JPS62172036A - Plasma treating apparatus - Google Patents

Plasma treating apparatus

Info

Publication number
JPS62172036A
JPS62172036A JP1369686A JP1369686A JPS62172036A JP S62172036 A JPS62172036 A JP S62172036A JP 1369686 A JP1369686 A JP 1369686A JP 1369686 A JP1369686 A JP 1369686A JP S62172036 A JPS62172036 A JP S62172036A
Authority
JP
Japan
Prior art keywords
plasma
processing
guide
processing apparatus
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1369686A
Other languages
Japanese (ja)
Other versions
JPH0334777B2 (en
Inventor
Hidehiro Okamoto
岡本 秀宏
Katsumi Hasegawa
勝美 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1369686A priority Critical patent/JPS62172036A/en
Publication of JPS62172036A publication Critical patent/JPS62172036A/en
Publication of JPH0334777B2 publication Critical patent/JPH0334777B2/ja
Granted legal-status Critical Current

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  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE:An apparatus, equipped with a plasma treating means, provided in a vacuum treating vessel and having a structure selectively usable for both routes for one-side treatment or both-side treatment of a material to be treated and capable of stably processing the material even at a high speed without changing the vacuum degree and readily changing over the one-side and both- side treatment. CONSTITUTION:A material 23 to be treated is wound up around a shaft 4 constituting a delivery means 19 as a delivery roll 2 and then fed therefrom to a plasma irradiation means 22 having cathodes 6, 6, 6' and 6' and anodes 7 and 7' provided therein and carried out along a route 8 for treating only one side of the material 23 or transferred along a route 9 for treating both sides to complete the treatment in a state of the material 23 wound around a shaft 5 constituting a winding means 20 as a roll 3. The changeover of the routes 8 and 9 is carried out by using guide chains 8' and 9' placed on both ends of a transfer means 21 consisting of plural guide roll groups and tying one end of the material 23 to either one thereof.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、布帛、フィルム等のシート状物や糸条物のよ
うな連続体をプラズマ処理するための装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an apparatus for plasma-treating a continuous body such as a sheet-like article such as a fabric or a film or a yarn article.

〔従来技術およびその問題点〕[Prior art and its problems]

従来、繊維製品の洗濯による再汚染(黒ずみ)の防止加
工(以後SR加工と略)は、疎水性の合成繊維の場合に
強く求められている。これまでの方法は、親水性の樹脂
を繊維表面に付与することにより、疎水性繊維の表面を
親水化し、SR性を付与する方法が行なわれている。し
かし、かかる樹脂加工による方法は、着用時の洗濯など
に対する耐久性に乏しい。また、繊維表面に付着した樹
脂に染着した染料が移行する[多行昇華性を促進するた
め、染色堅牢度を低下させる。また、使用する親水性樹
脂がおおむねボリエチレングリコール系樹脂、またはこ
れの誘導体であるため、処理された布帛の風合いは、ワ
ックス感が強いものとなる等の多くの欠点を有している
。このため、このような欠点がなく、しかも安価に工業
的規模で、繊維布帛、特に合成繊維布帛にSR性を付与
できる技術の開発が望まれていた。
BACKGROUND ART Conventionally, there has been a strong demand for hydrophobic synthetic fibers to be treated to prevent recontamination (darkening) due to washing of textile products (hereinafter abbreviated as SR treatment). The conventional method has been to apply a hydrophilic resin to the fiber surface to make the surface of the hydrophobic fiber hydrophilic and impart SR properties. However, such resin processing methods lack durability against washing during wear. In addition, the dye attached to the resin attached to the fiber surface migrates (promotes multi-line sublimation, reducing color fastness). Furthermore, since the hydrophilic resin used is generally a polyethylene glycol resin or a derivative thereof, the treated fabric has many drawbacks such as a strong waxy feel. Therefore, it has been desired to develop a technique that does not have such drawbacks and can impart SR properties to fiber fabrics, especially synthetic fiber fabrics, at low cost and on an industrial scale.

このような問題を解決する方法として、最近繊維表面に
樹脂加工に代って、プラズマ処理することにより繊維表
面を直接親水化し、木綿と同等以上の優れたSR性を付
与することができることが判ってきた。
As a way to solve these problems, it has recently been discovered that instead of resin treatment, the fiber surface can be directly hydrophilized by plasma treatment, giving it an excellent SR property equivalent to or better than that of cotton. It's here.

しかしながら、シート状物及び繊維等の連続体を連続的
に処理し得るプラズマ処理装置に関しては種々の問題が
発生し、その改良のため多数の提案がある。これを大別
すると、シート状物等を大気中から繰出し、連続シール
機構を有する減圧された処理室に導入した後、再度大気
中で巻取るタイプと、シート状物等の繰出し、巻取りを
すべて1つの減圧された容器中で行なうハツチ連続タイ
プとに分けられる。前者の連続シール機構を有するタイ
プは、減圧処理室を小形化できること、また、減圧状態
を解除することなく水準の切換が行なえ、作業性が良い
ことなど利点はあるが、繊維布帛などの高含気性シート
状物の処理に際しては、シートに含まれる空気などの揮
発性物質が、シール部分だけでは充分に除去できず、処
理速度が大きくなった場合のシール性に問題がある。
However, various problems occur with plasma processing apparatuses that can continuously process continuous objects such as sheet-like materials and fibers, and many proposals have been made to improve these problems. Broadly speaking, there are two types: a type in which a sheet-like material is fed out from the atmosphere, introduced into a depressurized processing chamber with a continuous sealing mechanism, and then rolled up again in the atmosphere; There are two types: hatch continuous type, which is all carried out in one vacuum container; The former type, which has a continuous sealing mechanism, has the advantage of being able to downsize the vacuum processing chamber and being able to change the level without releasing the vacuum state, making it easy to work with, but it is not suitable for high-containing materials such as textiles. When processing airy sheet-like materials, volatile substances such as air contained in the sheet cannot be sufficiently removed by the sealing portion alone, and there is a problem with sealing performance when the processing speed increases.

また、後者のバッチ連続タイプの処理機では、シート状
物等の繰出し、巻取り手段を真空容器内に内蔵するため
、減圧容器の容積が大きくなり、目的とする減圧度に到
達するまでの時間が過大となり処理効率が低下するとい
う問題を有する。
In addition, in the latter batch continuous type processing machine, the means for feeding out and winding up sheet-like materials is built into the vacuum container, so the volume of the vacuum container becomes large, and it takes time to reach the desired degree of vacuum. There is a problem in that the processing efficiency becomes excessive and the processing efficiency decreases.

〔発明の目的〕[Purpose of the invention]

本発明の目的は上記した従来におけるプラズマ処理装置
の欠点を改良し、高速処理においても、減圧度が変化せ
ず、安定した条件下で加工できるバッチ連続式の特徴を
生かしつつ、減圧容器の容積を極小にでき、しかも作業
性の良いプラズマ処理装置を提供することにあり、かつ
被処理物の片面処理や両面処理がその用途に応じて簡単
に切りかえられる処理を極めて効率よく行うことのでき
るプラズマ処理装置を提供するものである。
The purpose of the present invention is to improve the above-mentioned drawbacks of conventional plasma processing equipment, and to take advantage of the features of a continuous batch system that allows processing under stable conditions without changing the degree of pressure reduction even during high-speed processing, and to reduce the volume of a vacuum vessel. Our goal is to provide a plasma processing device that can minimize the amount of water and have good workability, and that can extremely efficiently perform single-sided or double-sided processing of the object to be processed, which can be easily switched depending on the application. A processing device is provided.

〔発明の構成〕[Structure of the invention]

本発明は上記した目的を達成するため次の構成をとるも
のである。即ち、減圧処理容器と、この減圧処理容器内
に収容された被処理物の繰出手段、巻取手段、搬送手段
およびプラズマ照射手段とからなるプラズマ処理装置で
あって、前記プラズマ照射手段が、被処理物の片面処理
用経路と両面処理用経路の双方を選択的に使用可能な構
造であるプラズマ処理装置を特徴とするものである。
The present invention has the following configuration to achieve the above object. That is, it is a plasma processing apparatus comprising a reduced pressure processing container, a feeding means, a winding means, a conveying means, and a plasma irradiation means for the object to be processed stored in the reduced pressure processing container, wherein the plasma irradiation means The present invention is characterized by a plasma processing apparatus having a structure that allows selective use of both a single-sided processing route and a double-sided processing route for processing objects.

本発明に使用される被処理物とは、織物、編物、不織布
、ウェッブ等の布帛状物、フィルム、箔、紙等のシート
状物、或いはこれ等の複合物、又はこれらの布帛或はシ
ート状物に樹脂をコーティングしたもの、更には紡績糸
やフィラメント糸の如き糸条物等が適用される。
The objects to be treated used in the present invention include fabrics such as woven fabrics, knitted fabrics, nonwoven fabrics, and webs, sheet-like articles such as films, foils, and papers, or composites thereof, or fabrics or sheets thereof. Materials coated with resin, yarn materials such as spun yarn and filament yarn, etc. can be used.

本発明は、一つの減圧処理容器の内に、被処理物の繰出
手段、巻取手段、搬送手段と、プラズマ照射手段とを一
体的に設けたものであって、これにより減圧処理容器の
容積を極少にし、コンパクトで、作業性、処理効率の高
いプラズマ処理装置になしうる。更に減圧処理容器内に
設けたプラズマ照射手段は、被処理物を片面処理しうる
のみならず、同時に両面処理もできるように構成されて
おり、それぞれの処理を行うに当り被処理物の通過経路
(パス)を、被処理物搬送手段と連携させた切替手段に
より選択的に使用するよう構成されている。
The present invention integrates a feeding means, a winding means, a conveying means, and a plasma irradiation means for the object to be processed in one reduced pressure processing container, thereby reducing the volume of the reduced pressure processing container. This makes it possible to create a compact plasma processing device with high workability and processing efficiency. Furthermore, the plasma irradiation means installed in the reduced-pressure processing container is configured so that it can process not only one side of the object to be processed, but also both sides at the same time. (path) is configured to be used selectively by a switching means that is linked with a processing object conveying means.

本発明において使用されるプラズマ照射手段は、その原
理は従来公知のものであればいかなるものでも採用しう
るが、好ましくは、2枚の板状の陰極を対向配置した間
に棒状の陽極を複数本配置するような構造を用いるのが
よい。
The plasma irradiation means used in the present invention may employ any conventionally known principle; however, preferably, a plurality of rod-shaped anodes are arranged between two plate-shaped cathodes facing each other. It is better to use a structure in which this arrangement is made.

この種のプラズマ照射装置を用いて、片面もしくは両面
の処理を個々に又は同時に行わせるためには、同じ構造
の少なくとも2個の装置を平列、直列、もしくは対向さ
れて配置し、ガイドロール等の被処理物の搬送手段を切
り替えることによってそのバスを変更することにより行
う。被処理物の搬送手段は、ガイドバー2.ガイドロー
ラー、コンベアベルト等で構成された積極回転方式又は
自由回転方式のものであればよい。バスの切替は、搬送
手段の一部に適宜の切替ガイドを設けることにより達成
される。例えば、ガイドバー、ガイドローラーを移動さ
せるとか、被処理物の先端をニップして必要な部所へ誘
導するガイド部材、或いはチェーン部材等を用いること
ができる。
In order to treat one side or both sides individually or simultaneously using this type of plasma irradiation device, at least two devices of the same structure are arranged in parallel, in series, or facing each other, and guide rolls, etc. This is done by changing the bus by switching the transport means for the workpiece. The means for conveying the object to be processed is a guide bar 2. Any active rotation type or free rotation type configured with guide rollers, conveyor belts, etc. may be used. Bus switching is achieved by providing a suitable switching guide on part of the transport means. For example, it is possible to use a guide bar, a guide roller that moves, a guide member that nip the tip of the object to guide it to a required location, a chain member, or the like.

以下、本発明の一実施例を図面により説明する。An embodiment of the present invention will be described below with reference to the drawings.

第1図は本発明にかかる装置全体の断面図であり、第2
図はその平面図である。また、第3図は、第1図のプラ
ズマ照射手段部分の拡大側面図であり、第4図は、その
正面である。
FIG. 1 is a sectional view of the entire device according to the present invention, and FIG.
The figure is a plan view thereof. 3 is an enlarged side view of the plasma irradiation means portion of FIG. 1, and FIG. 4 is a front view thereof.

第1図および第2図において、1は減圧処理容器であり
、12.13は減圧処理容器1の1部を構成する可lI
l]扉を示す。8および9は被処理物23の経路であり
、経路8は被処理物23の片面のみを処理する場合を示
し、経路9は両面を処理する場合を示す。
In FIG. 1 and FIG. 2, 1 is a reduced pressure processing container, and 12.13 is a container constituting a part of the reduced pressure processing container 1.
l] Indicates the door. 8 and 9 are the paths of the object to be processed 23, path 8 indicates the case where only one side of the object 23 to be processed is processed, and path 9 indicates the case where both sides are processed.

減圧処理容器1は排気管14を介して減圧ポンプ10に
接続され、10− ’Torr程度の減圧に保持され、
この減圧下で被処理物23を低温プラズマ処理するよう
になっている。
The reduced pressure processing container 1 is connected to a reduced pressure pump 10 via an exhaust pipe 14, and is maintained at a reduced pressure of about 10-'Torr.
The object to be treated 23 is subjected to low-temperature plasma treatment under this reduced pressure.

被処理物23は繰出手段19を構成する軸4に繰出用ロ
ール2として巻上げられた状態になっており、ここから
経路8又は9を経て巻取手段20を構成する軸5にロー
ル3として巻取られた状態になって完結する。これらの
被処理物23の搬送は駆動用モータ11により軸4およ
び/または5を駆動することによって行なわれる。
The workpiece 23 is wound up as a feeding roll 2 on a shaft 4 constituting a feeding means 19, and then wound as a roll 3 on a shaft 5 forming a winding means 20 via a path 8 or 9. It is completed when it is taken. The objects to be processed 23 are transported by driving the shafts 4 and/or 5 by the drive motor 11.

第1図から判るように本発明のプラズマ処理装置にあっ
ては、1つの減圧処理容器1中に被処理物23の繰出手
段19と巻取手段20とが組になって隣接配置されると
ともに、さらにこれにプラズマ照射手段22が近接して
対向配置されているためコンパクトな構造となっている
。被処理物の搬送手段21は、ガイドバー、ガイドロー
ル、ベルト等からなり、上記繰出手段19、プラズマ照
射手段22、巻取手段20の間や、その近傍に配置され
ている。
As can be seen from FIG. 1, in the plasma processing apparatus of the present invention, a feeding means 19 and a winding means 20 for the object to be processed 23 are arranged adjacent to each other as a pair in one reduced pressure processing container 1. Furthermore, since the plasma irradiation means 22 is disposed close to and facing the plasma irradiation means 22, the structure is compact. The conveying means 21 for the object to be processed is made up of a guide bar, a guide roll, a belt, etc., and is arranged between or near the feeding means 19, the plasma irradiation means 22, and the winding means 20.

プラズマ照射手段22は、二枚の対向した板状の陰極6
,6 ; 6’、 6°の間に複数本の棒状の陽極7,
7゛を間隔をおいて配置したもので、この棒状の陽極7
.7゛の両側を被処理物23が移動しながらプラズマ処
理されるようになっている。
The plasma irradiation means 22 includes two opposing plate-shaped cathodes 6.
, 6; 6', multiple rod-shaped anodes 7 between 6 degrees,
7" are arranged at intervals, and this rod-shaped anode 7
.. The object to be processed 23 is subjected to plasma processing while moving on both sides of 7.

このような構成を有するプラズマ照射手段が少なくとも
二つ対向して配置されている。これによって、被処理物
23の片面処理のみを行う場合には経路8に沿って被処
理物23を搬送すればよく、また両面処理する場合には
、経路9に沿って被処理物23を搬送すればよい。
At least two plasma irradiation means having such a configuration are arranged facing each other. As a result, when processing only one side of the workpiece 23, the workpiece 23 can be transported along the path 8, and when processing both sides, the workpiece 23 can be transported along the path 9. do it.

上述のように被処理物23を二つの経路8又は9に切替
える方法として、ガイドチェーンを使用すると容易に行
なうことができる。すなわち、第3,4図において、8
’、9’ は、それぞれ片面処理、両面処理の経路を形
成するためのガイドチェーンを表わし、これらのガイド
チェーン8゛、9°は、第4図に示すように複数のガイ
ドロール群からなる搬送手段21の両端に配置されてい
る。被処理物23の経路の切替は、被処理物23を完全
に抜き取った後に、いずれか目的とする経路8又は9を
形成するガイドチェーン8゛又は9°に被処理物23の
一端を結びつけ、そのガイドチェーン8゛又は9゛を回
転させることにより、目的とする経路8又は9に被処理
物23をセットすることができる。
As described above, the workpiece 23 can be easily switched to the two paths 8 or 9 by using a guide chain. That is, in Figures 3 and 4, 8
', 9' represent guide chains for forming paths for single-sided processing and double-sided processing, respectively, and these guide chains 8', 9' represent conveyor chains consisting of a plurality of guide roll groups, as shown in Fig. 4. They are arranged at both ends of the means 21. To switch the path of the workpiece 23, after the workpiece 23 has been completely removed, one end of the workpiece 23 is tied to a guide chain 8' or 9° that forms the desired path 8 or 9. By rotating the guide chain 8' or 9', the workpiece 23 can be set on the desired path 8 or 9.

〔発明の効果〕〔Effect of the invention〕

本発明のlidにより、高含気性のシート状物、たとえ
ば織編物、不織布、トウ、繊維、コーテイング物、多孔
質フィルムなどを処理する場合に、特に処理速度の変化
による残圧処理室の減圧度の変化がないというパンチ式
処理機の特徴を維持しつつ、パンチ式処理機の欠点であ
る作業性を大幅に向上することができ、かつ被処理物の
片面処理や両面処理がその用途に応してn1j単に変え
ることができる。
When processing highly air-containing sheet materials such as woven and knitted fabrics, non-woven fabrics, tows, fibers, coated materials, porous films, etc. using the lid of the present invention, the degree of depressurization in the residual pressure processing chamber due to changes in processing speed is particularly important. While maintaining the characteristic of a punch-type processing machine, which is that there is no change in the process, the workability, which is a drawback of punch-type processing machines, can be greatly improved. and n1j can simply be changed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明におけるブラズ゛7処理装置の断面図で
あり、第2図その平面図である。また、第3図は、第1
図のプラズマ照射手段の部分の拡大側面図、第4図は同
正面図である。 1・・・減圧処理容器、2・・・繰出ロール、3・・・
巻取ロール、4.5・・・回転軸、6,6°・・・陰極
、7゜7”・・・陽極2.8・・・(片面処理用)経路
、9・・・(両面処理用)経路、8゛・・・(片面処理
用の)ガイドチェーン、9“・・・(両面処理用の)ガ
イドチェーン、19・・・繰出手段、20・・・巻取手
段、21・・・両送手段、22・・・プラズマ照射手段
FIG. 1 is a sectional view of the Blaze 7 processing apparatus according to the present invention, and FIG. 2 is a plan view thereof. Also, Figure 3 shows the first
FIG. 4 is an enlarged side view of a portion of the plasma irradiation means in the figure, and FIG. 4 is a front view thereof. 1... Decompression processing container, 2... Feeding roll, 3...
Winding roll, 4.5...rotating shaft, 6,6°...cathode, 7°7"...anode 2.8...(for single-sided processing) path, 9...(both-sided processing) route, 8゛...guide chain (for single-sided processing), 9''...guide chain (for double-sided processing), 19...feeding means, 20...winding means, 21... - Both feeding means, 22... plasma irradiation means.

Claims (1)

【特許請求の範囲】 1、減圧処理容器と、この減圧処理容器内に収容された
被処理物の繰出手段、巻取手段、搬送手段およびプラズ
マ照射手段とからなるプラズマ処理装置であって、前記
プラズマ照射手段が、被処理物の片面処理用経路と、両
面処理用経路の双方を選択的に使用可能な構造であるこ
とを特徴とするプラズマ処理装置。 2、プラズマ照射手段が、2枚の対向して配置された板
状の陰極と、その間に配置された複数本の棒状の陽極と
からなり、少なくとも2組対向して配列されている特許
請求の範囲第1項記載のプラズマ処理装置。 3、被処理物の搬送手段の一部に、被処理物の片面処理
用経路と、両面処理用経路とにそれぞれ別個に案内可能
にする案内手段が設けられている特許請求の範囲第1項
記載のプラズマ処理装置。 4、案内手段がガイドチェーンである特許請求の範囲第
3項記載のプラズマ処理装置。
[Scope of Claims] 1. A plasma processing apparatus comprising a reduced pressure processing container, a feeding means, a winding means, a conveying means, and a plasma irradiation means for the object to be processed stored in the reduced pressure processing container, the plasma processing apparatus comprising: A plasma processing apparatus characterized in that the plasma irradiation means has a structure that allows selective use of both a single-sided processing path and a double-sided processing path of the object to be processed. 2. The plasma irradiation means is composed of two plate-shaped cathodes arranged opposite to each other and a plurality of rod-shaped anodes arranged between them, and at least two sets of plate-shaped anodes are arranged to face each other. The plasma processing apparatus according to scope 1. 3. The scope of claim 1, wherein a part of the conveyance means for the workpiece is provided with a guide means that allows the workpiece to be guided separately into a single-sided processing route and a double-sided processing route, respectively. The plasma processing apparatus described. 4. The plasma processing apparatus according to claim 3, wherein the guide means is a guide chain.
JP1369686A 1986-01-27 1986-01-27 Plasma treating apparatus Granted JPS62172036A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1369686A JPS62172036A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1369686A JPS62172036A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

Publications (2)

Publication Number Publication Date
JPS62172036A true JPS62172036A (en) 1987-07-29
JPH0334777B2 JPH0334777B2 (en) 1991-05-23

Family

ID=11840357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1369686A Granted JPS62172036A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

Country Status (1)

Country Link
JP (1) JPS62172036A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62174235A (en) * 1986-01-28 1987-07-31 Toray Ind Inc Plasma treatment apparatus for long object

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149441A (en) * 1984-01-17 1985-08-06 Kuraray Co Ltd Plasma treatment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149441A (en) * 1984-01-17 1985-08-06 Kuraray Co Ltd Plasma treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62174235A (en) * 1986-01-28 1987-07-31 Toray Ind Inc Plasma treatment apparatus for long object
JPH0441701B2 (en) * 1986-01-28 1992-07-09 Toray Industries

Also Published As

Publication number Publication date
JPH0334777B2 (en) 1991-05-23

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