JPS62126647A - Wire bonding method - Google Patents

Wire bonding method

Info

Publication number
JPS62126647A
JPS62126647A JP60267752A JP26775285A JPS62126647A JP S62126647 A JPS62126647 A JP S62126647A JP 60267752 A JP60267752 A JP 60267752A JP 26775285 A JP26775285 A JP 26775285A JP S62126647 A JPS62126647 A JP S62126647A
Authority
JP
Japan
Prior art keywords
bonding
wire
compressing force
stage
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60267752A
Other languages
Japanese (ja)
Inventor
Takao Watanabe
隆夫 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60267752A priority Critical patent/JPS62126647A/en
Publication of JPS62126647A publication Critical patent/JPS62126647A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To ensure a bonding state even under low temperature conditions, by changing the compressing force of metallic wire to the pad and the lead frame of a semiconductor pellet by a plurality of stages so that the force is small at first and gradually increases thereafter, in bonding work. CONSTITUTION:At first, a control circuit 1 reads compressing data at the first and second stages used at the first bonding B1. Based on the compressing force data, a driving and controlling signal for an actuator 5 required for generating the compressing force is outputted to an amplifier circuit 4. As a result, a driving current having a current value corresponding to said driving and controlling signal is outputted from the amplifier circuit 4 and supplied to the actuator. For example, under the state a metallic wire is contacted with the surface of a pad, a capillary is changed by an amount of displacement (a) corresponding to the compressing force data at the first stage. Then, the compressing force of 30g is applied to the bonding part of the metallic wire. After the compression, the capillary is changed by an amount of displacement (b) corresponding to the compressing force data at the second stage. Then, the compressing force of 50g is applied to the wire bonding part of the metallic wire.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、ワイヤボンディング方法の改良に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to improvements in wire bonding methods.

〔発明の技術的背景〕[Technical background of the invention]

半導体の製造工程において、基板上にマウントされた半
導体ペレットと同基板に設けられたリードフレームとの
間を接続する方法として、一般にワイヤボンディング法
が使用されている。このワイヤボンディング法には、主
として熱圧着法、超音波ボンディング法およびその両方
を組合わせたサーモソニックボンデ、インク法等がある
が、これらの方法はいずれも基板を所定の温度に加熱し
た状態で、Au、 Cu、Aρなどの金属ワイヤをパッ
ドまたはリードフレームに一定の加圧力で押付けること
によりボンディングを行なっている。−例として超音波
ボンディングの場合には、例えば第4図に示す如くパッ
ドに対する第1ボンディングB1においても、またリー
ドフレームに対する第2ボンデイングB2においても、
それぞれキャピラリによって例えば50g、100gと
いった一定の加圧力をボンディング点に印加してボンデ
ィングを行なっている。尚、図中POはキャピラリの変
位量の変化を示し、またTSは各ボンディングB1.B
2においてキャピラリを経て金属ワイヤに印加する超音
波出力波形を示している。
2. Description of the Related Art In a semiconductor manufacturing process, a wire bonding method is generally used as a method for connecting a semiconductor pellet mounted on a substrate and a lead frame provided on the same substrate. This wire bonding method mainly includes thermocompression bonding method, ultrasonic bonding method, thermosonic bonding method that combines both, and ink method, but all of these methods require heating the substrate to a predetermined temperature. Bonding is performed by pressing a metal wire such as , Au, Cu, or Aρ against a pad or lead frame with a constant pressure. - For example, in the case of ultrasonic bonding, both in the first bonding B1 to the pad and in the second bonding B2 to the lead frame, as shown in FIG.
Bonding is performed by applying a fixed pressure force of, for example, 50 g or 100 g to the bonding point using a capillary. In the figure, PO indicates the change in displacement of the capillary, and TS indicates each bonding B1. B
2 shows the ultrasonic output waveform applied to the metal wire via the capillary.

〔背景技術の問題点〕[Problems with background technology]

ところが、この様な一定の加圧力を印加する従来のワイ
ヤボンディング方法は、次のような欠点があった。すな
わち、基板は先に述べた如くボンディング時に所定温度
(例えば150〜300℃)に加圧するようにしている
が、基板の大きさや加熱用ヒータの配置位置によっては
基板に温度分布が発生し、この結果加圧力が一定である
と温度が低い部分でボンディング不良が発生し易くなる
。また、一般にワイヤボンディングはボンディングに先
立ち半導体ペレートのパッドやリードフレームの位置検
出を行なうようにしているが、金属ワイヤの先端部に金
属ボールを形成してボンディングを行なう場合には、こ
の金属ボールが上記位置検出中に冷えて接合し難い状態
になるため、第2ワイヤ以降のボンディングに比べて第
1ワイヤのボンディングの接合状態が悪化し、これによ
り接続不良が発生し易かった。
However, the conventional wire bonding method that applies such a constant pressing force has the following drawbacks. That is, as mentioned earlier, the substrate is pressurized to a predetermined temperature (for example, 150 to 300 degrees Celsius) during bonding, but depending on the size of the substrate and the placement position of the heater, a temperature distribution may occur on the substrate, and this As a result, if the pressing force is constant, bonding failures tend to occur in areas where the temperature is low. Additionally, wire bonding generally involves detecting the position of the semiconductor plate pad and lead frame prior to bonding, but when bonding is performed by forming a metal ball at the tip of the metal wire, this metal ball Since the wires cool down during the position detection and become difficult to bond, the bonding condition of the bonding of the first wire becomes worse than that of the bonding of the second wire and subsequent wires, and as a result, a connection failure is likely to occur.

〔発明の目的〕[Purpose of the invention]

本発明は、低温度条件下でも確実な接合状態が得られる
ようにし、これにより接続不良の発生を低減して歩留り
の良いボンディングを行ない得るワイヤボンディング方
法を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a wire bonding method that can obtain a reliable bonding state even under low temperature conditions, thereby reducing the occurrence of connection failures and performing bonding with a high yield.

〔発明の概要〕[Summary of the invention]

本発明は、上記目的を達成するために、ボンディングに
際し、半導体ベレン1〜のパッドおよびリードフレーム
への金属ワイヤの加圧力を、最初は小さく次第に大きく
なるように複数段階に変化させるようにしたものである
In order to achieve the above object, the present invention changes the pressing force of the metal wire to the pad and lead frame of the semiconductor belen 1 in multiple stages such that it is initially small and gradually increases during bonding. It is.

〔発明の実施例〕[Embodiments of the invention]

第1図は、本発明の一実施例におけるワイヤボンデイン
ク方法を実施するためのワイヤボンディング駆動回路の
構成を示すもので、この駆動回路は制御回路1を備えて
いる。この制御回路1は例えばマイクロコンピュータを
主制御部として備えたもので、バスを介して制御データ
設定用の入力部2および制御データ記憶用のメモリ3が
接続されている。また制御回路1には増幅回路4.6を
介してアクチュエータ5および超音波トランスジューサ
7が接続されている。アクチュエータ5は、制御回路1
の駆動指示に従って増幅回路4から出力される駆動電流
により動作してキャピラリを駆動するもので、上記駆動
電流値に応じた量だけキャピラリを変位させる。また超
音波トランスジューサ7は、制御回路1の指示に従って
増幅器6から光中される駆動信号により付勢され、この
駆動信号の大きさに応じた振幅の超音波を上記駆動信号
の発生時間だけボンディング部に供給する。
FIG. 1 shows the configuration of a wire bonding drive circuit for carrying out a wire bonding ink method according to an embodiment of the present invention, and this drive circuit includes a control circuit 1. As shown in FIG. This control circuit 1 includes, for example, a microcomputer as a main control section, and is connected via a bus to an input section 2 for setting control data and a memory 3 for storing control data. Further, an actuator 5 and an ultrasonic transducer 7 are connected to the control circuit 1 via an amplifier circuit 4.6. The actuator 5 is connected to the control circuit 1
The capillary is operated by the drive current output from the amplifier circuit 4 in accordance with the drive instruction, and the capillary is displaced by an amount corresponding to the drive current value. Further, the ultrasonic transducer 7 is energized by a drive signal transmitted from the amplifier 6 according to instructions from the control circuit 1, and transmits an ultrasonic wave having an amplitude corresponding to the magnitude of the drive signal to the bonding section for a period of time during which the drive signal is generated. supply to.

次に、以上の構成に基づいて本実施例のワイヤボンディ
ング方法を説明する。尚、ここでは第1および第2の各
ボンディングB1.B2とも、加圧力を2段階に設定し
た場合について説明する。
Next, the wire bonding method of this embodiment will be explained based on the above configuration. Note that here, each of the first and second bonding B1. For both B2, a case will be explained in which the pressurizing force is set in two stages.

先ずオペレータは、ボンディングの前に第1ボンデイン
グB1および第2ボンデイングB2における加圧力デー
タを入力部2から例えばキー操作により入力し、これを
メモリ3に記憶させておく。
First, before bonding, the operator inputs pressing force data for the first bonding B1 and the second bonding B2 from the input unit 2 by, for example, key operation, and stores this in the memory 3.

例えば、第1ボンデイングB1については1段階目が3
0gで2段階目が509となるように設定し、一方第2
ボンディングB2については1段階目が709で2段階
目が100gとなるように設定する。
For example, for the first bonding B1, the first stage is 3.
Set the second stage to 509 at 0g, while the second stage
Bonding B2 is set so that the first stage is 709 and the second stage is 100 g.

また次に、超音波振動の印加タイミングおよび超音波の
振幅の大きさを示すデータをメモリ3に記憶させる。例
えば、ここでは第1および第2の各ボンディングB1.
B2とも1段階目では印加せず、2段階目から印加する
ように印加開始タイミングを設定し、かつ振幅値を通常
の振幅値より小さく設定する。そうして、加圧力データ
および超音波の印加制御データを全て設定したのちボン
ディング動作を開始させる。
Next, data indicating the application timing of ultrasonic vibration and the magnitude of the amplitude of the ultrasonic wave is stored in the memory 3. For example, here each of the first and second bonding B1.
The application start timing for both B2 is set so that it is not applied in the first stage, but is applied from the second stage, and the amplitude value is set smaller than the normal amplitude value. After setting all the press force data and ultrasonic application control data, the bonding operation is started.

そうすると、制御回路1は先ず第1のボンディングB1
で使用する1段階目および2段階目の加圧力データをメ
モリ3からそれぞれ読み出し、これらの加圧力データに
基づいてその加圧力を発生させるために必要なアクチュ
エータ5の駆動制御信号を増幅回路4に出力する。この
結果、増幅回路4からは上記駆動制御信号に応じた電流
値の駆動電流が出力されてアクチュエータ5に供給され
、これによりアクチュエータ5は動作してキャピラリを
変位させる。例えば第2図に示す如く、金属ワイヤがパ
ッド面に接触した状態で、先ず1段階目の加圧力データ
に対応する変位量aだけキャピラリを変位させ、これに
より30gの加圧力を金属ワイヤのボンディング部に印
加する。そしてこの加圧の終了後、2段階目の加圧力デ
ータに対応する変位mbだけキャピラリを変位させ、こ
れにより50gの加圧力を金属ワイヤのボンディング部
に印加する。また、この2段階目の加圧時に制御回路1
は、増幅回路6に超音波発生制御信号を出力する。この
結果、超音波トランスジューサ7からは第2図に示す如
く2段階目の加圧時に超音波が発生され、金属ワイヤの
ボンディング部に印加される。かくして、第1ボンデイ
ングB1におけるワイヤボンディングが終了する。
Then, the control circuit 1 first performs the first bonding B1
The first-stage and second-stage pressing force data to be used are read from the memory 3, and based on these pressing force data, a drive control signal for the actuator 5 necessary to generate the pressing force is sent to the amplifier circuit 4. Output. As a result, the amplifier circuit 4 outputs a drive current having a current value corresponding to the drive control signal and supplies it to the actuator 5, whereby the actuator 5 operates to displace the capillary. For example, as shown in Fig. 2, with the metal wire in contact with the pad surface, the capillary is first displaced by a displacement amount a corresponding to the pressure force data of the first stage, thereby applying a pressure force of 30 g to the bonding of the metal wire. applied to the part. After this pressurization is completed, the capillary is displaced by a displacement mb corresponding to the second-stage pressurizing force data, thereby applying a pressurizing force of 50 g to the bonding portion of the metal wire. Also, during this second stage of pressurization, the control circuit 1
outputs an ultrasonic generation control signal to the amplifier circuit 6. As a result, ultrasonic waves are generated from the ultrasonic transducer 7 during the second stage of pressurization as shown in FIG. 2, and are applied to the bonding portion of the metal wire. Thus, the wire bonding in the first bonding B1 is completed.

以下同様に、第2ボンデイングB2においても制御回路
1は、メモリ3に設定した加圧力データに従って1段階
目および2段階目に分けてそれぞれ異なる加圧力が印加
されるようにアクチュエータ5を駆動し、これによりキ
ャピラリを変位させる。例えば第2図に示す如く、1段
階目では変位量Cだけキャピラリを変位させてこれによ
り70yの加圧力を金属ワイヤのボンディング部に加え
、2段階目では変位量dだけキャピラリを変位させてこ
れににより100gの加圧力をボンディング部に印加す
る。またこの2段階目では、超音波トランスジューサ7
から超音波振動を発生させてこの振動を金属ワイヤのボ
ンディング部に印加する。
Similarly, in the second bonding B2, the control circuit 1 drives the actuator 5 so that different pressing forces are applied in the first stage and the second stage according to the pressing force data set in the memory 3, This displaces the capillary. For example, as shown in Figure 2, in the first step, the capillary is displaced by a displacement amount C, thereby applying a pressing force of 70y to the bonding part of the metal wire, and in the second step, the capillary is displaced by a displacement amount d. A pressing force of 100 g is applied to the bonding part. Also, in this second stage, the ultrasonic transducer 7
Ultrasonic vibrations are generated from the metal wire and applied to the bonding portion of the metal wire.

かくして、第2ボンデイングB2のワイヤボンディング
が終了し、これにより1サイクルのワイヤボンディング
動作が完了する。
Thus, the wire bonding of the second bonding B2 is completed, thereby completing one cycle of the wire bonding operation.

このように本実施例であれば、第1ボンデイングB1に
おいてもまた第2ボンデイングB2においても、加圧力
を2段階に変化させて加えるようにし、しかも加圧力の
大きさを1段階目では小さく2段階目では大きく設定し
たので、1段階目の小さな加圧力により、金属ワイヤは
ワイヤ自身やパッド、リードフレーム面に無理な力が加
わることなく仮接合され、さらにこの状態で次の2段階
目で大きな加圧力が加えられかつ超音波振動が印加され
ることにより、金属ワイヤは確実にパッドまたはリード
フレームに接合されることになる。
In this embodiment, the pressure is applied in two stages, both in the first bonding B1 and in the second bonding B2, and the magnitude of the pressure is small in the first stage and is applied in two stages. Since the setting was large in the first step, the metal wire was temporarily joined without applying excessive force to the wire itself, the pad, or the lead frame surface due to the small pressing force in the first step, and in this state, in the second step. The application of a large pressure force and ultrasonic vibration ensures that the metal wire is bonded to the pad or lead frame.

したがって、たとえ基板の加熱温度が所定温度に満たな
い位置でもまた金属ボールの温度が低い場合であっても
、常に高強度で確実な接合を行なうことができ、これに
より接続不良の発生を低減して歩留りを大幅に高めるこ
とができる。
Therefore, even if the heating temperature of the board is lower than the specified temperature or the temperature of the metal ball is low, it is possible to always achieve a high-strength and reliable bond, which reduces the occurrence of connection failures. yield can be significantly increased.

尚、本発明は上記実施例に限定されるものではない。例
えば、上記実施例では加圧力を2段階に変化させるよう
にしたが、必要に応じて3段階以上に変化させてもよい
。また上記実施例では超音波振動を2段階目の加圧時に
のみ印加するようにしたが、必要に応じて例えば第3図
に示す如く19一 段階口にも小振幅に設定した上で印加するようにしても
よい。さらに、前記実施例では超音波ボンディング法を
例にとって説明したが、熱圧着法やサーモソニックボン
ディング法等の他の方法に適用してもよい。要するに、
加圧ボンディングを行なう方法であれば如何なる方法に
も適用可能である。その他、各段階での加圧力の値やボ
ンディング駆動回路の構成等についても、本発明の要旨
を逸脱しない範囲で種々変形して実施できる。
Note that the present invention is not limited to the above embodiments. For example, in the above embodiment, the pressing force is changed in two steps, but it may be changed in three or more steps as necessary. Further, in the above embodiment, ultrasonic vibration is applied only during the second stage of pressure application, but if necessary, it can also be applied to the first stage port 19 with a small amplitude as shown in FIG. You can do it like this. Further, although the above embodiments have been explained using the ultrasonic bonding method as an example, other methods such as thermocompression bonding and thermosonic bonding may be applied. in short,
Any method that performs pressure bonding is applicable. In addition, the value of the pressing force at each stage, the structure of the bonding drive circuit, etc. can be modified in various ways without departing from the gist of the present invention.

〔発明の効果〕〔Effect of the invention〕

以上詳述したように本発明によれば、ボンディングに際
し、半導体ペレットのパッドおよびリードフレームへの
金属ワイヤの加圧力を、最初は小さく次第に大きくなる
ように複数段階に変化させるようにしたことによって、
低温度条件下でも確実な接合状態を得ることができ、こ
れにより接続不良の発生を低減し得て歩留りの良いボン
ディングを行ない得るワイヤボンディング方法を提供す
ることができる。
As detailed above, according to the present invention, during bonding, the pressure applied by the metal wire to the pad of the semiconductor pellet and the lead frame is changed in multiple stages such that it is initially small and then gradually increases.
It is possible to provide a wire bonding method that can obtain a reliable bonding state even under low temperature conditions, thereby reducing the occurrence of connection failures and performing bonding with a high yield.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は本発明の一実施例におけるワイヤ
ボンディング方法を説明するためのもので、第1図は同
方法を実施するためのボンディング駆動回路の構成を示
すブロック図、第2図はキャピラリの変位量の変化およ
び超音波出力波形を示す図、第3図は本発明の他の実施
例におけるワイヤボンディング方法を説明するためのキ
ャピラリの変位量の変化および超音波出力波形を示す図
、第4図は従来のワイヤボンディング方法を説明するた
めのキャピラリの変位量の変化および超音波出力波形を
示す図である。 1・・・制御回路、2・・・入力部、3・・・メモリ、
4゜6・・・増幅回路、5・・・アクチュエータ、7・
・・超音波トランスジューサ、PO・・・キャピラリの
変位量の変化、TS・・・超音波出力波形、B1・・・
第1ボンデイング、B2・・・第2ボンデイング。 出願人代理人  弁理士 鈴江武彦 第2図
1 and 2 are for explaining a wire bonding method according to an embodiment of the present invention, and FIG. 1 is a block diagram showing the configuration of a bonding drive circuit for implementing the method, and FIG. 3 is a diagram showing a change in capillary displacement and an ultrasonic output waveform, and FIG. 3 is a diagram showing a change in capillary displacement and an ultrasonic output waveform for explaining a wire bonding method in another embodiment of the present invention. , and FIG. 4 are diagrams showing changes in capillary displacement and ultrasonic output waveforms for explaining the conventional wire bonding method. 1... Control circuit, 2... Input section, 3... Memory,
4゜6...Amplification circuit, 5...Actuator, 7.
...Ultrasonic transducer, PO...Change in capillary displacement, TS...Ultrasonic output waveform, B1...
1st bonding, B2... 2nd bonding. Applicant's agent Patent attorney Takehiko Suzue Figure 2

Claims (2)

【特許請求の範囲】[Claims] (1)半導体ペレットのパッドおよび基板に設けられた
リードフレームに対し、基板を加熱した状態でかつ金属
ワイヤを加圧してボンディングするワイヤボンディング
方法において、前記半導体ペレットのパッドおよびリー
ドフレームへの金属ワイヤの加圧力を最初は小さく次第
に大きくなるように複数段階に変化させるようにしたこ
とを特徴とするワイヤボンディング方法。
(1) In a wire bonding method in which a metal wire is bonded by applying pressure to a pad of a semiconductor pellet and a lead frame provided on a substrate while the substrate is heated, the metal wire is bonded to a pad of a semiconductor pellet and a lead frame provided on the lead frame. A wire bonding method characterized in that the applied force is changed in multiple stages such that it is initially small and gradually increases.
(2)半導体ペレットのパッドおよび基板に設けられた
リードフレームに対し、基板を加熱した状態でかつ金属
ワイヤを加圧してボンディングするワイヤボンディング
方法において、前記半導体ペレットのパッドおよびリー
ドフレームへの金属ワイヤの加圧力を最初は小さく次第
に大きくなるように複数段階に変化させるようにし、か
つ金属ワイヤに対し最初は零かまたは小さく次第に大き
くなるように超音波振動を印加するようにしたことを特
徴とするワイヤボンディング方法。
(2) In a wire bonding method in which a metal wire is bonded to a pad of a semiconductor pellet and a lead frame provided on a substrate while the substrate is heated and a metal wire is pressurized, the metal wire is bonded to a pad of a semiconductor pellet and a lead frame provided on the lead frame. The applied force is changed in multiple stages such that it is initially small and gradually increases, and ultrasonic vibration is applied to the metal wire such that it is initially zero or is small and gradually increases. Wire bonding method.
JP60267752A 1985-11-28 1985-11-28 Wire bonding method Pending JPS62126647A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60267752A JPS62126647A (en) 1985-11-28 1985-11-28 Wire bonding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60267752A JPS62126647A (en) 1985-11-28 1985-11-28 Wire bonding method

Publications (1)

Publication Number Publication Date
JPS62126647A true JPS62126647A (en) 1987-06-08

Family

ID=17449085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60267752A Pending JPS62126647A (en) 1985-11-28 1985-11-28 Wire bonding method

Country Status (1)

Country Link
JP (1) JPS62126647A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244626A (en) * 1988-03-25 1989-09-29 Mitsubishi Electric Corp Wire bonding method
JPH03245544A (en) * 1990-02-23 1991-11-01 Toshiba Corp Wire bonding
JPH0424934A (en) * 1990-05-16 1992-01-28 Kaijo Corp Wire bonding apparatus and method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244626A (en) * 1988-03-25 1989-09-29 Mitsubishi Electric Corp Wire bonding method
JPH03245544A (en) * 1990-02-23 1991-11-01 Toshiba Corp Wire bonding
JPH0424934A (en) * 1990-05-16 1992-01-28 Kaijo Corp Wire bonding apparatus and method thereof

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