JPS62152434U - - Google Patents

Info

Publication number
JPS62152434U
JPS62152434U JP3911186U JP3911186U JPS62152434U JP S62152434 U JPS62152434 U JP S62152434U JP 3911186 U JP3911186 U JP 3911186U JP 3911186 U JP3911186 U JP 3911186U JP S62152434 U JPS62152434 U JP S62152434U
Authority
JP
Japan
Prior art keywords
cooling medium
susceptor
dry etching
medium passage
divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3911186U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3911186U priority Critical patent/JPS62152434U/ja
Publication of JPS62152434U publication Critical patent/JPS62152434U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP3911186U 1986-03-19 1986-03-19 Pending JPS62152434U (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3911186U JPS62152434U (OSRAM) 1986-03-19 1986-03-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3911186U JPS62152434U (OSRAM) 1986-03-19 1986-03-19

Publications (1)

Publication Number Publication Date
JPS62152434U true JPS62152434U (OSRAM) 1987-09-28

Family

ID=30851981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3911186U Pending JPS62152434U (OSRAM) 1986-03-19 1986-03-19

Country Status (1)

Country Link
JP (1) JPS62152434U (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03104887A (ja) * 1989-09-20 1991-05-01 Hitachi Ltd 真空処理装置
JP2004259829A (ja) * 2003-02-25 2004-09-16 Hitachi High-Technologies Corp プラズマ処理装置
JP2007254827A (ja) * 2006-03-23 2007-10-04 Fujitsu Ltd スパッタリング装置及びスパッタリング方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03104887A (ja) * 1989-09-20 1991-05-01 Hitachi Ltd 真空処理装置
JP2004259829A (ja) * 2003-02-25 2004-09-16 Hitachi High-Technologies Corp プラズマ処理装置
JP2007254827A (ja) * 2006-03-23 2007-10-04 Fujitsu Ltd スパッタリング装置及びスパッタリング方法

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