JP3605612B2 - Liquid crystal display and color filter panel - Google Patents

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a liquid crystal display device capable of multicolor display and a color filter panel used for the liquid crystal display device.
[0002]
[Prior art]
2. Description of the Related Art Some liquid crystal display devices capable of multicolor display have a structure in which two transparent substrates are opposed to each other and a liquid crystal is injected into a gap between these transparent substrates. A display electrode composed of a transparent electrode is formed in each pixel area on the surface of the transparent substrate, and an insulating light-shielding pattern is provided on the surface of the transparent substrate surrounding the pixel area. ing.
[0003]
In a liquid crystal display device having such a structure, a color filter is provided in a pixel area of one of the transparent substrates to form a color filter panel, thereby performing multicolor display. In the color filter panel, the insulating light-shielding pattern is provided to shield light between the R, G, and B colors in the pixel area and the periphery thereof. Therefore, the insulating light-shielding pattern is formed in a frame shape. . Conventionally, display electrodes are mainly arranged on color filters.
[0004]
FIG. 7 shows a configuration of a color filter panel constituting a conventional liquid crystal display device. In FIG. 7, for simplicity of description, only the configuration for one pixel composed of the three primary colors of RGB is described. However, the liquid crystal display device is innumerably provided with such a configuration for one pixel. Needless to say.
[0005]
That is, this color filter panel has the transparent substrate 30. The transparent substrate 30 is provided with red, green, and blue color filters 31, 32, and 33 and an insulating light-shielding pattern 34 on the liquid crystal side surface. The color filters 31, 32, and 33 are arranged in parallel on the transparent substrate 30 with a slight gap therebetween, and are further insulated so as to surround the color filters 31, 32, and 33 and fill the gaps. A light-shielding pattern 34 is provided. The insulating light-shielding pattern 34 is arranged in a frame shape surrounding each color filter 31, 32, 33. A smooth layer 35 is provided on the upper surfaces of the color filters 31, 32, 33 and the insulating light-shielding pattern 34, and the upper portions of the color filters 31, 32, 33 and the insulating light-shielding pattern 34 are flattened by the smooth layer 35. The display electrode 36 is provided on the upper surface.
[0006]
By providing such a smoothing layer 35 and flattening the upper portions of the color filters 31, 32, and 33, the display electrode 36 is formed by side etching generated during etching when forming the display electrode 36, stress due to a step, and the like. The electrode 36 is prevented from breaking at the ends of the color filters 31, 32, 33.
[0007]
However, in the configuration of such a conventional color filter panel or liquid crystal display device, the provision of the smoothing layer 35 increases the number of manufacturing processes and increases the manufacturing cost. In addition, the transmittance of the smoothing layer 35 lowers the display quality. There was an inconvenience of lowering.
[0008]
Further, even if the smoothing layer 35 is provided, the smoothing layer 35 is provided for flattening the upper part of the color filters 31, 32, 33 and the insulating light-shielding pattern 34. It is inevitable that a step corresponding to the thickness of the insulating light-shielding pattern 34 occurs between the end and the transparent substrate 30. On the other hand, the display electrode 36 may be drawn out of the insulating light-shielding pattern 34 because the display electrode 36 is connected to an external liquid crystal drive circuit (not shown). In such a case, a disconnection due to side etching, stress due to a step, or the like occurs in the display electrode 36 due to a step generated when the smooth layer 35 and the transparent substrate 30 are opened, thereby lowering the yield. .
[0009]
In order to solve such inconvenience, in the conventional configuration disclosed in Japanese Utility Model Laid-Open No. 1-145515, the shape of the color filters 31, 32, and 33 is made the same as the shape of the display electrode 36, so that the insulation is achieved. By disposing the color filters 31, 32, and 33 below the extending end of the display electrode 36 extending to the outside of the light-shielding pattern 34, the step is eliminated.
[0010]
[Problems to be solved by the invention]
However, even in the conventional configuration in which the disconnection caused by the step portion is prevented, the display electrode 36 has the following structure. That is, although the display electrode 36 in the pixel area must be exposed due to its structure, the extended end 36a of the display electrode 36 drawn out from the insulating light-shielding pattern 34 (on the insulating light-shielding pattern 34). (Including the display electrode 36) is exposed. Therefore, the surface of the display electrode 36 is apt to be damaged, which causes a reduction in yield.
[0011]
The present invention has been made in order to solve the above-mentioned problem, and it is possible to prevent disconnection of a display electrode without forming a smooth layer on a color filter, and to further prevent damage of the display electrode. It aims at providing a display device and a color filter panel.
[0012]
[Means for Solving the Problems]
In the liquid crystal display device according to the first aspect of the present invention, a pair of opposing substrates each having a display electrode provided in each pixel area are arranged to face each other with a liquid crystal interposed therebetween, and are disposed in each pixel area of one opposing substrate. Provide color filterIn addition toIn the pair of opposed substrates, one end of the color filter is extended to the outside of the pixel area along the substrate surface direction, and the display electrode is formed from the inside to the outside of the pixel area on the upper surface of the color filter, And an end portion of the display electrode located outside the pixel area is covered with an insulating protective film.In the liquid crystal display device, the insulating protective film is configured by extending a part of an insulating light-shielding pattern provided on a counter substrate surrounding the pixel area to outside the pixel area.In particular, it has the following effects. That is, by using the color filter outside the pixel area and the pixel area as a base layer of the display electrode, the color filter is used as a smooth layer for the display electrode, and disconnection of the display electrode is prevented.In addition, since the insulating protective film can be configured by extending a part of the existing insulating light-shielding pattern, the structure is simplified, the manufacturing is simplified, and the manufacturing cost is reduced. it can.
[0013]
Also, since the display electrode extends to the outside of the pixel area, the end of the extended display electrode is easily damaged, but the display electrode end in this portion is covered with an insulating protective film. Therefore, the display electrode in this portion is not easily damaged.
[0014]
The liquid crystal display device according to a second aspect of the present invention is the liquid crystal display device according to the first aspect, wherein an end of the display electrode located outside the pixel area is insulated and protected except for an electrode lead-out portion. It is characterized by being coated with a film, and has the following effects. That is, since the electrode take-out portion is not covered with the insulating protective film, the display electrode can be easily pulled out from this portion.
[0015]
According to claim 3 of the present inventionThe color filter panel, in addition to providing a display electrode and a color filter for each pixel area on a transparent substrate, extending one end of the color filter along the substrate surface direction to the outside of the pixel area. A color filter panel in which the display electrode is formed from the inside to the outside of the pixel area on the upper surface of the color filter, and the end of the display electrode located outside the pixel area is covered with an insulating protective film; The protective film is characterized in that it is configured by extending a part of the insulating light-shielding pattern provided on the transparent substrate surrounding the pixel area to the outside of the pixel area. It has the same effect as item 1.
[0016]
According to claim 4 of the present inventionThe present invention is the color filter panel according to claim 3, wherein an end of the display electrode located outside the pixel area is covered with an insulating protective film except for an electrode lead-out portion. This has the same effect as the above-described claim 2.
[0019]
BEST MODE FOR CARRYING OUT THE INVENTION
FIG. 1 shows a configuration of a liquid crystal display device according to an embodiment of the present invention. In FIG. 1, for the sake of simplicity, only the configuration for one pixel consisting of the three primary colors of RGB is shown. However, the liquid crystal display device has a configuration in which such a configuration for one pixel is innumerable. Needless to say. Further, the present invention is not limited to such a liquid crystal display device, and it goes without saying that the present invention can be applied to any type of liquid crystal display device.
[0020]
The liquid crystal display device has a structure in which two transparent substrates 1A and 1B are opposed to each other, and a liquid crystal 2 is injected into a gap between the transparent substrates 1A and 1B. Display electrodes 3A and 3B made of a transparent electrode film such as ITO are provided on the liquid crystal side surfaces (inner surfaces) of the transparent substrates 1A and 1B. These display electrodes 3A and 3B are arranged orthogonally to each other between the transparent substrates 1A and 1B. Further, one transparent substrate 1A is provided with red, green, and blue color filters 4, 5, and 6, and the transparent substrate having these color filters 4, 5, and 6 and the display electrode 3A is provided. 1A constitutes a color filter panel. The liquid crystal display device of the present embodiment is characterized by the structure of the color filter panel.
[0021]
In the color filter panel, as shown in FIG. 2, color filters 4, 5, and 6 composed of three colors of red, green, and blue are first provided in each pixel area 7 on the transparent substrate 1A in parallel and slightly apart from each other. Are located. On the upper surfaces of the color filters 4, 5, and 6, display electrodes 3A are formed in the same pattern as the color filters 4, 5, and 6.
[0022]
Further, in each pixel area 7 of the transparent substrate 1A, an insulating light-shielding pattern 8 is provided so as to surround the color filters 4, 5, and 6, and the gap between the color filters 4, 5, and 6 and each pixel The surface of the transparent substrate 1A around the area 7 is covered with an insulating light-shielding pattern 8 in a frame shape.
[0023]
Part of each of the color filters 4, 5, and 6 extends to the outside of each pixel area 7 along the surface direction of the transparent substrate 1A. The extending ends 4a, 5a, 6a of the color filters 4, 5, 6 extend further outside the frame portion of the insulating light-shielding pattern 8. The display electrode 3A disposed on each of the color filters 4, 5, and 6 also extends to the outside of each pixel area 7 along the extending end 4a, 5a, and 6a of each of the color filters 4, 5, and 6. ing. Further, the insulating light-shielding pattern 8 also extends outside the pixel area 7 along the extending end 3Aa of the display electrode 3A, and the extending end 3Aa of the display electrode 3A is It is covered by the extension end 8a. However, an opening 9 is provided at the extension end 8a of the insulating light-shielding pattern 8 at the tip of the extension end 3Aa of the display electrode 3A, and the extension end 3Aa is exposed to the outside at this opening 9 portion. External connection is possible. In the present embodiment, the electrode take-out portion is formed from this opening 9, but the electrode take-out portion is not constituted only by such an opening 9, and a part of the extension end 3Aa is exposed. Needless to say, any configuration may be used.
[0024]
With this configuration, the pixel area 7 and the extended ends 4a, 5a, and 6a of the color filters 4, 5, and 6 outside the pixel area 7 serve as a base layer of the display electrode 3A. Therefore, the extended ends 4a, 5a, and 6a of these color filters 4, 5, and 6 function as a smooth layer for the display electrode 3A, thereby extending the display electrode 3A to the outside of the pixel area 7. Despite this, disconnection of the display electrode 3A is prevented.
[0025]
Further, since the display electrode 3A extends to the outside of the pixel area 7, the extension end 3Aa of the display electrode 3A is easily damaged, but the extension end 3Aa is connected to the extension of the insulating light-shielding pattern 8. The extension end 3Aa of the display electrode 3A is less likely to be damaged because it is covered by the extension 8a.
[0026]
Next, a first manufacturing method of the color filter panel will be described with reference to FIG. First, R, G, and B color filters 4, 5, and 6 are formed on the transparent substrate 1A by a photolithography method. The order of forming R, G, and B is arbitrary. As an example, the production of the R color filter 4 is as follows. That is, an R (red) photoresist layer is formed on the transparent substrate 1A that has been subjected to the cleaning and the predetermined pretreatment, using, for example, a negative photoresist CR-7001 manufactured by Fuji Film Ohlin Co., Ltd. The photoresist layer is formed using a photoresist layer forming apparatus.
[0027]
Next, the photoresist layer is irradiated with exposure light by an exposure device through a photomask (not shown), thereby exposing the photoresist layer (negative type) and removing the unexposed areas of the photoresist layer. Thus, the R (red) color filter 4 is formed. The method for forming the R (red) color filter 4 has been described above. The G (green) and B (blue) color filters 5 and 6 are also formed in the same manner as described above using the photoresist of the color. Form. (See FIG. 3 (a))
At this time, the color filters 4, 5, and 6 are also extended to the outside of the pixel area 7 so that the color filters 4, 5, and 6 become a base layer of the extended end 3Aa of the display electrode 3A. Outgoing ends 4a, 5a and 6a are formed.
[0028]
Next, a conductive transparent thin film 10 of ITO or the like is formed on the entire surface of the transparent substrate 1A on the color filters 4, 5, and 6 by a method such as a sputtering method (see FIG. 3B). A positive photoresist film 11 (for example, TLCR-P8001 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is formed on the transparent transparent thin film 10 by a photoresist layer forming apparatus. Further, after arranging a photomask 12 on the formed positive photoresist film 11 and irradiating exposure light, the positive photoresist film 11 is exposed to light. The etching mask 13 is formed by removing the portion. Then, the conductive transparent thin film 10 is selectively etched through the manufactured etching mask 13 to form the display electrode 3A. After the formation of the display electrode 3A, the etching mask 13 is removed. (See FIGS. 3 (c), (d) and (e))
After washing and performing various pretreatments on the transparent substrate 1A on which the display electrode 3A is formed, a black insulating negative photoresist film 14 (for example, V-259BKIS036X manufactured by Nippon Steel Chemical Co., Ltd.) is formed. (Refer to FIG. 3 (f).) Then, a photomask 15 is arranged on the negative photoresist film 11, and then the exposure light is irradiated thereon, thereby exposing the insulating negative photoresist film 14 to light. By removing the portion of the insulating negative photoresist film 14 that is not used (the portion of the pixel area 7), the insulating light shielding pattern 8 is formed by the remaining insulating negative photoresist film 14. (See Fig. 3 (g))
The insulating light-shielding pattern 8 has a frame shape surrounding the pixel area 7, and further has the extended ends 4 a at the extended ends 4 a, 5 a, 6 a, and 3 Aa of the color filters 4, 5, 6 and the display electrode 3 A. , 5a, 6a, and 3Aa. However, openings 9 are formed at the ends of the extended ends 4a, 5a, 6a, and 3Aa at the extended ends 8a of the insulating light-shielding patterns 8 to expose the display electrodes 3a.
[0029]
In this manufacturing method, since the color filters 4, 5, and 6 are provided as a base layer of the display electrode 3A, a step does not occur in the display electrode 3a extending outside the pixel area 7. (Refer to FIG. 2B.) Therefore, a liquid crystal display device and a color filter panel with no disconnection and high yield can be manufactured without providing a new structure such as providing a separate smooth layer.
[0030]
Next, a second method of manufacturing the color filter panel will be described with reference to FIG.
[0031]
First, R, G, and B color filters 4, 5, and 6 and a conductive transparent thin film 10 are formed on the transparent substrate 1A by the same method as the above-described first manufacturing method. (See FIGS. 4A and 4B)
Further, a negative photoresist film 16 (for example, composed of TFN-010PL manufactured by Tokyo Ohka Kogyo Co., Ltd.) is formed on the conductive transparent thin film 10 by a photoresist layer forming apparatus. Further, by irradiating exposure light after arranging a photomask 17 on the formed negative photoresist film 16, the negative photoresist film 16 is exposed, and furthermore, the negative photoresist film 16 which is not exposed is exposed. By removing the portion, an etching mask 18 corresponding to the shape of the display electrode 3A is formed. Then, the conductive transparent thin film 10 is selectively etched through the formed etching mask 18 to form the display electrode 3A. After the formation of the display electrode 3A, the etching mask 13 is removed. (See FIGS. 4 (c), (d) and (e))
The insulating light-shielding pattern 8 is formed on the transparent substrate 1A, on which the display electrode 3A is formed, by forming an insulating negative photoresist film 14 and performing an etching process using an etching mask 15 as in the first manufacturing method. (FIGS. 4F and 4G).
[0032]
As described above, the second manufacturing method is different from the first manufacturing method in that a negative photoresist is used as the etching mask 18 used for etching the display electrode 3A.
[0033]
Next, a third manufacturing method of the color filter panel will be described with reference to FIG. First, R, G, and B color filters 4, 5, and 6 are formed on the transparent substrate 1A by a photolithography method. The order of forming R, G, and B is arbitrary. Taking the production of the R color filter 4 as an example, it is as follows. That is, an R (red) photoresist layer is formed on the transparent substrate 1A that has been washed and subjected to a predetermined pretreatment, using a dry film resist R transer (negative type) manufactured by Fuji Film Ohlin Co., Ltd. The photoresist layer is formed using a photoresist layer forming apparatus.
[0034]
Next, the photoresist layer is irradiated with exposure light by an exposure device through a photomask (not shown), thereby exposing the photoresist layer (negative type) and removing the unexposed areas of the photoresist layer. Thus, the R (red) color filter 4 is formed. The method of forming the R (red) color filter 4 has been described above. The G (green) and B (blue) color filters 5 and 6 are similarly formed using photoresists of the colors. (See FIG. 5 (a).) At this time, the color filters 4, 5, and 6 are also provided with pixels so that the color filters 4, 5, and 6 serve as a base layer of the extended end 3Aa of the display electrode 3A. It goes without saying that the extension ends 4a, 5a, 6a extending to the outside of the area 7 are prepared.
[0035]
Next, a conductive transparent thin film 10 of ITO or the like is formed on the entire surface of the transparent substrate 1A on the color filters 4, 5, and 6 by a method such as a sputtering method (see FIG. 5B). A positive photoresist film 19 (for example, Tokyo Ohka Kogyo Co., Ltd.) selectively exposed on the transparent transparent thin film 10 only to light having a wavelength that does not pass through the color filters 4, 5, and 6 by a photoresist layer forming apparatus. TLCR-P8000PM). Then, by irradiating exposure light from the back surface of the transparent substrate 1A (the surface without the color filters 4, 5, 6), the positive photoresist film 19 other than the regions where the color filters 4, 5, 6 are formed is exposed, and furthermore, Forms an etching mask 20 by selectively removing the exposed portion of the positive photoresist film 19. Then, the conductive transparent thin film 10 is selectively etched through the etching mask 20 to form the display electrode 3A. After forming the display electrode 3A, the etching mask 13 is removed. (See FIGS. 5 (c), (d) and (e))
Similarly to the first manufacturing method, the transparent substrate 1A on which the display electrode 3A is formed is subjected to the formation of the insulating negative type photoresist film 14 and the etching treatment using the etching mask 15 so that the insulating light shielding pattern 8 is formed. Is formed (see FIGS. 5F and 5G).
[0036]
The third manufacturing method differs from the first and second manufacturing methods in that, as described above, the etching mask 20 used for etching the display electrode 3A is manufactured by backside exposure that does not require a photomask. There are different features. Since the backside exposure is an exposure process that does not require a mask, there is an advantage that the process is simplified and the manufacturing cost can be reduced because no mask is required.
[0037]
Next, a fourth manufacturing method of the color filter panel will be described with reference to FIG. First, color filters 4, 5, and 6 of three colors, R, G, and B, and a display electrode 3A are formed on the transparent substrate 1A by a method similar to the third manufacturing method described above (FIG. 6 ( a), (b), (c), (d), (e)).
[0038]
Next, after subjecting the transparent substrate 1A on which the color filters 4, 5, 6 and the display electrode 3A are formed to a cleaning treatment and a predetermined pretreatment, light having a wavelength that does not pass through the color filters 4, 5, 6 An insulating negative type photoresist film 21 (for example, a dry film resist black transer manufactured by Fuji Film Ohlin Co., Ltd.) that is selectively exposed only to the substrate is formed. Then, the photomask 22 is arranged on the surface of the transparent substrate 1A (the surface with the color filters 4, 5, and 6). As the photomask 22, a photomask 22 having an opening 22a formed in a portion surrounding the periphery of each pixel area 7 in a frame shape and a portion corresponding to the outside of the pixel area 7 is used.
[0039]
Then, by irradiating exposure light from the surface of the transparent substrate 1A through the photomask 22, the insulating negative photoresist film 21 has a region corresponding to the frame region of the insulating light-shielding pattern 8 and the outside of the pixel area 7. A region corresponding to the region is exposed.
[0040]
Next, by exposing the back surface of the transparent substrate 1A (the surface without the color filters 4, 5, 6) to exposure light, the area without the color filters 4, 5, 6 is selectively exposed. Then, the insulating light-shielding pattern 8 is formed by removing the portion of the insulating negative photoresist film 21 which is not exposed to light.
[0041]
According to this method, almost all regions of the insulating negative type photoresist film 21 can be formed by back surface exposure that hardly requires a photomask, thereby simplifying manufacturing and reducing costs. be able to.
[0042]
However, the color filters 4, 5, and 6 of the color filter panel have extended ends 4a, 5a, and 6a that extend to the outside of the pixel area 7, and further have extended ends 4a, 5a, and 6a. It is necessary to cover 6 a with the extended end 8 a of the insulating light-shielding pattern 8.
[0043]
On the other hand, since the color filter extension ends 4a, 5a, and 6a are provided below the extension end 8a of the insulating light-shielding pattern, the color filter extension ends 4a, 5a , 6a cannot be exposed to the insulating negative type photoresist film 21. Therefore, only the region of the insulating negative type photoresist film 21 disposed on the extending ends 4a, 5a, 6a of the color filter is selectively exposed through the photomask 22 from the surface side of the transparent substrate 1A. This realizes exposure of this region. If the photomask 22 used in this case is formed with an opening 22a surrounding the pixel area 7 in a frame shape, the insulating negative type photo-detector disposed on the extending ends 4a, 5a, 6a of the color filter is formed. It can correspond to the region of the resist film 21. Since such an opening 22a can be formed relatively coarsely and easily, the manufacturing cost does not increase significantly despite the necessity of preparing the photomask 22.
[0044]
【The invention's effect】
As described above, according to the present invention, by using a color filter outside the pixel area and the pixel area as a base layer of the display electrode, the color filter functions as a smooth layer for the display electrode, The disconnection of the electrode for use is prevented. Furthermore, since the display electrode extends to the outside of the pixel area, the end of the extended display electrode is easily damaged, but the display electrode end in this portion is covered with an insulating protective film. Therefore, the display electrode in this portion is hardly damaged. Therefore, it is possible to provide a liquid crystal display device and a color filter panel that are hardly broken or damaged without providing an extra structure such as a smooth layer. Furthermore, if such an insulating protective film is formed from an existing structure called an insulating light-shielding pattern, the structure is further simplified, the manufacturing becomes easier, and the manufacturing cost can be reduced.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a main part showing a configuration of a liquid crystal display device according to an embodiment of the present invention.
FIG. 2 is a plan view of a color filter panel included in the liquid crystal display device according to the embodiment, and sectional views taken along lines A-A ', B-B', and C-C 'thereof.
FIG. 3 is a cross-sectional view showing each step of a first method for manufacturing a color filter panel constituting the liquid crystal display device of the present invention.
FIG. 4 is a cross-sectional view showing each step of a second method for manufacturing a color filter panel constituting the liquid crystal display device of the present invention.
FIG. 5 is a cross-sectional view showing each step of a third method for manufacturing a color filter panel constituting the liquid crystal display device of the present invention.
FIG. 6 is a cross-sectional view showing each step of a fourth method for manufacturing a color filter panel constituting the liquid crystal display device of the present invention.
FIG. 7 is a plan view of a color filter panel constituting a conventional liquid crystal display device, and a cross-sectional view taken along line A-A 'and line B-B' thereof.
[Explanation of symbols]
1A, 1B Transparent substrate 2 Liquid crystal 3A, 3B Display electrode
4, 5, 6 color filter 7 pixel area
8 Insulating light-shielding pattern 8a Extension end 9 Opening
10 Conductive transparent thin film 11 Positive photoresist film
12 Photomask 13 Etching mask
14 Insulating negative photoresist film
15 Photomask 16 Negative photoresist film
17 Photomask 18 Etching mask
19 Positive photoresist film 20 Etching mask
21 Insulating negative photoresist film 22 Photomask
22a opening

Claims (4)

A pair of opposed substrates has display electrodes provided in each pixel area, across the liquid crystal as well as facing each other, the color filter is provided in addition to the Rukoto to each pixel area of one of the counter substrate, wherein one of the opposing substrate Then, one end of the color filter is extended to the outside of the pixel area along the direction of the substrate surface, and the display electrode is formed from the inside to the outside of the pixel area on the upper surface of the color filter, and the outside of the pixel area is formed. A liquid crystal display device comprising an end portion of the display electrode located at a position covered with an insulating protective film ,
The liquid crystal display device according to claim 1, wherein the insulating protective film is configured by extending a part of an insulating light-shielding pattern provided on a counter substrate surrounding the pixel area to outside of the pixel area . The liquid crystal display device according to claim 1,
An end portion of the display electrode located outside the pixel area is covered with the insulating protective film except for an electrode take-out portion. In addition to providing the display electrode and the color filter for each pixel area on the transparent substrate, one end of the color filter extends to the outside of the pixel area along the substrate surface direction, and A color filter panel in which the display electrode is formed from the inside to the outside of the pixel area on the upper surface, and the end of the display electrode located outside the pixel area is covered with an insulating protective film,
The color filter panel according to claim 1, wherein the insulating protection film surrounds the pixel area and extends a part of the insulating light-shielding pattern provided on the transparent substrate to outside the pixel area. It is a color filter panel of Claim 3, Comprising:
A color filter panel, wherein an end of the display electrode located outside the pixel area is covered with an insulating protective film except for an electrode lead- out portion .

Images