JPS62117153A - Production of substrate for optical disk having guide groove - Google Patents

Production of substrate for optical disk having guide groove

Info

Publication number
JPS62117153A
JPS62117153A JP25489585A JP25489585A JPS62117153A JP S62117153 A JPS62117153 A JP S62117153A JP 25489585 A JP25489585 A JP 25489585A JP 25489585 A JP25489585 A JP 25489585A JP S62117153 A JPS62117153 A JP S62117153A
Authority
JP
Japan
Prior art keywords
substrate
resin
curing
epoxy resin
guide groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25489585A
Other languages
Japanese (ja)
Inventor
Setsuo Suzuki
節夫 鈴木
Yuji Sakamoto
有史 坂本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP25489585A priority Critical patent/JPS62117153A/en
Publication of JPS62117153A publication Critical patent/JPS62117153A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the titled disk without any remaining molding strains and capable of regulating the refractive index by treating both surfaces of the substrate with a soln. contg. a silane compd. having an ethylenic double bond, heating the substrate, then pressing a stamper master disk and a glass sheet on both surfaces of the substrate through an UV curing resin, irradiating UV rays, simultaneously curing the two layers, and releasing the substrate from a die. CONSTITUTION:A mixture of gamma-methacryloxypropyltrimethoxysilane and ethanol in 1/8 weight ratio is used as a coupling agent and uniformly coated by dipping on both surfaces of the highly transparent epoxy substrate 2 obtained by cast molding. The material is heated in a drier at 100 deg.C for 1hr and then washed with acetone. The epoxy substrate 2, both surfaces of which are treated with the coupling agent, is thus obtained. Then an UV curing resin 3 is coated, the resin is cured, then the epoxy substrate 2 is released from the master disk 1 and a clamping plate 4, and the substrate for an optical disk with one surface having specified ruggedness and both surfaces coated with the UV curing resin 3 is obtained. The substrate has excellent adhesion and is not cambered.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はエゼキシ樹脂注型基板上の片面に案内溝が形成
され且つ他面に平滑tJV硬化層が形成された案内溝つ
き光ディスク用基板の製造方法に関するものである。更
に詳しくはエゼギシ1脂注型透明基板の両面にビニルシ
ラン等のエチレン性2重結合を有するシラン化合物の溶
液を塗布し加熱乾燥せしめた後両面にUV硬硬化脂脂層
配し、これをスタン・ε−とガラス板で鋏圧し、ガラス
面からUV光を照射し硬化させて片面に案内溝、片面に
平滑聞硬化層を形成する光ディスク用基板に係るもので
ある。
Detailed Description of the Invention [Industrial Application Field] The present invention relates to an optical disc substrate with guide grooves, in which guide grooves are formed on one side of an epoxy resin cast substrate and a smooth tJV hardened layer is formed on the other side. This relates to a manufacturing method. More specifically, a solution of a silane compound having an ethylenic double bond, such as vinyl silane, is applied to both sides of an Ezegishi 1 transparent substrate, heat-dried, and then a UV hardened fat layer is placed on both sides. This invention relates to an optical disc substrate which is pressed between ε- and glass plates, and is cured by irradiating UV light from the glass surface to form a guide groove on one side and a smooth hardened layer on the other side.

〔従来技術〕[Prior art]

従来側ゆる光学記録媒体に用いられる基板は、ガラス又
は透明な合成樹脂基板であって、且つ複屈折の無いとい
う条件のために光学的に等方性である材料が用いられて
来ており、ポリメチルメタクリレート、ピリスルホン、
ぼりカーボネート、ゴリビニルクロライド、ビニルクロ
ライドとビニルアセテートの共重合体等が提案されてき
た。然しなからこれらの中でも成形性、光学的透明性と
いった点でほとんどイリメチルメタクリレート(PMM
A)またはホ0リカーボネー)  (PC)が用いられ
ている。ポリメチルメタクリレ−) (PMMA)基板
またはPC基板は一般に射出成形により得られる。
Conventionally, the substrates used in all optical recording media are glass or transparent synthetic resin substrates, and optically isotropic materials have been used to ensure no birefringence. polymethyl methacrylate, pyrisulfone,
Bori carbonate, golibinyl chloride, a copolymer of vinyl chloride and vinyl acetate, etc. have been proposed. However, among these, most of them are irimethyl methacrylate (PMM) in terms of moldability and optical transparency.
A) or polycarbonate (PC) is used. Polymethyl methacrylate (PMMA) substrates or PC substrates are generally obtained by injection molding.

然しなから内基板とも記録密度の向上に伴ない媒体の高
度の信頼性が要求されだして来ると以下の欠点が大きな
問題となって来る。
However, as the recording density of the inner substrate increases and a higher degree of reliability is required of the medium, the following drawbacks become a major problem.

■N航基板の場合耐熱性に劣るため、各種の機能膜蒸着
に際して、基板表面の温度が上昇し、変形が生じる。
(2) In the case of N-type substrates, the heat resistance is poor, so when various functional films are deposited, the temperature of the substrate surface increases and deformation occurs.

0両基板とも熱可塑性樹脂であるためアクセス時の高速
回転時、遠心力によるクリープを生じる場合がある。ま
た保管時に高温にさらされると変形が生じ謂ゆる回転に
伴なう面ブレが大きくなる。
Since both substrates are made of thermoplastic resin, creep may occur due to centrifugal force during high-speed rotation during access. Furthermore, if exposed to high temperatures during storage, deformation occurs and surface wobbling due to so-called rotation increases.

θ又P■仏基板の場合吸湿性が大であるため、吸湿変形
が生じるとか、機能膜の酸化を助長するといった問題が
生じる。
In the case of a θ or a P₫ substrate, the hygroscopicity is large, and problems arise such as deformation due to moisture absorption and promotion of oxidation of the functional film.

0両基板とも射出成形で製造する為、成形歪が残シ複屈
折を生じる。
Since both substrates are manufactured by injection molding, molding distortion causes residual birefringence.

0両基板とも屈折率の調整が困難であり一つの屈折率に
限定されてしまう。
It is difficult to adjust the refractive index of both substrates, and the refractive index is limited to one.

等である。etc.

〔発明の構成〕[Structure of the invention]

本願発明者らはかかる欠点を克服すべくまず各種樹脂を
用いた基板について検討を行ない、エポキシ樹脂、有機
多塩基酸無水物、硬化促進剤、および変色防止剤からな
るエポキシ樹脂組成物を注型加熱成形することによシ得
られる基板が光学記録媒体として上記欠点を解消するも
のであること金兄い出し先に出願した。
In order to overcome such drawbacks, the inventors of the present application first investigated substrates using various resins, and cast an epoxy resin composition consisting of an epoxy resin, an organic polybasic acid anhydride, a curing accelerator, and a discoloration inhibitor. The present invention was filed with the applicant that a substrate obtained by thermoforming could be used as an optical recording medium to overcome the above-mentioned drawbacks.

次いで該基板上に案内溝を形成すべく紫外線硬化樹脂を
塗布し原板スタンズーを圧接した後基板面側から聞覚を
照射し、樹脂層を硬化せしめて脱型して凹凸を転写形成
する公知の方法を試みた。
Next, an ultraviolet curable resin is applied to the substrate to form guide grooves, and after the original plate is pressed against the substrate, a light beam is irradiated from the substrate surface side to harden the resin layer, and the mold is removed to transfer the unevenness. I tried the method.

しかしながら従来の方法では以下の問題のあることが判
明した。即ち基板を構成する樹脂が酸無水物硬化エポキ
シ樹脂であるため、樹脂骨格の水陵基に起因して一般の
闘硬化樹脂に比較して、著しるしく親水性界面になり通
常の聞硬化樹脂系で基板密着性が得られず実用に耐え得
ないものであった。またこの欠点を解消すべく該W硬化
樹脂系に架橋モノマーとして一〇H基、−C0OH基を
有するアクリルモノマーを用いたところ今度は親水性界
面を有するスタンズー原盤とも密着してし寸い脱型不可
能であった。
However, it has been found that the conventional method has the following problems. In other words, since the resin constituting the substrate is an acid anhydride-cured epoxy resin, it has a significantly more hydrophilic interface than a general hard-curing resin due to the water groups in the resin skeleton, making it more difficult to use than a normal hard-curing resin. The system was unable to achieve adhesion to the substrate and was not suitable for practical use. In addition, in order to eliminate this drawback, when we used an acrylic monomer having 10H and -C0OH groups as a crosslinking monomer in the W curing resin system, it adhered closely to the Stanzu master disk having a hydrophilic interface and was easily removed from the mold. It was impossible.

更にW硬化樹脂層の硬化収縮に起因して基板が側脂層を
凹にして反るという現象も併発した。
Furthermore, due to curing shrinkage of the W cured resin layer, a phenomenon in which the substrate was warped by making the side fat layer concave also occurred.

本願発明者らはエポキシケ(脂基板であるが故に生ずる
かかる問題を解決すべく鋭意fJ肘と重ね本願発明に到
達した。即ちエチレン性2重結合を有するシラン化合物
を含む溶液で基板両面を処理し、加熱処理後両面にUV
硬化樹脂を介してスタンノZ−原盤およびガラス板を基
板面に圧接し、ガラス板側からUV光を照射して該2層
を同時に硬化せしめ、エビキシ硬化物より硬度の高い硬
化層となし脱型して3層構成の案内溝つき基板を得ると
いう方法を見い出したものである。
The inventors of the present application have worked diligently to arrive at the present invention in order to solve this problem that arises because the substrate is an epoxy resin (greasy substrate).That is, the inventors of the present invention have worked hard to arrive at the present invention.That is, both surfaces of the substrate are treated with a solution containing a silane compound having an ethylenic double bond. , UV on both sides after heat treatment
The Stanno Z master and the glass plate are pressed against the substrate surface via the cured resin, and UV light is irradiated from the glass plate side to simultaneously cure the two layers, resulting in a cured layer that is harder than the Ebikishi cured product and removed from the mold. We have discovered a method of obtaining a substrate with guide grooves having a three-layer structure.

本発明のエポキシ樹脂基板を得るために用いられるエポ
キシ樹脂は、常温で液状のものであればすべて適用でき
、液状ビスフェノールA系樹脂、脂環族系エアj2ギシ
情脂、脂肪族系エポキシ樹脂等の樹脂が用いられる。ま
たこれらエポキシ・樹脂を混合使用することは、本願発
明において極めて有効であり、特に脂環式17」ソキシ
回脂と液状ビスフェノールA系樹脂の混合は、その混合
割合により得られる硬化物の屈折重金適宜調整すること
が出来る点で1に要である。
Any epoxy resin used to obtain the epoxy resin substrate of the present invention can be used as long as it is liquid at room temperature, such as liquid bisphenol A resin, alicyclic air resin, aliphatic epoxy resin, etc. resin is used. In addition, mixing and using these epoxies and resins is extremely effective in the present invention, and in particular, the mixing of alicyclic 17'' oxylipid and liquid bisphenol A-based resin is effective for refracting heavy metals in the cured product obtained by adjusting the mixing ratio. 1 is essential in that it can be adjusted as appropriate.

丑だ混合比率も重要であり混合比率と)I14折率の関
係は直線関係企イイしているという興味ある事実も詳細
な研究によ遵見い出している。光ディスク用基板として
は、芳香族系樹脂と脂環族系樹脂の比率が9:1〜1:
9の範囲が好ましく、芳香族系樹脂がこの範囲より多い
場合は屈折率が大きくなってしまい、逆に脂環族系樹脂
が多い場合は屈折率が小さくなってしまう。また、ブロ
ム化エポキシ樹脂も適宜利用可能である。
The mixing ratio is also important, and detailed research has revealed the interesting fact that there is a linear relationship between the mixing ratio and the I14 refractive index. For optical disc substrates, the ratio of aromatic resin to alicyclic resin is 9:1 to 1:
The range of 9 is preferable, and if the amount of aromatic resin exceeds this range, the refractive index will become large, and conversely, if the amount of alicyclic resin is large, the refractive index will become small. Furthermore, brominated epoxy resins can also be used as appropriate.

本発明において用いられる基板を得るために用いられる
硬化剤である酸無水物としては液状エポキシ樹脂との相
溶性が優れていればすべて適用可能であるが、特にヘキ
サヒドロ無水フタル酸、テトラヒドロ無水フタール酸、
メチルテトラヒドロ無水フタール酸、エンドメチレンテ
トラヒドロ無水フタール酸、ダリアセライン酸無水物等
の脂肪族系又は脂環族系のものおよび無水マレイン酸、
無水フタル酸、無水トリメリット酸、無水ピロメリット
酸等の不飽和脂肪族系又は芳香族系のものとがあり硬化
剤についても前記樹脂における場合と同様の理由から混
合利用も有効であり、特に芳香族系硬化剤と脂環族系硬
化剤の組合わせが望ましい。硬化剤では、芳香環濃度の
高いもの程、高屈折率の硬化物が得られる。
As the acid anhydride used as the curing agent to obtain the substrate used in the present invention, any acid anhydride can be used as long as it has excellent compatibility with the liquid epoxy resin, but hexahydrophthalic anhydride and tetrahydrophthalic anhydride are particularly applicable. ,
Aliphatic or alicyclic anhydride such as methyltetrahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, daliaceric anhydride, and maleic anhydride;
There are unsaturated aliphatic or aromatic curing agents such as phthalic anhydride, trimellitic anhydride, and pyromellitic anhydride, and for the same reasons as in the case of the above-mentioned resins, it is also effective to use a mixture of curing agents. A combination of an aromatic curing agent and an alicyclic curing agent is desirable. As for the curing agent, the higher the aromatic ring concentration, the higher the refractive index of the cured product.

本発明に用いられる基板を得るために用いられる硬化促
進剤としては2−エチル−4−メチルイミダゾール、2
−メチルイミダゾール、1−ベンジル−2−メチルイミ
ダゾール等のイミダゾール類、8級アミン類等があるが
イミダゾール類が望ましい。また変色防止剤は本発明に
用いられる基板を得るため重要であり、光透過安定性に
寄与するものである。これら変色防止剤としては2−6
−ジターシャリ−ブチルフェノール等のヒンダードフェ
ノール類、有機スルフィド類、有機フォスファイト類、
高級脂肪酸塩等が単独、もしくは組合わせて使用される
。特に高温下での変色安定性を確保するため、これらの
併用効果は著じるしい場合がある。
The curing accelerator used to obtain the substrate used in the present invention includes 2-ethyl-4-methylimidazole, 2-ethyl-4-methylimidazole,
-Imidazoles such as methylimidazole and 1-benzyl-2-methylimidazole, 8th class amines, and the like, but imidazoles are preferred. Further, the anti-discoloration agent is important for obtaining the substrate used in the present invention, and contributes to light transmission stability. These discoloration inhibitors include 2-6
- Hindered phenols such as ditertiary-butylphenol, organic sulfides, organic phosphites,
Higher fatty acid salts and the like are used alone or in combination. Particularly in order to ensure discoloration stability under high temperatures, the effect of these combinations may be significant.

かくして得られる配合物を型に注型し、加熱硬化させて
脱型するといりた謂ゆる注型成形法により基板を得る。
A substrate is obtained by a so-called cast molding method in which the thus obtained compound is cast into a mold, heated and cured, and then removed from the mold.

型としては表面平滑性という観点からガラス型が好まし
く必要ならばガラス表面と適宜離型処理することも有効
である。
The mold is preferably a glass mold from the viewpoint of surface smoothness, and if necessary, it is also effective to appropriately release the mold from the glass surface.

次いで該基板上に、ビニルシラン、メタクリロキシアル
キルシラン等のエチレン性2重結合ヲ有するシラン化合
物を有機溶剤に溶解した溶液を用いて処理する。処理法
としては浸漬法、スピンコータ法、ロールコータ−法、
スプレー法等の通常用いられる方法で行なわれる。
Next, the substrate is treated with a solution in which a silane compound having an ethylenic double bond, such as vinylsilane or methacryloxyalkylsilane, is dissolved in an organic solvent. Treatment methods include dipping method, spin coater method, roll coater method,
This is carried out by a commonly used method such as a spray method.

また溶液を得るための有機溶媒としては低級アルコール
類が好ましく、メタノール、エタノール、プロピルアル
コール、イソプロピルアルコール等が挙げられる。ビニ
ルシランと低級アルコニルの比率は1:8〜1:10が
好ましい。又加熱温度は50℃〜120℃好ましくは8
0℃〜100℃の範囲で行なわれ処理時間は温度により
左右され一定しないが通常10〜60分の範囲で行なわ
れる。
Further, as the organic solvent for obtaining the solution, lower alcohols are preferable, and examples thereof include methanol, ethanol, propyl alcohol, isopropyl alcohol, and the like. The ratio of vinylsilane to lower alkonyl is preferably 1:8 to 1:10. In addition, the heating temperature is 50°C to 120°C, preferably 8°C.
The treatment is carried out at a temperature of 0 DEG C. to 100 DEG C., and the treatment time varies depending on the temperature, but is usually carried out in a range of 10 to 60 minutes.

なお加熱処理は不可欠でちゃ、加熱処理のない場合は基
板面がベタつくとか基板面とtrv硬化硬化層脂層着性
が低下してしまう。この加熱効果の理由は定かでは無い
が工l−Iソキン回脂中に存在する一CH基とシラノー
ル基の反応に起因すると推察される。
Note that heat treatment is essential; without heat treatment, the substrate surface becomes sticky or the adhesion of the trv cured layer to the substrate surface deteriorates. Although the reason for this heating effect is not certain, it is presumed to be due to the reaction between the mono-CH group and the silanol group present in the 1-I sokin rejuvenating fat.

次いで処理両面にα硬化樹脂を配するがこの場合使用さ
れる樹脂としては紫外線硬化樹脂はアクリル酸ないしメ
タクリル酸のモノエステル、ジエステル、トリエステル
あるいはテトラエステルの七ツマ−やオリゴマーを主成
分とするものである。
Next, an α-curing resin is placed on both sides of the treated surface. In this case, the UV-curing resin used is mainly composed of 7-mers or oligomers of monoesters, diesters, triesters, or tetraesters of acrylic acid or methacrylic acid. It is something.

例、tばエチルアクリレート、n−ブチルアクリレート
、ヘキシルアクリしノート、オクチルアクリレート、2
−エチルへキシルアクリレート、オクタデシルアクリレ
ート、エトキシエチルアクリレートおよびフェノキシエ
チルアクリレートのようなアルキルアクリレート、アル
コキシアルキルアクリレート、フェノキシアルキルアク
リレートおよびフェニルアクリレートやジアクリレート
、例、tJf 1.3−プロノぐンジオールジアクリレ
ート、ジエチレングリコールジアクリレートおよびテト
ラエチレングリコールジアクリレートのようなアルカン
ジオールジアクリレートおよびアルケングリコールジア
クリレートやトリアクリレート、例えばトリメチロール
プロノζンドリアクリレートおよびペンタエリトリトー
ルトリアクリレートやテトラアクリレート、例えばRン
タエリトリトールテトラアクリレートのオリゴマのアク
リル酸エステル、例えばぼりエチレングリコールアクリ
レート、ウレタンアクリレート、ダリエステルアクリレ
ート、及びエポキシアクリレート等である。
Examples, ethyl acrylate, n-butyl acrylate, hexyl acrylate, octyl acrylate, 2
- alkyl acrylates, alkoxyalkyl acrylates, phenoxyalkyl acrylates and phenyl acrylates and diacrylates, such as ethylhexyl acrylate, octadecyl acrylate, ethoxyethyl acrylate and phenoxyethyl acrylate, e.g. tJf 1,3-pronogundiol diacrylate, Oligomers of alkanediol diacrylates and alkene glycol diacrylates and triacrylates such as diethylene glycol diacrylate and tetraethylene glycol diacrylate, such as trimethylolprono-and-dryacrylate and pentaerythritol triacrylate and tetraacrylate, such as R-ntaerythritol tetraacrylate. acrylic esters such as ethylene glycol acrylate, urethane acrylate, daryester acrylate, and epoxy acrylate.

なお、光開始剤については、透明樹脂基板の光透過特性
を留意すべきものであシ、該エポキシ樹脂基板において
は290nm以下の波長光はほとんど透過しないため、
適当なものとして例えば2,2−ジメトキシ−2−フェ
ニ゛ルアセトフェノン、ベンゾインイソブチルエーテル
等の比較的長波長領域での感度の良好な光開始剤または
その組合せが好ましい。また、強じん性附与目的で、主
成分100重量部に一すチオール化合物を2〜10、好
ましくは5重量部程度添加することが出来る。10重量
部を越える量の添加は、耐熱性、硬度、ガラス転移点等
において好ましい結果が得られない。
Regarding the photoinitiator, it is important to pay attention to the light transmission characteristics of the transparent resin substrate, and since the epoxy resin substrate hardly transmits light with a wavelength of 290 nm or less,
Suitable photoinitiators having good sensitivity in a relatively long wavelength range, such as 2,2-dimethoxy-2-phenylacetophenone and benzoin isobutyl ether, or combinations thereof are preferred. Further, for the purpose of imparting toughness, 2 to 10, preferably about 5 parts by weight of a monothiol compound can be added to 100 parts by weight of the main component. If the amount exceeds 10 parts by weight, favorable results cannot be obtained in terms of heat resistance, hardness, glass transition point, etc.

さらに必要に応じ紫外線硬化樹脂系に安定剤、変色防止
剤、付着性附与剤等を添加しても良い。
Furthermore, if necessary, stabilizers, discoloration inhibitors, adhesion agents, etc. may be added to the ultraviolet curable resin system.

次いで上記α硬化樹脂を処理エポキシ基板両面に配しこ
れを金属スタン・S−とガラス板で鋏圧し、ガラス板面
よりUV″If:、を照射し、2層のUVm脂層を硬化
せしめる。この場合処理された基板表面にはエチレン性
2重結合が存在するためUV硬化樹脂と反応を生じ強固
に密着する。一方金属スタン・り−およびガラス板表面
は衆知の如く極めて親水性界面を有しているため、α硬
化樹脂とは全く接着せず脱型転写が極めて有効に行なわ
れる。
Next, the above-mentioned α-curing resin is placed on both sides of the treated epoxy substrate and pressed between a metal stun S- and a glass plate, and UV'' If: is irradiated from the glass plate surface to cure the two UVm resin layers. In this case, the surface of the treated substrate has ethylenic double bonds that react with the UV curing resin and form a strong bond.On the other hand, the surface of the metal stand and glass plate has an extremely hydrophilic interface as is well known. Therefore, it does not adhere to the α-curing resin at all, and the mold release transfer is performed extremely effectively.

かくして得られる基板は片面に転写された溝を有し、他
面に平滑硬化樹脂層を有する、光・磁気ディスク用基板
として極めて優れた基板であった。
The thus obtained substrate had grooves transferred to one side and a smooth cured resin layer on the other side, and was an extremely excellent substrate for optical/magnetic disks.

以下に実施例を示す。Examples are shown below.

〔実施例〕〔Example〕

実施例1 注型法で得られた透明性の良好なエポキシ基板にカップ
リング処理剤としてγ−メタクリロキシプロピルトリメ
トキシシラン/エタノール1/8(重量比)を用い、浸
漬法にてエポキシ基板両面に均一に塗布し、100℃、
1時間、乾燥器にて加熱処理し、これをアセトンで洗浄
し、両面カップリング処理したエポキシ基板を得た。次
に第1図の様に紫外線硬化樹脂をコートし、樹脂を硬化
させた後原盤(1)、圧締板(4)からエポキシ基板を
はくりし、片面に所定の凹凸を有し、両面紫外線硬化樹
脂でコートした光ディスク用基板を得た。該基板は密着
性にすぐれ、かつ、反りのないものであった0 比較例1 カップリング処理を施さないエポキシ基板に実施例と同
様に紫外線硬化樹脂を塗布し、硬化させたがコート樹脂
とエポキシ基板の密着性に劣り、信頼性だりうる光ディ
スク用基板は得られなかった。
Example 1 Using γ-methacryloxypropyltrimethoxysilane/ethanol 1/8 (weight ratio) as a coupling treatment agent on an epoxy substrate with good transparency obtained by a casting method, both sides of the epoxy substrate were coated by a dipping method. Apply it evenly to 100℃,
This was heated in a dryer for 1 hour, and washed with acetone to obtain an epoxy substrate subjected to double-sided coupling treatment. Next, as shown in Figure 1, after coating with ultraviolet curable resin and curing the resin, the epoxy substrate is peeled off from the master (1) and the pressing plate (4). An optical disc substrate coated with an ultraviolet curing resin was obtained. The substrate had excellent adhesion and did not warp.0 Comparative Example 1 An epoxy substrate that had not been subjected to coupling treatment was coated with an ultraviolet curing resin and cured, but the coating resin and epoxy The adhesion of the substrate was poor, and a reliable optical disk substrate could not be obtained.

比較例2 片面にカップリング処理を施したエポキシ基板を用い、
実施例と同様に紫外線硬化樹脂をカンプリング処理面と
原盤の間のみ塗布し、硬化させ、片面所定の凹凸を有す
る光ディスク用基板をえた。
Comparative Example 2 Using an epoxy substrate with coupling treatment on one side,
In the same manner as in the example, an ultraviolet curable resin was applied only between the compacted surface and the master disk and cured to obtain an optical disk substrate having a predetermined unevenness on one side.

しかし得られた該基板は明らかに反りがみられ、トラッ
キング、フォーカシング制御の困難な基板であった。
However, the obtained substrate was clearly warped, making it difficult to control tracking and focusing.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による光ディスク用基板を製造する模式
図である。 図中1は原盤(スタンノ!′)、2はエポキシ基板、3
は紫外線硬化樹脂、4はシラン化合物層、5はガラス板
、6は紫外線光源
FIG. 1 is a schematic diagram of manufacturing an optical disk substrate according to the present invention. In the figure, 1 is the master (Stanno!'), 2 is the epoxy board, and 3
is an ultraviolet curing resin, 4 is a silane compound layer, 5 is a glass plate, and 6 is an ultraviolet light source

Claims (2)

【特許請求の範囲】[Claims] (1)エポキシ樹脂、有機多塩基酸無水物、硬化促進剤
及び変色防止剤から成るエポキシ樹脂の注型透明硬化物
平板を得た後、該透明基板両面に、エチレン性2重結合
を含有するシラン化合物の溶液を塗布するかまたは該基
板をシラン化合物の溶液中に浸漬した後50℃以上の温
度で加熱処理を施す工程と、処理した両面にその硬化物
硬度がエポキシ樹脂硬化物硬度より高い硬化物の得られ
る紫外線硬化樹脂を介在せしめ、片面に案内溝を有する
原板またはスタンパーを積載し、他面に平滑面を有する
ガラス板を積載し、全体を圧接した後、ガラス板側から
紫外線を照射し両面に介在する紫外線硬化樹脂層を同時
に硬化せしめる工程と、案内溝を有する原板およびガラ
ス板を取りはずしてエポキシ樹脂基板片面に所望の案内
溝を転写すると同時に他面に紫外線硬化平滑面を形成す
る工程から成ることを特徴とする案内溝を有する光ディ
スク用基板の製造方法。
(1) After obtaining a cast transparent cured flat plate of an epoxy resin consisting of an epoxy resin, an organic polybasic acid anhydride, a curing accelerator, and a discoloration inhibitor, both surfaces of the transparent substrate contain ethylenic double bonds. A step of applying a solution of a silane compound or immersing the substrate in a solution of a silane compound and then heat-treating at a temperature of 50°C or higher, and the hardness of the cured product on both treated surfaces is higher than the hardness of the cured product of the epoxy resin. An ultraviolet curable resin that can be obtained as a cured product is interposed, an original plate or a stamper with a guide groove on one side is loaded, a glass plate with a smooth surface is placed on the other side, and after the whole is pressed together, ultraviolet rays are applied from the glass plate side. A process of simultaneously curing the ultraviolet curable resin layers interposed on both sides by irradiation, and removing the original plate and glass plate having guide grooves, transferring the desired guide grooves to one side of the epoxy resin substrate, and simultaneously forming an ultraviolet curable smooth surface on the other side. 1. A method of manufacturing an optical disc substrate having a guide groove, the method comprising the steps of:
(2)紫外線硬化樹脂がアクリル酸ないしメタクリル酸
のモノエステル、ジエステル、トリエステルあるいはテ
トラエステルのモノマーやオリゴマーを主成分とするも
のである特許請求の範囲第1項記載の案内溝を有する光
ディスク用基板の製造方法。
(2) For an optical disk having a guide groove according to claim 1, wherein the ultraviolet curable resin is mainly composed of a monomer or oligomer of a monoester, diester, triester, or tetraester of acrylic acid or methacrylic acid. Substrate manufacturing method.
JP25489585A 1985-11-15 1985-11-15 Production of substrate for optical disk having guide groove Pending JPS62117153A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25489585A JPS62117153A (en) 1985-11-15 1985-11-15 Production of substrate for optical disk having guide groove

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25489585A JPS62117153A (en) 1985-11-15 1985-11-15 Production of substrate for optical disk having guide groove

Publications (1)

Publication Number Publication Date
JPS62117153A true JPS62117153A (en) 1987-05-28

Family

ID=17271332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25489585A Pending JPS62117153A (en) 1985-11-15 1985-11-15 Production of substrate for optical disk having guide groove

Country Status (1)

Country Link
JP (1) JPS62117153A (en)

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