JPS60209938A - Production of optical recording medium - Google Patents

Production of optical recording medium

Info

Publication number
JPS60209938A
JPS60209938A JP6507084A JP6507084A JPS60209938A JP S60209938 A JPS60209938 A JP S60209938A JP 6507084 A JP6507084 A JP 6507084A JP 6507084 A JP6507084 A JP 6507084A JP S60209938 A JPS60209938 A JP S60209938A
Authority
JP
Japan
Prior art keywords
resin
epoxy resin
substrate
refractive index
alicyclic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6507084A
Other languages
Japanese (ja)
Inventor
Setsuo Suzuki
節夫 鈴木
Koji Morishita
森下 浩二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP6507084A priority Critical patent/JPS60209938A/en
Publication of JPS60209938A publication Critical patent/JPS60209938A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/253Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
    • G11B7/2533Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins

Landscapes

  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To obtain a substrate which has excellent heat resistance, thermal shape retentivity, moisture resistance and water resistance and is further adjusted as desired in refractive index by using a soln. contg. vinyl silane in treating an epoxy resin substrate. CONSTITUTION:A substrate for an optical disk consists preferably of an arom. resin and alicyclic resin in a 9:1-1:9 ratio range. The refractive index is too large if the ratio of the arom. resin is more than said range and conversely the refractive index is too small if the rate of the alicyclic resin is more than said range. A bromoepoxy resin is usable suitably usable as well. A combination of an arom. hardener and alicyclic hardener is preferable as a hardener. The hardened material having the higher refractive index is obtd. with the higher concn. of the arom. ring. The vinyl silane is ethylenic unsatd. silane, e.g. methacryloxy alkyl silane such as gamma-methcryloxy propyl trimethoxysilane and the ratio of the vinyl silane and lower alcohol is preferably 1:8-1:10.

Description

【発明の詳細な説明】 本発明は光学記録媒体に2いて、エポキシ樹脂注型硬化
切上基板とし、δらに紫外線硬化樹脂により所定の凹凸
全原板、スタンパ−力≧ら転写せしめる方法に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming an epoxy resin cast cured cut-up substrate on an optical recording medium, and transferring a predetermined irregularity of the entire original plate with an ultraviolet curable resin and a stamper force of ≧ to δ. It is.

この所定の凹凸とは、ビデオディスクやデジタルオーデ
ィオディスクでは信号ビットであり、画像ファイルやコ
ンピューターファイルに用いられるディスクでは案内溝
である。
These predetermined irregularities are signal bits in video discs and digital audio discs, and guide grooves in discs used for image files and computer files.

従来謂ゆる光学記録媒体に用いらnる基板は、ガラス又
は透明な合成樹脂基板でろって、且つ複屈折の無いとい
う条件のために光学的に等方性である材料が用いられて
米て寂9、ポリメチルメタクリレート、ポリスルホン、
ポリカーボネート、ポリビニルクロライド、ビニルクロ
ライドトビニルアセテートの共重合体等が提案されてき
た。然1、た九らr−rL、I−、の中で家I7ワ嵌4
律 臀受凸誂市社ふいりた点ではとんどポリメチルメタ
クリレート(PMMA)が用いられている。ポリメチル
メタクリレ−)(PMMA)基板は一般に射出成形によ
り得られる。然しなからポリメチルメタアクリレ−) 
(PMMA)の基板の場合、記録密度の向上に伴ない媒
体の一度の信頼性が要求されだして米ると以下の欠点が
大きな問題となって米る。
Conventionally, the substrates used in so-called optical recording media are either glass or transparent synthetic resin substrates, and in order to avoid birefringence, optically isotropic materials are used. Jaku9, polymethyl methacrylate, polysulfone,
Polycarbonate, polyvinyl chloride, copolymers of vinyl chloride and tovinyl acetate, and the like have been proposed. 1, Takura r-rL, I-, in the house I7 wa 4
Polymethyl methacrylate (PMMA) is used in most cases. Polymethyl methacrylate (PMMA) substrates are generally obtained by injection molding. However, polymethyl methacrylate)
In the case of (PMMA) substrates, the following drawbacks become major problems as the reliability of the medium begins to be required as the recording density increases.

■耐熱性に劣るため、各種の機能膜蒸層に際して、基板
異面の温度が上昇し、変形が生じる。
■Due to poor heat resistance, when various functional films are vaporized, the temperature of different surfaces of the substrate increases, causing deformation.

@熱可塑性樹脂であるためアクセス時の高速回転時、遠
心力によるクリープを生じる場合がある。
@Since it is a thermoplastic resin, creep may occur due to centrifugal force during high-speed rotation during access.

また保管時に高温にさらされると変形が生じ謂ゆる回転
に伴なう面プレが大きくなる。
Furthermore, if exposed to high temperatures during storage, deformation occurs, which increases surface play due to so-called rotation.

θ吸湿性が犬であるため、吸湿変形が生じると71\、
愼籠膜の酸化ケ助長するといつた問題が生じる。
Since θ hygroscopicity is dog, if hygroscopic deformation occurs, 71\,
If the oxidation of the cage film is promoted, the following problems will occur.

O射出成形で製造する為、成形歪が残り複屈折を生じる
Since it is manufactured by O injection molding, molding distortion remains and birefringence occurs.

■屈折率の調整が困難であり一つの屈折率に限定烙れて
しまう。
■Adjusting the refractive index is difficult and is limited to one refractive index.

等である。etc.

本願発明者らはかかる欠点を克服すべくまず各種樹脂音
用いた基板について検討を行ない、エポキシ樹脂、有機
多塩基酸無水物、硬化促進剤、および変色防止剤からな
るエポキシ樹脂組成*’を注型力ロ熱成形することによ
り得ら扛る基板が光学記録媒体として上記欠点tS消す
るものでるること1見い出した。
In order to overcome such drawbacks, the inventors of the present invention first investigated substrates using various resins, and developed an epoxy resin composition*' consisting of an epoxy resin, an organic polybasic acid anhydride, a curing accelerator, and a discoloration inhibitor. It has been found that a substrate obtained by thermoforming can be used as an optical recording medium and eliminates the above-mentioned drawbacks.

また該基板上に信号ピット、案内溝全形成すべく、紫外
線硬化樹脂を塗布し原盤スタンバを圧接後、基板面力・
ら紫外光を照射し、樹脂層を硬化せしめて脱型して凹凸
を転写する従来公知の方法全適用した。しかしながら基
板がエポキシ樹)1酋硬化物に変ることによυ以下の如
き問題が生じた。
In addition, in order to form all the signal pits and guide grooves on the substrate, after applying ultraviolet curable resin and pressing the master standber, the substrate surface force and
All conventional methods were used, including irradiating the resin layer with ultraviolet light to cure the resin layer, removing the mold, and transferring the unevenness. However, by changing the substrate to a cured epoxy resin, the following problems arose.

即ち基板を構成する樹脂がば無水物硬化エポキシ樹脂で
おるため、樹脂骨格の水酸基に起因して、アクリル樹脂
に比較して界面が著しるしく親水性界面となり通常の紫
外線硬化樹脂系では著しるしく密着性に劣るものであっ
た。この欠点を解消する方法として該樹脂系に架橋剤と
して一〇H基、−COOH基等の親水基金有するアクリ
ルモノマーを用いたところ今度は親水性界面ケ有する金
属でおる原盤との密着性も良くなってしまい脱型不可能
であった。
In other words, since the resin constituting the substrate is an anhydride-cured epoxy resin, the hydroxyl groups in the resin skeleton make the interface significantly more hydrophilic than that of acrylic resins, unlike in ordinary UV-curable resin systems. The adhesion was poor. As a way to overcome this drawback, we used an acrylic monomer having a hydrophilic group such as 10H group or -COOH group as a crosslinking agent in the resin system, which resulted in good adhesion to the metal master having a hydrophilic interface. It became impossible to remove the mold.

本願発明者らはこの問題tも解決すべく鋭意検討全型ね
、ビニルシラン金倉む温液を用いて該エポキシ樹脂基盛
金処理するという方法?見い出し比。即ち、エポキシ樹
脂界面においてビニルシラン化合吻のシランとエポキシ
樹脂骨格中に残存する一〇H基と?反応せしめ次いで7
11]熱処理によるビニル基金重合せしめ疎水性である
紫外線硬化樹脂との親和性?増大せしめ、且つ該樹脂と
原盤との離型性全向上せしめるという方法七見い出し本
願発明に到達した。
In order to solve this problem, the inventors of the present application have earnestly investigated a method of treating the epoxy resin base metal using a hot vinyl silane liquid. Heading ratio. That is, at the epoxy resin interface, the silane of the vinyl silane compound and the 10H group remaining in the epoxy resin skeleton? React and then 7
11] Is it compatible with UV-curable resins that are hydrophobic and polymerized with vinyl foundations through heat treatment? The inventors of the present invention have found a method for increasing the mold releasability between the resin and the master disk.

本発明に2いて用いられるエポキシ樹脂は、常温で液状
のものでめnばすべて適用でき、液状ビスフェノールA
系#脂、脂環族系エポキシ樹脂、脂肪族系エポキシ樹脂
等の樹脂が用いら扛る。またこれらエポキシ樹脂全混合
使用することは、本ボキシ樹脂と液状ビスフェノールA
系m脂の混合は、その混合割合により得られる硬化物の
屈折率?適宜調整することが出来る点で重要でるる。
The epoxy resin used in the present invention is liquid at room temperature and can be applied to all types of liquid bisphenol A.
Resins such as resins, alicyclic epoxy resins, and aliphatic epoxy resins are used. In addition, using a complete mixture of these epoxy resins means that this boxy resin and liquid bisphenol A
Is the refractive index of the cured product obtained depending on the mixing ratio of M type fats? This is important in that it can be adjusted as appropriate.

また混合比率も重要であり混合比率と屈折率の関係は直
線関係?有しているという興味ある事実も詳細な研究に
より見い出している。光デイスク用基板としては、芳香
族系樹脂と脂環族系樹脂の比率が9=1〜1;9の範囲
が好ましく、芳香族系樹脂がこの範囲より多い場合は屈
折率が犬きくなってしまい、逆に脂環族系樹脂が多い場
合は屈折率が小さくなってしまう。また、ブロム化エポ
キシ使脂も適宜利用可能である。
Also, the mixing ratio is important, and is the relationship between the mixing ratio and the refractive index a linear relationship? Through detailed research, we have discovered the interesting fact that For optical disk substrates, the ratio of aromatic resin to alicyclic resin is preferably in the range of 9 = 1 to 1;9, and if the amount of aromatic resin exceeds this range, the refractive index becomes sharp. On the other hand, if there is a large amount of alicyclic resin, the refractive index will become small. Furthermore, brominated epoxy resins can also be used as appropriate.

本発明に2いて用いられる硬化剤でめる酸無水物として
は液状エポキシ樹脂との相溶性が優れていればすべて適
用可能であるが、特にヘキサヒドロ無水7タル酸、テト
ラヒドロ無水フタール酸、メチルテトラヒドロ無水フタ
ール酸、エンドメチレンテトラヒドロ無水フタール酸、
ポリアセライン酸無水物等の脂肪族系又は脂環族系のも
の2よット酸、無水ピロメリット酸等の不飽和脂肪族系
又は芳香族系のものとがめり硬化剤についても前記樹脂
に2ける場合と同様の理由から混合利用も有効であり、
特に芳香族系硬化剤と力旨環族系硬化剤の組合わせが望
ましい。硬化剤では、芳香環濃度の高いもの程、高屈折
率の硬化物が得られる。
Any acid anhydride used as a curing agent in the present invention can be used as long as it has excellent compatibility with the liquid epoxy resin, but in particular, hexahydro-7-talic anhydride, tetrahydrophthalic anhydride, methyltetrahydro- Phthalic anhydride, endomethylenetetrahydrophthalic anhydride,
Aliphatic or alicyclic hardeners such as polyacelaic anhydride, unsaturated aliphatic or aromatic hardeners such as acid, pyromellitic anhydride, etc. are also included in the above resins. Mixed use is also effective for the same reasons as in case
In particular, a combination of an aromatic curing agent and a cyclic curing agent is desirable. As for the curing agent, the higher the aromatic ring concentration, the higher the refractive index of the cured product.

本発明に用いられる硬化促進剤としては2−エチル−4
−メチルイミダゾール、2−メチルイミダゾール、l−
ベンジル−2−メチルイミダゾール等のイミダゾール類
、8級アミン類等があるがイミダゾール類が望ましい。
The curing accelerator used in the present invention is 2-ethyl-4
-Methylimidazole, 2-methylimidazole, l-
There are imidazoles such as benzyl-2-methylimidazole, 8th class amines, etc., but imidazoles are preferable.

また変色防止剤は本発明に2いて重要であり、光透過安
定性に寄与するものである。
The anti-discoloration agent is also important in the present invention and contributes to light transmission stability.

これら変色防止剤としては2−6−ジターシャリ−ブチ
ルフェノール等のヒンダードフェノール類、有機スルフ
ィド類、有機7オスフアイト類、高級脂肪酸塩等が単独
、もしくは組合わせて使用される。
As these discoloration inhibitors, hindered phenols such as 2-6-ditertiary-butylphenol, organic sulfides, organic heptatoosphites, higher fatty acid salts, etc. are used alone or in combination.

特に高温下での変色安定性全確保するため、これらの併
用効果は著しるしい場合がある。
Particularly in order to ensure complete discoloration stability under high temperatures, the effect of these combinations may be remarkable.

また、ここにいうビニルシランはエテン系不飽和シラン
、特にγ−メタクリロキシプロピルトリメトキシシラン
のようなメタクリロキシアルキルシランである。また低
級アルコールとしては、メタノール、エタノール、プロ
ビアアルコール、イソプロピルアルコール等が挙げられ
る。又、ビニルシランと低級アルコールの比率はl:8
〜1:10が好ましい。又加熱温度は50°0〜120
℃好ましくは80℃辷100 ’Oの範囲で行なわれ処
理時間は温度により左右され一定しないが通常10〜6
0分の範囲で行なわれる。
Furthermore, the vinyl silane referred to herein is an ethenically unsaturated silane, particularly a methacryloxyalkylsilane such as γ-methacryloxypropyltrimethoxysilane. Examples of lower alcohols include methanol, ethanol, provia alcohol, isopropyl alcohol, and the like. Also, the ratio of vinyl silane and lower alcohol is 1:8.
~1:10 is preferred. Also, the heating temperature is 50°0~120
It is preferably carried out at a temperature of 80°C x 100°C, and the treatment time varies depending on the temperature, but is usually 10 to 6°C.
This is done within a range of 0 minutes.

紫外線硬化樹脂はアクリル酸ないしメタクリル酸のモノ
エステル、ジエステル、トリエステルあるいはテトラエ
ステルのモノマーやオリゴマー?主成分とするものであ
る。
Is the UV curing resin a monomer or oligomer of acrylic acid or methacrylic acid monoester, diester, triester, or tetraester? It is the main ingredient.

例えばエチルアクリレート、n−ブチルアクリレート、
ヘキシルアクリレート、オクチルアクリレート、2−エ
チルへキシルアクリレート、オクタデシルアクリレート
、エトキシエテルアクリレート2よびフェノキシエチル
アクリレートのようなアルキルアクリレート、アルコキ
シアルキルアクリレート、フェノキシアルキルアクリレ
ート2よびフェニルアクリレートやジアクリレート、例
えば1.8−プロパンジオールジアクリレート、ジエチ
レングリコールジアクリレート2よびテトラエチレング
リコールジアクリレートのようなアルカンジオールジア
クリレート3よびアルケングリコールジアクリレートや
トリアクリレート、例えばトリメチロールプロパントリ
アクリレートおよびペンタエリトリトールトリアタリレ
ートやテトラアクリレート、例えばペンタエリトリトー
ルテトラアクリレートのオリゴマのアクリル酸エステル
、例えばポリエチレングリコールアタリレート、ウレタ
ンアクリレート、ポリエステルアクリレート、及びエポ
キシアタリレート等である。
For example, ethyl acrylate, n-butyl acrylate,
Alkyl acrylates, alkoxyalkyl acrylates, phenoxyalkyl acrylates 2 and phenyl acrylates and diacrylates, such as hexyl acrylate, octyl acrylate, 2-ethylhexyl acrylate, octadecyl acrylate, ethoxyethyl acrylate 2 and phenoxyethyl acrylate, such as 1.8- Alkanediol diacrylates 3 such as propane diol diacrylate, diethylene glycol diacrylate 2 and tetraethylene glycol diacrylate 3 and alkene glycol diacrylates and triacrylates such as trimethylolpropane triacrylate and pentaerythritol triacrylate and tetraacrylates such as penta Oligomeric acrylic esters of erythritol tetraacrylate, such as polyethylene glycol acrylate, urethane acrylate, polyester acrylate, and epoxy arylate.

なお、光開始剤については、透明樹脂基板の光透過特性
を留意すべきものであり、該エポキシ樹脂基板において
は290nm以下の波長光はほとんど透過しないため、
適当なものとして例えば2.2−ジメトキシ−2−フェ
ニルアセトフェノン、ベンゾインイソブチルエーテル等
の比較的長波長領域での感匿の艮好な光開始剤またはそ
の組合せが好ましい。また、強じん性附与目的で、主成
分100重量部にポリチオール化合物t2〜10、好ま
しくは5重量S程度添加することが出来る。10重量部
を越える童の添加は、耐熱性、硬度、ガラス転移点等に
おいて好ましい結果が得られない。さらに必要に応じ紫
外線硬化樹脂系に安定剤、変色防止剤、付涜性附与剤等
を添加しても良い。
Regarding the photoinitiator, the light transmission characteristics of the transparent resin substrate should be taken into consideration, and since the epoxy resin substrate hardly transmits light with a wavelength of 290 nm or less,
Suitable photoinitiators with good sensitivity in a relatively long wavelength range, such as 2,2-dimethoxy-2-phenylacetophenone, benzoin isobutyl ether, or combinations thereof, are preferred. Further, for the purpose of imparting toughness, a polythiol compound t2 to 10, preferably about 5 weight S, can be added to 100 parts by weight of the main component. If more than 10 parts by weight is added, favorable results cannot be obtained in terms of heat resistance, hardness, glass transition point, etc. Furthermore, if necessary, stabilizers, discoloration inhibitors, anti-fouling agents, etc. may be added to the ultraviolet curable resin system.

本発明により得られた基板は、従来のものに比べ、耐熱
性、熱保形性、耐湿性、耐水性に優れ、ぜらに任意に屈
折率の調整された基板である。
The substrate obtained by the present invention has excellent heat resistance, thermal shape retention, moisture resistance, and water resistance compared to conventional substrates, and also has a refractive index arbitrarily adjusted.

以下に実施例葡挙げる。Examples are listed below.

実施例1 以下の配合のエポキシ樹脂及び硬化剤から成る組iFC
wlJを調整した。
Example 1 iFC set consisting of epoxy resin and curing agent with the following formulation
Adjusted wlJ.

配合組成物A 液状ビスフェノールA型エポキシ樹脂 100重量部メ
チルへキサヒドロフタール酸無水物 88 1ベンゼン
ヒドロキシトルエン 1.0 #2−エチルー4−メチ
ルイミダゾール o5 l配合組成物B 脂環式エポキシ樹脂 100重it部 メチルへキサヒドロフタール酸無水物 122 lベン
ゼンヒドロキシトルエン 1.0 #2−エチルー4−
メチルイミダゾール 2.0#次いで上記配合物の比が
1対1になるように混合し、注型用樹脂組成物とする。
Blended composition A Liquid bisphenol A type epoxy resin 100 parts by weight Methylhexahydrophthalic anhydride 88 1 Benzene hydroxytoluene 1.0 #2-Ethyl-4-methylimidazole o5 l Blended composition B Alicyclic epoxy resin 100 Heavy it part Methyl hexahydrophthalic anhydride 122 l Benzene hydroxytoluene 1.0 #2-ethyl-4-
Methylimidazole 2.0# Next, the above formulations were mixed in a ratio of 1:1 to obtain a resin composition for casting.

該混合樹脂組成物t2枚のガラス板から声成される厚み
1.5麿 のキャビティ内に注入脱泡し120℃2時間
加熱硬化せしめる。さらに、ガラス板ケ離型してエポキ
シ樹脂基板を得た。
The mixed resin composition was injected into a 1.5 mm thick cavity formed from two glass plates, defoamed, and cured by heating at 120° C. for 2 hours. Furthermore, the glass plate was released from the mold to obtain an epoxy resin substrate.

次いでγ−メタクリロ中ジプロピルトリメトキシシラン
のlOチエタノール浴液中に基板?浸漬せしめた後、8
0℃の熱風乾燥器にて80分加熱処理し、こn2アセト
ンにて洗浄した。次に紫外線硬化樹脂tコートし、所定
の凹凸を有する原盤に圧接し、裏面より紫外線ケ照射し
、樹脂r硬化した後、原盤からはくジし、所定の凹凸を
有する紫外線硬化樹脂が強固に密層した後台体を傅た。
Then the substrate was placed in a lO-thiethanol bath of dipropyltrimethoxysilane in γ-methacrylic acid. After soaking, 8
It was heat-treated in a hot air dryer at 0° C. for 80 minutes, and washed with n2 acetone. Next, it is coated with ultraviolet curable resin, pressed against a master disc with predetermined irregularities, irradiated with ultraviolet rays from the back side, and after the resin R is cured, it is peeled off from the master disc, and the ultraviolet curable resin with predetermined irregularities becomes strong. The densely layered rear body was removed.

また原盤からの剥離は容易であった。またこの際使用し
た紫外線硬化樹脂の配合@は以下の如くでめった。
Moreover, it was easy to peel off from the master disc. Further, the formulation of the ultraviolet curing resin used at this time was as follows.

液状ビスフェノールA系エポキシアタリレート 60重
量部ペンタエリスリトールトリアタリンレート 40 
I2 + 2−:)メトキシ−2−ファニルアセトフェ
ノン 81実施例2 実施lと同様な方法で基板を得た後、以下の紫外線硬化
樹脂配合物音用いて基板上に樹脂層全形成し、この樹脂
層を介して案内溝つき原盤を圧接し基盤面より紫外元金
照射し、樹脂を硬化しめた。
Liquid bisphenol A-based epoxy arylate 60 parts by weight Pentaerythritol triatarate 40
I2 + 2-:) Methoxy-2-phanylacetophenone 81 Example 2 After obtaining a substrate in the same manner as in Example 1, a resin layer was entirely formed on the substrate using the following ultraviolet curable resin composition, and this resin layer A master disc with guide grooves was pressed against the base plate through the base plate, and ultraviolet rays were irradiated from the base surface to harden the resin.

ペンタエリスリトールテトラチオプロビオネート 60
重量部トリアリールイソシアスレート 40 Nベンゾ
インイソブチルエーテル 8I 原盤から基板金剥離したところ容易に剥離し、紫外線硬
化樹脂層に案内溝が忠実に転写さn、@脂層が強固に密
層した複合体【得た。
Pentaerythritol tetrathioprobionate 60
Part by weight Triaryl isocyanate 40 N benzoin isobutyl ether 8I When the substrate gold was peeled off from the master, it was easily peeled off, and the guide grooves were faithfully transferred to the ultraviolet curing resin layer. Obtained.

比較例1 エポキシ樹脂基板表面髪処理することなく、実施例1と
全く同様の実験を行ったところ硬化1f11脂層は基板
面に全く接着せず凹凸を有する皮膜が基板面から剥離し
た。
Comparative Example 1 The same experiment as in Example 1 was conducted without hair-treating the surface of an epoxy resin substrate. The cured 1f11 oil layer did not adhere to the substrate surface at all, and a film with unevenness was peeled off from the substrate surface.

比較例2 紫外線硬化樹脂として親水性七ツマ−を用いた以下の配
合物音用い、基板面を処理すること無〈実施例1と同様
な方法會試みた。
Comparative Example 2 A method similar to Example 1 was attempted using the following formulation using hydrophilic 7-mer as an ultraviolet curable resin, but without treating the substrate surface.

液状ビスフェノールA系エポキシアクリレート 60重
−ms2−ヒドロキシ−エチル、メタアクリレート 4
0 Nベンゾインイソブチルエーテル 8I この積来は紫外線硬化#l脂層が基板面と原盤面に接着
してしまい全く脱型不可能であった。
Liquid bisphenol A-based epoxy acrylate 60-ms2-hydroxy-ethyl, methacrylate 4
0 N benzoin isobutyl ether 8I In this case, the ultraviolet-cured #1 resin layer adhered to the substrate surface and the master surface, making it impossible to remove the mold at all.

Claims (1)

【特許請求の範囲】 (1)エポキシ樹脂、有機多塩基酸無水物、硬化促進剤
、及び変色防止剤から成るエポキシ樹脂の注型透明硬化
@を得た後、該透明基板?ビニルシランを含有する低級
アルコール溶液中に浸漬せしめ、50′C以上の温度で
那熱処理を施す工程、と、処理面に紫外線硬化m uh
 ’iコートした後、所定の凹凸を有する原盤又はスタ
ンパ−に圧接し、紫外線により11脂倉硬化ぜしめた後
脱型し基板に所定の凹凸全転写せしめる工程から成るこ
と全特徴とする光学記録媒体の製造方法。 (2)エポキシ樹脂が芳香族系エポキシ樹脂と脂環式エ
ポキシの混合物であって、その配合比が9:1〜l:9
でおる特許請求の範囲第(1)項記載の光学的記録媒体
の製造方法。 (8)エポキシ樹脂が芳香族系エポキシ樹脂と脂環ジ、
硬化物の屈折率が1.50〜1.60の範囲の一定の値
に調整された特許請求の範囲第(1)項又はi 12)
項記載の光学的記録媒体の製造方法。
[Scope of Claims] (1) After obtaining a cast transparent cured epoxy resin consisting of an epoxy resin, an organic polybasic acid anhydride, a curing accelerator, and a discoloration inhibitor, the transparent substrate? A step of immersing the surface in a lower alcohol solution containing vinyl silane and subjecting it to heat treatment at a temperature of 50'C or higher, and applying ultraviolet curing to the treated surface.
Optical recording is characterized in that it consists of a step of applying pressure to a master or stamper having a predetermined unevenness after coating, hardening it with ultraviolet rays, and then removing the mold and transferring all of the predetermined unevenness to the substrate. Method of manufacturing media. (2) The epoxy resin is a mixture of aromatic epoxy resin and alicyclic epoxy, and the blending ratio is 9:1 to 1:9.
A method for manufacturing an optical recording medium according to claim (1). (8) The epoxy resin is an aromatic epoxy resin and an alicyclic di,
Claim (1) or i12) in which the refractive index of the cured product is adjusted to a constant value in the range of 1.50 to 1.60.
A method for producing an optical recording medium as described in Section 3.
JP6507084A 1984-04-03 1984-04-03 Production of optical recording medium Pending JPS60209938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6507084A JPS60209938A (en) 1984-04-03 1984-04-03 Production of optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6507084A JPS60209938A (en) 1984-04-03 1984-04-03 Production of optical recording medium

Publications (1)

Publication Number Publication Date
JPS60209938A true JPS60209938A (en) 1985-10-22

Family

ID=13276317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6507084A Pending JPS60209938A (en) 1984-04-03 1984-04-03 Production of optical recording medium

Country Status (1)

Country Link
JP (1) JPS60209938A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554793A (en) * 1978-05-24 1980-01-14 Philips Nv Information recording element and producing same
JPS5922248A (en) * 1982-07-28 1984-02-04 Sumitomo Bakelite Co Ltd Plastic optical disc

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554793A (en) * 1978-05-24 1980-01-14 Philips Nv Information recording element and producing same
JPS5922248A (en) * 1982-07-28 1984-02-04 Sumitomo Bakelite Co Ltd Plastic optical disc

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