JPS62172034A - Plasma treating apparatus - Google Patents

Plasma treating apparatus

Info

Publication number
JPS62172034A
JPS62172034A JP1369486A JP1369486A JPS62172034A JP S62172034 A JPS62172034 A JP S62172034A JP 1369486 A JP1369486 A JP 1369486A JP 1369486 A JP1369486 A JP 1369486A JP S62172034 A JPS62172034 A JP S62172034A
Authority
JP
Japan
Prior art keywords
winding
plasma
delivery
feeding
reduced pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1369486A
Other languages
Japanese (ja)
Inventor
Hidehiro Okamoto
岡本 秀宏
Katsumi Hasegawa
勝美 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1369486A priority Critical patent/JPS62172034A/en
Publication of JPS62172034A publication Critical patent/JPS62172034A/en
Pending legal-status Critical Current

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  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:An apparatus, having adjacent delivery means and winding means in a vacuum treating vessel and further a plasma irradiation means provided opposite thereto and capable of stably carrying out treatment even at a high treatment speed without changing the vacuum degree and minimizing the treating vessel. CONSTITUTION:An apparatus capable of feeding a material 15 to be treated in a state wound up around a shaft 4 as a delivery roll 2 which is a delivery means 16 to a plasma irradiation means 19 with combination of cathodes 6 and 6' anodes 7 and 7' through an one-side treating route 8 or both-side treating route 9 and winding onto a winding shaft 5 which is a winding means 17 and completing the treatment in a state of a roll 3. The delivery means 15 and winding means 17 are arranged in a very close vertical orientation and placed in an area 18 to prevent the contact of the material 15 to be treated in any stage of both means and further satisfy the formula D>=2A [0.343(B/A)<2>+0.707] (A is the radius of the delivery and winding rolls when the material 15 is completely wound up; B is the radius of both shafts; D is the distance between the central axes of both shafts).

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、フィルム、布帛等のシート状物や糸条物のよ
うな連続体をプラズマ処理するだめの’AMに関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an AM for plasma-treating a continuous body such as a sheet-like material such as a film or a fabric, or a continuous material such as a yarn material.

〔従来技術およびその問題点] 従来、繊維製品の洗濯による再汚染(黒ずみ)の防止加
工(以後SR加工と略)は、疎水性の合成繊維の場合に
強く求められている。これまでの方法では、現水性の樹
脂を繊維表面に付与することにより、疎水性繊維の表面
を親水化し、SR性を付与するようにしている。しかし
、かかる樹脂加工による方法は、着用時の洗濯などに対
する耐久性に乏しい。また、繊維表面に付着した樹脂に
染着した染料が移行する移行昇華性を促進するため、染
色堅牢度を低下させる。
[Prior art and its problems] Conventionally, there has been a strong demand for hydrophobic synthetic fibers to be treated to prevent recontamination (darkening) caused by washing textile products (hereinafter abbreviated as SR treatment). In conventional methods, the surface of hydrophobic fibers is made hydrophilic by applying a water-soluble resin to the fiber surface, thereby imparting SR properties. However, such resin processing methods lack durability against washing during wear. In addition, since it promotes transfer sublimation in which the dye dyed onto the resin attached to the fiber surface is transferred, the color fastness is reduced.

また、使用する親水性樹脂がおおむねポリエチレングリ
コール系樹脂またはこれの誘W体であるため、処理され
た布帛の風合いは、ワソツス感が強いものとなる等の多
くの欠点を有している。このため、このような欠点がな
く、しかも安価に工業的規模で、繊維布帛、特に合成繊
維布帛にSR性を付与できる技術の開発が望まれていた
Furthermore, since the hydrophilic resin used is generally a polyethylene glycol resin or its derivative, the treated fabric has many drawbacks such as a strong stiff feel. Therefore, it has been desired to develop a technique that does not have such drawbacks and can impart SR properties to fiber fabrics, especially synthetic fiber fabrics, at low cost and on an industrial scale.

この様な問題を解決する方法として、最近、繊維表面に
樹脂加工に代わって、プラズマ処理することにより繊維
表面を直接親水化し、木綿と同等以上の優れたSR性を
付与することができることが判ってきた。
As a way to solve these problems, it has recently been discovered that instead of resin treatment, the fiber surface can be directly hydrophilized by plasma treatment, giving it superior SR properties equivalent to or better than that of cotton. It's here.

しかしながら、シート状物及び繊維等の連続体を連続的
に処理し得るプラズマ処理装置に関し種々の問題が発生
し、その改良のため多数の[がある。これを大別すると
、シート状物等を大気中から繰出し、連続シール機構を
有する減圧された処理室に導入した後、再度大気中で巻
取るタイプと、シート状物等の繰出し、巻取りをすべて
一つの減圧された容器中で行なうバンチ連続タイプに分
けられる。前者の連続シール機構を有するタイプは、減
圧処理室を小形化できること、また、減圧状態を解除す
ることなく水準の切換が行なえ、作業性が良いことなど
の利点はあるが、繊維布帛などの高含気性シート状物の
処理に際しては、シートに含まれる空気などの揮発性物
質が、シール部分だけでは充分に除去できず、そのため
に処理速度が大きくなった場合のシール性に問題がある
However, various problems have arisen with plasma processing apparatuses that can continuously process continuous objects such as sheet-like materials and fibers, and there are many methods for improving these problems. Broadly speaking, there are two types: a type in which a sheet-like material is fed out from the atmosphere, introduced into a depressurized processing chamber with a continuous sealing mechanism, and then rolled up again in the atmosphere; It is divided into bunch continuous type, all conducted in one vacuum vessel. The former type, which has a continuous sealing mechanism, has the advantage of being able to downsize the decompression chamber and being able to change the level without releasing the decompression state, making it easy to work with. When processing an air-containing sheet, volatile substances such as air contained in the sheet cannot be sufficiently removed by the sealing portion alone, which causes problems in sealing performance when the processing speed is increased.

また、後者のバッチ連続タイプの処理機では、シート状
物等の繰出し、巻取り手段を真空容器内に内蔵するため
、減圧容器の容積が大きくなり、目的とする減圧度に到
達するまでの時間が過大となり処理効率が低下するとい
う問題を有する。
In addition, in the latter batch continuous type processing machine, the means for feeding out and winding up sheet-like materials is built into the vacuum container, so the volume of the vacuum container becomes large, and it takes time to reach the desired degree of vacuum. There is a problem in that the processing efficiency becomes excessive and the processing efficiency decreases.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上述した従来のプラズマ処理装置の欠
点を改良し、高速処理においても、減圧度が変化せず、
安定した条件下で加工でき、しかもバッチ連続式の特徴
を生かしつつ減圧容器の容積を極小にできるプラズマ処
理装置を提供するものである。
The purpose of the present invention is to improve the above-mentioned drawbacks of the conventional plasma processing apparatus, and to avoid changes in the degree of depressurization even during high-speed processing.
It is an object of the present invention to provide a plasma processing apparatus that can perform processing under stable conditions and can minimize the volume of a vacuum vessel while taking advantage of the characteristics of a continuous batch system.

〔発明の構成〕[Structure of the invention]

本発明は上記した目的を達成するため次の構成を有する
ものである。即ち、減圧処理容器と、前記減圧処理容器
内に収容された被処理物の繰出手段および巻取手段と、
前記減圧処理容器内に収容されたプラズマ照射手段とを
有するプラズマ処理装置であって、前記繰出手段と巻取
手段とを隣接配置した区域と、前記プラズマ照射手段と
を対向配置したプラズマ処理装置を特徴とするものであ
る。
The present invention has the following configuration to achieve the above object. That is, a reduced pressure processing container, a feeding means and a winding means for the object to be processed stored in the reduced pressure processing container,
A plasma processing apparatus having a plasma irradiation means housed in the reduced pressure processing container, wherein a region where the feeding means and the winding means are arranged adjacent to each other and the plasma irradiation means are arranged opposite to each other. This is a characteristic feature.

本発明のプラズマ処理装置は、減圧処理容器内に被処理
物の繰出手段と、巻取手段と、プラズマ照射手段とが収
容配置されたものであって、特に繰出手段と巻取手段と
は互いに隣接して近くに配置されており、更に隣接配置
されている繰出手段と巻取手段との配置区域と、前記プ
ラズマ照射手段とが対向して配置されているものである
。換言すれば、従来のプラズマ照射装置にあっては、被
処理物の繰出手段と巻取手段との中間にプラズマ照射手
段が配置されていたのに対し、本発明では、プラズマ照
射手段の一方の側に繰出手段と巻取手段とを配置せしめ
たものである。
In the plasma processing apparatus of the present invention, a means for feeding out the object to be processed, a winding means, and a plasma irradiation means are housed in a reduced pressure processing container, and in particular, the feeding means and the winding means are mutually arranged. The plasma irradiation means is arranged to face an area in which the feeding means and the winding means, which are arranged close to each other, are arranged adjacent to each other. In other words, in the conventional plasma irradiation apparatus, the plasma irradiation means was arranged between the means for feeding out the object to be treated and the means for winding it up, whereas in the present invention, one A feeding means and a winding means are arranged on the side.

減圧容器中における上記区域とプラズマ照射手段との位
置関係は特に限定されるものではなく、左右水平位置で
あっても、上下垂直配置であってもよい。本発明におけ
る被処理物としては、織物、編物、不織布、糸(紡績糸
、フィラメント糸)、フィルム、ウェッブ等いかなるも
のでも適用することができる。
The positional relationship between the above-mentioned area and the plasma irradiation means in the reduced pressure container is not particularly limited, and may be horizontally horizontal or vertically vertical. The object to be treated in the present invention may be any material such as woven fabrics, knitted fabrics, nonwoven fabrics, yarns (spun yarns, filament yarns), films, webs, etc.

本発明において、被処理物の繰出手段と、巻取手段とは
できる限り近接させて配置することが好ましいが、処理
作業中に被処理物が繰出手段から巻取手段に至る間に被
処理物同志が接触しない状態を維持しておく必要がある
。そのため、繰出手段に巻かれている被処理物の外表面
と、巻取手段に巻かれていく被処理物の外表面とがいず
れの段階においても接触しないようクリアランスを有す
るように配置することが好ましい。繰出手段と巻取手段
の駆動は、スピンドル駆動方式の回転手段を使用するこ
とがよく、両方の回転軸は略同径で構成されることが好
ましい。
In the present invention, it is preferable that the feeding means for the workpiece and the winding means are arranged as close as possible. It is necessary to maintain a state of no contact between comrades. Therefore, it is necessary to arrange the workpiece so that there is a clearance so that the outer surface of the workpiece being wound around the feeding means and the outside surface of the workpiece being wound around the winding means do not come into contact at any stage. preferable. The feeding means and the winding means are preferably driven by spindle-driven rotating means, and both rotating shafts are preferably configured to have approximately the same diameter.

繰出手段および巻取手段が、同径の軸で構成されている
場合に前記のクリアランスについて考えてみると、次の
関係を満足する場合に可能となる。
Considering the above-mentioned clearance when the feeding means and the winding means are constituted by shafts having the same diameter, the clearance is possible if the following relationship is satisfied.

ここで、 A:被処理物を完全に巻取った場合の、繰出手段(ロー
ル)および巻取手段(ロール)の半径。
Here, A: Radius of the feeding means (roll) and the winding means (roll) when the workpiece is completely wound up.

B:繰出および巻取用軸の半径。B: Radius of the unwinding and winding shaft.

D:繰出および巻取用軸心間距離。D: Distance between centers for feeding and winding.

ここで、D≧2Aの場合には本発明の繰出および巻取手
段をプラズマ照射手段に対向させて配置し、減圧処理室
の容積を極少する効果は半減するため、好ましくは、 となるように配置するのが望ましい。
Here, in the case of D≧2A, the effect of disposing the feeding and winding means of the present invention facing the plasma irradiation means and minimizing the volume of the vacuum processing chamber is halved, so preferably, It is desirable to place

以下本発明の一実施例を図面により説明する。An embodiment of the present invention will be described below with reference to the drawings.

第1図は本発明におけるプラズマ処理装置の側面図で、
第2図はその平面図である。第1図および第2図におい
て1は減圧処理容器で、12゜13は減圧処理容器1の
1部を構成する可動扉である。8および9は被処理物1
5の経路であり、8は被処理物150片面のみを処理す
る場合の経路を、また9は両面を処理する場合の経路を
示す。
FIG. 1 is a side view of the plasma processing apparatus according to the present invention.
FIG. 2 is a plan view thereof. In FIGS. 1 and 2, reference numeral 1 indicates a reduced pressure processing container, and reference numerals 12 and 13 indicate a movable door constituting a part of the reduced pressure processing container 1. As shown in FIG. 8 and 9 are the object to be processed 1
5, 8 indicates a route when only one side of the object to be processed 150 is processed, and 9 indicates a route when both sides are processed.

減圧処理容器1は排気管14を介して減圧ポンプ10に
接続されて10” 3Torr程度の減圧に保持され、
被処理物15が減圧下で低温プラズマ処理されるように
なっている。
The reduced pressure processing container 1 is connected to a reduced pressure pump 10 via an exhaust pipe 14 and is maintained at a reduced pressure of about 10" 3 Torr.
The object to be treated 15 is subjected to low-temperature plasma treatment under reduced pressure.

被処理物15は繰出手段16である繰出用ロール2とし
て軸4に巻上げられた状態で供給され、経路8または9
を経て巻取手段17である巻取用軸5に巻取られ、ロー
ル3の状態で完結する。
The workpiece 15 is supplied in a state where it is wound up on a shaft 4 as a feeding roll 2 serving as a feeding means 16, and is fed through a path 8 or 9.
After that, it is wound up on a winding shaft 5, which is a winding means 17, and is completed in the state of a roll 3.

これらの被処理物15の搬送は、駆動用モータ11によ
り軸4および/または5を駆動することによって行なわ
れる。
The objects to be processed 15 are transported by driving the shafts 4 and/or 5 by the drive motor 11.

被処理物15の繰出手段16と巻取手段17とは、極め
て近接した上下方向の隣接配列状態をとり、区域18に
配置されている。この配列は上下方向に限定されず左右
水平方向の配置も可能である。
The feeding means 16 and the winding means 17 for the object to be processed 15 are arranged in a very close vertically adjacent arrangement in the area 18 . This arrangement is not limited to the vertical direction, but can also be arranged horizontally and horizontally.

先に説明した通り、軸4および5は、それぞれの軸に被
処理物15を全量巻込んだ場合にその外周が互いに重な
り合うように配置し、しかも繰出し、巻取り作業中に互
いの外周が接触しないように接近させて配置するのがよ
い。
As explained above, the shafts 4 and 5 are arranged so that when the entire amount of the workpiece 15 is wound around each shaft, their outer circumferences overlap each other, and their outer circumferences come into contact with each other during the unwinding and winding operations. It is best to place them close to each other to avoid them.

本発明にあっては、上記区域18とプラズマ照射手段1
9とを対向させて減圧処理容器内に配置するものである
。その間隔は任意であり、また互いの配置方向はこの実
施例では水平方向であるが、上下方向でも差支えない。
In the present invention, the area 18 and the plasma irradiation means 1
9 are placed facing each other in the vacuum processing container. The spacing between them is arbitrary, and although the direction in which they are arranged is horizontal in this embodiment, they may also be arranged in the vertical direction.

プラズマ照射手段19は互いに対向配置された2枚の板
状の陰極6.6;6”、6゛とこの2枚の6,6;6°
、6゛間に配置した複数の棒状の陽極7,7゛の組合せ
で電極を構成してなるものである。
The plasma irradiation means 19 consists of two plate-shaped cathodes 6.6;6'', 6゛ and these two plate-shaped cathodes 6,6;6° arranged opposite to each other.
, 6. The electrode is constituted by a combination of a plurality of rod-shaped anodes 7, 7' arranged between 7' and 6'.

この電極構成の特徴は、陰極6,6°を板状にし、しか
も棒状の陽極7.7”をこの陰極の間に配置することに
より、放電による低温プラズマを効率良く利用すること
ができ、しかも電極が占める容積を最小限に減少するこ
とを可能にするものである。このような電極を採用する
ことにより、はじめて一つの減圧処理容器内で被処理物
の両面を1度に処理し得るようになる。
The feature of this electrode configuration is that the cathodes 6.6° are plate-shaped and the rod-shaped anode 7.7" is placed between the cathodes, making it possible to efficiently utilize the low-temperature plasma generated by the discharge. This makes it possible to reduce the volume occupied by the electrode to a minimum.By adopting such an electrode, it is possible to process both sides of the object at once in one vacuum processing container for the first time. become.

ここで、さらに放電効率を高めるためには、互いに対向
配置された陰極板の表面積(陽極に相対する面の総面積
)は棒状陽極の表面積の総和より大きくする必要があり
、好ましくは1.5倍以上、さらに好ましくは2.5倍
以上とすることによって安定した放電を行なうことがで
きる。
Here, in order to further increase the discharge efficiency, the surface area of the cathode plates (the total area of the surfaces facing the anode) placed opposite to each other needs to be larger than the total surface area of the rod-shaped anodes, preferably 1.5 Stable discharge can be achieved by increasing the amount by at least twice as much, more preferably by at least 2.5 times.

〔発明の効果〕〔Effect of the invention〕

本発明の装置によると、高含気性のシート状物、たとえ
ば織編物、不織布、トウ、ウエツジ、糸、コーテイング
物、多孔質フィルムなどを処理する場合に、特に処理速
度の変化による減圧処理室の減圧度の変化もなく、ハツ
チ弐処理機の特徴を維持しつつ、多量の被処理物の処理
を行なうことができる。また、本発明においては減圧処
理容器の容積を減少でき所定の減圧度に到達するまでの
時間を短縮することができる。
According to the apparatus of the present invention, when processing highly air-containing sheet-like materials such as woven and knitted fabrics, non-woven fabrics, tows, wedges, yarns, coated materials, porous films, etc., the reduced pressure processing chamber is There is no change in the degree of pressure reduction, and it is possible to process a large amount of objects while maintaining the characteristics of the Hutch 2 processing machine. Further, in the present invention, the volume of the reduced pressure processing container can be reduced, and the time required to reach a predetermined degree of reduced pressure can be shortened.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明におけるプラズマ処理装置の横断面図、
第2図は同プラズマ処理装置の側面図である。 1・・・減圧処理容器、2・・・繰出ロール、3・・・
巻取ロール、4・・・繰出用軸、5・・・巻取用軸、6
゜6′・・・陰極、7,7°・・・陽極、15・・・被
処理物、16・・・繰出手段、17・・・巻取手段、1
9・・・プラズマ照射手段。
FIG. 1 is a cross-sectional view of a plasma processing apparatus according to the present invention;
FIG. 2 is a side view of the plasma processing apparatus. 1... Decompression processing container, 2... Feeding roll, 3...
Winding roll, 4... Feeding shaft, 5... Winding shaft, 6
゜6′...Cathode, 7,7°...Anode, 15...Workpiece, 16...Feeding means, 17... Winding means, 1
9...Plasma irradiation means.

Claims (1)

【特許請求の範囲】 1、減圧処理容器と、前記減圧処理容器内に収容された
被処理物の繰出手段および巻取手段と、前記減圧処理容
器内に収容されたプラズマ照射手段とを有するプラズマ
処理装置であって、前記繰出手段と巻取手段とを隣接配
置した区域と、前記プラズマ照射手段とを対向配置した
ことを特徴とするプラズマ処理装置。 2、隣接配置されている前記繰出手段と前記巻取手段と
は、処理中において各手段に係合している被処理物同志
が互いに接触しないようにクリアランスを介して対向配
置されている特許請求の範囲第1項記載のプラズマ処理
装置。 3、前記繰出手段および巻取手段は、略同径の軸で構成
されている特許請求の範囲第1項記載のプラズマ処理装
置。
[Scope of Claims] 1. A plasma comprising a reduced pressure processing container, a feeding means and a winding means for an object to be processed contained in the reduced pressure processing container, and a plasma irradiation means contained in the reduced pressure processing container. A plasma processing apparatus characterized in that an area in which the feeding means and the winding means are arranged adjacent to each other and the plasma irradiation means are arranged opposite to each other. 2. A patent claim in which the feeding means and the winding means, which are arranged adjacent to each other, are arranged opposite to each other with a clearance so that the objects to be processed that are engaged with each means do not come into contact with each other during processing. The plasma processing apparatus according to item 1. 3. The plasma processing apparatus according to claim 1, wherein the feeding means and the winding means are constituted by shafts having approximately the same diameter.
JP1369486A 1986-01-27 1986-01-27 Plasma treating apparatus Pending JPS62172034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1369486A JPS62172034A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1369486A JPS62172034A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

Publications (1)

Publication Number Publication Date
JPS62172034A true JPS62172034A (en) 1987-07-29

Family

ID=11840300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1369486A Pending JPS62172034A (en) 1986-01-27 1986-01-27 Plasma treating apparatus

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JP (1) JPS62172034A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0730057A1 (en) * 1993-11-03 1996-09-04 Aktsionernoe Obschestvo "Tsvet" Machine for processing textile sheets with a low-temperature plasma

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747333A (en) * 1980-09-02 1982-03-18 Nitto Electric Ind Co Ltd Method of forming thin polymer film on film
JPS60149441A (en) * 1984-01-17 1985-08-06 Kuraray Co Ltd Plasma treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747333A (en) * 1980-09-02 1982-03-18 Nitto Electric Ind Co Ltd Method of forming thin polymer film on film
JPS60149441A (en) * 1984-01-17 1985-08-06 Kuraray Co Ltd Plasma treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0730057A1 (en) * 1993-11-03 1996-09-04 Aktsionernoe Obschestvo "Tsvet" Machine for processing textile sheets with a low-temperature plasma
EP0730057A4 (en) * 1993-11-03 1996-11-19 Aktsionernoe Obschestvo Tsvet Machine for processing textile sheets with a low-temperature plasma

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