JPH01167315A - Optical disc base plate - Google Patents

Optical disc base plate

Info

Publication number
JPH01167315A
JPH01167315A JP62327604A JP32760487A JPH01167315A JP H01167315 A JPH01167315 A JP H01167315A JP 62327604 A JP62327604 A JP 62327604A JP 32760487 A JP32760487 A JP 32760487A JP H01167315 A JPH01167315 A JP H01167315A
Authority
JP
Japan
Prior art keywords
composition
meth
optical disc
photocuring
stamper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62327604A
Other languages
Japanese (ja)
Inventor
Satoru Tsuchida
悟 土田
Takahiro Horie
隆宏 堀江
Masami Abe
阿部 真美
Teruki Aizawa
輝樹 相沢
Takehiko Ishibashi
石橋 武彦
Haruki Yokono
春樹 横野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP62327604A priority Critical patent/JPH01167315A/en
Publication of JPH01167315A publication Critical patent/JPH01167315A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the title base plate excellent in e.g., surface hardeness, by photocuring, to a specified shape, a composition produced by incorporating a specified amount of a self-scission-type photopolymerization initiator in a composition comprising a specific polymerizable compound and photopolymerizable (meth)acrylate monomer, etc. CONSTITUTION:(I) a composition comprising (A) pref. 5-50wt.% of a polymerizable compound of the formula (R1 is H or CH3; R2 is H, 1-6C alkyl, etc.) and (B) pref. 50-80wt.% of at least one kind of compound selected from (meth)acrylate monomers, vinyl group-contg. monomers each photopolymerizable with the component A is incorporated with (II) 0.5-5wt.%, based on the composition I, of a self-scission-type photopolymerization initiator to produce a composition with a viscosity of <=800cp (at 25 deg.C). This composition is injected, pref. between a transparent plate and stamper with such integral as to be designed to keep a desired level by spacer, followed by ultraviolet irradiation to effect photocuring, thus obtaining the objective optical disc base plate little in optical strain and warpage due to moisture absorption, excellent in heat resistance, mechanical strength, etc.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、音声、画像、情報などを保存、記録、再生す
る光ディスク基板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disc substrate for storing, recording, and reproducing audio, images, information, and the like.

〔従来の技術〕[Conventional technology]

光ディスクメモリー用のディスク基板の製造法としては
、ポリカーボネート樹脂、アクリル樹脂片面にスタンバ
が設置されている金型の中に重合度の低いプラスチック
を高温高圧で流し込んで成形する方法、又ガラス、アク
リル樹脂、ポリカーボネート樹脂、エポキシ樹脂等の平
板上に光硬化性の樹脂を流し込みその上から金属スタン
バを押しあて、基板側から放射線を照射して樹脂を硬化
させ、スタンバを剥離して光ディスク基板を製造する、
所謂22法が知られている。
Disk substrates for optical disk memories are manufactured by pouring plastic with a low degree of polymerization into a mold with a stand bar installed on one side of polycarbonate resin or acrylic resin at high temperature and pressure, or by molding plastic with glass or acrylic resin. , a photocurable resin is poured onto a flat plate of polycarbonate resin, epoxy resin, etc., a metal stand bar is pressed onto it, radiation is irradiated from the substrate side to harden the resin, and the stand bar is peeled off to produce an optical disk substrate. ,
The so-called 22 method is known.

更に特開昭60−112409号公報、特開昭60−2
02557号公報、特開昭61−44689号公報、特
開昭61−98710号公報、特開昭61−11591
3号公報、特開昭61−159411号公報、特開昭6
1−176618号公報にアクリル系樹脂を光硬化させ
て光ディスク基板を製造する方法が提案されている。
Furthermore, JP-A-60-112409, JP-A-60-2
02557, JP 61-44689, JP 61-98710, JP 61-11591
Publication No. 3, JP-A-61-159411, JP-A-6
Japanese Patent No. 1-176618 proposes a method of manufacturing an optical disc substrate by photocuring an acrylic resin.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

光ディスク基板をインジェクション法で成形する方法は
生産性に優れるが、異物が混入しやすく、C/Nが低い
ばかりでなく、ポリカーボネート樹脂については、成形
時の残留応力のため分子が配向して光学的歪(複屈折)
が大きくなり易く、また表面硬度が低いため製造工程時
に傷がつきやすい欠点を有しており、ポリメチルメタク
リレート樹脂については、吸湿性が大きいためディスク
が反りやすく、かつ、耐熱性が低いため記録膜をつけた
溝の熱安定性が低いという問題点がある。
The method of molding optical disk substrates by injection method has excellent productivity, but not only does it allow foreign matter to get mixed in and the C/N ratio is low, but in the case of polycarbonate resin, residual stress during molding causes the molecules to become oriented, resulting in optical problems. Distortion (birefringence)
Polymethyl methacrylate resin has the disadvantage of easily becoming large and easily scratched during the manufacturing process due to its low surface hardness.Polymethyl methacrylate resin has high hygroscopicity, which causes the disc to warp easily, and its heat resistance is low, making it difficult to record. There is a problem that the thermal stability of the groove with the film is low.

又2P法による場合は、2段階で光ディスク基板を作成
するため作業上からも時間を要し、また基板と光硬化樹
脂との密着性の高信頼性も要求され、更に透明な基板の
選定が重要であり、アクリル樹脂では低Tgで吸湿性に
よる反りの問題、ポリカーボネート樹脂は大きい複屈折
、エポキシ樹脂は成形時の硬化時間が長い等の問題があ
る。
Furthermore, in the case of using the 2P method, the optical disc substrate is created in two steps, which takes time, and also requires high reliability in adhesion between the substrate and the photocuring resin, and it is also necessary to select a transparent substrate. Acrylic resins have a problem of warping due to their low Tg and hygroscopicity, polycarbonate resins have large birefringence, and epoxy resins have problems such as a long curing time during molding.

特開昭60−112409号公報、特開昭61−202
557号公報、特開昭61−44689号公報、特開昭
61−98710号公報、特開昭61−115913号
公報、特開昭61−159411号公報、特開昭61−
176618号公報で提案された方法は、反りの低減、
低吸水、低吸湿、耐熱性等を特徴とするとされているが
いずれもまだ実用化に至っていない。
JP-A-60-112409, JP-A-61-202
557, JP 61-44689, JP 61-98710, JP 61-115913, JP 61-159411, JP 61-1987-
The method proposed in Publication No. 176618 reduces warpage,
It is said to have characteristics such as low water absorption, low moisture absorption, and heat resistance, but none of these have yet been put into practical use.

に至っていない。has not yet been reached.

本発明は、光学的歪(複屈折)、吸湿による反りが少な
く、表面硬度、耐熱性、機械的強度に優れ長期信頼性の
高い光ディスク基板を提供するものである。
The present invention provides an optical disk substrate that is less warped due to optical distortion (birefringence) and moisture absorption, has excellent surface hardness, heat resistance, and mechanical strength, and has high long-term reliability.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、Aニー数式 %式% 〔式中R6は11またはCH3を示し、R2はH,C,
〜C6までのアルキル基またはフェニル基を示す。
The present invention is based on the A knee formula % formula % [wherein R6 represents 11 or CH3, R2 represents H, C,
-C6 alkyl group or phenyl group.

〕 で示される重合性化合物と、 B:光重合可能な(メタ)アクリレートモノマー、ビニ
ル基含有モノマーおよびこれらのオリゴマーの中から選
ばれる少なくとも1種以上とを含有する組成物に、該組
成物に対して0.5〜5重量%の自己開裂型光重合開始
剤を含有させた、粘度が800cp (25°C)以下
である樹脂組成物を所定の形状に光硬化させて成る光デ
ィスク基板を提供するものである。
] A composition containing a polymerizable compound represented by B: at least one selected from photopolymerizable (meth)acrylate monomers, vinyl group-containing monomers, and oligomers thereof; Provided is an optical disc substrate made by photocuring a resin composition containing 0.5 to 5% by weight of a self-cleavable photopolymerization initiator and having a viscosity of 800 cp (25°C) or less into a predetermined shape. It is something to do.

A成分の重合性化合物は、代表的にはネオペンチルグリ
コールとピバリン酸から合成される低粘度液状モノマー
である。
The polymerizable compound of component A is a low-viscosity liquid monomer typically synthesized from neopentyl glycol and pivalic acid.

B成分の光重合可能なアクリレートモノマー、ビニル基
含有モノマーおよびこれらのオリゴマーとしては、ビス
フェノールAエポキシ(メタ)アクリレート等のエポキ
シ(メタ)アクリレート、ポリエステル(メタ)アクリ
レート、ウレタン(メタ)アクリレート、シリコーン(
メタ)アクリレート、2.2−ビス(4−メタクリロイ
ルオキシエトキシフェニル)プロパン、2.2−ビス(
4−アクリロイルオキシエトキシビフェニル)プロパン
、2.2−ビス(4−アクリロイルオキシエトキシフェ
ニル)スルホン、2,2−ビス(4−アクリロイルオキ
シエトキシフェル)スルホン、1.6−ヘキサンシオー
ルジ(メタ)アクリレート、トリメチロールプロパント
リ(メタ)アクリレート、ペンタエリスリトールテトラ
(メタ)アクリエート、ジペンタエリスリトールヘキサ
(メタ)アクリレート、エトオキシトリメチロールプロ
パントリ(メタ)アクリレート、ネオペンチルグリコー
ルジ(メタ)アクリレート、トリプロピレングリコール
ジ(メタ)アクリレート、イソボニル(メタ)アクリレ
ート、トリシクロデカニル(メタ)アクリレート、スチ
レン、N−ビニルピロリドン、およびこれらのオリゴマ
ー等が使用される。オリゴマーの分子量は200〜10
00が好ましい。
Photopolymerizable acrylate monomers, vinyl group-containing monomers, and oligomers thereof as component B include epoxy (meth)acrylates such as bisphenol A epoxy (meth)acrylate, polyester (meth)acrylates, urethane (meth)acrylates, silicone (
meth)acrylate, 2.2-bis(4-methacryloyloxyethoxyphenyl)propane, 2.2-bis(
4-Acryloyloxyethoxybiphenyl)propane, 2,2-bis(4-acryloyloxyethoxyphenyl)sulfone, 2,2-bis(4-acryloyloxyethoxyfer)sulfone, 1,6-hexanethiol di(meth)acrylate , trimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, ethoxytrimethylolpropane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, tripropylene Glycol di(meth)acrylate, isobonyl(meth)acrylate, tricyclodecanyl(meth)acrylate, styrene, N-vinylpyrrolidone, oligomers thereof, and the like are used. The molecular weight of the oligomer is 200-10
00 is preferred.

A、B成分は、混合して用いるものであり、それらの混
合割合は、それぞれの種類及び使用量により異なるが、
A成分が50%(重量%以下同じ)を超えると、吸湿性
が増大する傾向にあり、5%未満では耐熱性が低下する
傾向にあり、好ましくない。B成分の各々についても、
それ自体の構造、官能基数、混合後の粘度などにより異
なるため一義的には決められないが、通常50%以上好
ましくは50〜80%使用する。
Components A and B are used in combination, and their mixing ratio varies depending on the type and amount used,
If the A component exceeds 50% (same as below weight %), hygroscopicity tends to increase, and if it is less than 5%, heat resistance tends to decrease, which is not preferable. Regarding each of the B components,
Although it cannot be determined unambiguously because it varies depending on the structure itself, the number of functional groups, the viscosity after mixing, etc., it is usually used in an amount of 50% or more, preferably 50 to 80%.

本発明で用いる光重合開始剤は、硬化物の非着色性の観
点から、自己開裂型が用いられる。これらは公知のもの
でよく、代表的には、ベンゾインメチルエーテル、ベン
ゾインエチルエーテル、2゜2−ジメトキシ−2−フェ
ニルアセトフェノン、■−ヒドロキシシクロへキシルフ
ヱニルケトン、1−(4−イソプロピルフェニル)−2
−ヒドロキシ−2−メチルプロパン等が挙げられる。こ
れらをA、B両成分に対して0.5〜5重量%使用する
。これらは2種以上併用してもよい。
The photopolymerization initiator used in the present invention is a self-cleavable type from the viewpoint of non-coloring of the cured product. These may be known ones, and typically include benzoin methyl ether, benzoin ethyl ether, 2゜2-dimethoxy-2-phenylacetophenone, ■-hydroxycyclohexylphenyl ketone, 1-(4-isopropylphenyl )-2
-Hydroxy-2-methylpropane and the like. These are used in an amount of 0.5 to 5% by weight based on both components A and B. Two or more of these may be used in combination.

本発明の樹脂組成物に、必要に応じて黄変防止剤、紫外
線吸収剤、酸化防止剤、レベリング剤、重合禁止剤、離
型剤、帯電防止剤等のいわゆる添加剤を本発明の効果を
妨げない範囲で添加することができる。
Additives such as anti-yellowing agents, ultraviolet absorbers, antioxidants, leveling agents, polymerization inhibitors, mold release agents, and antistatic agents may be added to the resin composition of the present invention as necessary to achieve the effects of the present invention. It can be added as long as it does not interfere.

又、上記樹脂組成物は、型内に注入して硬化せしめるも
のであるから常温での粘度は極力低いほど良い。粘度を
下げる手段として樹脂組成物を加温する方法があるが、
ポットライフの短縮、樹脂膨張状態での硬化による残留
応力発生といった加温による弊害を生ずるので好ましく
ない。
Furthermore, since the resin composition is injected into a mold and cured, the viscosity at room temperature is preferably as low as possible. There is a method of heating the resin composition as a means of lowering the viscosity.
This is undesirable because it causes disadvantages due to heating, such as a shortened pot life and generation of residual stress due to curing in an expanded state of the resin.

上記樹脂組成物の粘度は、1〜2IIIm厚のキャビテ
ィーに注入することと、脱泡の点から800cp(25
°C)以下とする。粘度が800cpを超えると、注入
及び脱泡が非常に困難になる。
The viscosity of the above resin composition is 800 cp (25
°C) or less. When the viscosity exceeds 800 cp, pouring and defoaming becomes very difficult.

上記樹脂組成物を重合し、ディスク基板を製造するには
、スペーサーで所定の間隔を保つ透明板と金属又は透明
板のスタンパとの間、又は2枚の透明板の間に樹脂組成
物を注入し、片面又は全面から紫外線等を照射し、光硬
化させる。後者の場合は、その後、光硬化させた基板の
上にスタンパの溝を転写した樹脂層を形成する。
To polymerize the above resin composition and manufacture a disk substrate, the resin composition is injected between a transparent plate and a metal or transparent plate stamper, or between two transparent plates, keeping a predetermined distance with a spacer. It is photocured by irradiating it with ultraviolet rays, etc. from one side or the entire surface. In the latter case, a resin layer having the grooves of the stamper transferred thereon is then formed on the photocured substrate.

ソリの無い基板を得るためには、光硬化の際心4、透明
板温度、樹脂組成物温度、スタンパ温度を可及的均一に
することが好ましい。三者の温度差は、20°C以下、
好ましくは、5°C以下が良い。三者間で20°Cを超
える温度差が生じると、基板のソリが大きくなる。
In order to obtain a substrate without warpage, it is preferable to make the center 4, transparent plate temperature, resin composition temperature, and stamper temperature as uniform as possible during photocuring. The temperature difference between the three is less than 20°C.
Preferably, the temperature is 5°C or less. If a temperature difference of more than 20°C occurs between the three, the warpage of the substrate will increase.

又、光照射の際、光照度ムラの是正、リタデーション低
減、及び透明板、スタンパに存在する可能性がある欠陥
(キズ、異物、汚し等)の影響を除去する目的で、光源
や透明板、スタンパを移動あるいは回転して光硬化する
ことが望ましい。
In addition, during light irradiation, the light source, transparent plate, and stamper are It is desirable to photocure by moving or rotating.

〔実施例〕〔Example〕

以下、本発明を実施例に基づいて詳細に説明するが、本
発明はこれに限定されるものではない。
Hereinafter, the present invention will be explained in detail based on Examples, but the present invention is not limited thereto.

実施例1〜4、比較例1.2 2枚の仮ガラスとスペーサーとからなるガラス鋳型を用
意し、この鋳型中に、2重量部の1−(4−イソプロピ
ルフェニル)−2−ヒドロキシ−2−メチルプロパン−
1−オンを添加、混合した第1表No、  1〜No、
 4の粘度が800cp (25°C)以下の各種樹脂
組成物を注入し、80W/cll+高圧水銀灯を用いて
周囲から紫外線を照射した。
Examples 1 to 4, Comparative Example 1.2 A glass mold consisting of two pieces of temporary glass and a spacer was prepared, and in this mold, 2 parts by weight of 1-(4-isopropylphenyl)-2-hydroxy-2 -Methylpropane-
1-one added and mixed Table 1 No. 1 to No.
Various resin compositions having a viscosity of 800 cp (25° C.) or less were injected into the sample, and ultraviolet rays were irradiated from the surrounding area using an 80 W/cll + high-pressure mercury lamp.

60秒間硬化した後、離型し、厚さ1.2 mn+、直
径30ctnの均一な厚みの基板を得た。この基板を用
いて、以下(1)〜(5)の特性を測定したところ第1
表の結果を得た。また比較としてNo、5、No、  
6の表示の樹脂を用いた基板についても特定を測定した
After curing for 60 seconds, the mold was released to obtain a uniform substrate with a thickness of 1.2 m+ and a diameter of 30 ctn. Using this substrate, we measured the following characteristics (1) to (5).
Obtained the results in the table. Also, for comparison, No. 5, No.
The specificity was also measured for a substrate using the resin shown in No. 6.

(1)  吸水率:60″Cの水中に300時間放置し
、JIS−に6911に準じて測定した。
(1) Water absorption rate: The sample was left in water at 60''C for 300 hours and measured according to JIS-6911.

(2)耐熱温度i DMA法によりガラス転移温度を測
定した。
(2) Heat Resistant Temperature i The glass transition temperature was measured by the DMA method.

(3)光学特性:厚さ1.2m+wの樹脂板に830n
mの光をあて、光透過率を分光光度計で求めた。
(3) Optical properties: 830n on a resin plate with a thickness of 1.2m + w
The light transmittance was determined using a spectrophotometer.

又830nmの光をあてて複屈折率を求めて、リターデ
ーションも測定した。
In addition, retardation was also measured by irradiating light of 830 nm to determine birefringence.

(4)表面硬度:鉛筆硬度を求めた。(4) Surface hardness: Pencil hardness was determined.

(5)曲げ強度: J Is−に691 N、:準じて
測定した。
(5) Bending strength: Measured according to JIS-691N.

第1表かられかるように、本発明の基板は、ポリメチル
メタクリレートの基板に比較し、吸水率が小さ(、耐熱
温度が高い。又、ポリカーボネートの基板との比較では
、リターデーション及び表面硬度に優れている。
As can be seen from Table 1, the substrate of the present invention has a lower water absorption rate (and higher heat resistance) than a polymethyl methacrylate substrate.Also, compared to a polycarbonate substrate, it has lower retardation and surface hardness. Excellent.

実施例5〜8 溝状パターン付Ni製スタンパに対して、離型剤を塗布
したガラス板を向かい合せに配置し、両者の間に1.2
 nvの空間を設けて樹脂注入型を形成した。この時、
スタンパベースに25°Cの水を循環させ、ガラス板に
は、ブロアーを用いて25°Cの空気を吹き続けた。
Examples 5 to 8 A glass plate coated with a release agent was placed facing a Ni stamper with a grooved pattern, and 1.2 mm was placed between the two.
A resin injection mold was formed with a space of nv. At this time,
Water at 25°C was circulated through the stamper base, and air at 25°C was continuously blown onto the glass plate using a blower.

この型の中に、恒温槽内で25°Cに保った実施例1〜
4で示された第1表No、  1〜No、  4の各樹
脂を注入し、80 W / cm高圧水銀灯を用いて6
0秒間ガラス板側から紫外線を照射し、樹脂を硬化させ
、溝状パターン付基板を得た。溝付の透明基板にTe系
記録膜を30μm厚さに蒸着した後、基板全体を100
°C,を時間の雰囲気にさらし、記録膜の結晶化を行っ
て光ディスク記録媒体を作成した。得られた光ディスク
記録媒体は、情報出力時の出力レベルは良好であり、か
つ基板に反りが生じなかった。
Example 1~ kept in this mold at 25°C in a constant temperature bath
Inject each resin No. 1 to No. 4 in Table 1 shown in No. 4, and heat it using an 80 W/cm high pressure mercury lamp.
The resin was cured by irradiating ultraviolet rays from the glass plate side for 0 seconds to obtain a grooved patterned substrate. After depositing a Te-based recording film on a grooved transparent substrate to a thickness of 30 μm, the entire substrate was
An optical disc recording medium was prepared by exposing the recording film to an atmosphere of 10°C for a period of time to crystallize the recording film. The obtained optical disc recording medium had a good output level when outputting information, and the substrate did not warp.

実施例9〜10 離型剤を塗布した溝状パターン付ガラス製スタンパに対
して離型剤を塗布したガラス板を用い、実施例5〜8の
要領で樹脂注入剤を用意した。さらに、この型の中に、
実施例1〜4で示された第1表No、  1〜No、 
 3の各樹脂を注入した。80W/ cm高圧水銀灯を
用いて、紫外線をガラス板側から15秒間、スタンパ側
から15秒秒間時に照射して、樹脂を硬化せしめた。得
られた溝状パターン付基板に実施例5〜8と同一処理を
施し光ディスク記録媒体を作製した。
Examples 9 to 10 A resin injection agent was prepared in the same manner as in Examples 5 to 8 using a glass plate coated with a release agent and a grooved patterned glass stamper coated with a release agent. Furthermore, in this mold,
Table 1 No. 1 to No. shown in Examples 1 to 4,
3 resins were injected. Using an 80 W/cm high pressure mercury lamp, ultraviolet rays were irradiated from the glass plate side for 15 seconds and from the stamper side for 15 seconds to cure the resin. The obtained grooved patterned substrate was subjected to the same treatment as in Examples 5 to 8 to produce an optical disc recording medium.

得られた光ディスク記録媒体に反りは見られず、又、情
報の書き込み、読み出しを円滑に行うことができた。
No warping was observed in the obtained optical disc recording medium, and information could be written and read smoothly.

〔発明の効果〕〔Effect of the invention〕

本発明の光ディスク基板は、光学的歪(複屈折)、吸湿
による反りが少な(、表面硬度、耐熱性に優れると共に
、光硬化により短時間で成形できるので生産性に優れて
いる。
The optical disc substrate of the present invention has low optical distortion (birefringence), low warpage due to moisture absorption, excellent surface hardness, and heat resistance, and is excellent in productivity because it can be molded in a short time by photocuring.

また、スペーサで所定の間隔を保つガラス板とスタンパ
との間に樹脂組成物を注入し紫外線等を照射し光硬化さ
せ光ディスク基板を製造すれば、その生産性はさらに高
められる。
Furthermore, productivity can be further improved by injecting a resin composition between the glass plate and the stamper, which are maintained at a predetermined distance by a spacer, and photocuring the resin composition by irradiating it with ultraviolet rays or the like to produce an optical disk substrate.

Claims (1)

【特許請求の範囲】 1、A:一般式 ▲数式、化学式、表等があります▼ 〔式中R_1はHまたはCH_3を示し、R_2はH、
C_1〜C_6までのアルキル基またはフェニル基を示
す。〕 で示される重合性化合物と、 B:光重合可能な(メタ)アクリレートモ ノマー、ビニル基含有モノマーおよびこれらのオリゴマ
ーの中から選ばれる少なくとも1種以上とを含有する組
成物に、該組成物に対して0.5〜5重量%の自己開裂
型光重合開始剤を含有させた、粘度が800cp(25 ℃)以下である樹脂組成物を所定の形状に光硬化させて
成る光ディスク基板。 2、樹脂組成物をスペーサーで所望の間隔を保つ透明板
とスタンパとの間に注入し紫外線を照射し光硬化させて
成る特許請求の範囲第1項記載の光ディスク基板。 3、光硬化させる際に、透明板温度、樹脂組成物温度、
スタンパ温度を均一にして光硬化させて成る特許請求の
範囲第2項記載の光ディスク基板。
[Claims] 1. A: General formula ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R_1 represents H or CH_3, R_2 represents H,
Indicates an alkyl group or a phenyl group from C_1 to C_6. ] A composition containing a polymerizable compound represented by B: at least one selected from photopolymerizable (meth)acrylate monomers, vinyl group-containing monomers, and oligomers thereof; An optical disc substrate formed by photocuring into a predetermined shape a resin composition containing 0.5 to 5% by weight of a self-cleavable photopolymerization initiator and having a viscosity of 800 cp (25°C) or less. 2. The optical disc substrate according to claim 1, wherein a resin composition is injected between the transparent plate and the stamper, which are maintained at a desired distance by a spacer, and is photocured by irradiation with ultraviolet rays. 3. When photocuring, the temperature of the transparent plate, the temperature of the resin composition,
3. The optical disk substrate according to claim 2, which is photocured at a uniform stamper temperature.
JP62327604A 1987-12-24 1987-12-24 Optical disc base plate Pending JPH01167315A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62327604A JPH01167315A (en) 1987-12-24 1987-12-24 Optical disc base plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62327604A JPH01167315A (en) 1987-12-24 1987-12-24 Optical disc base plate

Publications (1)

Publication Number Publication Date
JPH01167315A true JPH01167315A (en) 1989-07-03

Family

ID=18200912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62327604A Pending JPH01167315A (en) 1987-12-24 1987-12-24 Optical disc base plate

Country Status (1)

Country Link
JP (1) JPH01167315A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010142713A (en) * 2008-12-17 2010-07-01 Ckd Corp Filter apparatus
JP2016075911A (en) * 2015-10-15 2016-05-12 キヤノン株式会社 Optical material and optical element
JP2017200979A (en) * 2016-05-06 2017-11-09 キヤノン株式会社 Optical composition, cured product and optical element
USRE47000E1 (en) 2010-05-24 2018-08-21 Canon Kabushiki Kaisha Optical element compound, optical material, and optical element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010142713A (en) * 2008-12-17 2010-07-01 Ckd Corp Filter apparatus
USRE47000E1 (en) 2010-05-24 2018-08-21 Canon Kabushiki Kaisha Optical element compound, optical material, and optical element
JP2016075911A (en) * 2015-10-15 2016-05-12 キヤノン株式会社 Optical material and optical element
JP2017200979A (en) * 2016-05-06 2017-11-09 キヤノン株式会社 Optical composition, cured product and optical element

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