JPS62127229A - Heat treatment of film - Google Patents

Heat treatment of film

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Publication number
JPS62127229A
JPS62127229A JP26751785A JP26751785A JPS62127229A JP S62127229 A JPS62127229 A JP S62127229A JP 26751785 A JP26751785 A JP 26751785A JP 26751785 A JP26751785 A JP 26751785A JP S62127229 A JPS62127229 A JP S62127229A
Authority
JP
Japan
Prior art keywords
film
heat treatment
temperature
heat
spacer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26751785A
Other languages
Japanese (ja)
Other versions
JPH0519899B2 (en
Inventor
Akira Shinguu
新宮 公
Masao Suzuki
鈴木 将夫
Hitoshi Mikoshiba
均 御子柴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP26751785A priority Critical patent/JPS62127229A/en
Publication of JPS62127229A publication Critical patent/JPS62127229A/en
Publication of JPH0519899B2 publication Critical patent/JPH0519899B2/ja
Granted legal-status Critical Current

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  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)

Abstract

PURPOSE:To manufacture a continuous film with excellent dimensional heat stability by a method wherein the film is picked up while being heat-treated under the state that a spacer is piled up to the film. CONSTITUTION:First, a film 1 and a spacer 2 are set in a preheating oven 4. The temperature in the preheating oven 4 is controlled to be at the atmospheric air temperature of 30 deg.C which is below the glass transition temperature of the film. Secondly, the temperature in a heat-treating oven 4b is raised so as to put a wind-up machine into rotation when said temperature reaches 140 deg.C in order to pick up the film under heat to a roll 3. The film 1 with 200m in length passes through the heat-treating oven 4b in 2min and is wound up to a wind-up shaft 3a by spending about 2hr. Finally, after the film is wound up, the spacer 2 is removed. The surface resistance value and the like of the obtained film are uniform. No scratch develops on the external surface. at the same time, the heat shrinkage factor of the obtained film is also small.

Description

【発明の詳細な説明】 (利用分野) 本発明は長尺のフィルムを熱処理し熱時寸法安定性のす
ぐれたフィルムを得るフィルムの熱処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Application) The present invention relates to a method for heat treating a long film to obtain a film with excellent dimensional stability when heated.

特に光学的、電気的用途に使用する光選択性膜、透明導
電性膜等の機能性薄膜を積層したプラスチックフィルム
の熱処理に有用であり、熱部寸法安定性のりぐれた長尺
フィルムが取j!1でさる。
It is particularly useful for heat treatment of plastic films laminated with functional thin films such as photo-selective films and transparent conductive films used in optical and electrical applications, and long films with excellent dimensional stability in hot parts are available. ! 1 is a monkey.

(従来技術) フィルムの熱処理方法には、そのフィルムの長さ1こよ
り熱処理方法が異なる。比較的短いフィルムの熱処理方
法としては、■トンネル式連続炉中で低速度で連続的に
処理する。■フィルムを比較的ゆるく巻きそのまま加熱
か中で熱処理する(例えば特開昭58−98219号公
報)■巻回層間にスペーサを介在さけたロール状フィル
ムを加熱炉中で熱処理する(例えば特開昭60−823
38号公報)等の方7人が知られているが、上述した従
来の方法はそれぞれ次の問題点を有している。■の方法
では熱処理時間が数分〜数十分程度なら有効な方法であ
るが、通常その時間では不充分なことが多く熱処理時間
が長くなると加熱炉も長くなり、フィルムの取り扱い時
のロスも多くなり、又加熱炉の製造コストち高くなる。
(Prior Art) The heat treatment method for a film differs depending on the length of the film. As a heat treatment method for relatively short films, (1) Continuous treatment at low speed in a continuous tunnel furnace. ■ Roll the film relatively loosely and heat-treat it in a heating oven (for example, Japanese Patent Application Laid-Open No. 58-98219). ■ Heat-treat the rolled film in a heating furnace without intervening a spacer between the wound layers (for example, Japanese Patent Application Laid-Open No. 1987-98219). 60-823
Seven methods are known, such as Japanese Patent No. 38), but each of the above-mentioned conventional methods has the following problems. Method (2) is effective if the heat treatment time is from a few minutes to several tens of minutes, but that time is usually insufficient, and the longer the heat treatment time, the longer the heating furnace, and the loss during handling of the film. This also increases the manufacturing cost of the heating furnace.

■の方法て゛は長尺の場合フィルムをゆるく巻くのが困
難であり、又、巻きずれによる(セの発生等が起こり易
い。■の方法では■の方法の問題点を克服しているが、
フィルム間に空気層が存在するため各フィルム間の熱伝
導がおそくロール状フィルム全体が温度上昇するのに時
間がかかる。即ち巻回したフィルムの長さ方向に温度分
布が生じ、全体が均一な温度になるまで長時間を要する
。このためにフィルムの良さ方向において、巻き取り始
めの部分、中央部分9巻き取り終りの部分の熱処理温度
及び時間の差が大きくなる。又フィルムの長さ方向にフ
ィルムの熱部寸法安定性の異なるものができる。すなわ
ら、フィルム全体に亘って均一な熱処理が難しいという
問題がある。
With method (2), it is difficult to wind the film loosely when the film is long, and it is also easy to cause misalignment (slips, etc.).Method (2) overcomes the problems of method (2), but
Since there is an air layer between the films, heat conduction between the films is slow, and it takes time for the temperature of the entire rolled film to rise. That is, a temperature distribution occurs in the length direction of the wound film, and it takes a long time for the entire film to reach a uniform temperature. For this reason, the difference in heat treatment temperature and time between the beginning of winding and the central part 9 and the end of winding increases in the film's thickness direction. Also, the dimensional stability of the hot part of the film can differ in the length direction of the film. In other words, there is a problem in that uniform heat treatment over the entire film is difficult.

従って比較的長尺のフィル11の熱処理方法としては、
熱処理時間の短いものは前述した■の方法が一般的に用
いられている。しかしながら熱処理時間が良いものにつ
いては今だ有用な方法が見出されていない。なおどの方
法をとるにしてもフィルムの熱収縮による変形やブロッ
キング、スクラッチ等の発生をさけなければならない。
Therefore, as a heat treatment method for a relatively long film 11,
For short heat treatment times, the method (2) described above is generally used. However, no useful method has yet been found for a method that requires a good heat treatment time. Whatever method is used, it is necessary to avoid deformation, blocking, scratches, etc. due to thermal shrinkage of the film.

(発明の目的) 本発明は、かかる現状に鑑みなされたもので、フィルム
の熱収縮による変形や、ブロッキング。
(Objective of the Invention) The present invention has been made in view of the current situation, and is aimed at preventing deformation and blocking due to heat shrinkage of the film.

スクラッチ等の発生がなく、長さ方向にも均一な熱処理
ができ、良好なフィルムを得ることができる長尺フィル
ムの熱処理方法を目的としたものである。
The object of the present invention is to provide a method for heat-treating a long film that does not cause scratches, can be heat-treated uniformly in the longitudinal direction, and can produce a good film.

(発明の構成及び作用) 上述の目的は以下の本発明により達成される。(Structure and operation of the invention) The above objects are achieved by the invention as follows.

−シなわら本発明は、フィルムの熱処理す法においで、
熱処理温度より低い保持温度に保持された該フィルムの
ロールよりフィルムを巻き出して熱処理温度に保持され
た熱処理炉に尋き、該熱処理炉内で略熱処理温度まで加
熱する一方、その間にフィルムの少なくとも両端にスペ
ーサを重ねて、該熱処理炉内で加熱されたフィルムをス
ペーサが介在するロールに連続的に巻き上げ、次いで該
スペーサ介在ロールを熱処理温度に所定時間保持して熱
処理することを特徴とするフィルムの熱処理方法である
- However, the present invention provides a method for heat treating a film,
The film is unwound from the roll of the film held at a holding temperature lower than the heat treatment temperature and transferred to a heat treatment furnace maintained at the heat treatment temperature, and heated to approximately the heat treatment temperature in the heat treatment furnace, while at least A film characterized by stacking spacers on both ends, continuously winding up the film heated in the heat treatment furnace onto a roll with spacers interposed therebetween, and then heat-treating the film by holding the spacer-interposed roll at the heat treatment temperature for a predetermined period of time. This is a heat treatment method.

上述の通り、本発明ではフィルム巻回層間にスペーサを
介在させフィルム間でのブロッキング。
As mentioned above, in the present invention, a spacer is interposed between the film winding layers to achieve blocking between the films.

スクラッチの発生等を防ぐと共に、巻き出し側のフィル
ムは熱処理する温度以下の保持温度に保持して巻き出し
部での熱のロールへの影響を排除する一方、送り出され
たフィルムを熱処理する温度まで加熱しながら巻回層間
にフィルムの両端に沿ってスペーサを介在させてロール
に巻き上げることにより熱処理温度と同じ温度の熱風を
フィルム間に巻き込むようにしてあり、よってフィルム
の巻回層間の温度は均一となり、長さ方向にも均一な理
想的な熱処理状態が達成されるものである。
In addition to preventing the occurrence of scratches, the film on the unwinding side is maintained at a holding temperature below the temperature for heat treatment to eliminate the effect of heat on the roll at the unwinding section, and at the same time the film is kept at a temperature below the temperature for heat treatment. By inserting spacers along both ends of the film between the wound layers while heating and winding the film into a roll, hot air at the same temperature as the heat treatment temperature is drawn between the films, so the temperature between the wound layers of the film is uniform. Thus, an ideal heat treatment condition that is uniform in the length direction is achieved.

又、巻き取った復熱処理温度に保持する場合に、巻き取
り側を回転し続けることにより、フィルムのダレによる
変形やブロッキング等を防ぐこともでき、より良好な熱
処理を可能とすることができる。
Further, when maintaining the reheating treatment temperature at which the film is wound, by continuing to rotate the winding side, deformation and blocking due to sagging of the film can be prevented, and better heat treatment can be performed.

なお、保持温度は、熱処理炉に入る時の温度差及び熱処
理炉内での加熱l)間の減少という点からは高い方が好
ましいが、さき出し中のロールでの熱変形という点から
は低い方が好ましく、通′常実質的にさき出し中のフィ
ルムの品質(スクラッチの発生等)に影響を与えない温
度に選定される。
Note that a higher holding temperature is preferable from the viewpoint of reducing the temperature difference when entering the heat treatment furnace and during heating in the heat treatment furnace, but it is lower from the viewpoint of thermal deformation in the rolls during exposure. The temperature is preferably selected at a temperature that does not substantially affect the quality of the film being exposed (such as the occurrence of scratches).

かかる点から保持温度は処理するフィルムのガラス転位
fAα以下に選定される。保持温度に保持する手段とし
ては熱風を吹込む予熱炉等利用できるが、保持温度が大
気温度で良い場合は不要である。
From this point of view, the holding temperature is selected to be below the glass transition fAα of the film to be processed. A preheating furnace that blows hot air or the like can be used as a means for maintaining the holding temperature, but this is not necessary if the holding temperature can be kept at atmospheric temperature.

上)ホの本発明は、後述するプラスチックフィルム等の
フィルム自体の熱狛性を調整するための熱処理、あるい
こハらフィルムを基板としてその上に真空蒸着、スパッ
タリング、化学コーティング等により透明導電性膜、光
選択性膜等の機能性薄膜を形成したフィルムの電気特性
、光学特性2機械的特性、耐熱性、耐湿度性等の向上の
ための熱処理等、所定時開以上所定の処理温度に維持す
る必要がある熱処理一般に適用できる。特に後述の実施
例に示す透明導電性フィルムの如く、熱処理時間の長い
熱処理で有利である。従って本発明の適用できるフィル
ムは、上述の熱処理に耐えうるちのであれば特にυj約
はなく、次間するプラスチックフィルムあるいはこれを
基板としてぞの上機能性薄膜を積層としたフィルム等が
ある。
(a) The present invention (e) involves heat treatment to adjust the thermal tenacity of the film itself, such as a plastic film described below, or a transparent conductive film is applied to the film as a substrate by vacuum evaporation, sputtering, chemical coating, etc. Electrical properties and optical properties of films with functional thin films such as membranes and photo-selective films 2 Heat treatment to improve mechanical properties, heat resistance, humidity resistance, etc. Applicable to general heat treatment that needs to be maintained. This is particularly advantageous for heat treatment that requires a long heat treatment time, such as a transparent conductive film shown in Examples below. Therefore, the film to which the present invention can be applied is not particularly limited to υj as long as it can withstand the above-mentioned heat treatment, and may include a plastic film or a film in which a functional thin film is laminated on top of the plastic film as a substrate.

例えば、ポリエチレンテレフタレートフィルム。For example, polyethylene terephthalate film.

ポリ−[チレンナフタレートフィルム、ポリスチレンフ
ィルム、ポリカーボネートフィルム、 l−リアセテー
トフイルム、ポリサルフォンフイルム、ポリエーテルサ
ルフォンフイルム、ポリイミドフィルム、ポリアミドイ
ミドフィルム等が挙げられるが、耐熱性、耐湿度性、熱
寸法安定性等からポリエチレンテレフタレートフィルム
が好ましく用いられる。
Examples include poly-[tyrene naphthalate film, polystyrene film, polycarbonate film, l-lyacetate film, polysulfone film, polyether sulfone film, polyimide film, polyamide-imide film, etc., but heat resistance, humidity resistance, thermal dimension Polyethylene terephthalate film is preferably used from the viewpoint of stability.

以下、図面を参照しつつ本発明の詳細な説明する。Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図は本発明の実施例に用いた装置の構成図である。FIG. 1 is a block diagram of an apparatus used in an embodiment of the present invention.

第1図において、1は巻き出し銅のフィルムのO−ルを
、2はフィルムの両端に設置されるスペーサを、3は第
2図に示すようにスペーサ2が介在するように巻き上げ
られたロールを、4aは予熱炉を、4bは熱処理炉をそ
れぞれ示している。なお、予熱炉4aと熱処理炉4bは
周知の熱風炉で独立に温度i、II御可能となっている
。所定の加工を施し巻き取られたフィルム1のロール1
aを予熱室4aの巻き出し部に取り付けると共に、フィ
ルムの両端に設置するスペーサ2のO−ル2aを同様に
取り付ける。このスペーサ2は間隔を一定にするものな
ら特に制約はないが、熱処理されるフィルム1が熱収縮
をする場合には出来れば熱処理されるフィルム1と同種
のものが好ましい。即ら、スペーサ2が熱処理されるフ
ィルム1と同種であれば熱収縮率がほぼ同じとなり巻き
取り後の熱処理により熱収縮した場合でも巻きくずれや
、巻き締まり等による変形を最少限にすることが可能で
ある。
In Figure 1, 1 is the roll of the unrolled copper film, 2 is the spacer installed at both ends of the film, and 3 is the roll wound up with the spacer 2 interposed as shown in Figure 2. , 4a represents a preheating furnace, and 4b represents a heat treatment furnace. The preheating furnace 4a and the heat treatment furnace 4b are well-known hot blast furnaces, and the temperatures i and II can be controlled independently. Roll 1 of film 1 that has been subjected to prescribed processing and wound up
A is attached to the unwinding part of the preheating chamber 4a, and the O-ru 2a of the spacer 2 to be installed at both ends of the film is similarly attached. There are no particular restrictions on the spacers 2 as long as the spacing is constant, but if the film 1 to be heat-treated is subject to heat shrinkage, it is preferably the same type as the film 1 to be heat-treated. That is, if the spacer 2 is of the same type as the film 1 to be heat-treated, the heat shrinkage rate will be almost the same, and even if the spacer 2 is heat-shrinked due to heat treatment after winding, deformation due to unrolling or tightness of the winding can be minimized. It is possible.

予熱炉4a内の巻き出し側のロール1aから送り出され
たフィルム1は、スペーサ2と共にガイドロール5によ
り重ね合わされる。この場合、ガイドロール5に接触す
るのはスペーサ2であり熱処理されるフィルム1は接触
しないため、該フィルム1のがイドロール5によるスク
ラッチを防止することができる。熱処理炉4bに入った
フィルム1とスペーサ2の温度は巻き取られるまでに熱
処LgIm度近(まで上がるため熱収縮が始まり、ある
程度の熱収縮は巻き取られるまでに終了している。通常
この加熱処理時間は1分間から10分間で充分である。
The film 1 sent out from the roll 1a on the unwinding side in the preheating furnace 4a is overlapped with the spacer 2 by the guide roll 5. In this case, since it is the spacer 2 that contacts the guide roll 5 and the film 1 to be heat treated does not come into contact with it, it is possible to prevent the film 1 from being scratched by the idle roll 5. The temperature of the film 1 and spacer 2 that have entered the heat treatment furnace 4b rises to nearly LgIm (degrees) before being wound up, so heat shrinkage begins, and some degree of heat shrinkage has already been completed by the time the film is wound up. A heat treatment time of 1 minute to 10 minutes is sufficient.

又、スペーサ2の巾並びに厚さは大きくするほどフィル
ム面間の間隔を大きくすることになり有利となるが、熱
処理終了後のスペーサ2の除去のためのフィルム端部の
切断中が増大し、フィルムの1]方向のロスが増大し、
かつフィルムロール3の径が増大するために不利となる
。従ってスペーサ2の巾はフィルム巾の1/10〜11
50.厚さは50μm〜500μmとすることが好まし
い。なおスペーサ2はフィルム1の巾が広い場合は両端
部のみでなく、その中間部にも設けると良い。又、スペ
ーサ2には上記厚みに更にナーリング加工等により凹凸
をつけることによりフィルムロール3のフィルム間の空
気を外と若干通気できるようにしたものも用いることが
できる。
Further, the larger the width and thickness of the spacer 2, the larger the distance between the film surfaces, which is advantageous, but the cutting of the film end to remove the spacer 2 after the heat treatment is completed increases. The loss in the 1] direction of the film increases,
Moreover, the diameter of the film roll 3 increases, which is disadvantageous. Therefore, the width of spacer 2 is 1/10 to 11 of the film width.
50. The thickness is preferably 50 μm to 500 μm. Note that when the width of the film 1 is wide, the spacer 2 may be provided not only at both ends but also at the middle part. Further, the spacer 2 may have the above-mentioned thickness and be made uneven by knurling or the like so that the air between the films of the film roll 3 can be slightly ventilated to the outside.

尚、これらフィルム1及びスペーサ2はあらかじめオリ
ゴマー等の発生を抑えるための従来公知の予備処理、コ
ーティングされたものでもよい。
Incidentally, the film 1 and the spacer 2 may be subjected to a conventional pretreatment or coating in order to suppress the generation of oligomers and the like.

熱処理する温度は、熱処理の目的に応じて適宜選定され
る。フィルム1がプラスチックフィルムを含む場合には
そのプラスチックフィルムのガラス転位点を越える温度
であればいかなる温度でもよいが、通常ポリエチレンテ
レフタレートの場合は120℃以上180℃以下の温度
である。又、巻き上げたフィルムロール3の熱処理に要
する時間は目的に応じて異なり、熱処理温度が高い程短
時間ですむが通常30分以上である。すなわち、熱処理
の時間及び温度は、対象物具体的には加熱処理すべきフ
ィルム例えばその上に加工された薄膜材質により適宜実
験的に選定される。
The temperature at which the heat treatment is performed is appropriately selected depending on the purpose of the heat treatment. When the film 1 includes a plastic film, any temperature may be used as long as it exceeds the glass transition point of the plastic film, but in the case of polyethylene terephthalate, the temperature is usually 120°C or more and 180°C or less. Further, the time required for heat treatment of the wound film roll 3 varies depending on the purpose, and the higher the heat treatment temperature, the shorter the time required, but it is usually 30 minutes or more. That is, the time and temperature of the heat treatment are appropriately selected experimentally depending on the object, specifically the film to be heat treated, for example, the material of the thin film processed thereon.

予熱炉4aの保持温度は熱処理炉4bの温度より低けれ
ば、フィルムロール1aの急濫な加熱による、スクラッ
チやキズを実用上支障のない最少限にすることが可能で
あるが、保持時開により左右され、りYましくけ巻き出
し側のフィルムの全てが送り出されるまでの時間が2時
間以内ぐあれば良い。これは2時間以上になると巻き出
し側のフィルムが熱収縮を開始しスクラッチが非常゛に
多く発生するためである。なお、保持温度がフィルムの
ガラス転位点以下の温度ではかかる問題はない。
If the holding temperature of the preheating furnace 4a is lower than the temperature of the heat treatment furnace 4b, it is possible to minimize scratches and scratches caused by rapid heating of the film roll 1a without causing any practical problems. Depending on the situation, the time it takes for all of the film on the unwinding side to be fed out should be within 2 hours. This is because if the unwinding time exceeds 2 hours, the film on the unwinding side will start to shrink due to heat, resulting in a large number of scratches. Note that this problem does not occur when the holding temperature is below the glass transition point of the film.

以下実施例により本発明を説明する。The present invention will be explained below with reference to Examples.

(実施例1) 巾400am 、厚み100μmの二輪延伸されたポリ
エチレンテレフタレートフィルムを真空蒸着装置に入れ
、真空度I X 10” T Orrになるまで真空槽
を排気した。その後、In 203/31102(Sn
 025wt%)を電子ビームで加熱蒸発させインジウ
ム・スズ酸化物膜を形成したフィルム]を200m t
ti−偏した。
(Example 1) A two-wheel stretched polyethylene terephthalate film having a width of 400 am and a thickness of 100 μm was placed in a vacuum evaporation apparatus, and the vacuum chamber was evacuated until the degree of vacuum reached I x 10" T Orr. Thereafter, In 203/31102 (Sn
025wt%) was heated and evaporated with an electron beam to form an indium tin oxide film].
ti-biased.

スペーサ2として厚さ 125μm、巾15.のポリエ
チレンテレフタレートフィルムをロール状に200m巻
き取って準備した。
Spacer 2 has a thickness of 125 μm and a width of 15. A polyethylene terephthalate film was prepared by winding it into a roll of 200 m.

前記のインジウム・スズ酸化物膜を形成したフィルム1
のロール1aを巻き出し軸1bに、スペーサ2のロール
2aをスペーサ取り付は軸2bに取り付け、巻取機(図
示省略)の巻取軸3aまでフィルム1を取り出して取り
付は予熱炉4aの温度を110℃に制御し連続巻き取り
可能にした。
Film 1 with the above-mentioned indium tin oxide film formed
The roll 1a of the spacer 2 is attached to the unwinding shaft 1b, the roll 2a of the spacer 2 is attached to the shaft 2b, the film 1 is taken out to the winding shaft 3a of the winder (not shown), and the roll 2a of the spacer 2 is attached to the preheating furnace 4a. The temperature was controlled at 110°C to enable continuous winding.

次いで熱処理炉4bの温度が140℃に上昇した所で巻
取機を回転させて加熱しつつロール3に巻き上げた。フ
ィルム1が熱処理炉4bに入り、巻き取られるまでの時
間を19闇として約1時間かけて巻き返した。尚フィル
ムは熱処理炉4bに入り1分以内にフィルム表面温度が
138℃に達していた。
Next, when the temperature of the heat treatment furnace 4b rose to 140° C., the winding machine was rotated to heat the film and wind it onto the roll 3. The film 1 entered the heat treatment furnace 4b and was rewound for about 1 hour with a time of 19 hours until it was rewound. The film entered the heat treatment furnace 4b and the film surface temperature reached 138° C. within 1 minute.

巻き取り終了後、更に 140℃で24時間然処理を行
なった後(この場合巻取機の回転は止めておいた)、熱
処理炉4bを冷却し、フィルムロール3を取り出してス
リッター付巻回し機でフィルム両端をそれぞれ巾251
1Ilで切断してスベーIすの除去とスペーサによるフ
ィルム端部の変形、汚れ部分を除去した。
After winding was completed, the film was further treated at 140°C for 24 hours (in this case, the rotation of the winder was stopped), the heat treatment furnace 4b was cooled, and the film roll 3 was taken out and passed through a winder with a slitter. The width of both ends of the film is 251 mm.
The film was cut with 1Il to remove the substrate and the deformation and dirt on the edges of the film caused by the spacer.

この様にして得た透明導電性フィルムは、フィルムの長
さ方向及び巾方向全域に亘って表面抵抗値9表面抵抗直
線性、及び透過率共にバラツキも少なく良好であった。
The transparent conductive film thus obtained had good surface resistance value of 9, surface resistance linearity, and transmittance with little variation over the entire length and width directions of the film.

又外観を検査したところ傷の発生は全く見られず外観良
好であった。
Further, when the external appearance was inspected, no scratches were observed and the external appearance was good.

フィルムの長さ方向(MD)及び巾方向(TD)の12
0℃で30分加熱した場合の熱収縮率は使用したフィル
ムではそれぞれ0.9%、0.8%であり、熱処理後で
はそれぞれ0.1%、0.1%以下であり、フィルムの
長さ方向のいづれの箇所でもこの範囲内であった。
12 in the length direction (MD) and width direction (TD) of the film
The heat shrinkage rates of the used films when heated for 30 minutes at 0°C were 0.9% and 0.8%, respectively, and after heat treatment they were 0.1% and 0.1% or less, respectively, and the film length Both locations in the horizontal direction were within this range.

(実施例2) 実施例1と全く同様にして、同じフィルム1とスペーサ
2とを200mずつ予熱炉4a内にセットすると共に巻
取軸3aまで取り出し、予熱炉4aの温度をガラス転位
温度以下の大気温度30℃に制御した。
(Example 2) In exactly the same manner as in Example 1, the same film 1 and spacer 2 were set in a preheating furnace 4a for 200 m each, and the take-up shaft 3a was taken out, and the temperature of the preheating furnace 4a was lowered to below the glass transition temperature. The atmospheric temperature was controlled at 30°C.

次いで熱処理炉4bの温度を上げ140℃に上背した所
で巻取機を回転させて加熱しつつロール3に巻き上げた
。フィルム1が熱処理炉4bに入り、巻き取られるまで
の時間を2分間として約20.1間かけC巻き返した。
Next, the temperature of the heat treatment furnace 4b was raised to 140°C, and the winding machine was rotated to heat the film and wind it onto the roll 3. The film 1 entered the heat treatment furnace 4b and was rewound C for about 20.1 minutes, with the time until it was wound up being 2 minutes.

尚フィルムは加熱炉に入り1分以内にフィルム表面(温
度が138℃に達していた。
Note that the film surface (temperature reached 138° C.) within 1 minute after entering the heating oven.

さき取り終了後、実施例1と全く同様にして熱処理する
ど共にスペーサ2の除去等を行なった。
After scraping, heat treatment was performed in exactly the same manner as in Example 1, and the spacers 2 were removed.

この様にして得た透明導電性フィルムは、実施例1と同
様フィルムの長さ方向及び11]方向全域に口って表面
抵抗値1表面抵抗直線性、及び透過率共にバラツキも少
なく良好であった。又外観を検査したところ傷の発生は
全く見られず外観良好であった。又その熱収縮率も実施
例1と全く同様で良好であった。
As in Example 1, the transparent conductive film obtained in this manner had good surface resistance value, surface resistance linearity, and transmittance with little variation in the entire length direction and 11] direction of the film. Ta. Further, when the external appearance was inspected, no scratches were observed and the external appearance was good. Further, its heat shrinkage rate was exactly the same as that of Example 1 and was good.

(比較例) 実施例1.2と同様にして準備したフィルム200mと
スペーサ(++3 : 15#I、厚み125μm 、
良さ 200m >を予熱炉4a及び熱処理炉4bの温
度を共に30℃に設定して実施例1と同様にして巻き取
った。その後熱処理炉4bの温度を140℃に設定し2
4時間熱処理を行なった。
(Comparative example) 200 m of film prepared in the same manner as in Example 1.2 and spacer (++3: 15 #I, thickness 125 μm,
The film having a thickness of 200 m was wound up in the same manner as in Example 1, with the temperatures of both the preheating furnace 4a and the heat treatment furnace 4b set at 30°C. After that, the temperature of the heat treatment furnace 4b was set to 140°C.
Heat treatment was performed for 4 hours.

得られたフィルムのスペーサ除去のための両端部の切断
19はフィルムの熱収縮による変形のため30#Iとし
なければならずロスが大きくなった。
The cutting 19 at both ends of the resulting film for removing the spacer had to be cut to 30#I due to deformation due to heat shrinkage of the film, resulting in a large loss.

又、熱処理後の表面抵抗値は熱処理している+15の巻
き状態で最外周側と最内周側について、フィルムの11
〕方向の両端部から約6個は表面抵抗値がほと/υど同
じであったが、巾の両端部を除いた中心部及び巻き中央
部の表面抵抗値は最外周の1.5倍以上あり、又中央部
は巾方向のバラツキし非常に大きかった。これは熱処理
する時に、巻き取ったフィルムの長さ方向、巾方向の中
心部の温度上昇が遅り、24時間では十分に上昇してお
らず熱処理が不十分となっていたためである。又、フィ
ルムの長さ方向全域に亘って細いスクラッチが発生して
おり外観上2品質上不良のものであった。
In addition, the surface resistance value after heat treatment is 11 for the outermost and innermost sides of the film in the heat-treated +15 rolled state.
] The surface resistance value of about 6 pieces from both ends in the direction was almost the same /υ, but the surface resistance value of the center part excluding both ends of the width and the center part of the winding was 1.5 times that of the outermost circumference. In addition, there was a very large variation in the width direction at the center. This is because during heat treatment, the temperature rise in the center of the wound film in the length and width directions was slow, and the temperature did not rise sufficiently within 24 hours, resulting in insufficient heat treatment. In addition, thin scratches were generated throughout the length of the film, and the film was of poor quality in terms of appearance and quality.

又、熱部寸法安定性はフィルムのMD、TD方向の前述
の熱収縮率で使用したフィルムがそれぞれ0.9%、0
.8%であり、熱処理後では長さ方向の最外周と最内周
ではそれぞれ0.1%、0.1%以下であったが、中央
部は0.4%、0.4%であり、熱処理が不十分である
ことを示していた。
In addition, the dimensional stability of the hot part was 0.9% and 0 for the film used with the above-mentioned heat shrinkage rates in the MD and TD directions, respectively.
.. After heat treatment, it was 0.1% and 0.1% or less at the outermost and innermost peripheries in the length direction, respectively, but it was 0.4% and 0.4% at the center, This indicated that the heat treatment was insufficient.

以上本発明を実施例により詳しく説明したが本発明は、
かかる実施例に限定されるものではない。
Although the present invention has been explained in detail by examples above, the present invention
The present invention is not limited to such examples.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例に用いたフィルムの熱処理装置
の説明図、第2図は第1図における巻き取り側のフィル
ムロールの断面説明図である。 1:フィルム   2ニスペーサ 4a:予熱炉   4b:熱処理炉 特許出願人  帝  人  株  式  会  社第 
1 図 第2 図
FIG. 1 is an explanatory view of a film heat treatment apparatus used in an example of the present invention, and FIG. 2 is an explanatory cross-sectional view of a film roll on the winding side in FIG. 1. 1: Film 2 Spacer 4a: Preheating furnace 4b: Heat treatment furnace Patent applicant: Teijin Co., Ltd.
1 Figure 2

Claims (1)

【特許請求の範囲】 1、フィルムの熱処理方法において、熱処理温度より低
い保持温度に保持された該フィルムのロールよりフィル
ムを巻き出して熱処理温度に保持された熱処理炉に導き
、該熱処理炉内で略熱処理温度まで加熱する一方、その
間にフィルムの少なくとも両端にスペーサを重ねて、該
熱処理炉内で加熱されたフィルムをスペーサが介在する
ロールに連続的に巻き上げ、次いで該スペーサ介在ロー
ルを熱処理温度に所定時間保持して熱処理することを特
徴とするフィルムの熱処理方法。 2、前記保持温度が処理するフィルムのガラス転移温度
以下である特許請求の範囲第1項記載のフィルムの熱処
理方法。 3、前記処理するフィルムのロールを保持温度に制御さ
れた予熱炉に保持する特許請求の範囲第1項又は第2項
記載のフィルムの熱処理方法。 4、前記スペーサをフィルムが熱処理炉に入る前にフィ
ルムに重ねる特許請求の範囲第1項、第2項又は第3項
記載のフィルムの熱処理方法。 5、前記スペーサ介在ロールを巻き取り方向に回転させ
ながら熱処理温度に所定時間保持して熱処理する特許請
求の範囲第1項、第2項、第3項又は第4項記載のフィ
ルムの熱処理方法。 6、前記フィルムがプラスチックフィルム上に機能性薄
膜を積層した機能性フィルムである特許請求の範囲1項
、第2項、第3項、第 4項又は第5項記載のフィルムの熱処理方法。
[Claims] 1. In a method for heat treatment of a film, the film is unwound from a roll of the film held at a holding temperature lower than the heat treatment temperature, and introduced into a heat treatment furnace maintained at the heat treatment temperature, and in the heat treatment furnace. While heating to approximately the heat treatment temperature, spacers are stacked on at least both ends of the film in the meantime, the heated film in the heat treatment furnace is continuously wound onto a roll with spacers interposed therebetween, and then the spacer-interposed roll is heated to the heat treatment temperature. A method for heat treatment of a film, characterized in that the heat treatment is performed by holding the film for a predetermined period of time. 2. The method for heat treatment of a film according to claim 1, wherein the holding temperature is below the glass transition temperature of the film to be treated. 3. The method for heat treating a film according to claim 1 or 2, wherein the roll of film to be treated is held in a preheating furnace controlled at a holding temperature. 4. The method of heat treating a film according to claim 1, 2 or 3, wherein the spacer is placed on the film before the film enters the heat treatment furnace. 5. The method of heat treating a film according to claim 1, 2, 3, or 4, wherein the spacer-interposed roll is rotated in the winding direction while being held at a heat treatment temperature for a predetermined period of time for heat treatment. 6. The method of heat treating a film according to claim 1, 2, 3, 4, or 5, wherein the film is a functional film obtained by laminating a functional thin film on a plastic film.
JP26751785A 1985-11-29 1985-11-29 Heat treatment of film Granted JPS62127229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26751785A JPS62127229A (en) 1985-11-29 1985-11-29 Heat treatment of film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26751785A JPS62127229A (en) 1985-11-29 1985-11-29 Heat treatment of film

Publications (2)

Publication Number Publication Date
JPS62127229A true JPS62127229A (en) 1987-06-09
JPH0519899B2 JPH0519899B2 (en) 1993-03-18

Family

ID=17445937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26751785A Granted JPS62127229A (en) 1985-11-29 1985-11-29 Heat treatment of film

Country Status (1)

Country Link
JP (1) JPS62127229A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03106423A (en) * 1989-09-21 1991-05-07 Kurabo Ind Ltd After-treatment method for micro-porous film and spacer sheet for after-treatment
EP0730949A2 (en) * 1995-03-09 1996-09-11 Fuji Photo Film Co., Ltd. Methods of winding, annealing and unwinding a polymer film web, an annealing apparatus and a photographic film support prepared using said method or apparatus
US5879606A (en) * 1995-02-07 1999-03-09 Fuji Photo Film Co., Ltd. Method for recovering flatness of web material and apparatus therefor
CN101378891A (en) * 2006-02-09 2009-03-04 杜邦帝人薄膜美国有限公司 Manufacturing process for polyester film exhibiting low thermal shrinkage
JP2016049473A (en) * 2014-08-28 2016-04-11 住友電気工業株式会社 Burning method of conductive ink, manufacturing method of substrate for print wiring board, and air-permeable spacer sheet

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03106423A (en) * 1989-09-21 1991-05-07 Kurabo Ind Ltd After-treatment method for micro-porous film and spacer sheet for after-treatment
US5879606A (en) * 1995-02-07 1999-03-09 Fuji Photo Film Co., Ltd. Method for recovering flatness of web material and apparatus therefor
US6065955A (en) * 1995-02-07 2000-05-23 Fuji Photo Film Co., Ltd. Apparatus for recovering flatness of web material
EP0730949A2 (en) * 1995-03-09 1996-09-11 Fuji Photo Film Co., Ltd. Methods of winding, annealing and unwinding a polymer film web, an annealing apparatus and a photographic film support prepared using said method or apparatus
EP0730949A3 (en) * 1995-03-09 1997-01-08 Fuji Photo Film Co Ltd Methods of winding, annealing and unwinding a polymer film web, an annealing apparatus and a photographic film support prepared using said method or apparatus
US6017212A (en) * 1995-03-09 2000-01-25 Fuji Photo Film Co., Ltd. Methods of winding, annealing and unwinding a polymer film web, an annealing apparatus and photographic film support prepared using said method or apparatus
JP2009526116A (en) * 2006-02-09 2009-07-16 デュポン テイジン フィルムズ ユー.エス.リミテッド パートナーシップ Method for producing coated polyester film
JP2009525895A (en) * 2006-02-09 2009-07-16 デュポン テイジン フィルムズ ユー.エス.リミテッド パートナーシップ Process for producing polyester film exhibiting low heat shrinkage
CN101378891A (en) * 2006-02-09 2009-03-04 杜邦帝人薄膜美国有限公司 Manufacturing process for polyester film exhibiting low thermal shrinkage
JP2013128925A (en) * 2006-02-09 2013-07-04 Dupont Teijin Films Us Lp Method for manufacturing coated polyester film
US8591998B2 (en) 2006-02-09 2013-11-26 Dupont Teijin Films U.S. Limited Partnership Manufacturing process for polyester film exhibiting low thermal shrinkage
KR101404881B1 (en) * 2006-02-09 2014-06-09 듀폰 테이진 필름즈 유.에스. 리미티드 파트너쉽 Manufacturing process for coated polyester film
US8802226B2 (en) 2006-02-09 2014-08-12 Dupont Teijin Films U.S. Limited Partnership Manufacturing process for coated polyester film
JP2014168780A (en) * 2006-02-09 2014-09-18 Dupont Teijin Films Us Lp Manufacturing process for coated polyester film
US9522983B2 (en) 2006-02-09 2016-12-20 Dupont Teijin Films U.S. Limited Partnership Manufacturing process for coated polyester film
JP2016049473A (en) * 2014-08-28 2016-04-11 住友電気工業株式会社 Burning method of conductive ink, manufacturing method of substrate for print wiring board, and air-permeable spacer sheet

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