JPH07109657B2 - Light disk - Google Patents

Light disk

Info

Publication number
JPH07109657B2
JPH07109657B2 JP62019637A JP1963787A JPH07109657B2 JP H07109657 B2 JPH07109657 B2 JP H07109657B2 JP 62019637 A JP62019637 A JP 62019637A JP 1963787 A JP1963787 A JP 1963787A JP H07109657 B2 JPH07109657 B2 JP H07109657B2
Authority
JP
Japan
Prior art keywords
protective film
solvent
light beam
plastic substrate
beam irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62019637A
Other languages
Japanese (ja)
Other versions
JPS63188837A (en
Inventor
浩幸 土田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Holdings Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP62019637A priority Critical patent/JPH07109657B2/en
Publication of JPS63188837A publication Critical patent/JPS63188837A/en
Publication of JPH07109657B2 publication Critical patent/JPH07109657B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光ビームの照射によつて情報信号を再生でき
る光デイスクに係わり、特に、基板の保護膜に関する。
The present invention relates to an optical disc capable of reproducing an information signal by irradiating a light beam, and more particularly to a protective film for a substrate.

〔従来の技術〕[Conventional technology]

光デイスクの基板の材料としては、生産性、コストなど
の面から、一般にPC(ポリカーボネイト樹脂)、PMMA
(ポリメチルメタクリレート樹脂)などの熱可塑性樹脂
やエポキシ樹脂などの熱硬化性樹脂が用いられている。
このようなプラスチツク材料からなる基板、すなわち、
プラスチツク基板の一方の面には情報信号を表わすピツ
ト列からなるトラツクが形成されており、他方の面から
光ビームを照射してトラツクを走査することにより、情
報信号を再生することができる。
Generally, PC (polycarbonate resin) and PMMA are used as the substrate material for optical discs from the viewpoint of productivity and cost.
A thermoplastic resin such as (polymethylmethacrylate resin) or a thermosetting resin such as an epoxy resin is used.
A substrate made of such a plastic material, that is,
On one surface of the plastic substrate, a track composed of a pit row representing an information signal is formed, and by irradiating a light beam from the other surface to scan the track, the information signal can be reproduced.

かかる光デイスクにおいては、情報信号を良好に再生で
きるためには、プラスチツク基板の光ビームが照射され
る面、すなわち光ビーム照射面が一様に平坦でかつ塵芥
などが付着しないことが必要である。
In such an optical disc, in order to reproduce the information signal satisfactorily, it is necessary that the surface of the plastic substrate on which the light beam is irradiated, that is, the light beam irradiation surface is uniformly flat and dust and the like are not attached. .

しかしながら、従来では、光ビーム照射面は露出されて
おり、このために、往々にして傷がついたり、塵芥など
が付着しやすい。また、誤つて溶剤などによつて基板表
面が汚染されたりすることもある。光ビーム照射面に傷
がつくと、そこで照射される光ビームが乱反射され、再
生情報信号にレベル変動が生ずるし、また、塵芥や溶剤
などが付着すると、光ビームの透過量が変化して再生情
報信号にレベル変動が生ずる。特に、溶剤などが付着す
ると、これによつてプラスチツク基板が溶解し、光ビー
ム照射面に傷がつくことになる。塵芥や溶剤などが付着
したときにはこれらを拭き取ればよいが、プラスチツク
基板は比較的柔らかいために、光ビーム照射面に傷がつ
きやすいし、また、光ビーム照射面が帯電して塵芥がよ
り付着しやすくなる。
However, in the prior art, the light beam irradiation surface is exposed, which often causes scratches, dust, and the like. Further, the surface of the substrate may be erroneously contaminated by a solvent or the like. When the light beam irradiation surface is scratched, the light beam irradiated there is diffusely reflected, and the level of the reproduced information signal fluctuates. Also, if dust or solvent adheres, the amount of light beam transmission changes and reproduction is performed. Level fluctuations occur in the information signal. In particular, when a solvent or the like is attached, the plastic substrate is dissolved by this, and the light beam irradiation surface is damaged. If dust or solvent adheres to them, they can be wiped off.However, since the plastic substrate is relatively soft, the light beam irradiation surface is easily scratched, and the light beam irradiation surface is charged and dust is more likely to adhere to it. It will be easier.

一方、プラスチツク基板の光ビーム照射面側に保護膜を
設けることが知られている。その一例として、実開昭54
-179104号公報においては、保護膜としてシリコン化合
物とビニール化合物の混合体とし、光ビーム照射面の防
曇性、耐摩耗性を改善した光デイスクが開示されてい
る。
On the other hand, it is known to provide a protective film on the light beam irradiation surface side of the plastic substrate. As an example, Shokai 54
Japanese Patent Publication No. 179104 discloses an optical disk in which a mixture of a silicon compound and a vinyl compound is used as a protective film, and an antifogging property and an abrasion resistance of a light beam irradiation surface are improved.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかしながら、かかる混合体は熱硬化性樹脂であり、こ
れによる保護膜を形成するためには、プラスチツク基板
にこの混合体を塗布した後、熱を加えて硬化させる必要
があるが、その硬化に数時間を要し、光デイスクの生産
性に問題がある。しかも、硬化のための加熱温度が比較
的高温であるために、プラスチツク基板が熱変形してし
まうことになる。
However, such a mixture is a thermosetting resin, and in order to form a protective film by this, it is necessary to apply heat to the plastic substrate and then to cure it. It takes time and there is a problem in the productivity of the optical disk. Moreover, since the heating temperature for curing is relatively high, the plastic substrate is thermally deformed.

また、シリコン系樹脂は強アルカリ性の溶剤に容易に浸
かされるし、硬度が高すぎてしかもプラスチツク材とは
熱膨張率が異なるために、温度変化によつてプラスチツ
ク基板が膨張、収縮すると、保護膜にクラツクが生じた
り、保護膜が剥離するという問題がある。
In addition, since the silicone resin is easily immersed in a strong alkaline solvent, its hardness is too high, and its coefficient of thermal expansion is different from that of the plastic material, so if the plastic substrate expands or contracts due to temperature changes, it will be protected. There are problems that the film is cracked and the protective film is peeled off.

本発明の目的は、かかる問題点を解消し、光ビーム照射
面側の耐傷性に優れ、しかも性能や生産性が向上した光
デイスクを提供することにある。
An object of the present invention is to solve the above problems, and to provide an optical disk having excellent scratch resistance on the light beam irradiation surface side and improved performance and productivity.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的を達成するために、本発明は、光ビーム照射面
側に溶剤型紫外線硬化樹脂からなる保護膜を設けたもの
である。
To achieve the above object, the present invention provides a protective film made of a solvent-type ultraviolet curable resin on the light beam irradiation surface side.

〔実施例〕〔Example〕

以下、本発明の実施例を図面によつて説明する。 Embodiments of the present invention will be described below with reference to the drawings.

図は本発明による光デイスクの一実施例を示す断面図で
あつて、1はプラスチツク基板、1aは記録面、1bは光ビ
ーム照射面、2は記録膜、3は保護膜である。
FIG. 1 is a sectional view showing an embodiment of an optical disk according to the present invention, in which 1 is a plastic substrate, 1a is a recording surface, 1b is a light beam irradiation surface, 2 is a recording film, and 3 is a protective film.

同図において、プラスチツク基板1は、たとえばPC,PMM
Aなどの熱可塑性樹脂もしくはエポキシ樹脂などの熱硬
化性樹脂からなり、その一方の面1aはピツト列からなる
螺施状もしくは同心円状のトラツクが形成された記録面
である。この記録面1aには記録層2が設けられている。
In the figure, the plastic substrate 1 is, for example, a PC or PMM.
The recording surface is made of a thermoplastic resin such as A or a thermosetting resin such as an epoxy resin, and one surface 1a thereof is a recording surface on which a screw-shaped or concentric track made of a pit row is formed. A recording layer 2 is provided on the recording surface 1a.

プラスチツク基板1の他方の面1bは光ビームが照射され
る面であり、この光ビーム照射面1bに保護膜3が設けら
れている。この保護膜3は溶剤型紫外線硬化樹脂からな
り、高硬度でプラスチツク基板1に比べて帯電防止効果
が優れている。これによつて光ビーム照射面1b側の耐傷
性が向上し、帯電による塵芥などの付着を防止できる
し、溶剤によつて浸食されることはない。
The other surface 1b of the plastic substrate 1 is a surface irradiated with a light beam, and the light beam irradiation surface 1b is provided with a protective film 3. The protective film 3 is made of a solvent type ultraviolet curable resin, has a high hardness, and has an excellent antistatic effect as compared with the plastic substrate 1. As a result, scratch resistance on the light beam irradiation surface 1b side is improved, adhesion of dust and the like due to charging can be prevented, and corrosion by a solvent is prevented.

溶剤型紫外線硬化樹脂は、上記のように、機械的強度の
点で優れているが、これを保護膜3として用いる場合、
紫外線照射による硬化時での収縮率が小さくなければな
らない(15%程度以下)し、形成された被膜のプラスチ
ツク基板1との密着性が良好で、かつ屈折率や熱膨張率
がプラスチツク基板1と同程度で、溶剤に浸食されない
ものでなければならない。これらの条件を満足する溶剤
型紫外線硬型樹脂としては保護膜材料をトルエン、アセ
トン、メチルエチルケトン、メチルアルコール、エチル
アルコール、プロピルアルコールなどのいずれか1種類
の溶剤あるいは2種類以上の混合溶剤に溶解したものを
用いるが、プラスチツク基板1の材料によつて異なり、
溶剤を選択して用いなければならない。ここで、その一
具体例を示すと、プラスチツク基板1をPCからなるもの
とした場合、保護膜3として上記諸条件を満す溶剤型紫
外線硬化樹脂はスリーボンド社のUVX-HM・185-2があ
る。
The solvent-type ultraviolet curable resin is excellent in mechanical strength as described above, but when it is used as the protective film 3,
The shrinkage rate upon curing by ultraviolet irradiation must be small (about 15% or less), the adhesion of the formed film to the plastic substrate 1 is good, and the refractive index and the thermal expansion coefficient are the same as those of the plastic substrate 1. It should be comparable and not corrosive to solvents. As a solvent-type UV-hardening resin that satisfies these conditions, the protective film material is dissolved in any one solvent such as toluene, acetone, methyl ethyl ketone, methyl alcohol, ethyl alcohol, propyl alcohol, or a mixed solvent of two or more kinds. However, it depends on the material of the plastic substrate 1,
The solvent must be selected and used. Here, as one specific example, when the plastic substrate 1 is made of PC, UVX-HM.185-2 manufactured by ThreeBond Co., Ltd. is a solvent-type ultraviolet curable resin that satisfies the above conditions as the protective film 3. is there.

次に、この溶剤型紫外線硬化樹脂を保護膜3とした光デ
イスクの保護膜形式方法および性能について説明する。
Next, the method and performance of forming a protective film for an optical disc using the solvent-type ultraviolet curable resin as the protective film 3 will be described.

まず、保護膜形成方法については、PCからなるプラスチ
ツク基板の光ビーム照射面に、スピンコート法により、
溶剤型紫外線硬化樹脂(先のUVX-HM・185-2)を3〜5
μmの厚さで塗布し、80℃の雰囲気内で1分間予備乾燥
を行なつた後(これによつて溶剤を除く)、150mW/cm2
の紫外線を10秒間照射して溶剤型紫外線硬化樹脂を硬化
させる。これによつて保護膜が得られる。
First, regarding the protective film forming method, the light beam irradiation surface of the plastic substrate made of PC is spin-coated,
Solvent type UV curable resin (previous UVX-HM / 185-2) 3-5
150mW / cm 2 after coating with a thickness of μm and predrying for 1 minute in an atmosphere of 80 ° C (thus removing the solvent)
The ultraviolet ray of 10 is irradiated for 10 seconds to cure the solvent type ultraviolet curable resin. Thereby, a protective film is obtained.

このようにして形成された保護膜に対して、次のよう
に、各種の試験を行なつたところ極めて良好な結果が得
られた。
When various tests were performed on the protective film formed in this manner as follows, extremely good results were obtained.

保護膜を100区分にカツテイングし、セロハンテープで
これらを引き剥がすクロスハツチ試験(100/100)を行
なつたが、剥がれる部分は全くなかつた。このように、
PC基板との密着性は極めて良好であつた。また、温度が
60℃、湿度が90%の雰囲気中に1000時間以上、温度が0
℃で湿度が0%の雰囲気中に500時間以上放置する環境
試験に対しても、密着性の変化はみられなかつた。
A cross-hatch test (100/100) was carried out in which the protective film was cut into 100 sections, and these were peeled off with cellophane tape, but no peeling part was found. in this way,
The adhesion to the PC board was extremely good. Also, if the temperature is
1000 hours or more in an atmosphere of 60 ° C and 90% humidity, with a temperature of 0
No change in adhesion was observed even in an environmental test in which the sample was left in an atmosphere of 0 ° C and a humidity of 0% for 500 hours or more.

200gの荷重をかけて保護膜の表面を5000回擦するスチー
ルウール(#0000)試験を行なつたが、その表面には全
く傷がつかなかつた。これにより、保護膜は充分高い耐
擦傷性を有していることがわかる。
A steel wool (# 0000) test was conducted in which the surface of the protective film was rubbed 5000 times under a load of 200 g, but no scratch was found on the surface. This shows that the protective film has sufficiently high scratch resistance.

収縮に伴なうリターデーシヨン変化(複屈折)の測定を
行なつたが、リターデーシヨンは数nm増加しただけで問
題はなかつた。また、保護膜の光線透過率(透明度)は
PC基板と同程度であつた。
We measured the retardation change (birefringence) associated with contraction, but there was no problem because the retardation increased by a few nm. The light transmittance (transparency) of the protective film is
It was about the same as the PC board.

2時間サイクルで−40℃〜+90℃の変化を行ない、これ
を250回繰り返えす熱サイクル試験を行なつたが、密着
性、リターデーシヨンに変化はなかつたし、保護膜にク
ラツクは全く生じなかつた。また、耐溶剤試験を行なつ
たが、保護膜は用いた全ての溶剤に浸食されなかつた。
A thermal cycle test was conducted in which the temperature was changed from -40 ° C to + 90 ° C in a 2-hour cycle, and this was repeated 250 times, but there was no change in adhesion or retardation, and there was no crack on the protective film. It never happened. Further, a solvent resistance test was conducted, but the protective film was not corroded by all the solvents used.

以上のように、PCからなるプラスチツク基板の光ビーム
照射面側での保護膜としては、上記の溶剤型紫外線硬化
樹脂(UVX-HM・185-2)が好適である。この溶剤型紫外
線硬化樹脂をPC基板に塗布したとき、その溶剤がPC基板
の表面を溶解し、紫外線硬化樹脂がPC基板に侵入するい
わゆるアンカー効果が生じ、これによつてPC基板と形成
された保護膜との密着性が良好なのである。また、この
溶剤型紫外線硬化樹脂は親水性官能基を有しており、透
水率がPC基板よりも適度に大きい。この結果、PC基板と
の界面で水が留まつてPC基板から剥離してしまうような
ことがなく、これによつてもPC基板との密着性が良好と
なるし、また、PC基板に比べて帯電防止効果も得られる
ことになる。
As described above, as the protective film on the light beam irradiation surface side of the plastic substrate made of PC, the above solvent-type ultraviolet curable resin (UVX-HM • 185-2) is suitable. When this solvent-type UV curable resin was applied to a PC substrate, the solvent dissolved the surface of the PC substrate, causing a so-called anchor effect in which the UV curable resin penetrates into the PC substrate, thereby forming the PC substrate. It has good adhesion to the protective film. In addition, this solvent-based ultraviolet curable resin has a hydrophilic functional group, and its water permeability is reasonably larger than that of the PC substrate. As a result, water does not stay at the interface with the PC board and peel off from the PC board.This also improves the adhesion to the PC board, and compared to PC boards. As a result, an antistatic effect can be obtained.

〔発明の効果〕 以上説明したように、本発明によれば、プラスチツク基
板の光ビーム照射面側の耐傷性が大幅に改善されること
はもちろんのこと、保護膜の該プラスチツク基板に対す
る密着性、耐擦傷性、収縮率、透明度も優れているし、
保護膜自体も耐溶剤性に優れ、しかも、該保護膜は極め
て短時間で形成できることから、優れた性能を保持でき
る光デイスクの生産性が大幅に向上するという効果を得
ることができる。
[Effects of the Invention] As described above, according to the present invention, the scratch resistance on the light beam irradiation surface side of the plastic substrate is, of course, significantly improved, and the adhesion of the protective film to the plastic substrate, It also has excellent scratch resistance, shrinkage and transparency.
The protective film itself is also excellent in solvent resistance, and since the protective film can be formed in an extremely short time, it is possible to obtain an effect that the productivity of the optical disk capable of maintaining excellent performance is significantly improved.

【図面の簡単な説明】[Brief description of drawings]

図は本発明による光デイスクの一実施例を示す断面図で
ある。 1……プラスチツク基板、1a……記録面、1b……光ビー
ム照射面、2……記録膜、3……保護膜。
FIG. 1 is a sectional view showing an embodiment of an optical disc according to the present invention. 1 ... Plastic substrate, 1a ... recording surface, 1b ... light beam irradiation surface, 2 ... recording film, 3 ... protective film.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】透明なプラスチツク基板の記録面とは反対
側の光ビーム照射面上に、溶剤によって該光ビーム照射
面を溶解した溶剤型紫外線硬化樹脂からなる保護膜を設
けたことを特徴とする光デイスク。
1. A protective film made of a solvent-type ultraviolet curable resin having a light beam irradiation surface dissolved by a solvent is provided on the light beam irradiation surface of the transparent plastic substrate opposite to the recording surface. Light disk to do.
JP62019637A 1987-01-31 1987-01-31 Light disk Expired - Lifetime JPH07109657B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62019637A JPH07109657B2 (en) 1987-01-31 1987-01-31 Light disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62019637A JPH07109657B2 (en) 1987-01-31 1987-01-31 Light disk

Publications (2)

Publication Number Publication Date
JPS63188837A JPS63188837A (en) 1988-08-04
JPH07109657B2 true JPH07109657B2 (en) 1995-11-22

Family

ID=12004730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62019637A Expired - Lifetime JPH07109657B2 (en) 1987-01-31 1987-01-31 Light disk

Country Status (1)

Country Link
JP (1) JPH07109657B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5013594A (en) * 1987-09-25 1991-05-07 Hitachi Maxwell, Ltd. Optical information recording medium and its production
JP2004272995A (en) 2003-03-07 2004-09-30 Tdk Corp Optical disk and its manufacturing method
JP2004272994A (en) 2003-03-07 2004-09-30 Tdk Corp Optical disk and its manufacturing method
JP2004272993A (en) 2003-03-07 2004-09-30 Tdk Corp Optical disk and its manufacturing method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113432A (en) * 1981-01-06 1982-07-14 Mitsubishi Rayon Co Ltd Base plate for video or audio disk
JPS6057552A (en) * 1983-09-07 1985-04-03 Fuji Photo Film Co Ltd Laser recording medium
JPS6145437A (en) * 1984-08-08 1986-03-05 Hitachi Ltd Optical recording medium
JPH0719395B2 (en) * 1984-11-15 1995-03-06 日立化成工業株式会社 Optical disc
JPS61153844A (en) * 1984-12-27 1986-07-12 Fuji Photo Film Co Ltd Information recording medium
JPS637531A (en) * 1986-06-25 1988-01-13 Dainippon Printing Co Ltd Protective film for optical information recording medium

Also Published As

Publication number Publication date
JPS63188837A (en) 1988-08-04

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