JPS62135809A - Preparation of liquid crystal display device - Google Patents

Abstract

PURPOSE:To enable complete shielding from light by forming light shielding insulative thin film utilizing a photoresist which has been used for patterning a transparent electrode on other part of at least one substrate of confronting substrates than said transparent electrode, as masking material. CONSTITUTION:Photoresist 3 is coated on the whole part of the upper surface of transparent electroconductive film in a substrate having transparent electroconductive film 2 (e.g. ITO film or SnO2 film, etc.) on one side of a transparent substrate 1. Then, the substrate 1 is exposed and developed to treat the photoresist 3 for patterning, and the part uncoated with the photoresist is removed by etching. Thereafter, a light shielding insulative material layer 4 is formed by vacuum deposition or sputtering using metallic oxide or org. or inorg. pigment, and a light shielding and insulative material layer 4 is formed on other parts of the substrate than the part of the transparent electrode 2 by removing the light shielding and insulative layer 4 formed on the photoresist 2 together with the photoresist 2 by dipping the substrate 1 in aq. alkali or acetone. Among light shielding insulative materials, Fe2O3, NiO, etc., are effective. By this method, a light shielding layer having superior characteristics can be formed on an exact position with a relatively simple process.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a method for forming a film that prevents light reflection and light transmission in areas other than the display pattern in order to improve display quality in a liquid crystal display device. Regarding.

[Conventional technology]

It is known that preventing light transmission and light reflection in areas other than the display pattern in a liquid crystal display device produces a black stripe effect and increases the sharpness of the display, thereby improving the display quality. Conventionally, in order to obtain this powerful effect, 1) the GH method of adding a dichroic dye into the liquid crystal, 2) the use of a polarizing plate with low transmittance. .

3) A light blocking film is formed on the inner surface of the liquid crystal cell where lighting is not required to block light.

Methods such as 3) have been considered, but method 3) is considered to be the most effective method due to its light blocking effect, and the following methods were conventionally used for its production. .

1) Photosensitive f! After applying E' and buttering the parts that should block light, dye with a dye having the required spectral intensity of 15 f.

2) A7. C, Cr, etc. gold aim or p, o,
A thin film of metal oxide such as MgO, COO, N4O, etc. is deposited on a transparent electrographic substrate by sputtering and patterned by photoetching.

etc.

[The problems that the invention attempts to solve]

Method 1) requires a thickness of about 1μ to 2μ to obtain the necessary light-blocking properties, and the heat resistance is low at 180°C, making it difficult to use a crystalline cell! ! Heat treatment conditions during manufacturing process? The need for management is having a negative impact on the display life of the liquid crystal display device. Also, for 21 methods, go to! , Kari.

When using a conductive metal such as Cr, a light shielding film and a transparent! It is necessary to provide an interval between 1M and it is not possible to completely block out the light, and I
Even when a metal oxide such as M170+ COO is used, it is difficult to perform an adjustment operation on a transparent titlli because the metal oxide is opaque and dusty. There were some viewpoints where complete light shielding was not possible due to misalignment of the oxide patterning.

[Means for deciding when to open the lid t'#6] In order to solve the above-mentioned drawbacks, the present invention provides light shielding using an insulating material such as a metal oxide. Photoresist used for patterning? Leave it as is and use it as a masking material, and apply the insulating material to the substrate. Obtain odor using vacuum method, etc. By forming the film by a so-called lift-off method, the above-mentioned problem was solved, and a thin film having a good light blocking percentage could be formed in a liquid crystal display device.

[Effect]

The present invention will be explained based on Figure 1u. As shown in Figure 1 (α), one side of the transparent substrate 1 is coated with oxide or 8nO.

In a substrate having a transparent conductive film 2 such as
For patterning, photoresist 3t is coated on the entire surface of the transparent conductive film 2 as shown in (b).

After exposure, 7 otoresist as shown in C)-3? Patterning. Thereafter, the portions of the transparent conductive film that are not covered with the photoresist are etched and removed, leaving a square shape. Next, a light-blocking edge material layer 4 made of metal oxide, organic, inorganic pigment, etc.
By vacuum evaporation method or sputtering method? ). Thereafter, the entire substrate 1 is immersed in an alkaline aqueous solution or acetate, and the photoresist 2 and the light-blocking insulation 1-4 placed on the photoresist 2 are removed. )
As shown, a light-blocking insulating layer 4 is formed on a portion other than the transparent electrolyte 2.

Here, as the light-fast insulation material, metal oxide, for example,
pe, o8. H4O, C(10, MgO, etc.) are effective.

The metal oxide material 'klK? ! It is possible to obtain better light-blocking properties by stacking or mixing different materials such as μ alone or in combination with two kinds of μ by vapor deposition or sputtering to obtain better light-blocking characteristics. Furthermore, it is possible to form a film using an inorganic or organic pigment as a material other than metal oxides by sputtering.

When using the pigment, there is a great advantage in that the required spectral characteristics can be selected relatively freely compared to when using the metal oxide.

]1 column] Next, the present invention will be explained in detail by way of an embodiment.

Implementation row 1 Hemp 1 diagram (After forming the eye-like VC transparent conductor 2, F6 with the photoresist 3 remaining on the transparent conductor 2)
．． It is formed with a thickness of 100 OA in the shape of 100 mm by the o, t sputtering method. After that, the substrate of ω was immersed in KOHIQ water solution for 1 minute, and the photoresist 3
Peel off and rinse thoroughly with pure water. The light transmittance i when the light is blocked formed by such a method is 1.5% or less, which is sufficient to achieve the purpose of the invention. I had sex that night.

Example 2 After forming FgO by the 500A sputtering method in the above-mentioned Example Row 1, light blocking K k was further formed by the F202.
It is formed by Ic Cook, 500A sputtering method.

After cooling down, the photoresist is peeled off in the same manner as in Example 1. The F'6.03 film with a thickness of about 500 A has a yellowish brown color due to leakage of Yc elements on the long wavelength side. Also, the COO film has a thickness of 500A, and there is light leakage on the short wavelength side, resulting in a blue color. therefore? The film of $03 and the color of C,0 have a complementary color relationship, and by laminating both, good shielding is achieved.
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A light blocking layer made of the organic pigments was formed to a thickness of 150 OA by sputtering using a mixture of organic pigments of three colors cyan, magenta, and yellow at equal needles as a target on the substrate in the state shown in Figure 1 (-). The hindlimb substrate was immersed in acetone for 1 minute to completely remove the photoresist, and then rinsed with Freon.The light-blocking layer thus formed had a light transmittance of 5% or less, which is the object of the present invention. He had the necessary and sufficient character to earn money.

〔Effect of the invention〕

As explained above, using the photoresist gold used to form the transparent 11E pottery, a light-blocking layer made of metal acid, arsenic, or inorganic and organic pigments is applied to the parts other than the transparent electrode using the 7-to-7 method. It is possible to form a layer with good properties at a precise position [ζ] through a relatively simple process. Therefore, it is possible to provide an IA liquid crystal display device with good display quality at a low cost.

[Brief explanation of drawings]

FIGS. 1(α) to 1(1) are explanatory diagrams of the process side of forming a light-blocking insulating layer according to the present invention. 1 - Transparent glass substrate 2 - Transparent conductive film 3 - Photoresist 4 - Light blocking insulating layer and above

Claims (4)

[Claims] (1) In manufacturing a liquid crystal display device consisting of opposing substrates sandwiching a liquid crystal layer and having transparent electrodes on their inner surfaces, the transparent electrode is patterned by etching on a portion of at least one of the opposing substrates other than the transparent electrode. 1. A method of manufacturing a liquid crystal display device, comprising forming a light-blocking insulating thin film using a photoresist used in the coating as a masking material. (2) The method for manufacturing a liquid crystal display device according to claim 1, wherein the light-blocking insulating thin film is a metal oxide. (3) The metal oxide is Fe_2O_3, MgO, C_0
The method for manufacturing a liquid crystal display device according to claim 2, characterized in that the liquid crystal display device is made of at least one of O and NiO. (4) The method for manufacturing a liquid crystal display device according to claim 1, wherein the light-shielding insulating film is an organic pigment.