JPS62174635U - - Google Patents
Info
- Publication number
- JPS62174635U JPS62174635U JP6143286U JP6143286U JPS62174635U JP S62174635 U JPS62174635 U JP S62174635U JP 6143286 U JP6143286 U JP 6143286U JP 6143286 U JP6143286 U JP 6143286U JP S62174635 U JPS62174635 U JP S62174635U
- Authority
- JP
- Japan
- Prior art keywords
- processing device
- air supply
- chamber
- upper wall
- supply hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000428 dust Substances 0.000 claims description 2
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986061432U JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986061432U JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174635U true JPS62174635U (US08088918-20120103-C00476.png) | 1987-11-06 |
| JPH043624Y2 JPH043624Y2 (US08088918-20120103-C00476.png) | 1992-02-04 |
Family
ID=30894765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986061432U Expired JPH043624Y2 (US08088918-20120103-C00476.png) | 1986-04-23 | 1986-04-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH043624Y2 (US08088918-20120103-C00476.png) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02148828A (ja) * | 1988-11-30 | 1990-06-07 | Tokyo Electron Ltd | レジスト塗布装置 |
| JPH02158124A (ja) * | 1988-12-12 | 1990-06-18 | Tokyo Electron Ltd | 現像装置 |
| JP2011204933A (ja) * | 2010-03-26 | 2011-10-13 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| KR20150098211A (ko) * | 2014-02-19 | 2015-08-27 | 램 리서치 아게 | 웨이퍼-형상 물체를 프로세싱하는 방법 및 장치 |
| JP2016092144A (ja) * | 2014-10-31 | 2016-05-23 | 東京エレクトロン株式会社 | 基板液処理装置、排気切替ユニットおよび基板液処理方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217329A (ja) * | 1983-05-25 | 1984-12-07 | Hitachi Ltd | スピンナ装置 |
| JPS6173334A (ja) * | 1984-09-19 | 1986-04-15 | Hitachi Ltd | 処理装置 |
-
1986
- 1986-04-23 JP JP1986061432U patent/JPH043624Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217329A (ja) * | 1983-05-25 | 1984-12-07 | Hitachi Ltd | スピンナ装置 |
| JPS6173334A (ja) * | 1984-09-19 | 1986-04-15 | Hitachi Ltd | 処理装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02148828A (ja) * | 1988-11-30 | 1990-06-07 | Tokyo Electron Ltd | レジスト塗布装置 |
| JPH02158124A (ja) * | 1988-12-12 | 1990-06-18 | Tokyo Electron Ltd | 現像装置 |
| JP2011204933A (ja) * | 2010-03-26 | 2011-10-13 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| KR20150098211A (ko) * | 2014-02-19 | 2015-08-27 | 램 리서치 아게 | 웨이퍼-형상 물체를 프로세싱하는 방법 및 장치 |
| JP2015179823A (ja) * | 2014-02-19 | 2015-10-08 | ラム・リサーチ・アーゲーＬａｍ Ｒｅｓｅａｒｃｈ Ａｇ | ウエハ状の物品を処理する方法および装置 |
| JP2016092144A (ja) * | 2014-10-31 | 2016-05-23 | 東京エレクトロン株式会社 | 基板液処理装置、排気切替ユニットおよび基板液処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH043624Y2 (US08088918-20120103-C00476.png) | 1992-02-04 |
