JPS6216276B2 - - Google Patents
Info
- Publication number
- JPS6216276B2 JPS6216276B2 JP6363083A JP6363083A JPS6216276B2 JP S6216276 B2 JPS6216276 B2 JP S6216276B2 JP 6363083 A JP6363083 A JP 6363083A JP 6363083 A JP6363083 A JP 6363083A JP S6216276 B2 JPS6216276 B2 JP S6216276B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- etched
- etching solution
- solution
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6363083A JPS59190366A (ja) | 1983-04-13 | 1983-04-13 | 3−v族化合物結晶用化学エツチング液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6363083A JPS59190366A (ja) | 1983-04-13 | 1983-04-13 | 3−v族化合物結晶用化学エツチング液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59190366A JPS59190366A (ja) | 1984-10-29 |
| JPS6216276B2 true JPS6216276B2 (cg-RX-API-DMAC7.html) | 1987-04-11 |
Family
ID=13234853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6363083A Granted JPS59190366A (ja) | 1983-04-13 | 1983-04-13 | 3−v族化合物結晶用化学エツチング液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59190366A (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5181924B2 (ja) * | 2008-08-21 | 2013-04-10 | ソニー株式会社 | 半導体発光素子及びその製造方法、並びに、下地に設けられた凸部、下地における凸部形成方法 |
-
1983
- 1983-04-13 JP JP6363083A patent/JPS59190366A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59190366A (ja) | 1984-10-29 |
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