JPS62169828A - Production of substrate for printed circuit - Google Patents
Production of substrate for printed circuitInfo
- Publication number
- JPS62169828A JPS62169828A JP984186A JP984186A JPS62169828A JP S62169828 A JPS62169828 A JP S62169828A JP 984186 A JP984186 A JP 984186A JP 984186 A JP984186 A JP 984186A JP S62169828 A JPS62169828 A JP S62169828A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy
- glycidyl ether
- resin composition
- laminate
- epoxy compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 title abstract description 4
- 239000004593 Epoxy Substances 0.000 claims abstract description 38
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000003822 epoxy resin Substances 0.000 claims abstract description 22
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 22
- 229920003986 novolac Polymers 0.000 claims abstract description 15
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 229930185605 Bisphenol Natural products 0.000 claims 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 1
- 229940125898 compound 5 Drugs 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 19
- 239000004744 fabric Substances 0.000 abstract description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 9
- 239000003795 chemical substances by application Substances 0.000 abstract description 9
- 239000011889 copper foil Substances 0.000 abstract description 6
- 239000003365 glass fiber Substances 0.000 abstract description 5
- 239000002966 varnish Substances 0.000 abstract description 5
- DGUJJOYLOCXENZ-UHFFFAOYSA-N 4-[2-[4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenol Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 DGUJJOYLOCXENZ-UHFFFAOYSA-N 0.000 abstract description 4
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 abstract description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 3
- 229910000077 silane Inorganic materials 0.000 abstract description 3
- 239000002798 polar solvent Substances 0.000 abstract description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 abstract 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 abstract 2
- 239000011342 resin composition Substances 0.000 abstract 2
- 229910015900 BF3 Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000000835 fiber Substances 0.000 description 5
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229920006231 aramid fiber Polymers 0.000 description 2
- -1 aryl glycidyl ether Chemical compound 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical compound CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000012783 reinforcing fiber Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
a、産業上の利用分野
本発明は、従来よりも優れた耐熱性・寸法安定性と作業
性とのバランスのとれたエポキシ樹脂系のプリント回路
用基板の133方法に関し、更に詳しくは、特定のエポ
キシ化合物組成を用いることにより上記目的を達成せl
υとする製造方法である。[Detailed Description of the Invention] a. Industrial Application Field The present invention relates to a 133 method for producing an epoxy resin-based printed circuit board that has a good balance between heat resistance, dimensional stability, and workability that are superior to conventional methods. More specifically, the above objective can be achieved by using a specific epoxy compound composition.
This is a manufacturing method that makes υ.
b、従来技術
大規模集積回路の高密度化及び電子部品の小型化に伴い
、それをうけるプリント配線板も高密度化、多層化の方
向へ向っている。b. Prior Art As the density of large-scale integrated circuits increases and electronic components become smaller, the printed wiring boards that receive them are also becoming more dense and multilayered.
ところで一般にプリント回路用基板の製造に用いられる
マトリックス樹脂としては、エポキシ樹脂が賞用されて
いる。即ち、エポキシ樹脂は一般に電気特性にすぐれ、
またガラス繊維や銅板どの接着性や硬化作業性等にすぐ
れており、プリン1−回路基板用として広く用いられる
に到っている。By the way, epoxy resin is generally used as a matrix resin for manufacturing printed circuit boards. In other words, epoxy resins generally have excellent electrical properties,
It also has excellent adhesion and curing workability to glass fibers and copper plates, and has come to be widely used for printed circuit boards.
かかるプリント回路基板用のエポキシ樹脂は、ビスフェ
ノールA−ジグリシジルエーテル型のエポキシ化合物と
ジシアンジアミドをも包含したアミン系硬化剤の組合せ
が一般に用いられている。As the epoxy resin for such printed circuit boards, a combination of a bisphenol A diglycidyl ether type epoxy compound and an amine curing agent including dicyandiamide is generally used.
しかしながら、高密度化・多層化が進行するに従って耐
熱性・寸法安定性等の面で、上記の如き一般的エボキシ
樹脂では性能が不足していることが明らかとなり、それ
らの改良が強く望まれるに到っている。そのため、゛エ
ポキシ樹脂よりも耐熱性の優れた、例えばポリイミド樹
脂がこの用途に用いられはじめているが、作業性・接着
性の面でエポキシ樹脂に比べるとどうしても劣らざるを
得ない。However, as higher density and multilayer technology progresses, it has become clear that the general epoxy resins described above lack performance in terms of heat resistance, dimensional stability, etc., and improvements in these are strongly desired. It has arrived. For this reason, polyimide resins, which have better heat resistance than epoxy resins, are beginning to be used for this purpose, but they are inevitably inferior to epoxy resins in terms of workability and adhesion.
そこで、エポキシ樹脂の特徴である作業性や接着性を保
持しつつ、ポリイミドに近い耐熱性を発揮しうるエポキ
シ樹脂が得られれば極めて有利に本用途に用いうろこと
になるはずである。Therefore, if an epoxy resin can be obtained that can exhibit heat resistance close to that of polyimide while retaining the workability and adhesive properties that are characteristic of epoxy resins, it would be extremely advantageous to use it for this purpose.
本発明者はかかる目的に用いうる耐熱性エポキシ樹脂を
鋭意検討した結果、α−ナフトールノボラック・グリシ
ジルエーテル型のエポキシ化合物に着目した。As a result of intensive studies on heat-resistant epoxy resins that can be used for such purposes, the inventors of the present invention focused on α-naphthol novolak glycidyl ether type epoxy compounds.
かかる化合物は、フェノールをより大きな芳香環を有す
るナフトールにかえる事により、対応するフェノールノ
ボラックグリシジルエーテル化合物より誘導されるエポ
キシ樹脂よりも数等優れた耐熱性・低吸湿性を有するエ
ポキシ樹脂が得られる。所が、かかるエポキシ化合物単
独で用いると硬化後のエポキシ樹脂が、かたくなり過ぎ
て可撓性や接着性・作業性の面で、プリント回路用基板
として問題点が生じる。By replacing phenol with naphthol, which has a larger aromatic ring, such a compound can provide an epoxy resin that has heat resistance and low moisture absorption that are numerically superior to epoxy resins derived from the corresponding phenol novolac glycidyl ether compounds. . However, if such an epoxy compound is used alone, the epoxy resin after curing becomes too hard, causing problems in terms of flexibility, adhesiveness, and workability when used as a printed circuit board.
しかるに、特定のビスフェノールA−ジグリシジルエー
テル型のエポキシ化合物を単独で用いた場合は勿論、そ
の耐熱性を改良するために例えばフェノールノボラック
グリシジルエーテル型エポキシ化合物をそれに加えて用
いた場合に比して、より良好な耐熱性が発揮しうる事を
見出し得て本発明に到達したものである。However, when a specific bisphenol A-diglycidyl ether type epoxy compound is used alone, for example, a phenol novolak glycidyl ether type epoxy compound is used in addition to it to improve its heat resistance. The present invention was achieved by discovering that better heat resistance can be exhibited.
即ち本発明は、繊維性基材にエポキシ樹脂組成物を含浸
・積層する工程及びそれに電導性物体を組合せる工程を
有するプリント回路用基板の製造方法において、当該エ
ポキシ樹脂組成物として、エポキシ当量が170〜35
00のビスフェノールA−グリシジルエーテル系エポキ
シ化合物5〜90重量部と、エポキシ当量が210〜4
00のα−ナフトールノボラックグリシジルエーテル9
5〜10重量部とからなるエポキシ混合物を主体として
用いることを特徴とするプリント回路用基板の製造方法
である。That is, the present invention provides a method for manufacturing a printed circuit board, which includes a step of impregnating and laminating a fibrous base material with an epoxy resin composition and a step of combining the epoxy resin composition with a conductive object, in which the epoxy resin composition has an epoxy equivalent of 170-35
5 to 90 parts by weight of a bisphenol A-glycidyl ether type epoxy compound of No. 00 and an epoxy equivalent of 210 to 4.
00 α-naphthol novolak glycidyl ether 9
This method of manufacturing a printed circuit board is characterized in that an epoxy mixture consisting of 5 to 10 parts by weight is used as a main component.
本発明方法に用いられるα−ナフトールノボラック・グ
リシジルエーテル系エポキシ化合物は、フェノールの代
りにα−ナフトールを用いてフェノールノボラックを得
るのと同様の条件下でホルムアルデヒドと酸性触媒の共
存下に反応せしめる事によって得られたα−ナフトール
ノボラックを、これも一般的なアリールグリシジルエー
テルを製造する方法に従って、酸受容体の共存下に、エ
ピクロルヒドリンと反応せしめる事によって得られる。The α-naphthol novolak/glycidyl ether epoxy compound used in the method of the present invention can be reacted in the presence of formaldehyde and an acidic catalyst under the same conditions as those used to obtain phenol novolac using α-naphthol instead of phenol. The α-naphthol novolak obtained by the above method is reacted with epichlorohydrin in the presence of an acid acceptor, also according to the general method for producing aryl glycidyl ether.
酸性触媒としては、シュウ酸、リン酸、塩酸等が好適に
用いられ、ホルムアルデヒドとしてはホルマリンのかた
ちのものが好適に用いられる。As the acidic catalyst, oxalic acid, phosphoric acid, hydrochloric acid, etc. are preferably used, and as the formaldehyde, formalin is preferably used.
α−ナフトールノボラックの縮合度は、用いるα−ナフ
トールとホルムアルデヒドのモル比や反応条件によって
調節する事が出来る。α−ナフトールの一部をフェノー
ル、クレゾール、ヒトOキシベンツアルデヒド等におき
かえて用いる事も出来る。一般に、1分子中に平均して
α−ナフトール核が2〜12、より好ましくは、3〜1
0含まれるノボラックが好適に用いられる。かかるα−
ナフトールノボラックとエピクロルヒドリンの反応にお
いて、副生する塩化水素の受容体しては、苛性ソーダ等
が好適に用いられる。The degree of condensation of α-naphthol novolak can be adjusted by adjusting the molar ratio of α-naphthol and formaldehyde used and reaction conditions. It is also possible to replace a part of α-naphthol with phenol, cresol, human O-oxybenzaldehyde, etc. Generally, there are on average 2 to 12 α-naphthol nuclei in one molecule, more preferably 3 to 1
A novolak containing 0 is preferably used. This α−
In the reaction of naphthol novolak and epichlorohydrin, caustic soda or the like is preferably used as a receptor for hydrogen chloride produced as a by-product.
かくして、得られたα−ナフトールノボラックグリシジ
ルエーテル系化合物はエポキシ当量が210〜4009
/eQ、のものが用いられる。特にエポキシ当量が21
0〜300g/eq、のちのが好ましい。The α-naphthol novolak glycidyl ether compound thus obtained has an epoxy equivalent of 210 to 4009.
/eQ is used. Especially when the epoxy equivalent is 21
0 to 300 g/eq, preferably later.
一方の必須成分であるビスフェノールA−グリシジルエ
ーテル系エポキシ化合物は、ビスフェノール八とエピク
ロルヒドリンの酸受容体共存下における反応によって得
られるが、各種のエポキシ当量のものが、市販されてお
り容易に入手出来る。The bisphenol A-glycidyl ether epoxy compound, which is one of the essential components, is obtained by the reaction of bisphenol A-glycidyl ether with epichlorohydrin in the presence of an acid acceptor, and various epoxy equivalents are commercially available and easily available.
本発明においては、エポキシ当量が170〜3500f
f/(!Q、のちのが用いられるが、特に200〜10
00り/eQ、のものが好ましい。In the present invention, the epoxy equivalent is 170 to 3500f.
f/(!Q, later used, but especially 200 to 10
00ri/eQ is preferable.
所定割合のかかるエポキシ化合物、エポキシ硬化剤を適
当な共通溶媒に溶解し、ワニスを作成し、それを!I帷
性基材例えば補強繊維布に含浸し、乾燥、熱処理してB
−ステージ状態のエポキシ樹脂として、いわゆるプリプ
レグを作成する。エポキシ硬化剤としては、ジシアンジ
アミドや、4.4′−ジアミノジフェニルスルホン<D
DS)。Dissolve a predetermined proportion of the epoxy compound and epoxy curing agent in a suitable common solvent, create a varnish, and use it! I Impregnate a cloth base material such as reinforcing fiber cloth, dry it, and heat-treat it.
- Creating a so-called prepreg as an epoxy resin in a stage state. Examples of the epoxy curing agent include dicyandiamide and 4,4'-diaminodiphenylsulfone<D
DS).
4.4′−ジアミノジフェニルメタン、m−フェニレン
ジアミンの如き、芳香族アミン系の硬化剤が特に好適に
用いられる。就中、DDS及びジシアンジアミドが、B
−ステージ・プリプレグのポットライフや硬化物のTg
の見地から好適である。Aromatic amine curing agents such as 4.4'-diaminodiphenylmethane and m-phenylenediamine are particularly preferably used. Among them, DDS and dicyandiamide are B
- Pot life of stage prepreg and Tg of cured product
It is suitable from the viewpoint of
エポキシ樹脂と化学的に反応する硬化剤以外に、硬化の
速度を調節する硬化促進剤も適宜選択して用いる事が出
来る。かかる促進剤はカチオン系及びアニオン系が知ら
れているが、酸フッ化ホウ素モノエチルアミン錯塩等も
好適に用いる事が出来る。エポキシ化合物と硬化剤の使
用割合は、一般に両者の化学反応当世付近の割合が用い
られる。In addition to the curing agent that chemically reacts with the epoxy resin, a curing accelerator that adjusts the curing speed can also be appropriately selected and used. Although cationic and anionic accelerators are known, acid boron fluoride monoethylamine complex salts and the like can also be suitably used. The ratio of the epoxy compound and the curing agent to be used is generally the same as the chemical reaction between the two.
かかるエポキシ化合物と硬化剤のワニスを作成するのに
用いられる溶媒としては、テトラヒドロフラン、ジオキ
サン等のエーテル系溶媒、アセトン、メチルエチルケト
ン、メチルイソブチルケトン等のケトン系溶媒、酢酸エ
チル、酢酸ブヂル等のエステル系溶媒、ジヂメルボルム
アミド、ジメチルアレドアミド等のアミド系溶媒等の極
性溶媒が主溶媒として用いられる。溶媒の選定及び濃度
の選定についてはワニスの含浸時の粘度及び溶媒の蒸発
速度を考慮して適当に選べばよい。Solvents used to create a varnish containing such an epoxy compound and a hardening agent include ether solvents such as tetrahydrofuran and dioxane, ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, and ester solvents such as ethyl acetate and butyl acetate. A polar solvent such as an amide solvent such as didymelbormamide or dimethylaledamide is used as the main solvent. The selection of the solvent and the concentration may be appropriately selected in consideration of the viscosity of the varnish during impregnation and the evaporation rate of the solvent.
補強用繊維布としては、一般にはエポキシシラン等のい
わゆるシランカプラーで処理したガラス繊維織布が用い
られるが、ガラス繊維マツ1〜も単独或はガラス繊維織
布と組合せて用いる事が出来る。それ以外の繊維例えば
アラミド繊維l維のマット及び/又は不織布も、該繊維
が繊維軸方向への熱膨張率が極めて小さい事を利用して
用いる事も出来る。これらのアラミドより得られるフィ
ブリッド及び/又はこれらのアラミド繊維をすきこんだ
紙も用いる事が出来る。通常のセルロース系の紙も使用
する事が出来る。As the reinforcing fiber cloth, a glass fiber woven cloth treated with a so-called silane coupler such as epoxy silane is generally used, but glass fiber pine 1 to 1 can also be used alone or in combination with a glass fiber woven cloth. Other fibers such as aramid fiber mats and/or nonwoven fabrics can also be used by taking advantage of the fact that these fibers have an extremely small coefficient of thermal expansion in the fiber axis direction. Fibrids obtained from these aramids and/or paper in which these aramid fibers are inserted can also be used. Ordinary cellulose paper can also be used.
かかる繊維布への上記ワニスの含浸、乾燥及びB−ステ
ージ化のための熱処理は、周、知の各種方法によって実
施する事が出来る。即ち、長尺の繊維布を用いて、連続
的に処理を順次施す方式およ及びバッチ式に一定大きさ
のm帷を順次処理していく方式等いかなる方式をもとる
事が出来る。Impregnation of the varnish into the fiber cloth, drying, and heat treatment for B-staging can be carried out by various well-known methods. That is, any method can be used, such as a method in which a long fiber cloth is sequentially treated, or a method in which m-threads of a certain size are sequentially treated in a batch manner.
乾燥、B−ステージ化の処理条件については、使用する
溶媒、硬化剤の種類によってその反応条件は異なるが簡
単な実験によって、その条件を決める事が出来る。Regarding the processing conditions for drying and B-staging, the reaction conditions vary depending on the type of solvent and curing agent used, but the conditions can be determined by simple experiments.
かくして得られたプリプレグを製造しようとする積層板
の厚さに応じて、適当枚数重ね合わせ、いわゆるサブス
トラッテイブ法に用いる銅張積層板を得ようとする場合
には両面又は片面に銅箔を重ねて、加熱プレスにより積
層板とする事が出来る。Depending on the thickness of the laminate to be manufactured from the thus obtained prepreg, an appropriate number of prepregs may be stacked together to obtain a copper-clad laminate for use in the so-called substrative method. They can be stacked together to form a laminate by hot pressing.
かかる銅張り積層板に用いる銅箔は、圧延銅箔及び電解
銅箔が用いられ、プリプレグへの接着面は粗面でかつ接
着増進処理をおこなったものが用いられる。The copper foil used in such a copper-clad laminate is a rolled copper foil or an electrolytic copper foil, and the surface to be bonded to the prepreg is rough and has been subjected to an adhesion enhancement treatment.
多層板を得る場合には、かかる銅張積層板を配線処理し
た後、さらにプリプレグをはさんで一体化処理されるた
め、銅箔の両面が樹脂との接着に用いられる事になる。When obtaining a multilayer board, after the copper-clad laminate is processed for wiring, it is further integrated with prepreg, so both sides of the copper foil are used for adhesion to the resin.
サブストラクティブ法用銅張積層板の形以外に、プリプ
レグの積層のみによって、積層板を作成し、表面又は樹
脂内に無電解メッキ用の核剤を付着させ、接着促進処理
をほどこした後、レジストにより回路パターンを作成、
無電解メッキ処理によりレジストの付着していない部分
に、銅等による回路を作成せしめるいわゆるアディティ
ブ法による基板として用いる事が出来る。さらに、銀や
銅の粉末を多口に含むいわゆる導電性ペイントを用いて
スクリーン印刷等によって該積層板上に回路を作成せし
める方法によってもよい。In addition to the form of copper-clad laminates for the substructive method, laminates are created only by laminating prepregs, a nucleating agent for electroless plating is attached to the surface or in the resin, and after adhesion promotion treatment, resist is applied. Create a circuit pattern by
It can be used as a substrate using the so-called additive method, in which a circuit is formed using copper or the like in areas where resist is not attached by electroless plating. Furthermore, a method may be used in which a circuit is formed on the laminate by screen printing or the like using a so-called conductive paint containing a large amount of silver or copper powder.
いずれの導体回路作成法によっても、本発明によるエポ
キシ化合物の混合物を用いて得た回路基板は、そのすぐ
れた耐熱性1寸法安定性、低吸湿性によって従来のエポ
キシ樹脂積層板をこえた優れた実用性能を発揮し、高密
度用多層板用として優れたものである。Regardless of the conductor circuit preparation method, the circuit board obtained using the epoxy compound mixture according to the present invention has excellent heat resistance, one-dimensional stability, and low moisture absorption, which surpasses conventional epoxy resin laminates. It exhibits practical performance and is excellent for high-density multilayer boards.
以下に、実施例、比較例をあげて本発明を詳述する。実
施例は説明のためであってそれに限定するものではない
。The present invention will be described in detail below with reference to Examples and Comparative Examples. The examples are illustrative and not limiting.
(1) 使用材料
(イ) α−ナフトールノボラックグリシジルエーテル
型エポキシ化合物については、本文中の説明の如き製法
により調製したエポキシ当量250g/eQ、 、融点
65〜93℃のものを使用to+ ビスフェノールA
−グリシジルエーテル型エポキシ化合物はエピコート1
001として市販のちのを使用(エポキシ当量450〜
500g/(!Q、 )
(司 比較のためのフェノールノボラックグリシジルエ
ーテル型エポキシ化合物としては、エビコート 154
(エポキシ当量176〜181)として市販のものを使
用
(ニ) ガラスクロスとしては、日東紡製WE18に
105BZ−2(目位置205!?/ゴ)を使用(ホ)
銅箔3μmの口拡グレード製電解銅箔を使用
(へ) ジアミノジフェニルスルホン(DDS)。(1) Materials used (a) For the α-naphthol novolac glycidyl ether type epoxy compound, use one prepared by the manufacturing method as explained in the text, with an epoxy equivalent weight of 250 g/eQ, and a melting point of 65 to 93°C.
- Glycidyl ether type epoxy compound is Epicote 1
Use commercially available Chino as 001 (epoxy equivalent: 450~
500g/(!Q, ) (Tsukasa) As a phenol novolak glycidyl ether type epoxy compound for comparison, Ebicoat 154
(Epoxy equivalent: 176-181) Use a commercially available glass cloth (D) As the glass cloth, use Nittobo WE18 105BZ-2 (eye position 205!?/G) (E)
Diaminodiphenyl sulfone (DDS) is used.
三フッ化ホウ素モノエチルアミン錯塩、メチルエチルケ
トン等は市販のものを使用
(2)銅張り積層板試作条件
表1にしめした如き条件にて、銅張り積層板試作を行な
った。Commercially available boron trifluoride monoethylamine complex salts, methyl ethyl ketone, etc. were used. (2) Conditions for trial production of copper-clad laminates A trial production of copper-clad laminates was carried out under the conditions shown in Table 1.
(3)得られた銅張り積層板性能測定 結果は表2にまとめた如くである。(3) Performance measurement of the obtained copper-clad laminate The results are summarized in Table 2.
(以下余白)
表 2 試作銅張り積層板性能
(測定方法−JIS C6481にtI!拠しておこ
なった)以上の結果より判る通り、実施例1及び実施例
2は従来の耐熱エポキシ組成物である比較例1並みの作
業性を維持しており、かつα−ナフ1−−ルノボラック
グリシジルエーテル型エポキシ単独使用の比較例2に比
較して、よく改良されている事が判る。(Leaving space below) Table 2 Performance of prototype copper-clad laminate (Measurement method - Based on JIS C6481 tI!) As can be seen from the above results, Examples 1 and 2 are conventional heat-resistant epoxy compositions. It can be seen that the workability is maintained at the same level as Comparative Example 1, and it is much improved compared to Comparative Example 2 in which α-naph 1-lunovolak glycidyl ether type epoxy is used alone.
1すられた積層板の耐熱性は、比較例2に近く比較例1
に比し大巾に改良されており、ひきはがし強さや半田耐
熱性の如く、積層板の可撓性に関係する測定項目につい
ては比較例1に近く、比較例2よりも大巾に改良されて
いる事が判る。1 The heat resistance of the smoothed laminate is close to that of Comparative Example 2.
The measurement items related to the flexibility of the laminate, such as peel strength and soldering heat resistance, are close to Comparative Example 1, and are significantly improved compared to Comparative Example 2. I can see that it is.
Claims (1)
程及びそれに電導性物体を組合せる工程を有するプリン
ト回路用基板の製造方法において、当該エポキシ樹脂組
成物として、エポキシ当量が170〜3500のビスフ
ェノールA−グリシジルエーテル系エポキシ化合物5〜
90重量部と、エポキシ当量が210〜400のα−ナ
フトールノボラックグリシジルエーテル95〜10重量
部とからなるエポキシ混合物を主体として用いることを
特徴とするプリント回路用基板の製造方法。In a method for producing a printed circuit board, which includes a step of impregnating and laminating a fibrous base material with an epoxy resin composition and a step of combining a conductive object therewith, the epoxy resin composition includes bisphenol having an epoxy equivalent of 170 to 3,500. A-Glycidyl ether epoxy compound 5~
90 parts by weight and 95 to 10 parts by weight of α-naphthol novolak glycidyl ether having an epoxy equivalent of 210 to 400.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP984186A JPS62169828A (en) | 1986-01-22 | 1986-01-22 | Production of substrate for printed circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP984186A JPS62169828A (en) | 1986-01-22 | 1986-01-22 | Production of substrate for printed circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62169828A true JPS62169828A (en) | 1987-07-27 |
JPH0423654B2 JPH0423654B2 (en) | 1992-04-22 |
Family
ID=11731347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP984186A Granted JPS62169828A (en) | 1986-01-22 | 1986-01-22 | Production of substrate for printed circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62169828A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003018675A1 (en) * | 2001-08-31 | 2003-03-06 | Sumitomo Bakelite Company Limited | Resin composition, prepreg, laminated sheet and semiconductor package |
CN102363891A (en) * | 2011-11-18 | 2012-02-29 | 山东金宝电子股份有限公司 | Double photoelectrolysis copper foil replacing rolled copper foil and used for production of flexible copper clad laminate, and production process of double photoelectrolysis copper foil |
JP2012052143A (en) * | 2010-02-03 | 2012-03-15 | Dic Corp | Process for production of phenol resin composition |
-
1986
- 1986-01-22 JP JP984186A patent/JPS62169828A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003018675A1 (en) * | 2001-08-31 | 2003-03-06 | Sumitomo Bakelite Company Limited | Resin composition, prepreg, laminated sheet and semiconductor package |
JP2012052143A (en) * | 2010-02-03 | 2012-03-15 | Dic Corp | Process for production of phenol resin composition |
JP4930656B2 (en) * | 2010-02-03 | 2012-05-16 | Dic株式会社 | Phenol resin composition, production method thereof, curable resin composition, cured product thereof, and printed wiring board |
CN102741344A (en) * | 2010-02-03 | 2012-10-17 | Dic株式会社 | Phenol resin composition, process for production thereof, curable resin composition, cured products tehreof, and printed wiring board |
US8394911B2 (en) | 2010-02-03 | 2013-03-12 | Dic Corporation | Phenol resin composition, production method therefor, curable resin composition, cured product thereof, and printed circuit board |
CN102363891A (en) * | 2011-11-18 | 2012-02-29 | 山东金宝电子股份有限公司 | Double photoelectrolysis copper foil replacing rolled copper foil and used for production of flexible copper clad laminate, and production process of double photoelectrolysis copper foil |
Also Published As
Publication number | Publication date |
---|---|
JPH0423654B2 (en) | 1992-04-22 |
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