JPS62137883A - Junction type semiconductor light emitting element - Google Patents

Junction type semiconductor light emitting element

Info

Publication number
JPS62137883A
JPS62137883A JP60279692A JP27969285A JPS62137883A JP S62137883 A JPS62137883 A JP S62137883A JP 60279692 A JP60279692 A JP 60279692A JP 27969285 A JP27969285 A JP 27969285A JP S62137883 A JPS62137883 A JP S62137883A
Authority
JP
Japan
Prior art keywords
flat plate
junction
plate part
light emitting
columnar protrusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60279692A
Other languages
Japanese (ja)
Inventor
Fumio Inaba
稲場 文男
Hiromasa Ito
弘昌 伊藤
Masashige Tsuji
辻 誠滋
Kazuyuki Tadatomo
一行 只友
Akira Mizuyoshi
明 水由
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Cable Industries Ltd
Original Assignee
Mitsubishi Cable Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Cable Industries Ltd filed Critical Mitsubishi Cable Industries Ltd
Priority to JP60279692A priority Critical patent/JPS62137883A/en
Publication of JPS62137883A publication Critical patent/JPS62137883A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/185Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To efficiently emit light in the vertical direction to a flat plate part by a method wherein electrodes are provided on the top surface of columnar protrusion and the surface of flat plate part and/or a columnar protrusion sidewall. CONSTITUTION:A light emitting element is composed of a flat plate part B, a columnar protrusion P provided on one side of the flat plate part B, electrode E1 provided on the surface of flat plate part B and the side peripheral part of columnar protrusion P as well as another electrode E2 provided on the top surface of columnar protrusion P. A cylindrical P-N junction PN1 extending in the vertical direction direction to the flat plate part B is situated in the columnar protrusion P. Besides, another P-N junction PN2 extending in parallel with said flat plate part B is situated in the flat plate part B. In such a constitution, the P-N junction PN1 only in the vertical direction to the substrate actually emits light while another P-N junction extending in parallel with the flat plate part B hardly emits light making it feasible to effectively use the light in the vertical direction.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、発光ダイオードや半導体レーザとして使用し
得る半導体発光素子に関し、特に基板に対して垂直方向
に形成されたp−n接合が効率的に発光する接合型半導
体発光素子に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor light emitting device that can be used as a light emitting diode or a semiconductor laser. The present invention relates to a junction type semiconductor light emitting device that emits light.

〔従来の技術〕[Conventional technology]

基板に対して垂直方向に光を放出する発光素子は光ファ
イバとの結合が容易であり、また、面発光体としての種
々の用途が期待されることから、半4体レーザや発光ダ
イオードの研究分野において開発が進められてきており
、近年、多種類のものが実用されている。
Light-emitting elements that emit light in a direction perpendicular to the substrate are easy to couple with optical fibers, and are expected to have various uses as surface emitters, so research into semi-quadramid lasers and light-emitting diodes is underway. Development has been progressing in this field, and many types have been put into practical use in recent years.

而して、垂直発光型素子の好適なものとして、第4図に
示す如き、平板部Bと、該平板部Bの片面上に設けられ
た柱状突起Pと、該平板部Bの上部表面および柱状突起
P側壁面とに設けられた電極E1ならびに平板部Bの底
面に設けられた電極E2とからなり、上記柱状突起P内
には該平板部に対して垂直方向に延在する筒状のp−n
接合(以下、p−n接合PNIという)を、また該平板
部には該平板部に平行に延在するp−n接合(以下、p
−n接合PN2という)をそれぞれ有する接合型半導体
発光素子であり、p−n接合PNIを貫通する回路C1
とp−n接合PN2を貫通する回路C2の2つの回路が
存在し、回路CI、C2に生ずる電流密度J1、J2が
式(りJl>0.IJ2      (+) を満足するものが提案されている。
As shown in FIG. 4, a preferable vertical light-emitting element includes a flat plate part B, a columnar projection P provided on one side of the flat plate part B, an upper surface of the flat plate part B, and a columnar projection P provided on one side of the flat plate part B. It consists of an electrode E1 provided on the side wall surface of the columnar protrusion P and an electrode E2 provided on the bottom surface of the flat plate part B, and within the columnar protrusion P there is a cylindrical electrode extending perpendicularly to the flat plate part. p-n
(hereinafter referred to as p-n junction PNI), and the flat plate part has a p-n junction (hereinafter referred to as p-n junction PNI) extending parallel to the flat plate part.
-n junction PN2), and a circuit C1 passing through the pn junction PNI.
A circuit has been proposed in which there are two circuits, ie, a circuit C2 that passes through the p-n junction PN2, and the current densities J1 and J2 generated in the circuits CI and C2 satisfy the formula (Jl>0.IJ2 (+)). There is.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、かかる接合型半導体発光素子においては
、」二記2種類のp−n接合のうちp−n接合PNIの
みが有用であり、p−n接合PN2は水平発光をもたら
すのみであり、木来忌むべきものである。従って、p−
n接合PN2が出来る限り発光せず、p−n接合PNI
がより効率的に発光する接合型半導体発光素子の出現が
待望されている。
However, in such a junction-type semiconductor light emitting device, of the two types of p-n junctions, only the p-n junction PNI is useful, and the p-n junction PN2 only brings about horizontal light emission; It is an abomination. Therefore, p-
The n-junction PN2 does not emit light as much as possible, and the p-n junction PNI
The emergence of a junction type semiconductor light emitting device that emits light more efficiently has been eagerly awaited.

従って、本発明の目的は、基板(平板部)に対して垂直
方向の光を効率的に放出する接合型半導体発光素子を掃
供することにある。
Therefore, an object of the present invention is to provide a junction type semiconductor light emitting device that efficiently emits light in a direction perpendicular to a substrate (flat plate portion).

〔問題点を解決するための手段〕[Means for solving problems]

かかる目的は、本発明、即ち、平板部と、該平板部の片
面上に設けられた柱状突起とからなり、少なくとも柱状
突起内に平板部に対して垂直方向に延在するp−n接合
を有する接合型半導体発光素子において、柱状突起頂上
面ならびに平板部上面および/または柱状突起側壁面に
電極を設けてなる接合型半導体発光素子によって解決さ
れる。
This object is achieved by the present invention, which is composed of a flat plate part and a columnar protrusion provided on one side of the flat plate part, and includes a p-n junction extending in the columnar protrusion at least in a direction perpendicular to the flat plate part. The problem is solved by a junction type semiconductor light emitting device having an electrode provided on the top surface of the columnar projection, the upper surface of the flat plate portion, and/or the side wall surface of the columnar projection.

以下、図面に基づき、本発明を具体的に説明す本発明の
発光素子は、基本的には、例えば第1図aに示す如く平
板部Bとその片面上に設けられた柱状突起I)からなり
、平板部Bの柱状突起I〕影形成の表面く即ち、平板部
B上部表面)並びに柱状突起Pの側周部に設けられた電
JIEIと柱状突起Pの頂上面に設けられた電極E2と
からなっている。電極E1及び電極E2は、第1図aに
示す位置および大きさに特定されるものではなく、本発
明の目的を達成しうる限り、前記の位置の範囲内であれ
ば、任意の位置に任意の大きさで設けられる。柱状突起
Pの頂上面に設けられた電極E2は、当該頂上面の全面
に設けてもよいが、上方向への発光を考慮すれば、光の
放出が可能なように頂上面の一部面のみに設けることが
好ましい。柱状突起P内には平板部Bに対して垂直方向
に延在する筒状のp−n接合PNIが存在しており、ま
た平板部B内には、該平板部Bに平行に延在するp−n
接合PN2が存在している。
Hereinafter, the present invention will be explained in detail based on the drawings.The light emitting device of the present invention basically consists of a flat plate part B and a columnar projection I) provided on one side thereof, as shown in FIG. 1a, for example. , the columnar projection I of the flat plate part B] the shadow-forming surface (that is, the upper surface of the flat plate part B), the electrode JIEI provided on the side circumference of the columnar projection P, and the electrode E2 provided on the top surface of the columnar projection P. It consists of The electrode E1 and the electrode E2 are not limited to the positions and sizes shown in FIG. It is set in the size of The electrode E2 provided on the top surface of the columnar projection P may be provided on the entire surface of the top surface, but if light emission in an upward direction is taken into consideration, the electrode E2 provided on the top surface of the columnar projection P may be provided on a part of the top surface so that light can be emitted. It is preferable to provide only the Inside the columnar projection P, there is a cylindrical p-n junction PNI extending perpendicularly to the flat plate part B, and inside the flat plate part B, there is a cylindrical p-n junction PNI extending parallel to the flat plate part B. p-n
Junction PN2 is present.

第2図は本発明の他の態様であり、第2図の態様におい
ては、平板部Bに平行に延在するp−n接合PN2が存
在しない点、および電極E1が実質的に柱状突起Pの側
周部のみに設けられている点においてのみ第1図aにお
ける態様と異なる。
FIG. 2 shows another embodiment of the present invention. In the embodiment of FIG. 2, there is no p-n junction PN2 extending parallel to the flat plate portion B, and the electrode E1 is substantially It differs from the embodiment shown in FIG. 1a only in that it is provided only on the side circumference of.

かくして第2図の態様においては、平板部Bに対して水
平方向p−n接合PN2がないので、さらに効率的に垂
直方向の光を取得できる。
Thus, in the embodiment of FIG. 2, since there is no horizontal pn junction PN2 with respect to the flat plate portion B, vertical light can be acquired more efficiently.

本発明においては、p−n接合の形成方法については、
特に制限を要せず、例えば不純物の拡散法、p (また
はn)型半導体層とn(またはp)型半ぷ体層のエピタ
キシャル気相成長法(この場合は、異種接合することも
可能である)、あるいはその他の方法によってよい。
In the present invention, the method for forming a pn junction is as follows:
There are no particular restrictions, and examples include impurity diffusion, epitaxial vapor growth of a p (or n) type semiconductor layer and an n (or p) type semiconducting layer (in this case, heterojunction is also possible). ) or by other methods.

本発明においては、垂直発光に寄与するp−rin接合
NIの長さは、柱状突起Pの高さを大きくすることによ
り長くすることができるので、柱状突起Pの高さは少な
くとも2戸、特に少なくとも10、・−とすることが好
ましい、半導体ウェハの表面上に柱状突起Pを形成する
ことは、たとえば反応性イオンエツチング法により可能
であり、しかして裔さ数十〜数百mの柱状突起I)を有
する本発明の発光素子が容易に製造できる。
In the present invention, the length of the p-rin junction NI contributing to vertical light emission can be increased by increasing the height of the columnar protrusion P, so the height of the columnar protrusion P is at least 2 mm, especially It is possible to form columnar protrusions P on the surface of a semiconductor wafer, which is preferably at least 10, -, by using, for example, a reactive ion etching method, and can form columnar protrusions extending several tens to hundreds of meters long. The light emitting device of the present invention having I) can be easily manufactured.

本発明に関して、柱状突起Pにおける「垂直方向」の意
味は平板部Bに対して角度90度の直角方向のみと限定
的に解釈する必要はなく、平板部Bに対して90度より
多少大きい、または小さい傾斜角度を有する場合も含ま
れる。たとえば、柱状突起Pの全体、もしくはその内部
に形成された同軸円筒状p−n接合PNIのみを、下部
の直径を大きくした円iff台状等に形成し、光ファイ
バに対して一層結合し易いように出力光を集束するもよ
く、あるいは逆に上記とは逆の円錐台状とし、使用目的
に応じて適度に発散させるもよい。
Regarding the present invention, the meaning of "vertical direction" in the columnar protrusion P does not need to be limited to a direction perpendicular to the flat plate part B at an angle of 90 degrees; Also included are cases where the angle of inclination is small. For example, the entire columnar protrusion P or only the coaxial cylindrical p-n junction PNI formed inside it may be formed into a trapezoidal shape with a larger diameter at the bottom, making it easier to couple to the optical fiber. The output light may be converged like this, or conversely, the output light may be shaped into a truncated cone, which is the opposite of the above, and it may be diverged appropriately depending on the purpose of use.

本発明接合型半導体発光素子に用いる発光材料としては
、■−V族化合物半導体であるGaAs、AffiGa
As、Ink、InGaAsP、Inc;aP、InA
sSb、、GaAsP、GaN、1nAsP、InAs
Sb等、n−vi族化合物半導体であるZn5e、Zn
S、、ZnO,、Cd5eSCdTc等、あるいはrV
−Vl族化合物半半導体あるPbTe、、Pb5nTc
、Pb5nSc等があり、それぞれの利料の長所を活か
して適用することが可能である。
The light-emitting materials used in the junction type semiconductor light-emitting device of the present invention include GaAs, AffiGa, which is a -V group compound semiconductor.
As, Ink, InGaAsP, Inc; aP, InA
sSb, , GaAsP, GaN, 1nAsP, InAs
Sb, etc., n-vi group compound semiconductors Zn5e, Zn
S,, ZnO,, Cd5eSCdTc, etc., or rV
-Vl group compound semi-semiconductor PbTe, Pb5nTc
, Pb5nSc, etc., and it is possible to apply them by taking advantage of their respective advantages.

本発明の接合型半導体発光素子の装造方法の一例をGa
As−A7!GaAs系半導体材料を用いた場合につい
て説明する(第3図のフローシート参照)。
An example of a method for manufacturing a junction type semiconductor light emitting device of the present invention is a Ga
As-A7! A case where a GaAs-based semiconductor material is used will be explained (see the flow sheet in FIG. 3).

まず、n型G a A s 5板B3の上にn型のAl
1xGal−xAsのFiB2、および柱状突起Pと上
部層B1とを形成するためのn型G a A S I蛋
Aを順次にエビクキシャル成長させて3層+1ζ造のへ
テロウェハを制作する(第3図C参照)、各顎のj7さ
は、例えば[B2が2〜50戸、最上層が2〜200戸
である。このヘテロウェハにつき、たとえば反応性イオ
ンエツチング法により上記最上部のn型GaΔs層をイ
オンエツチングし、柱状突起Pを形成する(第3図す参
照)、当該柱状突起Pを切り出した上記最上部層の残余
の部分が上部PJB1となる。当該柱状突起Pの頂上面
には、上記のエツチング工程の際に施与したマスク層が
存在しているが、核マスク層を所望とするp−+1接合
PNIの形状に成型し−C当該柱状突起Pの頂」二面に
残存させた状態で当該柱状突起Pの側周壁および上部1
fflB1の表面からn型を形成するための不純物、た
とえばZnを拡ffkさせる(第3図C参照)、その際
、基板B3の方向に向う拡散フロントは、バリアJiB
2内まで侵入させる。かくしてGaAsホモ接合たるp
−n接合PNIおよびAI!GaAsホモ接合たるp−
n接合PN2がそれぞれ形成される。 ′ 拡散過程の後に、当該柱状突起Pの側周壁」−および/
または平板部B上面に電極E1が、また柱状突起Pの頂
上面に電極E2が被着される。かくして、第1図すに示
した構成の接合型半導体発光素子が製造される。なお、
第1図すは第1図aをより詳細に示した図である。なお
、エツチングによる柱状突起Pの形成の際、エツチング
を高捏度に行って、上部P!Blが残存しないようにし
てもよく、更にはバリア層B2の一部をも除去して、平
板部Bの表面にはバリア層B2の内部が露出する程度と
してもよい。
First, n-type Al is placed on the n-type Ga As 5 plate B3.
FiB2 of 1xGal-xAs and n-type GaAsI protein A for forming columnar protrusions P and upper layer B1 are sequentially eviaxially grown to produce a 3-layer + 1ζ-structured heterowafer (Fig. 3). C), the j7 size of each jaw is, for example, [B2 is 2 to 50 doors, and the top layer is 2 to 200 doors. For this hetero wafer, the uppermost n-type GaΔs layer is ion-etched using, for example, a reactive ion etching method to form columnar protrusions P (see Figure 3). The remaining portion becomes the upper PJB1. On the top surface of the columnar protrusion P, there is a mask layer applied during the above etching process, but the core mask layer is molded into the desired p-+1 junction PNI shape. The side peripheral wall and the upper part 1 of the columnar projection P remain on the two sides of the "top of the projection P."
When an impurity, for example Zn, for forming n-type conductivity is spread from the surface of fflB1 (see FIG. 3C), the diffusion front toward the substrate B3 is formed by the barrier JiB.
Let it penetrate into 2. Thus GaAs homozygous p
-n junction PNI and AI! GaAs homozygous p-
An n-junction PN2 is formed respectively. ' After the diffusion process, the side peripheral wall of the columnar projection P'- and/
Alternatively, the electrode E1 is attached to the upper surface of the flat plate portion B, and the electrode E2 is attached to the top surface of the columnar projection P. In this way, a junction type semiconductor light emitting device having the configuration shown in FIG. 1 is manufactured. In addition,
FIG. 1 is a diagram showing FIG. 1a in more detail. In addition, when forming the columnar protrusion P by etching, the etching is performed at a high degree of kneading to form the upper part P! It may be arranged so that no Bl remains, or even a part of the barrier layer B2 may be removed so that the inside of the barrier layer B2 is exposed on the surface of the flat plate part B.

第2図に示した構成の接合型半導体発光素子は例えば次
のようにして製造される。
The junction type semiconductor light emitting device having the configuration shown in FIG. 2 is manufactured, for example, as follows.

即ち、第3図すに示した半導体発光素子の柱状突起頂部
(好ましくは、柱状突起Pの頂上面にマスク層1を有す
る。但し、第3図すでは当該マスク層1を省略した。)
及び平板部表面部にマスク層2を設け、柱状突起Pの側
周壁は非マスキング状態で不純物の拡散(好適には、亜
鉛の拡散)を行って、実質的に柱状突起P内に平板部に
対して垂直方向に延在するp−n接合PNIのみを形成
させることによって製造される(第3図C参照)。
That is, the top of the columnar projection of the semiconductor light emitting device shown in FIG. 3 (preferably, the mask layer 1 is provided on the top surface of the columnar projection P. However, the mask layer 1 is omitted in FIG. 3).
A mask layer 2 is provided on the surface of the flat plate portion, and impurity diffusion (preferably zinc diffusion) is performed on the side peripheral wall of the columnar protrusion P in an unmasked state to substantially form the flat plate portion inside the columnar protrusion P. It is manufactured by forming only a p-n junction PNI extending perpendicularly to the p-n junction (see FIG. 3C).

電極E1および電極E2は自体既知の手段にて設゛けれ
ばよく、たとえば蒸着等の手段にて全面に設け、リフト
オフして不必要な電極を除去することによって形成され
る。かくして第2図に示した構成の接合型半4体発光素
子が製造される。
The electrode E1 and the electrode E2 may be provided by means known per se, for example, by providing them on the entire surface by means such as vapor deposition, and removing unnecessary electrodes by lift-off. In this way, a junction type half-four-body light emitting device having the configuration shown in FIG. 2 is manufactured.

かくして得られた半導体発光素子において、平板部Bの
柱状突起Pの反対面に反射鏡または反射膜を設け、かつ
柱状突起Pの頂上面に半透明の反射鏡または反射膜を被
着形成して光共振機構を具0iitせしめると半導体レ
ーザとしても使用することが出来る。この半4体レーザ
においては、p−n接合PN1からの前記した増幅され
た自然放出に光帰還が生じて誘導放出によりレーザ発振
し、而して強力で指向性の良好な発光光が上記した半透
明反射鏡または反射膜を通して平板部Bに対して垂直方
向に放出される。
In the semiconductor light emitting device thus obtained, a reflective mirror or a reflective film is provided on the opposite surface of the columnar projection P of the flat plate portion B, and a translucent reflective mirror or reflective film is coated on the top surface of the columnar projection P. If the optical resonance mechanism is set to 0iit, it can also be used as a semiconductor laser. In this half-four body laser, optical feedback occurs in the above-mentioned amplified spontaneous emission from the p-n junction PN1, and laser oscillation occurs due to stimulated emission, and the strong and well-directed emitted light is emitted as described above. The light is emitted in a direction perpendicular to the flat plate portion B through a semi-transparent reflective mirror or reflective film.

〔作用〕[Effect]

本発明の接合型半導体発光素子は、基板に対して垂直方
向のp−n接合PNIのみが実質的に発光するという作
用を存する。
The junction type semiconductor light emitting device of the present invention has the effect that only the pn junction PNI in the direction perpendicular to the substrate substantially emits light.

〔効果〕〔effect〕

上記作用から明らかなように、本発明接合型半導体発光
素子は、実質的に平板部Bに対して垂直方向の光を有効
に取得しうるものであり、がっ、平板部Bに平行に延在
するp−n接合PN2は、それが仮に存在していても発
光には殆ど寄与せず、所望とする垂直方向の光を有効に
利用できるものである。本発明の発光素子は、誘導放出
による増幅作用を利用してより強力な垂直方向出力光が
得られ、発光ダイオード、半導体レーザ、スーパールミ
ッセントダイオード、高出力発光ダイオード等を実現す
ることができる。
As is clear from the above effects, the junction type semiconductor light emitting device of the present invention can effectively obtain light in a direction substantially perpendicular to the flat plate portion B; Even if the existing p-n junction PN2 exists, it hardly contributes to light emission and can effectively utilize light in the desired vertical direction. The light-emitting device of the present invention can obtain more powerful vertical output light by utilizing the amplification effect of stimulated emission, and can realize light-emitting diodes, semiconductor lasers, superluminescent diodes, high-output light-emitting diodes, etc. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図aおよび第2図は本発明の接合型半導体発光素子
の実施例の断面図である。第1図すは第1図aをより詳
細に示した一部断面を示す斜視図である。 第3図は第1図a (第1図b)および第2図に示した
接合型半導体発光素子製造例のフローシートである。 第4図は従来既知の接合型半導体発光素子の断面図であ
る。 B       :平板部 P       :柱状突起 El、B2  :電極 C1、C2:回路 PNI、PN2:p−n接合 B1      :上部層 B2      :バリアJり B 3           : 法(反A     
 :n型GaAs層 112    :マスク層
FIGS. 1a and 2 are cross-sectional views of embodiments of the junction type semiconductor light emitting device of the present invention. FIG. 1 is a perspective view showing a partial cross section showing FIG. 1a in more detail. FIG. 3 is a flow sheet of an example of manufacturing the junction type semiconductor light emitting device shown in FIG. 1a (FIG. 1b) and FIG. FIG. 4 is a sectional view of a conventionally known junction type semiconductor light emitting device. B: Flat plate part P: Columnar projection El, B2: Electrode C1, C2: Circuit PNI, PN2: p-n junction B1: Upper layer B2: Barrier JR B3: Law (anti-A
:n-type GaAs layer 112 :mask layer

Claims (1)

【特許請求の範囲】[Claims]  平板部と、該平板部の片面上に設けられた柱状突起と
からなり、少なくとも柱状突起内に平板部に対して垂直
方向に延在するp−n接合を有する接合型半導体発光素
子において、柱状突起頂上面ならびに平板部上部表面お
よび/または柱状突起側壁面に電極を設けてなる接合型
半導体発光素子。
In a junction type semiconductor light emitting device, which is composed of a flat plate part and a columnar protrusion provided on one side of the flat plate part, and has a p-n junction extending perpendicularly to the flat plate part in at least the columnar protrusion, the columnar A junction type semiconductor light-emitting device in which electrodes are provided on the top surface of a protrusion, the upper surface of a flat plate part, and/or the side wall surface of a columnar protrusion.
JP60279692A 1985-12-12 1985-12-12 Junction type semiconductor light emitting element Pending JPS62137883A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60279692A JPS62137883A (en) 1985-12-12 1985-12-12 Junction type semiconductor light emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60279692A JPS62137883A (en) 1985-12-12 1985-12-12 Junction type semiconductor light emitting element

Publications (1)

Publication Number Publication Date
JPS62137883A true JPS62137883A (en) 1987-06-20

Family

ID=17614541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60279692A Pending JPS62137883A (en) 1985-12-12 1985-12-12 Junction type semiconductor light emitting element

Country Status (1)

Country Link
JP (1) JPS62137883A (en)

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