JPS621264B2 - - Google Patents
Info
- Publication number
- JPS621264B2 JPS621264B2 JP54036875A JP3687579A JPS621264B2 JP S621264 B2 JPS621264 B2 JP S621264B2 JP 54036875 A JP54036875 A JP 54036875A JP 3687579 A JP3687579 A JP 3687579A JP S621264 B2 JPS621264 B2 JP S621264B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- source
- voltage
- mis
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
Landscapes
- Element Separation (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3687579A JPS55130170A (en) | 1979-03-30 | 1979-03-30 | Semiconductor device and method of fabricating the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3687579A JPS55130170A (en) | 1979-03-30 | 1979-03-30 | Semiconductor device and method of fabricating the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55130170A JPS55130170A (en) | 1980-10-08 |
JPS621264B2 true JPS621264B2 (enrdf_load_stackoverflow) | 1987-01-12 |
Family
ID=12481946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3687579A Granted JPS55130170A (en) | 1979-03-30 | 1979-03-30 | Semiconductor device and method of fabricating the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55130170A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5816568A (ja) * | 1981-07-22 | 1983-01-31 | Hitachi Ltd | 絶縁ゲ−ト型電界効果半導体装置 |
JPS58182274A (ja) * | 1982-04-20 | 1983-10-25 | Seiko Epson Corp | Mos型半導体装置 |
US4684967A (en) * | 1984-05-04 | 1987-08-04 | Integrated Logic Systems, Inc. | Low capacitance transistor cell element and transistor array |
JPS61281554A (ja) * | 1985-06-07 | 1986-12-11 | Fujitsu Ltd | Mis型半導体装置 |
JPS6370575A (ja) * | 1986-09-12 | 1988-03-30 | Sony Corp | Mos論理集積回路 |
-
1979
- 1979-03-30 JP JP3687579A patent/JPS55130170A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS55130170A (en) | 1980-10-08 |
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