1986-04-03 1990-02-06 Komag, Inc. Corrosion and wear resistant magnetic disk
US4929500A (en) * 1986-04-03 1990-05-29 Komag, Inc. Corrosion resistant magnetic disk
JPS63149847A (en) * 1986-12-12 1988-06-22 Nippon Telegr & Teleph Corp <Ntt> Magneto-optical recording medium
JPS63206932A (en) * 1987-02-24 1988-08-26 Matsushita Electric Ind Co Ltd Protective film for optical disk
JPH01245447A (en) * 1988-03-28 1989-09-29 Teijin Ltd Magneto-optical recording medium
JPH03242843A (en) * 1990-01-31 1991-10-29 Internatl Business Mach Corp <Ibm> Magneto-optic storage medium and dielectric layer thereof
JP5920510B1 (en) * 2015-03-25 2016-05-18 Tdk株式会社 Magnet member

Similar Documents

Publication Publication Date Title
JPS62175949A (en) Photomagnetic recording medium protected by compound oxide
JPH0550400B2 (en)
JPS62289948A (en) Magneto-optical recording medium
JPS60246041A (en) Photo thermomagnetic recording medium
JPS62121943A (en) Optical recording medium
JPS60131659A (en) Photomagnetic recording medium
JPS61278061A (en) Photomagnetic recording medium
JPH0350343B2 (en)
JPS62170050A (en) Photomagnetic disk
JP3205921B2 (en) Magneto-optical recording medium
JP2523300B2 (en) Optical recording medium
JPS6052944A (en) Optomagnetic recording medium
JPS63282942A (en) Magneto-optical recording medium and its production
JPS61237242A (en) Photomagnetic recording medium provided with dielectric multilayered film
JPH03157838A (en) Magneto-optical recording device
JPH02179947A (en) Magneto-optical recording medium
JPS63161550A (en) Optical recording medium
JPS62114134A (en) Optical information recording medium
JPS62109247A (en) Optical magnetic recording medium
JPH03268249A (en) Magneto-optical recording medium
JPS62157347A (en) Photomagnetic recording element and its production
JPS59162621A (en) Magnetic recording medium having plastic substrate
JPS615460A (en) Photothermomagnetic recording medium protected by gen
JPH0630182B2 (en) Manufacturing method of magneto-optical recording element
JPH01279443A (en) Production of magneto-optical recording medium