JPS62148828A - Semiconductor pressure sensor - Google Patents

Semiconductor pressure sensor

Info

Publication number
JPS62148828A
JPS62148828A JP29108185A JP29108185A JPS62148828A JP S62148828 A JPS62148828 A JP S62148828A JP 29108185 A JP29108185 A JP 29108185A JP 29108185 A JP29108185 A JP 29108185A JP S62148828 A JPS62148828 A JP S62148828A
Authority
JP
Japan
Prior art keywords
solder
pressure
silicon
chip
pressure sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29108185A
Other languages
Japanese (ja)
Inventor
Kiyoshi Ishibashi
清志 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP29108185A priority Critical patent/JPS62148828A/en
Publication of JPS62148828A publication Critical patent/JPS62148828A/en
Pending legal-status Critical Current

Links

Landscapes

  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PURPOSE:To avert the stress concn. to a silicon pedestal and to prevent the cracking or breakdown of the silicon pedestal by connecting a metallic stem and can be using a solder brazing filler metal. CONSTITUTION:Lead tin solder 21 is used as the brazing filler metal and the metallic stem 3 is connected to a windowed cap 7 by said solder. More specifically, the lead tin solder is molded to an annular shape and the molded solder is placed on a collar part 3a of the metallic stem 23; further the windowed cap 7 is put thereon. The solder is then melted in a vacuum by using IR rays or is heated to melt in hydrogen or hydrogen forming gas or if a flux is incorporated into the solder, the solder is heated to melt in air or nitrogen, by which the metallic stem 3 and the windowed cap 7 are adhered. The subsequent stages for assembling the sensor after the end of the adhesion are exactly the same as the conventional stages for assembling the sensor.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は半導体圧力センサに関するもので、ステムと
キャンとの接続を抵抗溶接では無く、鉛錫系の半田によ
って行い、抵抗溶接によって生じるシリコン台座、シリ
コンチップへの残留応力を減少するようにしたものに関
するものである。
[Detailed Description of the Invention] [Field of Industrial Application] This invention relates to a semiconductor pressure sensor, in which the stem and can are connected not by resistance welding but by lead-tin solder, and the silicon pedestal produced by resistance welding is , which reduces residual stress on silicon chips.

〔従来の技術〕[Conventional technology]

従来から、半導体圧力センサの製造方法は種々あるが、
本発明者らが改善せんとする半導体圧力センサは以下の
構造を有するもので、以下に述べるような組立方法によ
り組立てられ、その組立の過程で以下に述べるような組
立上の問題を有していた。
Conventionally, there are various methods of manufacturing semiconductor pressure sensors.
The semiconductor pressure sensor that the present inventors aim to improve has the following structure, and is assembled by the assembly method described below, and has the following assembly problems during the assembly process. Ta.

以下例として第2図に示すゲージ工形圧カセンサについ
て記述する。
The gauge-shaped pressure sensor shown in FIG. 2 will be described below as an example.

N形単結晶基板の一方の面にP形の拡散層を有し他方の
面から肉薄部を加工形成したシリコンダイヤフラムチッ
プ1を、シリコン単結晶から作られたシリコン台座2に
接着する。このシリコン台座2は被測定圧力をシリコン
ダイヤフラムチップ1の受圧面に導(ための言過穴を有
しており、またこのシリコンダイヤフラムチップ1を接
着したシリコン台座2自身を金属ステム3に接着した時
に、異種材料の接続のために生じる熱応力をシリコンダ
イヤフラムチップ1まで伝達させない機能を有している
。次にこのシリコン台座2自身を接着用ロウ材12によ
り金属ステム3に接着し、その後、金細線4によりリー
ドピン5とシリコンダイヤフラムチップ1のポンディン
グパッド6とを接続する。続いて窓明きキャンプ(キャ
ン)7を金属ステム3に抵抗溶接で溶接接続する。この
後窓明きキャップ7の窓からチップ表面にシリコンゲル
8を一滴垂らし、チップ表面上をシリコンゲル8で被覆
保護する。そして窓明きキャンプ7の窓を通気孔8を有
するフィルム9でふさぎ、シリコンゲル8を硬化させる
A silicon diaphragm chip 1, which has a P-type diffusion layer on one side of an N-type single crystal substrate and a thinned portion formed on the other side, is bonded to a silicon pedestal 2 made of silicon single crystal. This silicon pedestal 2 has an extrusion hole for guiding the pressure to be measured to the pressure receiving surface of the silicon diaphragm chip 1, and the silicon pedestal 2 itself, to which this silicon diaphragm chip 1 is attached, is attached to a metal stem 3. The silicon diaphragm chip 1 has a function of not transmitting the thermal stress that sometimes occurs due to the connection of dissimilar materials to the silicon diaphragm chip 1.Next, the silicon pedestal 2 itself is bonded to the metal stem 3 with an adhesive brazing material 12, and then, The lead pin 5 and the bonding pad 6 of the silicon diaphragm chip 1 are connected using a thin gold wire 4. Next, the window opening camp (can) 7 is welded and connected to the metal stem 3 by resistance welding. After this, the window opening cap 7 is welded. A drop of silicone gel 8 is dripped onto the chip surface through the window of the window, and the chip surface is coated and protected with silicone gel 8.Then, the window of the open window camp 7 is covered with a film 9 having ventilation holes 8, and the silicone gel 8 is cured. .

このようにして製造した半導体圧力センサは、金属ステ
ム3に付属している圧力導入パイプIOからの圧力P1
と、フィルム9の通気孔からの大気圧Paとの差の圧力
であるゲージ圧P2をシリコンダイヤフラムチップ1の
電気出力として取り出すことができ、ゲージ圧形半導体
圧力センサとして主に自動車のエンジン制御用のセンサ
として用いられている。
The semiconductor pressure sensor manufactured in this way has a pressure P1 from the pressure introduction pipe IO attached to the metal stem 3.
The gauge pressure P2, which is the pressure difference between the pressure and the atmospheric pressure Pa from the vent hole of the film 9, can be extracted as the electrical output of the silicon diaphragm chip 1, and is used as a gauge pressure type semiconductor pressure sensor mainly for controlling automobile engines. It is used as a sensor.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

さて以上説明したゲージ圧形半導体圧力センサの組立て
工程において、従来より問題にされている工程がある。
Now, in the assembly process of the gauge pressure type semiconductor pressure sensor described above, there is a process that has been problematic in the past.

それは抵抗溶接によるキャップ溶接工程である。良く知
られているように、キャップを抵抗溶接によりステムと
接続すると溶接待の歪がキャップ溶接後もゲージ圧形半
導体圧力センサに内在する。ゲージ圧形半導体圧力セン
サでは、この溶接歪がシリコンダイヤフラムチップ1に
伝わらないようにシリコン台座2が使われているが、こ
のためシリコン台座2に溶接歪が集中することになる。
It is a cap welding process using resistance welding. As is well known, when a cap is connected to a stem by resistance welding, strain during welding remains in the gauge pressure type semiconductor pressure sensor even after the cap is welded. In the gauge pressure type semiconductor pressure sensor, a silicon pedestal 2 is used to prevent this welding strain from being transmitted to the silicon diaphragm chip 1, but this causes the welding strain to concentrate on the silicon pedestal 2.

またシリコン台座2には金属ステム3とシリコン台座2
とを接着した時に発生する熱応力も加っており、はなは
だしい場合にはシリコン台座2にクラック(亀裂)11
が入ったり、シリコン台座2が破壊されることもある。
In addition, the silicon pedestal 2 has a metal stem 3 and a silicon pedestal 2.
Thermal stress generated when bonding is also applied, and in extreme cases, cracks 11 may occur in the silicon pedestal 2.
or the silicon pedestal 2 may be destroyed.

本発明は上記のような従来のものの問題点を解消するた
めになされたもので、シリコン台座への急激な応力集中
を回避し、これによって、シリコン台座のクラック発生
又は破壊を防止し、信頼性の高い半導体圧力センサを提
供することを目的とする。
The present invention was made in order to solve the problems of the conventional products as described above, and it avoids sudden stress concentration on the silicon pedestal, thereby preventing cracking or destruction of the silicon pedestal, and improving reliability. The purpose of the present invention is to provide a semiconductor pressure sensor with high performance.

c問題点を解決するための手段〕 この発明に係る半導体圧力センサは、鉛錫系の半田を使
ったロウ材により金属ステムとキャンとの接続を行うよ
うにしたものである。
Means for Solving Problem c] A semiconductor pressure sensor according to the present invention connects a metal stem and a can using a brazing material using lead-tin solder.

〔作用〕[Effect]

この発明においては、金属ステムと窓明きキャップとの
接続を半田口つ材で行うようにしたから、半田を溶かす
時の加熱温度は二百数十度以下で、かつ昇温から冷却ま
での時間を数分から数時間と極めて幅広くでき、これに
より接続の際の熱歪みを非常に少なくしてシリコン台座
への応力集中を回避し、シリコン台座のクランク発生又
は破壊を防止できる。
In this invention, since the metal stem and the aperture cap are connected using a solder spout, the heating temperature when melting the solder is less than 200 degrees Celsius, and the temperature from rising to cooling is low. The time can be very wide, from several minutes to several hours, and as a result, thermal strain during connection can be extremely reduced, stress concentration on the silicon pedestal can be avoided, and cranking or destruction of the silicon pedestal can be prevented.

〔実施例〕〔Example〕

以下、この発明の実施例を図について説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例による半導体圧力センサを示
す。本実施例のゲージ圧形半導体圧力センサの基本的な
構成部品は、ロウ材である鉛錫半田21を除き従来と同
じなので説明を省く。また金細線を使ったワイヤボンデ
ィングも従来と全く同一なので、その組立工程の説明も
省略する。
FIG. 1 shows a semiconductor pressure sensor according to one embodiment of the invention. The basic components of the gauge pressure type semiconductor pressure sensor of this embodiment are the same as the conventional ones except for the lead-tin solder 21, which is a brazing material, so a description thereof will be omitted. Also, since the wire bonding using thin gold wire is exactly the same as the conventional method, explanation of the assembly process will be omitted.

さて、窓明きキャップ7を金属ステム3に抵抗溶接で溶
接接続する際にシリコン台座2に過大な応力が加わり、
シリコン台座2に重大な影響を及ぼすことはすでに述べ
た。そこで本実施例では抵抗溶接の如く瞬間的な大電流
の印加により発生するジュール熱を利用する接続方法を
使わず、鉛錫半田21をロウ材として金属ステム3と窓
明きキャップ7との接続を行う。
Now, when connecting the window cap 7 to the metal stem 3 by resistance welding, excessive stress is applied to the silicon pedestal 2.
It has already been mentioned that this has a significant effect on the silicon pedestal 2. Therefore, in this embodiment, the metal stem 3 and the aperture cap 7 are connected using lead-tin solder 21 as a brazing material, without using a connection method such as resistance welding that utilizes Joule heat generated by instantaneous application of a large current. I do.

まず、鉛錫半田をリング状に成形する。必要に応じこの
成形半田の中にはあらかじめフラックスをサンドインチ
状に挟み込んでおいても良い。
First, lead-tin solder is formed into a ring shape. If necessary, flux may be sandwiched in advance into the molded solder in the form of a sandwich.

次にこの成形半田を金属ステム23のつば部3aの上に
載せて更にその上から窓明きキャップ7をかぶせる。つ
ば部3aには半田を熔かした際半田が他の部分へ広がっ
て行かないように半田たまり3bを作るなどの加工をし
ておいても良い。次にこの半田を真空中で赤外線を使っ
て熔かすか、あるいは水素または水素フォミングガス中
で加熱して溶かすか、あるいは半田にフラックスが含ま
れている時には空気中又はチッ素中で加熱して熔かすと
いったことにより、金属ステム3と窓明きキャップ7と
を接着する。接着が終ればその後の工程は従来の組立と
何ら変らないのでその説明は省略する。
Next, this molded solder is placed on the collar portion 3a of the metal stem 23, and the window cap 7 is further placed over it. The flange portion 3a may be processed by forming a solder pool 3b to prevent the solder from spreading to other parts when the solder is melted. This solder is then melted in a vacuum using infrared radiation, or by heating in hydrogen or hydrogen forming gas, or if the solder contains flux, by heating in air or nitrogen. In this manner, the metal stem 3 and the aperture cap 7 are bonded together. Once the adhesion is completed, the subsequent steps are no different from conventional assembly, so a description thereof will be omitted.

このように金属ステム3と窓明きキャップ7との接続を
半田口っけで行うと、 ■ 半田を熔かす時の加熱温度は二百数十度以下で、か
つ昇温から冷却までの時間を数分から数時間と極めて幅
広く出来るので、接続の際の熱歪みを非常に少なくする
ことが可能で、シリコン台座2への応力集中を回避でき
、従ってシリコン台座2のクランク発生又は破壊を防止
できる。
If the metal stem 3 and the window cap 7 are connected using a solder joint in this way, ■ the heating temperature when melting the solder is less than 200 degrees Celsius, and the time from temperature rise to cooling is short. This can be done over a very wide range from several minutes to several hours, making it possible to extremely reduce thermal distortion during connection, avoiding stress concentration on the silicon pedestal 2, and thus preventing cranking or destruction of the silicon pedestal 2. .

■ 接着は半田が溶けた時の表面張力を利用し、極めて
均一に行われるので、気密性が従来の抵抗溶接を使った
接続よりも良い。
■ Bonding is done extremely uniformly using the surface tension of melted solder, resulting in better airtightness than connections using conventional resistance welding.

■ 万一接続がうまく行かなかった時には再加熱により
やり直しがきく、などの効果を得ることができる。
■ If the connection does not go well, you can reheat it and try again.

なお、上記実施例ではゲージ圧形半導体圧力センサの場
合を例にとり説明したが、本発明はキャン内部を真空に
保持する絶対圧形半導体圧力センサにおいてキャップ付
けを行う場合にも通用可能であることは言うまでも無い
In addition, although the above embodiment has been explained using a gauge pressure type semiconductor pressure sensor as an example, the present invention can also be applied to the case where a cap is attached to an absolute pressure type semiconductor pressure sensor that maintains the inside of the can in a vacuum. Needless to say.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、金属ステムとキャンと
の接続を半田口つ材で行うようにしたから、半田を溶か
す時の加熱温度は二百数十度以下で、かつ昇温から冷却
までの時間を数分から数時間と極めて幅広くでき、この
ため接続の際の熱歪みを非常に少なくすることが可能で
、シリコン台座への応力集中を回避でき、従ってシリコ
ン台座のクランク発生又は破壊を防止できる効果がある
As described above, according to this invention, since the metal stem and the can are connected using a solder spout, the heating temperature when melting the solder is less than 200 degrees Celsius, and the temperature is lowered by cooling. It is possible to have a very wide range of time from several minutes to several hours, which makes it possible to extremely reduce thermal distortion during connection, and to avoid stress concentration on the silicon pedestal, thereby preventing cranking or breakage of the silicon pedestal. It has a preventive effect.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例による、キャップを金属ステ
ムに鉛錫半田をロウ材として使用してロウ付接着する半
導体圧力センサの製造方法を説明するための図、第2図
は抵抗溶接によりキャップを金属ステムに溶接する従来
の半導体圧力センサの製造方法を説明するための図であ
る。 1・・・シリコンダイヤフラムチップ、2・・・シリコ
ン台座、4・・・金細線、5・・・リードピン、6・・
・シリコンダイヤフラムチップのボンディングパノド、
7・・・窓明きキャップ、8・・・シリコンゲル、9・
・・フィルム、10・・・圧力導入パイプ、12・・・
台座と金属ステムとの接着用ロウ材、23・・・金属ス
テム、3a・・・金属゛ステムのつば部、3b・−・金
属ステムのつば部に設けた半田たまり部、2(・・・’
I’d1%半田。
Figure 1 is a diagram illustrating a method of manufacturing a semiconductor pressure sensor in which a cap is soldered to a metal stem using lead-tin solder as a brazing material, according to an embodiment of the present invention, and Figure 2 is a diagram illustrating resistance welding. FIG. 3 is a diagram illustrating a conventional method for manufacturing a semiconductor pressure sensor in which a cap is welded to a metal stem. 1... Silicon diaphragm chip, 2... Silicon pedestal, 4... Fine gold wire, 5... Lead pin, 6...
・Silicon diaphragm chip bonding panel,
7...Window cap, 8...Silicone gel, 9.
...Film, 10...Pressure introduction pipe, 12...
Brazing material for bonding the pedestal and metal stem, 23...Metal stem, 3a...Brim of metal stem, 3b--Solder pool provided on the brim of metal stem, 2(... '
I'd 1% solder.

Claims (1)

【特許請求の範囲】[Claims] (1)そのN形単結晶基板の一方の面にP形の拡散層を
、該基板のもう一方の面に肉薄部を有し、該肉薄部で流
体圧力を受圧する感圧シリコンチップと、 該チップを固定し、後述するステムからの応力が該チッ
プへ伝わるのを防ぐ機能、かつ流体圧力を上記感圧シリ
コンチップの受圧面に導くための圧力導入孔を有し、シ
リコン単結晶で形成された台座と、 該シリコン台座を固定し、チップに電源を供給しかつ出
力を取り出すためのリードピンおよび流体圧力を上記圧
力導入孔へ導く圧力導入パイプを有するステムと、 上記感圧シリコンチップおよびシリコン台座を保護する
機能を有し、大気圧を導入できあるいは内部を真空に保
持できる構造を有するキャンとを備えた半導体圧力セン
サにおいて、 上記ステムとキャンとを鉛錫系の半田によって結合して
なることを特徴とする半導体圧力センサ。
(1) A pressure-sensitive silicon chip having a P-type diffusion layer on one surface of the N-type single crystal substrate and a thin wall portion on the other surface of the substrate, the thin wall portion receiving fluid pressure; It has a function of fixing the chip and preventing stress from the stem described later from being transmitted to the chip, and has a pressure introduction hole for guiding fluid pressure to the pressure-receiving surface of the pressure-sensitive silicon chip, and is made of silicon single crystal. a stem having a lead pin for fixing the silicon pedestal, supplying power to the chip, and taking out an output, and a pressure introduction pipe for guiding fluid pressure to the pressure introduction hole; the pressure-sensitive silicon chip and the silicon pedestal; A semiconductor pressure sensor that has a can that has a function of protecting a base and has a structure that can introduce atmospheric pressure or maintain a vacuum inside, the stem and can being bonded together using lead-tin solder. A semiconductor pressure sensor characterized by:
JP29108185A 1985-12-24 1985-12-24 Semiconductor pressure sensor Pending JPS62148828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29108185A JPS62148828A (en) 1985-12-24 1985-12-24 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29108185A JPS62148828A (en) 1985-12-24 1985-12-24 Semiconductor pressure sensor

Publications (1)

Publication Number Publication Date
JPS62148828A true JPS62148828A (en) 1987-07-02

Family

ID=17764188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29108185A Pending JPS62148828A (en) 1985-12-24 1985-12-24 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPS62148828A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5289964A (en) * 1990-01-23 1994-03-01 Nippondenso Co., Ltd. Fluxless soldering process
US5986316A (en) * 1997-11-26 1999-11-16 Denso Corporation Semiconductor type physical quantity sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5289964A (en) * 1990-01-23 1994-03-01 Nippondenso Co., Ltd. Fluxless soldering process
US5986316A (en) * 1997-11-26 1999-11-16 Denso Corporation Semiconductor type physical quantity sensor

Similar Documents

Publication Publication Date Title
JP2647194B2 (en) Semiconductor package sealing method
US5641713A (en) Process for forming a room temperature seal between a base cavity and a lid using an organic sealant and a metal seal ring
JPH0119528B2 (en)
US4558346A (en) Highly reliable hermetically sealed package for a semiconductor device
JPS62148828A (en) Semiconductor pressure sensor
JPS5910229A (en) Semiconductor device and fabrication thereof
JPS6313337A (en) Process of mounting semiconductor element
JP3131370B2 (en) Semiconductor pressure sensor and method of manufacturing the same
JPH01225140A (en) Manufacture of semiconductor device
JP3918303B2 (en) Semiconductor package
JPH06241889A (en) Semiconductor device
JPS5917542B2 (en) Hermetically sealed assembly method for semiconductor devices
JP3049410B2 (en) Semiconductor package
JPH02130864A (en) Die pad structure for lead frame
JPH0455332B2 (en)
JPH01179346A (en) Manufacture of semiconductor device
JPS5856442A (en) Semiconductor device and manufacture thereof
JPS5852855A (en) Cap bonding
JPS6149442A (en) Resin seal method of chip carrier
JPH0661299A (en) Semiconductor device and manufacture thereof
JPH0521626A (en) Manufacturing method of metal lid
JPS6250633A (en) Reference pressure type semiconductor pressure transducer
JP2000105159A (en) Semiconductor pressure sensor
JPS6132445A (en) Semiconductor device
JPH0945847A (en) Semiconductor device and manufacture thereof