JPS6211780B2 - - Google Patents

Info

Publication number
JPS6211780B2
JPS6211780B2 JP56067911A JP6791181A JPS6211780B2 JP S6211780 B2 JPS6211780 B2 JP S6211780B2 JP 56067911 A JP56067911 A JP 56067911A JP 6791181 A JP6791181 A JP 6791181A JP S6211780 B2 JPS6211780 B2 JP S6211780B2
Authority
JP
Japan
Prior art keywords
wafer
lens barrel
marks
mask
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56067911A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57183033A (en
Inventor
Hiroshi Iwai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP56067911A priority Critical patent/JPS57183033A/ja
Priority to US06/373,629 priority patent/US4613230A/en
Publication of JPS57183033A publication Critical patent/JPS57183033A/ja
Publication of JPS6211780B2 publication Critical patent/JPS6211780B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56067911A 1981-05-06 1981-05-06 Method for wafer exposure and device thereof Granted JPS57183033A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56067911A JPS57183033A (en) 1981-05-06 1981-05-06 Method for wafer exposure and device thereof
US06/373,629 US4613230A (en) 1981-05-06 1982-04-30 Wafer exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56067911A JPS57183033A (en) 1981-05-06 1981-05-06 Method for wafer exposure and device thereof

Publications (2)

Publication Number Publication Date
JPS57183033A JPS57183033A (en) 1982-11-11
JPS6211780B2 true JPS6211780B2 (ko) 1987-03-14

Family

ID=13358557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56067911A Granted JPS57183033A (en) 1981-05-06 1981-05-06 Method for wafer exposure and device thereof

Country Status (1)

Country Link
JP (1) JPS57183033A (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59143159A (ja) * 1983-02-07 1984-08-16 Mitsubishi Electric Corp 写真製版技術におけるパタ−ン重ね合わせ方法
NL8600639A (nl) * 1986-03-12 1987-10-01 Asm Lithography Bv Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze.

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339175A (en) * 1976-09-21 1978-04-10 Smiths Industries Ltd Optical apparatus
JPS5347270A (en) * 1976-10-12 1978-04-27 Nec Home Electronics Ltd Semiconductor waver protecting film
JPS546816A (en) * 1977-06-20 1979-01-19 Kobe Steel Ltd Prevention of pouriggnozzle blockade
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS566437A (en) * 1979-06-26 1981-01-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Alignment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4863046U (ko) * 1971-11-16 1973-08-10

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339175A (en) * 1976-09-21 1978-04-10 Smiths Industries Ltd Optical apparatus
JPS5347270A (en) * 1976-10-12 1978-04-27 Nec Home Electronics Ltd Semiconductor waver protecting film
JPS546816A (en) * 1977-06-20 1979-01-19 Kobe Steel Ltd Prevention of pouriggnozzle blockade
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS566437A (en) * 1979-06-26 1981-01-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Alignment

Also Published As

Publication number Publication date
JPS57183033A (en) 1982-11-11

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