JPS62122129A - ウエハ上パタ−ン位置検出装置 - Google Patents

ウエハ上パタ−ン位置検出装置

Info

Publication number
JPS62122129A
JPS62122129A JP61104659A JP10465986A JPS62122129A JP S62122129 A JPS62122129 A JP S62122129A JP 61104659 A JP61104659 A JP 61104659A JP 10465986 A JP10465986 A JP 10465986A JP S62122129 A JPS62122129 A JP S62122129A
Authority
JP
Japan
Prior art keywords
wafer
mask
light
axis direction
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61104659A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0152893B2 (enrdf_load_stackoverflow
Inventor
Mitsuyoshi Koizumi
小泉　光義
Nobuyuki Akiyama
秋山　伸幸
Yoshimasa Oshima
良正 大島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61104659A priority Critical patent/JPS62122129A/ja
Publication of JPS62122129A publication Critical patent/JPS62122129A/ja
Publication of JPH0152893B2 publication Critical patent/JPH0152893B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP61104659A 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置 Granted JPS62122129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61104659A JPS62122129A (ja) 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61104659A JPS62122129A (ja) 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11464278A Division JPS5541739A (en) 1978-09-20 1978-09-20 Micro-projection type mask alignment device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP63210712A Division JPH01103835A (ja) 1988-08-26 1988-08-26 半導体ウエハ等の被露光試料

Publications (2)

Publication Number Publication Date
JPS62122129A true JPS62122129A (ja) 1987-06-03
JPH0152893B2 JPH0152893B2 (enrdf_load_stackoverflow) 1989-11-10

Family

ID=14386590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61104659A Granted JPS62122129A (ja) 1986-05-09 1986-05-09 ウエハ上パタ−ン位置検出装置

Country Status (1)

Country Link
JP (1) JPS62122129A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9027529B2 (en) 2010-02-18 2015-05-12 Volvo Technology Corporation Piston positioned for reciprocal movement in a combustion engine cylinder

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS5352072A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Pattern for alignment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS5352072A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Pattern for alignment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9027529B2 (en) 2010-02-18 2015-05-12 Volvo Technology Corporation Piston positioned for reciprocal movement in a combustion engine cylinder

Also Published As

Publication number Publication date
JPH0152893B2 (enrdf_load_stackoverflow) 1989-11-10

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