JPS6216275B2 - - Google Patents

Info

Publication number
JPS6216275B2
JPS6216275B2 JP8882182A JP8882182A JPS6216275B2 JP S6216275 B2 JPS6216275 B2 JP S6216275B2 JP 8882182 A JP8882182 A JP 8882182A JP 8882182 A JP8882182 A JP 8882182A JP S6216275 B2 JPS6216275 B2 JP S6216275B2
Authority
JP
Japan
Prior art keywords
diffraction grating
semiconductor substrate
etching
inp
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8882182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58207009A (ja
Inventor
Hajime Okuda
Yutaka Uematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP8882182A priority Critical patent/JPS58207009A/ja
Publication of JPS58207009A publication Critical patent/JPS58207009A/ja
Publication of JPS6216275B2 publication Critical patent/JPS6216275B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Semiconductor Lasers (AREA)
JP8882182A 1982-05-27 1982-05-27 回折格子の製造方法 Granted JPS58207009A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8882182A JPS58207009A (ja) 1982-05-27 1982-05-27 回折格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8882182A JPS58207009A (ja) 1982-05-27 1982-05-27 回折格子の製造方法

Publications (2)

Publication Number Publication Date
JPS58207009A JPS58207009A (ja) 1983-12-02
JPS6216275B2 true JPS6216275B2 (enExample) 1987-04-11

Family

ID=13953584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8882182A Granted JPS58207009A (ja) 1982-05-27 1982-05-27 回折格子の製造方法

Country Status (1)

Country Link
JP (1) JPS58207009A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4200382A1 (de) * 1992-01-09 1993-07-15 Siemens Ag Verfahren zum ueberwachsen von iii-v-halbleitermaterial
US6833084B2 (en) 1999-04-05 2004-12-21 Micron Technology, Inc. Etching compositions

Also Published As

Publication number Publication date
JPS58207009A (ja) 1983-12-02

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